JP6429872B2 - 基板ウェハ上に形成された発光デバイスを分離する方法 - Google Patents
基板ウェハ上に形成された発光デバイスを分離する方法 Download PDFInfo
- Publication number
- JP6429872B2 JP6429872B2 JP2016528617A JP2016528617A JP6429872B2 JP 6429872 B2 JP6429872 B2 JP 6429872B2 JP 2016528617 A JP2016528617 A JP 2016528617A JP 2016528617 A JP2016528617 A JP 2016528617A JP 6429872 B2 JP6429872 B2 JP 6429872B2
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- substrate
- crack
- thinning
- sapphire substrate
- forming
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
- H10H20/01335—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/018—Bonding of wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
Landscapes
- Led Devices (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
- Engineering & Computer Science (AREA)
- Drying Of Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361856857P | 2013-07-22 | 2013-07-22 | |
| US61/856,857 | 2013-07-22 | ||
| PCT/IB2014/062784 WO2015011583A1 (en) | 2013-07-22 | 2014-07-02 | Method of separating light emitting devices formed on a substrate wafer |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018203388A Division JP2019033280A (ja) | 2013-07-22 | 2018-10-30 | 基板ウェハ上に形成された発光デバイスを分離する方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016533029A JP2016533029A (ja) | 2016-10-20 |
| JP2016533029A5 JP2016533029A5 (enExample) | 2017-08-10 |
| JP6429872B2 true JP6429872B2 (ja) | 2018-11-28 |
Family
ID=51355579
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016528617A Active JP6429872B2 (ja) | 2013-07-22 | 2014-07-02 | 基板ウェハ上に形成された発光デバイスを分離する方法 |
| JP2018203388A Pending JP2019033280A (ja) | 2013-07-22 | 2018-10-30 | 基板ウェハ上に形成された発光デバイスを分離する方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018203388A Pending JP2019033280A (ja) | 2013-07-22 | 2018-10-30 | 基板ウェハ上に形成された発光デバイスを分離する方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US10079327B2 (enExample) |
| EP (1) | EP3025378B1 (enExample) |
| JP (2) | JP6429872B2 (enExample) |
| KR (1) | KR102231083B1 (enExample) |
| CN (1) | CN105556684B (enExample) |
| TW (2) | TWI726494B (enExample) |
| WO (1) | WO2015011583A1 (enExample) |
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| US11792898B2 (en) | 2012-07-01 | 2023-10-17 | Ideal Industries Lighting Llc | Enhanced fixtures for area lighting |
| US11160148B2 (en) | 2017-06-13 | 2021-10-26 | Ideal Industries Lighting Llc | Adaptive area lamp |
| DE102015109413A1 (de) * | 2015-06-12 | 2016-12-15 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung von optoelektronischen Konversions-Halbleiterchips und Verbund von Konversions-Halbleiterchips |
| US10529696B2 (en) * | 2016-04-12 | 2020-01-07 | Cree, Inc. | High density pixelated LED and devices and methods thereof |
| WO2017190060A1 (en) * | 2016-04-29 | 2017-11-02 | Flir Systems, Inc. | Methods for singulation and packaging |
| DE102016109720B4 (de) * | 2016-05-25 | 2023-06-22 | Infineon Technologies Ag | Verfahren zum Bilden eines Halbleiterbauelements und Halbleiterbauelement |
| JP6981800B2 (ja) * | 2017-07-28 | 2021-12-17 | 浜松ホトニクス株式会社 | 積層型素子の製造方法 |
| TWI780195B (zh) | 2017-08-03 | 2022-10-11 | 美商克里公司 | 高密度像素化發光二極體晶片和晶片陣列裝置以及製造方法 |
| US10734363B2 (en) | 2017-08-03 | 2020-08-04 | Cree, Inc. | High density pixelated-LED chips and chip array devices |
| US10529773B2 (en) | 2018-02-14 | 2020-01-07 | Cree, Inc. | Solid state lighting devices with opposing emission directions |
