JP2016533029A5 - - Google Patents

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JP2016533029A5
JP2016533029A5 JP2016528617A JP2016528617A JP2016533029A5 JP 2016533029 A5 JP2016533029 A5 JP 2016533029A5 JP 2016528617 A JP2016528617 A JP 2016528617A JP 2016528617 A JP2016528617 A JP 2016528617A JP 2016533029 A5 JP2016533029 A5 JP 2016533029A5
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Japan
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growth substrate
substrate
forming
thinning
sapphire substrate
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JP2016528617A
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Japanese (ja)
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JP6429872B2 (ja
JP2016533029A (ja
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Priority claimed from PCT/IB2014/062784 external-priority patent/WO2015011583A1/en
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Publication of JP2016533029A5 publication Critical patent/JP2016533029A5/ja
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JP2016528617A 2013-07-22 2014-07-02 基板ウェハ上に形成された発光デバイスを分離する方法 Active JP6429872B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361856857P 2013-07-22 2013-07-22
US61/856,857 2013-07-22
PCT/IB2014/062784 WO2015011583A1 (en) 2013-07-22 2014-07-02 Method of separating light emitting devices formed on a substrate wafer

Related Child Applications (1)

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JP2018203388A Division JP2019033280A (ja) 2013-07-22 2018-10-30 基板ウェハ上に形成された発光デバイスを分離する方法

Publications (3)

Publication Number Publication Date
JP2016533029A JP2016533029A (ja) 2016-10-20
JP2016533029A5 true JP2016533029A5 (enExample) 2017-08-10
JP6429872B2 JP6429872B2 (ja) 2018-11-28

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JP2016528617A Active JP6429872B2 (ja) 2013-07-22 2014-07-02 基板ウェハ上に形成された発光デバイスを分離する方法
JP2018203388A Pending JP2019033280A (ja) 2013-07-22 2018-10-30 基板ウェハ上に形成された発光デバイスを分離する方法

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US (3) US10079327B2 (enExample)
EP (1) EP3025378B1 (enExample)
JP (2) JP6429872B2 (enExample)
KR (1) KR102231083B1 (enExample)
CN (1) CN105556684B (enExample)
TW (2) TWI726494B (enExample)
WO (1) WO2015011583A1 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11792898B2 (en) 2012-07-01 2023-10-17 Ideal Industries Lighting Llc Enhanced fixtures for area lighting
US11160148B2 (en) 2017-06-13 2021-10-26 Ideal Industries Lighting Llc Adaptive area lamp
DE102015109413A1 (de) * 2015-06-12 2016-12-15 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung von optoelektronischen Konversions-Halbleiterchips und Verbund von Konversions-Halbleiterchips
US10529696B2 (en) * 2016-04-12 2020-01-07 Cree, Inc. High density pixelated LED and devices and methods thereof
WO2017190060A1 (en) * 2016-04-29 2017-11-02 Flir Systems, Inc. Methods for singulation and packaging
DE102016109720B4 (de) * 2016-05-25 2023-06-22 Infineon Technologies Ag Verfahren zum Bilden eines Halbleiterbauelements und Halbleiterbauelement
JP6981800B2 (ja) * 2017-07-28 2021-12-17 浜松ホトニクス株式会社 積層型素子の製造方法
TWI780195B (zh) 2017-08-03 2022-10-11 美商克里公司 高密度像素化發光二極體晶片和晶片陣列裝置以及製造方法
US10734363B2 (en) 2017-08-03 2020-08-04 Cree, Inc. High density pixelated-LED chips and chip array devices
US10529773B2 (en) 2018-02-14 2020-01-07 Cree, Inc. Solid state lighting devices with opposing emission directions
DE102018111227A1 (de) * 2018-05-09 2019-11-14 Osram Opto Semiconductors Gmbh Verfahren zum Durchtrennen eines epitaktisch gewachsenen Halbleiterkörpers und Halbleiterchip
US10903265B2 (en) 2018-12-21 2021-01-26 Cree, Inc. Pixelated-LED chips and chip array devices, and fabrication methods
US12426506B2 (en) 2019-07-19 2025-09-23 Evatec Ag Piezoelectric coating and deposition process
KR102868185B1 (ko) * 2019-08-16 2025-10-01 삼성전자주식회사 반도체 기판 및 이의 절단 방법
EP4052296A1 (en) 2019-10-29 2022-09-07 Creeled, Inc. Texturing for high density pixelated-led chips
US11646392B2 (en) 2020-06-09 2023-05-09 Nichia Corporation Method of manufacturing light-emitting device
US11437548B2 (en) 2020-10-23 2022-09-06 Creeled, Inc. Pixelated-LED chips with inter-pixel underfill materials, and fabrication methods
CN112967990B (zh) * 2020-11-23 2023-02-24 重庆康佳光电技术研究院有限公司 芯片处理方法、led芯片及显示装置
US11329208B1 (en) * 2020-12-01 2022-05-10 J C Chen Pixel assembly process
CN112701051B (zh) * 2020-12-25 2024-06-28 江苏中科智芯集成科技有限公司 一种高效散热的扇出型封装结构及其方法
WO2022141233A1 (zh) * 2020-12-30 2022-07-07 泉州三安半导体科技有限公司 一种半导体发光元件及其制备方法
CN114141914B (zh) * 2021-12-01 2023-05-23 东莞市中麒光电技术有限公司 衬底剥离方法
FR3144532A1 (fr) * 2022-12-28 2024-07-05 Aledia Procede de fabrication d'un dispositif electronique

