JP5902369B2 - 成分分離装置におけるプロセス流のための分離方法及び組立体 - Google Patents
成分分離装置におけるプロセス流のための分離方法及び組立体 Download PDFInfo
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Description
係する。有効性は、かかる材料が、捕捉材を通過する脱汚染されたプロセス流の流れを妨げない程度に関係する。かかる材料は、プロセス装置を横切る容認できない圧力低下の増大を生ずることなく、かつ広範囲の大きさの汚染物質をプロセス流から事実上全部除去することが望ましい。直角流の分配を促進する捕捉材を有することもまた非常に望ましい。プロセス流の濾過及び流れの分布のための本発明の方法は、従来から提案されている従来技術の方法と比較して、汚染物質の高効率かつ高効果的な濾過の提供;触媒床プロセス装置の寿命及び触媒の活性の増加;触媒の損失の減少;プロセス装置の構成の最適化を許す製品の選択性の向上と生産量/生産性の増大;プロセス装置内への及び装置内におけるプロセス流の直角流の分布の改良;及び通常の捕捉材により装置を横切る圧力低下が容認できないレベルに上昇したときにプロセス装置をラインから外す必要を無くすことの利点を持つ。これらの便益は投資及び運転費の節減、停止時間の短縮、プロセス装置の性能の向上、及びプロセス装置の運転時間の増加をもたらすであろう。
[例1:蒸留液水素添加処理装置における使用]
において僅か0.035kg/cm2(0.5psi)であった。水素添加処理装置A及
びBについての圧力差はそれぞれ5.80kg/cm2(82.5psi)、及び3.8
0kg/cm2(54psi)であった。比較して、本発明の網状要素を有する水素添加
処理装置C及びDは、通常のリンググレーディングシステムより格段に良好であった。本発明の網状要素に伴う低い圧力差のため、交換間の期間を劇的に長くすることができる。
[例2:ナフサ水素添加処理装置における使用]
理装置Cについての1.55kg/cm2(22psi)と対比して、水素添加処理装置
Dに対する圧力低下は−0.28kg/cm2(−4psi)であった。ナフサ水素添加
処理装置における汚染されたプロセス流は、主として蒸気相であった。本発明の網状要素は効率的かつ効果的に濾過したが、通常のリンググレーディングシステムは詰まった。
はこの両者、無機酸化物又はゼオライトを含む。従って、触媒は、鉄、ニッケル、コバルト、白金、パラジウム及びイリジュウムの少なくとも1種と組み合わせられたクロム、モリブデン及びタングステンの少なくとも1種を含む。6B族金属ではモリブデンが最も好ましい。触媒は、好ましくは、約2重量%から約14重量%の6B族金属を含むであろう。8族金属ではニッケル及びコバルトが最も好ましい。触媒中の8族金属の量は、好ましくは、約0.5重量%から約10重量%である。
Claims (20)
- ナフサ水素添加処理装置において、少なくとも一つのプロセス流を、希望の組成を有する二つ以上の成分プロセス流に分離する方法であって:
(a)寸法が6mmから100μmの範囲である二つ以上のセルを有する3次
元のセル状固体材料、ただし該セル状固体材料は複数のセル寸法及び形状を有す
る、を装置内に準備し;
(b)セル状固体材料を装置の少なくとも一つの区域内に位置決めし;
(c)少なくとも一つのプロセス流の二つ又はそれ以上の相を、セル状固体材料を収容
している区域内に導き;
(d)セル状固体材料の表面において二つ又はそれ以上の相を接触させ;
(e)該装置から一つ又はそれ以上の相の少なくとも一部分を希望の組成を持つ少なく
とも一つの成分プロセス流として回収する、
諸段階を含んで成り、(a)成分A及び成分Bを含んだ第一のプロセス流を第一の位置から装置に入れ、(b)成分Cを含んだ第二のプロセス流を第二の位置から装置に入れ、そして(c)第一のプロセス流と第二のプロセス流とをセル状固体材料の表面で密に接触させることによって、成分Aを含み成分Bを含まない第一の成分プロセス流と成分C及びすべての成分Bを含む第二の成分プロセス流とを形成することを特徴とする方法。 - セル状固体材料の区域から出る際に、相が希望の成分を有する請求項1の方法。
- セル状固体材料の表面が、装置内のセル状固体材料1立方メートル当たり250から4000平方メートルの範囲の表面積を有する請求項1の方法。
- セル状固体材料が、酸化物、炭化物、窒化物、ホウ化物、セラミック材料、金属材料、高分子材料、及び化学蒸着物よりなるグループから選定される請求項1の方法。
- セル状固体材料が、プロセス流に対して耐食性の材料から形成される請求項1の方法。
- セル状固体材料が、炭化ケイ素から形成される請求項1の方法。
- セル状固体材料が、4から30ppiの空隙度を有する請求項1の方法。
- 第一のプロセス流及び第二のプロセス流の一方が液体で他方が液体又は蒸気である請求項1の方法。
- セル状固体材料が球状のボールであって、その直径が、1/8インチ(3.18mm)から2インチ(50.8mm)である請求項1の方法。
- セル状固体材料が、不活性である請求項1の方法。
- 寸法が6mmから100μmの範囲である二つ以上のセルを有しかつ少なくとも一つのプロセス流からの二つ以上の相が接触する表面を有する3次元のセル状固体材料、ただし該セル状固体材料は複数のセル寸法及び形状を有する、を有する装置を備えており、該装置から一つ又はそれ以上の相の少なくとも一部分を希望の組成を持つ少なくとも一つの成分プロセス流として回収するための、ナフサ水素添加処理装置組立体であって、(a)成分A及び成分Bを含んだ第一のプロセス流を第一の位置から装置に入れ、(b)成分Cを含んだ第二のプロセス流を第二の位置から装置に入れ、そして(c)第一のプロセス流と第二のプロセス流とをセル状固体材料の表面で密に接触させることによって、成分Aを含み成分Bを含まない第一の成分プロセス流と成分C及びすべての成分Bを含む第二の成分プロセス流とを形成することを特徴とする組立体。
- セル状固体材料の直径が、1/8インチ(3.18mm)から2インチ(50.8mm)である請求項11の組立体。
- セル状固体材料が、装置の長さ全体にわたる網状の要素である請求項11の組立体。
- 相が少なくとも一つの液相及び少なくとも一つの蒸気相よりなる請求項11の組立体。
- セル状固体材料の表面が、装置内のセル状固体材料1立方メートル当たり250から4000平方メートルの範囲の表面積を有する請求項11の組立体。
- セル状固体材料が、酸化物、炭化物、窒化物、ホウ化物、セラミック材料、金属材料、高分子材料、及び化学蒸着物よりなるグループから選定される請求項11の組立体。
- セル状固体材料が、プロセス流に対して耐食性の材料から形成される請求項11の組立体。
- セル状固体材料が、炭化ケイ素から形成される請求項11の組立体。
- セル状固体材料が、4から30ppiの範囲の空隙度を有する請求項11の組立体。
- セル状固体材料が不活性である請求項11の組立体。
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