JP6037471B2 - オプトエレクトロニックデバイスの材料 - Google Patents
オプトエレクトロニックデバイスの材料 Download PDFInfo
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- JP6037471B2 JP6037471B2 JP2014508343A JP2014508343A JP6037471B2 JP 6037471 B2 JP6037471 B2 JP 6037471B2 JP 2014508343 A JP2014508343 A JP 2014508343A JP 2014508343 A JP2014508343 A JP 2014508343A JP 6037471 B2 JP6037471 B2 JP 6037471B2
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- optoelectronic device
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- 230000005693 optoelectronics Effects 0.000 title claims description 15
- 239000000463 material Substances 0.000 title description 31
- 229920000642 polymer Polymers 0.000 claims description 63
- 229910052757 nitrogen Inorganic materials 0.000 claims description 31
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- 229910052717 sulfur Inorganic materials 0.000 claims description 17
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 9
- 125000005842 heteroatom Chemical group 0.000 claims description 7
- 229910052698 phosphorus Inorganic materials 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 125000004429 atom Chemical group 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 125000002619 bicyclic group Chemical group 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 229910052741 iridium Inorganic materials 0.000 claims description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052711 selenium Inorganic materials 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 125000002950 monocyclic group Chemical group 0.000 claims description 3
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims description 2
- 150000002902 organometallic compounds Chemical class 0.000 claims 2
- 239000010410 layer Substances 0.000 description 69
- 239000000243 solution Substances 0.000 description 41
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 32
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- 238000000034 method Methods 0.000 description 21
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 18
- 125000003118 aryl group Chemical group 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- -1 aromatic tertiary amine Chemical class 0.000 description 13
- 239000000758 substrate Substances 0.000 description 13
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- 239000002800 charge carrier Substances 0.000 description 11
- 238000002347 injection Methods 0.000 description 11
- 239000007924 injection Substances 0.000 description 11
- 238000004020 luminiscence type Methods 0.000 description 11
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 10
- 239000000178 monomer Substances 0.000 description 10
- 230000006798 recombination Effects 0.000 description 10