| DE102018111227A1 (de) * | 2018-05-09 | 2019-11-14 | Osram Opto Semiconductors Gmbh | Verfahren zum Durchtrennen eines epitaktisch gewachsenen Halbleiterkörpers und Halbleiterchip |
| US10903265B2 (en) | 2018-12-21 | 2021-01-26 | Cree, Inc. | Pixelated-LED chips and chip array devices, and fabrication methods |
| US12426506B2 (en) | 2019-07-19 | 2025-09-23 | Evatec Ag | Piezoelectric coating and deposition process |
| KR102868185B1 (ko) * | 2019-08-16 | 2025-10-01 | 삼성전자주식회사 | 반도체 기판 및 이의 절단 방법 |
| EP4052296A1 (en) | 2019-10-29 | 2022-09-07 | Creeled, Inc. | Texturing for high density pixelated-led chips |
| US11646392B2 (en) | 2020-06-09 | 2023-05-09 | Nichia Corporation | Method of manufacturing light-emitting device |
| US11437548B2 (en) | 2020-10-23 | 2022-09-06 | Creeled, Inc. | Pixelated-LED chips with inter-pixel underfill materials, and fabrication methods |
| CN112967990B (zh) * | 2020-11-23 | 2023-02-24 | 重庆康佳光电技术研究院有限公司 | 芯片处理方法、led芯片及显示装置 |
| US11329208B1 (en) * | 2020-12-01 | 2022-05-10 | J C Chen | Pixel assembly process |
| CN112701051B (zh) * | 2020-12-25 | 2024-06-28 | 江苏中科智芯集成科技有限公司 | 一种高效散热的扇出型封装结构及其方法 |
| WO2022141233A1 (zh) * | 2020-12-30 | 2022-07-07 | 泉州三安半导体科技有限公司 | 一种半导体发光元件及其制备方法 |
| CN114141914B (zh) * | 2021-12-01 | 2023-05-23 | 东莞市中麒光电技术有限公司 | 衬底剥离方法 |
| FR3144532A1 (fr) * | 2022-12-28 | 2024-07-05 | Aledia | Procede de fabrication d'un dispositif electronique |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US6518079B2 (en) | 2000-12-20 | 2003-02-11 | Lumileds Lighting, U.S., Llc | Separation method for gallium nitride devices on lattice-mismatched substrates |
| US6576488B2 (en) * | 2001-06-11 | 2003-06-10 | Lumileds Lighting U.S., Llc | Using electrophoresis to produce a conformally coated phosphor-converted light emitting semiconductor |
| JP4529319B2 (ja) | 2001-06-27 | 2010-08-25 | 日亜化学工業株式会社 | 半導体チップとその製造方法 |
| CN100355032C (zh) | 2002-03-12 | 2007-12-12 | 浜松光子学株式会社 | 基板的分割方法 |
| US8294172B2 (en) * | 2002-04-09 | 2012-10-23 | Lg Electronics Inc. | Method of fabricating vertical devices using a metal support film |
| US6818532B2 (en) * | 2002-04-09 | 2004-11-16 | Oriol, Inc. | Method of etching substrates |
| US6580054B1 (en) * | 2002-06-10 | 2003-06-17 | New Wave Research | Scribing sapphire substrates with a solid state UV laser |
| CN1241253C (zh) * | 2002-06-24 | 2006-02-08 | 丰田合成株式会社 | 半导体元件的制造方法 |
| JP2004165227A (ja) * | 2002-11-08 | 2004-06-10 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体素子の製造方法 |
| JP3978514B2 (ja) | 2002-12-24 | 2007-09-19 | 株式会社ナノテム | 発光素子の製造方法および発光素子 |
| US7420218B2 (en) * | 2004-03-18 | 2008-09-02 | Matsushita Electric Industrial Co., Ltd. | Nitride based LED with a p-type injection region |
| WO2005122223A1 (en) | 2004-06-11 | 2005-12-22 | Showa Denko K.K. | Production method of compound semiconductor device wafer |
| JP2006173179A (ja) * | 2004-12-13 | 2006-06-29 | Toshiba Corp | 半導体装置の製造方法 |
| CN100433261C (zh) * | 2005-03-18 | 2008-11-12 | 夏普株式会社 | 氮化物半导体器件制造方法 |
| JP4818732B2 (ja) | 2005-03-18 | 2011-11-16 | シャープ株式会社 | 窒化物半導体素子の製造方法 |
| JP5016808B2 (ja) | 2005-11-08 | 2012-09-05 | ローム株式会社 | 窒化物半導体発光素子及び窒化物半導体発光素子製造方法 |
| JP2007173465A (ja) * | 2005-12-21 | 2007-07-05 | Rohm Co Ltd | 窒化物半導体発光素子の製造方法 |
| KR101262386B1 (ko) | 2006-09-25 | 2013-05-08 | 엘지이노텍 주식회사 | 질화물 반도체 발광소자의 제조 방법 |
| US9159888B2 (en) * | 2007-01-22 | 2015-10-13 | Cree, Inc. | Wafer level phosphor coating method and devices fabricated utilizing method |
| US8232564B2 (en) | 2007-01-22 | 2012-07-31 | Cree, Inc. | Wafer level phosphor coating technique for warm light emitting diodes |
