JP6007793B2

JP6007793B2 - 低分子化合物、感放射線性組成物、およびレジストパターン形成方法

低分子化合物、感放射線性組成物、およびレジストパターン形成方法 Download PDF

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Publication number: JP6007793B2
Authority: JP; Japan
Prior art keywords: group; carbon atoms; acid; compound; radiation
Prior art date: 2011-01-21
Legal status : Expired - Fee Related

Application number

JP2012553596A

Other languages

English (en)

Japanese (ja)

Other versions

JPWO2012098828A1 (ja

Inventor

宏美林

越後　雅敏

雅敏越後

Current Assignee

Mitsubishi Gas Chemical Co Inc

Original Assignee

Mitsubishi Gas Chemical Co Inc

Priority date

2011-01-21

Filing date

2012-01-06

Publication date

2016-10-12

2012-01-06 Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc

2014-06-09 Publication of JPWO2012098828A1 publication Critical patent/JPWO2012098828A1/ja

2016-10-12 Application granted granted Critical

2016-10-12 Publication of JP6007793B2 publication Critical patent/JP6007793B2/ja

Status Expired - Fee Related legal-status Critical Current

2032-01-06 Anticipated expiration legal-status Critical

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230000005855 radiation Effects 0.000 title claims description 87
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239000002253 acid Substances 0.000 claims description 91
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239000003431 cross linking reagent Substances 0.000 claims description 44
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238000004090 dissolution Methods 0.000 claims description 21
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