- 238000005215 recombination Methods 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 239000001301 oxygen Chemical group 0.000 description 9
- 238000005424 photoluminescence Methods 0.000 description 9
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 9
- 238000012546 transfer Methods 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 238000001228 spectrum Methods 0.000 description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 239000011593 sulfur Chemical group 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 239000012299 nitrogen atmosphere Substances 0.000 description 6
- 238000013086 organic photovoltaic Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000000295 emission spectrum Methods 0.000 description 5
- 125000001072 heteroaryl group Chemical group 0.000 description 5
- 230000005525 hole transport Effects 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- 229920006254 polymer film Polymers 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 125000001188 haloalkyl group Chemical group 0.000 description 4
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 4
- 238000002390 rotary evaporation Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- QYOXLKAKUAASNA-UHFFFAOYSA-N 1-bromodocosane Chemical compound CCCCCCCCCCCCCCCCCCCCCCBr QYOXLKAKUAASNA-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 3
- 125000002252 acyl group Chemical group 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 238000004128 high performance liquid chromatography Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 230000001443 photoexcitation Effects 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- VNFWTIYUKDMAOP-UHFFFAOYSA-N sphos Chemical group COC1=CC=CC(OC)=C1C1=CC=CC=C1P(C1CCCCC1)C1CCCCC1 VNFWTIYUKDMAOP-UHFFFAOYSA-N 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- UWYZHKAOTLEWKK-UHFFFAOYSA-N 1,2,3,4-tetrahydroisoquinoline Chemical compound C1=CC=C2CNCCC2=C1 UWYZHKAOTLEWKK-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- FEOWHLLJXAECMU-UHFFFAOYSA-N 4,7-dibromo-2,1,3-benzothiadiazole Chemical compound BrC1=CC=C(Br)C2=NSN=C12 FEOWHLLJXAECMU-UHFFFAOYSA-N 0.000 description 2
- XGTQHVQKGZSPIK-UHFFFAOYSA-N 4,9-dibromobenzo[f][2,1,3]benzothiadiazole Chemical compound C1=CC=CC2=C(Br)C3=NSN=C3C(Br)=C21 XGTQHVQKGZSPIK-UHFFFAOYSA-N 0.000 description 2
- BUZINZLHCBTJAK-UHFFFAOYSA-N 4-[2,7-dibromo-9-(4-hydroxyphenyl)fluoren-9-yl]phenol Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC(Br)=CC=C2C2=CC=C(Br)C=C21 BUZINZLHCBTJAK-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- MCEWYIDBDVPMES-UHFFFAOYSA-N [60]pcbm Chemical compound C123C(C4=C5C6=C7C8=C9C%10=C%11C%12=C%13C%14=C%15C%16=C%17C%18=C(C=%19C=%20C%18=C%18C%16=C%13C%13=C%11C9=C9C7=C(C=%20C9=C%13%18)C(C7=%19)=C96)C6=C%11C%17=C%15C%13=C%15C%14=C%12C%12=C%10C%10=C85)=C9C7=C6C2=C%11C%13=C2C%15=C%12C%10=C4C23C1(CCCC(=O)OC)C1=CC=CC=C1 MCEWYIDBDVPMES-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