| CN100580905C (zh) | 2007-04-20 | 2010-01-13 | 晶能光电(江西)有限公司 | 获得在分割衬底上制造的半导体器件的高质量边界的方法 |
| KR20100020936A (ko) * | 2007-07-12 | 2010-02-23 | 라티스 파워(지앙시) 코포레이션 | 파티션화된 기판 상에 제작되는 반도체 소자용 고품질 경계부 형성 방법 |
| JP2009032795A (ja) * | 2007-07-25 | 2009-02-12 | Rohm Co Ltd | 窒化物半導体発光素子の製造方法 |
| US8222064B2 (en) | 2007-08-10 | 2012-07-17 | Hong Kong Applied Science and Technology Research Institute Company Limited | Vertical light emitting diode device structure and method of fabricating the same |
| CN101610870B (zh) | 2007-10-16 | 2013-09-11 | 三星钻石工业股份有限公司 | 脆性材料基板的u形槽加工方法以及使用该方法的去除加工方法、打孔加工方法和倒角方法 |
| JP2010171371A (ja) * | 2008-12-26 | 2010-08-05 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体素子の製造方法 |
| US8324083B2 (en) | 2008-09-30 | 2012-12-04 | Toyoda Gosei Co., Ltd. | Method for producing group III nitride compound semiconductor element |
| JP4386142B2 (ja) * | 2009-01-23 | 2009-12-16 | 三菱化学株式会社 | 窒化物系半導体素子の製造方法 |
| JP5307612B2 (ja) | 2009-04-20 | 2013-10-02 | 株式会社ディスコ | 光デバイスウエーハの加工方法 |
| CN101930942A (zh) | 2009-06-24 | 2010-12-29 | 宇威光电股份有限公司 | 半导体晶圆的切割方法 |
| JP2011040564A (ja) | 2009-08-11 | 2011-02-24 | Toshiba Corp | 半導体素子の製造方法および製造装置 |
| JP2011071272A (ja) | 2009-09-25 | 2011-04-07 | Toshiba Corp | 半導体発光装置及びその製造方法 |
| JP2011171327A (ja) * | 2010-02-16 | 2011-09-01 | Toshiba Corp | 発光素子およびその製造方法、並びに発光装置 |
| CN102569543B (zh) * | 2010-12-30 | 2015-09-02 | 比亚迪股份有限公司 | 一种发光二极管芯片的制作方法 |
| JP2012184144A (ja) | 2011-03-07 | 2012-09-27 | Tokuyama Corp | 窒化ガリウム結晶積層基板及びその製造方法 |
| KR20130012376A (ko) * | 2011-07-25 | 2013-02-04 | 삼성전자주식회사 | 반도체 발광소자 제조방법 |
| US20130140592A1 (en) * | 2011-12-01 | 2013-06-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Light emitting diode with improved light extraction efficiency and methods of manufacturing same |
| JP6027027B2 (ja) | 2011-12-21 | 2016-11-16 | ビービーエスエイ リミテッドBBSA Limited | 半導体素子およびその製造方法ならびに半導体素子結合体 |
-
2014
- 2014-07-02 US US14/906,539 patent/US10079327B2/en active Active
- 2014-07-02 CN CN201480052062.5A patent/CN105556684B/zh active Active
- 2014-07-02 EP EP14752405.2A patent/EP3025378B1/en active Active
- 2014-07-02 KR KR1020167004378A patent/KR102231083B1/ko active Active
- 2014-07-02 JP JP2016528617A patent/JP6429872B2/ja active Active
- 2014-07-02 WO PCT/IB2014/062784 patent/WO2015011583A1/en not_active Ceased
- 2014-07-22 TW TW108142484A patent/TWI726494B/zh active
- 2014-07-22 TW TW103125179A patent/TWI680588B/zh active
-
2018
- 2018-09-18 US US16/134,441 patent/US11038081B2/en active Active
- 2018-10-30 JP JP2018203388A patent/JP2019033280A/ja active Pending
-
2020
- 2020-04-06 US US16/841,144 patent/US11038082B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US20160163916A1 (en) | 2016-06-09 |
| US11038081B2 (en) | 2021-06-15 |
| EP3025378A1 (en) | 2016-06-01 |
| TW202006969A (zh) | 2020-02-01 |
| TW201511330A (zh) | 2015-03-16 |
| EP3025378B1 (en) | 2020-05-06 |
| US11038082B2 (en) | 2021-06-15 |
| US10079327B2 (en) | 2018-09-18 |
| KR102231083B1 (ko) | 2021-03-23 |
| WO2015011583A1 (en) | 2015-01-29 |
| CN105556684A (zh) | 2016-05-04 |
| KR20160034987A (ko) | 2016-03-30 |
| TWI680588B (zh) | 2019-12-21 |
| JP2016533029A (ja) | 2016-10-20 |
| CN105556684B (zh) | 2019-10-18 |
| TWI726494B (zh) | 2021-05-01 |
| JP2019033280A (ja) | 2019-02-28 |
| US20200235259A1 (en) | 2020-07-23 |
| US20190103508A1 (en) | 2019-04-04 |
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