JP6386700B2 - 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法 - Google Patents

構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法 Download PDF

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Publication number
JP6386700B2
JP6386700B2 JP2013105491A JP2013105491A JP6386700B2 JP 6386700 B2 JP6386700 B2 JP 6386700B2 JP 2013105491 A JP2013105491 A JP 2013105491A JP 2013105491 A JP2013105491 A JP 2013105491A JP 6386700 B2 JP6386700 B2 JP 6386700B2
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Japan
Prior art keywords
film
mesopores
substrate
mesostructure
plasma etching
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JP2013105491A
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English (en)
Japanese (ja)
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JP2014029476A5 (https=
JP2014029476A (ja
Inventor
浩克 宮田
浩克 宮田
伸 北村
伸 北村
祐彦 ▲高▼橋
祐彦 ▲高▼橋
一幸 黒田
一幸 黒田
陽将 菅野
陽将 菅野
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Canon Inc
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Canon Inc
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Priority to JP2013105491A priority Critical patent/JP6386700B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Priority to KR1020157002255A priority patent/KR20150052834A/ko
Priority to RU2015103481A priority patent/RU2015103481A/ru
Priority to EP13813172.7A priority patent/EP2870493A4/en
Priority to US14/407,605 priority patent/US10473823B2/en
Priority to PCT/JP2013/068801 priority patent/WO2014007401A1/en
Priority to BR112014032796A priority patent/BR112014032796A2/pt
Priority to CN201380043698.9A priority patent/CN104583812B/zh
Publication of JP2014029476A publication Critical patent/JP2014029476A/ja
Publication of JP2014029476A5 publication Critical patent/JP2014029476A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/107—Porous materials, e.g. for reducing the refractive index
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Laminated Bodies (AREA)
JP2013105491A 2012-07-04 2013-05-17 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法 Active JP6386700B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2013105491A JP6386700B2 (ja) 2012-07-04 2013-05-17 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法
RU2015103481A RU2015103481A (ru) 2012-07-04 2013-07-03 Тонкая структура, оптический элемент, просветляющая пленка, водоотталкивающая пленка, подложка для масс-спектрометрии, фазовая пластинка, способ получения тонкой структуры и способ получения просветляющей пленки
EP13813172.7A EP2870493A4 (en) 2012-07-04 2013-07-03 FINE STRUCTURE, OPTICAL ELEMENT, ANTIREFLEX FOIL, WATER REPELLENT FOIL, SUBSTRATE FOR MASS SPECTROMETRY, PHASE PLATE, METHOD FOR PRODUCING A FINE STRUCTURE AND METHOD FOR PRODUCING AN ANTIREFLEX FOIL
US14/407,605 US10473823B2 (en) 2012-07-04 2013-07-03 Fine structure, optical member, antireflection film, water-repellent film, substrate for mass spectrometry, phase plate, process for producing fine structure, and process for producing antireflection film
KR1020157002255A KR20150052834A (ko) 2012-07-04 2013-07-03 미세구조체, 광학 부재, 반사방지막, 발수성 막, 질량 분석용 기판, 위상판, 미세구조체의 제조 방법, 및 반사방지막의 제조 방법
PCT/JP2013/068801 WO2014007401A1 (en) 2012-07-04 2013-07-03 Fine structure, optical member, antireflection film, water-repellent film, substrate for mass spectrometry, phase plate, process for producing fine structure, and process for producing antireflection film
BR112014032796A BR112014032796A2 (pt) 2012-07-04 2013-07-03 estrutura fina, membro óptico, película antirreflexo, película repelente a água, substrato para espectrometria de massa, placa de fase, processo para produzir estrutura fina, e processo para produzir película antirreflexo
CN201380043698.9A CN104583812B (zh) 2012-07-04 2013-07-03 微细结构体、光学构件、防反射膜和微细结构体制造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012150232 2012-07-04
JP2012150232 2012-07-04
JP2013105491A JP6386700B2 (ja) 2012-07-04 2013-05-17 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法

Publications (3)

Publication Number Publication Date
JP2014029476A JP2014029476A (ja) 2014-02-13
JP2014029476A5 JP2014029476A5 (https=) 2016-06-30
JP6386700B2 true JP6386700B2 (ja) 2018-09-05

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JP2013105491A Active JP6386700B2 (ja) 2012-07-04 2013-05-17 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法

Country Status (8)

Country Link
US (1) US10473823B2 (https=)
EP (1) EP2870493A4 (https=)
JP (1) JP6386700B2 (https=)
KR (1) KR20150052834A (https=)
CN (1) CN104583812B (https=)
BR (1) BR112014032796A2 (https=)
RU (1) RU2015103481A (https=)
WO (1) WO2014007401A1 (https=)

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Also Published As

Publication number Publication date
WO2014007401A1 (en) 2014-01-09
BR112014032796A2 (pt) 2017-06-27
EP2870493A1 (en) 2015-05-13
CN104583812A (zh) 2015-04-29
US10473823B2 (en) 2019-11-12
RU2015103481A (ru) 2016-08-20
US20150160377A1 (en) 2015-06-11
EP2870493A4 (en) 2016-07-20
KR20150052834A (ko) 2015-05-14
CN104583812B (zh) 2017-05-03
JP2014029476A (ja) 2014-02-13

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