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- 125000002877 alkyl aryl group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
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- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
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- 125000004122 cyclic group Chemical group 0.000 description 2
- YMWUJEATGCHHMB-DICFDUPASA-N dichloromethane-d2 Chemical compound [2H]C([2H])(Cl)Cl YMWUJEATGCHHMB-DICFDUPASA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000001194 electroluminescence spectrum Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- PQNFLJBBNBOBRQ-UHFFFAOYSA-N indane Chemical compound C1=CC=C2CCCC2=C1 PQNFLJBBNBOBRQ-UHFFFAOYSA-N 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 2
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
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- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000000103 photoluminescence spectrum Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229920000264 poly(3',7'-dimethyloctyloxy phenylene vinylene) Polymers 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 239000011970 polystyrene sulfonate Substances 0.000 description 2
- 229960002796 polystyrene sulfonate Drugs 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000003462 sulfoxides Chemical class 0.000 description 2
- 150000003536 tetrazoles Chemical class 0.000 description 2
- PFZLGKHSYILJTH-UHFFFAOYSA-N thieno[2,3-c]thiophene Chemical compound S1C=C2SC=CC2=C1 PFZLGKHSYILJTH-UHFFFAOYSA-N 0.000 description 2
- 229930192474 thiophene Natural products 0.000 description 2
- 125000005259 triarylamine group Chemical group 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- YITAERDJEQNELZ-UHFFFAOYSA-N (4-ethylphenoxy)boronic acid Chemical compound CCC1=CC=C(OB(O)O)C=C1 YITAERDJEQNELZ-UHFFFAOYSA-N 0.000 description 1
- FKASFBLJDCHBNZ-UHFFFAOYSA-N 1,3,4-oxadiazole Chemical compound C1=NN=CO1 FKASFBLJDCHBNZ-UHFFFAOYSA-N 0.000 description 1
- FTNJQNQLEGKTGD-UHFFFAOYSA-N 1,3-benzodioxole Chemical compound C1=CC=C2OCOC2=C1 FTNJQNQLEGKTGD-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- XILRUONFYBUYIE-UHFFFAOYSA-N 1-butyl-4-iodobenzene Chemical compound CCCCC1=CC=C(I)C=C1 XILRUONFYBUYIE-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- GGNDPFHHUHTCIO-UHFFFAOYSA-N 1h-benzimidazole;perylene-3,4,9,10-tetracarboxylic acid Chemical group C1=CC=C2NC=NC2=C1.C1=CC=C2NC=NC2=C1.C=12C3=CC=C(C(O)=O)C2=C(C(O)=O)C=CC=1C1=CC=C(C(O)=O)C2=C1C3=CC=C2C(=O)O GGNDPFHHUHTCIO-UHFFFAOYSA-N 0.000 description 1
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 1