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6518079B2 (en) 2000-12-20 2003-02-11 Lumileds Lighting, U.S., Llc Separation method for gallium nitride devices on lattice-mismatched substrates
US6576488B2 (en) * 2001-06-11 2003-06-10 Lumileds Lighting U.S., Llc Using electrophoresis to produce a conformally coated phosphor-converted light emitting semiconductor
JP4529319B2 (ja) 2001-06-27 2010-08-25 日亜化学工業株式会社 半導体チップとその製造方法
CN100355032C (zh) 2002-03-12 2007-12-12 浜松光子学株式会社 基板的分割方法
US8294172B2 (en) * 2002-04-09 2012-10-23 Lg Electronics Inc. Method of fabricating vertical devices using a metal support film
US6818532B2 (en) * 2002-04-09 2004-11-16 Oriol, Inc. Method of etching substrates
US6580054B1 (en) * 2002-06-10 2003-06-17 New Wave Research Scribing sapphire substrates with a solid state UV laser
CN1241253C (zh) * 2002-06-24 2006-02-08 丰田合成株式会社 半导体元件的制造方法
JP2004165227A (ja) * 2002-11-08 2004-06-10 Toyoda Gosei Co Ltd Iii族窒化物系化合物半導体素子の製造方法
JP3978514B2 (ja) 2002-12-24 2007-09-19 株式会社ナノテム 発光素子の製造方法および発光素子
US7420218B2 (en) * 2004-03-18 2008-09-02 Matsushita Electric Industrial Co., Ltd. Nitride based LED with a p-type injection region
WO2005122223A1 (en) 2004-06-11 2005-12-22 Showa Denko K.K. Production method of compound semiconductor device wafer
JP2006173179A (ja) * 2004-12-13 2006-06-29 Toshiba Corp 半導体装置の製造方法
CN100433261C (zh) * 2005-03-18 2008-11-12 夏普株式会社 氮化物半导体器件制造方法
JP4818732B2 (ja) 2005-03-18 2011-11-16 シャープ株式会社 窒化物半導体素子の製造方法
JP5016808B2 (ja) 2005-11-08 2012-09-05 ローム株式会社 窒化物半導体発光素子及び窒化物半導体発光素子製造方法
JP2007173465A (ja) * 2005-12-21 2007-07-05 Rohm Co Ltd 窒化物半導体発光素子の製造方法
KR101262386B1 (ko) 2006-09-25 2013-05-08 엘지이노텍 주식회사 질화물 반도체 발광소자의 제조 방법
US9159888B2 (en) * 2007-01-22 2015-10-13 Cree, Inc. Wafer level phosphor coating method and devices fabricated utilizing method
US8232564B2 (en) 2007-01-22 2012-07-31 Cree, Inc. Wafer level phosphor coating technique for warm light emitting diodes
CN100580905C (zh) 2007-04-20 2010-01-13 晶能光电(江西)有限公司 获得在分割衬底上制造的半导体器件的高质量边界的方法
KR20100020936A (ko) * 2007-07-12 2010-02-23 라티스 파워(지앙시) 코포레이션 파티션화된 기판 상에 제작되는 반도체 소자용 고품질 경계부 형성 방법
JP2009032795A (ja) * 2007-07-25 2009-02-12 Rohm Co Ltd 窒化物半導体発光素子の製造方法
US8222064B2 (en) 2007-08-10 2012-07-17 Hong Kong Applied Science and Technology Research Institute Company Limited Vertical light emitting diode device structure and method of fabricating the same
CN101610870B (zh) 2007-10-16 2013-09-11 三星钻石工业股份有限公司 脆性材料基板的u形槽加工方法以及使用该方法的去除加工方法、打孔加工方法和倒角方法
JP2010171371A (ja) * 2008-12-26 2010-08-05 Toyoda Gosei Co Ltd Iii族窒化物系化合物半導体素子の製造方法
US8324083B2 (en) 2008-09-30 2012-12-04 Toyoda Gosei Co., Ltd. Method for producing group III nitride compound semiconductor element
JP4386142B2 (ja) * 2009-01-23 2009-12-16 三菱化学株式会社 窒化物系半導体素子の製造方法
JP5307612B2 (ja) 2009-04-20 2013-10-02 株式会社ディスコ 光デバイスウエーハの加工方法
CN101930942A (zh) 2009-06-24 2010-12-29 宇威光电股份有限公司 半导体晶圆的切割方法
JP2011040564A (ja) 2009-08-11 2011-02-24 Toshiba Corp 半導体素子の製造方法および製造装置
JP2011071272A (ja) 2009-09-25 2011-04-07 Toshiba Corp 半導体発光装置及びその製造方法
JP2011171327A (ja) * 2010-02-16 2011-09-01 Toshiba Corp 発光素子およびその製造方法、並びに発光装置
CN102569543B (zh) * 2010-12-30 2015-09-02 比亚迪股份有限公司 一种发光二极管芯片的制作方法
JP2012184144A (ja) 2011-03-07 2012-09-27 Tokuyama Corp 窒化ガリウム結晶積層基板及びその製造方法
KR20130012376A (ko) * 2011-07-25 2013-02-04 삼성전자주식회사 반도체 발광소자 제조방법
US20130140592A1 (en) * 2011-12-01 2013-06-06 Taiwan Semiconductor Manufacturing Company, Ltd. Light emitting diode with improved light extraction efficiency and methods of manufacturing same
JP6027027B2 (ja) 2011-12-21 2016-11-16 ビービーエスエイ リミテッドBBSA Limited 半導体素子およびその製造方法ならびに半導体素子結合体

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