- ISCPEYGHUTZZLE-UHFFFAOYSA-N 2,7-dibromo-9,9-di(docosyl)fluorene Chemical compound C1=C(Br)C=C2C(CCCCCCCCCCCCCCCCCCCCCC)(CCCCCCCCCCCCCCCCCCCCCC)C3=CC(Br)=CC=C3C2=C1 ISCPEYGHUTZZLE-UHFFFAOYSA-N 0.000 description 1
- AVXFJPFSWLMKSG-UHFFFAOYSA-N 2,7-dibromo-9h-fluorene Chemical compound BrC1=CC=C2C3=CC=C(Br)C=C3CC2=C1 AVXFJPFSWLMKSG-UHFFFAOYSA-N 0.000 description 1
- KFDDOSKBEZKAMI-UHFFFAOYSA-N 2,9-dimethyl-4,7-diphenylbenzo[h]quinoline Chemical compound C=12C=CC3=C(C=4C=CC=CC=4)C=C(C)N=C3C2=CC(C)=CC=1C1=CC=CC=C1 KFDDOSKBEZKAMI-UHFFFAOYSA-N 0.000 description 1
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 1
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- XTBLDMQMUSHDEN-UHFFFAOYSA-N naphthalene-2,3-diamine Chemical compound C1=CC=C2C=C(N)C(N)=CC2=C1 XTBLDMQMUSHDEN-UHFFFAOYSA-N 0.000 description 1
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- 239000002244 precipitate Substances 0.000 description 1
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
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- VIXWGKYSYIBATJ-UHFFFAOYSA-N pyrrol-2-one Chemical compound O=C1C=CC=N1 VIXWGKYSYIBATJ-UHFFFAOYSA-N 0.000 description 1
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- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
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- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 238000010129 solution processing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
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- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 239000012905 visible particle Substances 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C13/00—Cyclic hydrocarbons containing rings other than, or in addition to, six-membered aromatic rings
- C07C13/28—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof
- C07C13/32—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings
- C07C13/54—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with three condensed rings
- C07C13/547—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with three condensed rings at least one ring not being six-membered, the other rings being at the most six-membered
- C07C13/567—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with three condensed rings at least one ring not being six-membered, the other rings being at the most six-membered with a fluorene or hydrogenated fluorene ring system
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0091—Complexes with metal-heteroatom-bonds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/115—Polyfluorene; Derivatives thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K99/00—Subject matter not provided for in other groups of this subclass
-
- C—CHEMISTRY; METALLURGY
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Description
R1及びR2は独立にC22-44ヒドロカルビル、1以上のS、N、O、PもしくはSi原子を含有するC22-44ヒドロカルビル、オキサアルキルアリール又はこれらの組合せであり、
R3及びR4は独立にH、C1-44ヒドロカルビル又は1以上のS、N、O、PもしくはSi原子を含有するC1-44ヒドロカルビルであるか、或いはR3とR4とが一緒に、3以下のS、N、O、P、又はSiヘテロ原子を含有するC2-10単環式又は二環式環を形成しており、
Xは、S、Se又はこれらの組合せである。
空気感受性の材料の取扱いは全て乾燥窒素雰囲気下で行った。全ての溶媒はFisher Scientificから購入し、特に断らない限りさらに精製することなく使用した。特に断らない限り、全ての試薬はSigma−Aldrichから購入し、さらに精製することなく使用した。1H NMRスペクトルは、Bruker Avance 400MHz NMRで得た。GPCは、Polymer Laboratories Mixed Bed−Cカラムで移動相としてクロロホルムを用いてAgilent 1100 GPCで得、ポリスチレン標準を参照した。HPLCは、Zorbax Eclipse XDB−C8カラム及び水/アセトニトリル移動相を用いるAgilent 1100 HPLCで得た。吸収スペクトルは、Varian Cary 300 Scan UV−Visible分光光度計を用いて記録した。
4,7−ジブロモ−2,1,3−ベンゾチアジアゾール(BTD)(1)
(1)の調製にはYangらの方法を使用した(Yang,R.;Tian,R;Yan,J.;Zhang,Y.;Yang,J.;Hou,Q.;Yang,W.;Zhang,C及びCao,Y.Macromolecules 2005,38,244)。
(2)の調製にはWeiらの方法を使用した(Wei,P.;Duan,L.;Zhang,D.;Qiao,J.;Wang,L.;Wang,R.;Dong,G.及びQui,Y.J.Mater.Chem.2008,18,806)。
(3)の調製にはYang,らの方法を使用した(Yang,J,;Jiang,C.;Zhang,Y.;Yang,R.;Yang,W.;Hou,Q.及びCao,Y.Macromolecules 2004,37,1211)。
(4)の調製にはReinhartらの方法を使用した(Reinhardt,B.;Brott,L.;Clarson,S.;Dillard,A.;Bhatt,J.;Kannan,R.;Yuan,L.;He,G.及びPrasad,P.Chem.Mater.1998,10,1863)。
Joらの方法を(5)の調製に適合させた(Jo,J.;Chi,C.;Hoger,S.;Wegner,G.及びYoon,D.Chem.Eur.J.2004,10,2681)。2,7−ジブロモ−9H−フルオレン(16.2g、50mmol)、ヨウ化カリウム(80mg、5mmol)、水酸化カリウム(86.2%KOH、J.T.Baker、16.3g、250mmol)及びジメチルスルホキシド(100mL)の混合物を250mLの三つ首丸底フラスコで磁気的に攪拌した。フラスコを15分間窒素でパージし、1−ブロモドコサン(50.6g、130mmol)を加えた。フラスコを60℃に加熱し、一晩攪拌した。この熱い溶液を氷上に注ぎ、生成物を1リットルのヘキサンで抽出した。ヘキサン抽出物を塩水で洗浄し、MgSO4上で乾燥させ、溶媒を蒸発させて40gのオフホワイトの粉末を得た。これは生成物及び残余の1−ブロモドコサンから構成されていた。最終の脱色を達成するために、50mLのヘキサン/硫酸(25/25)中の5gの生成物を250mgの酸化クロムと共に30分暖めた。ヘキサン層を集め、水で三回洗浄した後、酸性アルミナで濾過した。このアルミナを40mLの熱いヘキサンで洗浄した。溶媒の回転蒸発により、4gの純粋な白色生成物を得た。微量の1−ブロモドコサンが残っている場合、酢酸エチル又は酢酸ブチルからの追加の再結晶により分光学的に純粋な生成物が得られた。
ジボレート(6)は、Joらの方法の修正法を用いて合成した。ジブロミド(5)(6g、6.4mmol)を、250mLの丸底フラスコ内で100mLの無水THF内のビス(ピナコラト)ジボラン(9.8g、38.6mmol)、酢酸カリウム(3.79g、98.15mmol)、2−ジシクロヘキシルホスフィノ−2′,6′−ジメトキシビフェニル(SPhos)(262mg、0.638mmol)と合わせた。この溶液を窒素で30分パージし、Pd(II)Cl2(45mg、0.26mmol)を加え、反応物を4時間還流させた。冷えたら、THFを回転蒸発により除去し、残渣をヘキサンで抽出した。抽出物をCeliteで濾過した後濃縮した。ヘプタンを用いたシリカゲルクロマトグラフィーにより、5.54g(84%収率)の純粋な生成物を得た。
スキーム1.BTD又はBSeDを含有するポリマーの一般合成
F2290−BTD10(P1)の合成のための試薬を表2に示す。表3のポリマーP2−P6の調製のためのモノマーの量は所望のポリマー組成に従って調節した。
一般手順
ポリマーの光励起後のスペクトル及び時間分解動態は、469nm(Picoquant、〜70psパルス幅)又は355nm(〜500psパルス幅 JDS Uniphase)のパルスレーザー励起を用いるEdinburgh instruments F920蛍光光度計を用いて得た。検出器はスペクトル補正したMCP−PMT R3809(Hamamatsu)であった。クロロベンゼン(Aldrich)を試験した材料の溶液の溶媒媒体として使用した。溶液の濃度は、いろいろな溶液の光学密度が450nm〜470nmの範囲で1.0未満となるように調節した。
実施例4(P2)、実施例6(P4)、及び実施例7(P5)のポリマーの溶液吸収及び発光スペクトルを図2Aに示す。機器の配置及び強度は実験を通じて維持されたので、フォトルミネッセンスの積分強度は直接比較でき、相対的なフォトルミネッセンス量子収率を提供するために使用することができる。BTD−30試料は最も高いルミネッセンス効率を有していたので、ルミネッセンス量子効率はBTD−30試料を基準とした。スペクトルは、イオウがセレンに置換され、ジチアゾールコモノマーにおいてフェニルの代わりにナフチル基が使用されることで共役が増大すると、発光がより長い波長にシフトされることを示している。
また、ポリマーのルミネッセンス挙動はコモノマー及びそのフルオレンモノマーに対する相対充填量に依存する。図3は、実施例3及び4のBTDコポリマーの光励起後のルミネッセンス減衰曲線を示す。この図はまた、溶液中のF22−BTD−30ポリマー(実施例4)及びSumationから入手した9,9−ジオクチルフルオレン及びBTDから誘導された等量の単位からなるポリマー(F8−BTD)の468nmでの励起後の対応するルミネッセンス減衰曲線も示す。
Aldrichから入手したPVKを、塩化メチレン中ポリマー濃縮溶液(107mg/ml)の沸騰脱イオン水中への複数の沈殿によって精製した。次に、得られた沈殿を、重量損失が観察されなくなるまで真空オーブン(50℃)で数日乾燥させた。FIrpic(イリジウム(III)ビス(2−(4,6−ジフルオロフェニル)ピリジナト−N,C2’)ピコリネート、ADS 065BE)は入手時の状態のまま使用した。クロロベンゼンはAldrichから入手し、そのまま使用した。F8−BTはSumationから入手し、そのまま使用した。PVK、F8−BT及びFIrpicの溶液(1%w/v)は各々、実験室環境においてクロロベンゼン中で調製した。FIrpic:PVKの溶液は、それぞれの1%ストック溶液を0.2:1の比で混合することにより調製した。次に、1%のF8−BT溶液をFIrpic:PVK溶液に加えて、F8−BT:FIrpic:PVKの最終濃度割合が0.1:0.2:1の溶液を形成した。FIrpic及びPVKと混合された他の発光性ポリマー材料のスピンコーティング用の溶液を同様にして調製した。
デバイスの基板は、薄い(〜0.7mm)1”×1”のガラス片上のパターン化されたITO(厚さ80nm〜120nm)からなっていた。フォトリソグラフィープロセス後の洗浄工程の結果通例きれいな表面が得られ、従って基板はOLED製作の前に適度な洗浄を必要としたのみであった。場合により、フォトレジストのようなあらゆる残余の有機物質を確実に取り除くために、アセトン中5分の音波浴での全ての基板に対するアセトンによる追加の濯ぎを行った。フォトレジストが除去されたら、ITO基板を、基板を保持するためにTeflonプロセスボートを用いてイソプロパノール(研究用グレード)中に完全に沈め、超音波浴に10min入れた。イソプロパノール中での10minの音波浴処理後、各々の基板をイソプロパノール浴から取り出し、個別に窒素でブロー乾燥した。溶媒残渣によるITO基板の汚れ又は表面上の目に見える粒子がないことを確かめるために基板を検査した。最終の表面洗浄/処理工程として10minのUV/オゾン処理を使用した。
Claims (20)
- 次の式I及びIIの構造単位を含むポリマーを含むエレクトロルミネッセント層を有するオプトエレクトロニックデバイス。
R1及びR2は独立に−Ar(OCH 2 CH 2 (CH 2 ) m ) n OR 5 (式中、mは0又は1であり、nは20〜500の範囲であり、R 5 は低級アルキルである。)であり、
R3及びR4は独立にH、C1-44ヒドロカルビル、又は1以上のS、N、O、PもしくはSi原子を含有するC1-44ヒドロカルビルであるか、或いはR3とR4とが一緒に、3個以下のS、N、O、PもしくはSiヘテロ原子を含有するC2-10単環式もしくは二環式環を形成しており、
Xは、S、Se又はこれらの組合せである。 - XがSである、請求項1記載のオプトエレクトロニックデバイス。
- XがSeである、請求項1記載のオプトエレクトロニックデバイス。
- 式Iの構造単位が次式のものである、請求項1記載のオプトエレクトロニックデバイス。
R1a及びR2aは独立に−(OCH2CH2(CH2)m)nOR5であり、
m、n及びR 5 は請求項1で定義した通りである。 - 式Iの構造単位が次式のものである、請求項1記載のオプトエレクトロニックデバイス。
PEGは−CH2CH2(OCH2CH2)nOR5であり、
nは20〜100の範囲であり、
R5は低級アルキルである。 - 式IIの構造単位が次式のものである、請求項1記載のオプトエレクトロニックデバイス。
- 式IIの構造単位が次式のものである、請求項1記載のオプトエレクトロニックデバイス。
- 式IIの構造単位が次式のものである、請求項1記載のオプトエレクトロニックデバイス。
- さらに、イリジウムを含有する有機金属化合物を含む、請求項1乃至請求項8のいずれか1項記載のオプトエレクトロニックデバイス。
- イリジウムを含有する有機金属化合物がポリマーとブレンドされている、請求項9記載のオプトエレクトロニックデバイス。
- 次の式I及びIIの構造単位を含むポリマー。
R1及びR2は独立に−Ar(OCH 2 CH 2 (CH 2 ) m ) n (式中、mは0又は1であり、nは20〜500の範囲であり、R 5 は低級アルキルである。)であり、
R3及びR4は独立にH、C1-44ヒドロカルビル又は1以上のS、N、O、PもしくはSi原子を含有するC1-44ヒドロカルビルであるか、或いはR3とR4とが一緒に、3個以下のS、N、O、PもしくはSiヘテロ原子を含有するC2-10単環式もしくは二環式環を形成しており、
Xは、S、Se又はこれらの組合せである。 - XがSである、請求項11記載のポリマー。
- XがSeである、請求項11記載のポリマー。
- 式Iの構造単位が次式のものである、請求項11記載のポリマー。
R1a及びR2aは独立に−(OCH2CH2(CH2)m)nOR5であり、
m、n及びR 5 は請求項11で定義した通りである。 - 式Iの構造単位が次式のものである、請求項11記載のポリマー。
PEGは−CH2CH2(OCH2CH2)nOR5であり、
nは20〜100の範囲であり、
R5は低級アルキルである。 - 式IIの構造単位が次式のものである、請求項11記載のポリマー。
- 式IIの構造単位が次式のものである、請求項11記載のポリマー。
- 式IIの構造単位が次式のものである、請求項11記載のポリマー。
- 次式の化合物。
mは0又は1であり、
nは20〜500の範囲であり、
Xは各々独立にハロ、トリフレート、−B(OH)2、−B(OR)2、−BO2R又はこれらの組合せであり、
Rはアルキル又はアルキレンであり、
R 5 は低級アルキルである。 - R 1a 及びR 2a が−O−PEGであって、PEGが−CH2CH2(OCH2CH2)nOR5であり、nが20〜100の範囲であり、R5が低級アルキルである、請求項19記載の化合物。
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