JP5733401B2 - 半導体装置および半導体装置の製造方法 - Google Patents
半導体装置および半導体装置の製造方法 Download PDFInfo
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- JP5733401B2 JP5733401B2 JP2013527923A JP2013527923A JP5733401B2 JP 5733401 B2 JP5733401 B2 JP 5733401B2 JP 2013527923 A JP2013527923 A JP 2013527923A JP 2013527923 A JP2013527923 A JP 2013527923A JP 5733401 B2 JP5733401 B2 JP 5733401B2
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- semiconductor device
- lead frame
- metal layer
- electronic component
- wire
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- 239000004065 semiconductor Substances 0.000 title claims description 82
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 48
- 239000002184 metal Substances 0.000 claims description 48
- 239000000758 substrate Substances 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 claims description 2
- 229920000647 polyepoxide Polymers 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims 1
- 229910000679 solder Inorganic materials 0.000 description 38
- 238000010586 diagram Methods 0.000 description 9
- 230000004048 modification Effects 0.000 description 9
- 238000012986 modification Methods 0.000 description 9
- 239000000919 ceramic Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000017525 heat dissipation Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000035882 stress Effects 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910016525 CuMo Inorganic materials 0.000 description 1
- 229910002549 Fe–Cu Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
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JP2013527923A JP5733401B2 (ja) | 2011-08-10 | 2012-06-14 | 半導体装置および半導体装置の製造方法 |
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US9609775B2 (en) * | 2012-11-05 | 2017-03-28 | Nsk Ltd. | Semiconductor module |
JP6201626B2 (ja) | 2013-10-23 | 2017-09-27 | スミダコーポレーション株式会社 | 電子部品及び電子部品の製造方法 |
US10741478B2 (en) * | 2016-03-30 | 2020-08-11 | Mitsubishi Electric Corporation | Power module and method of manufacturing the same, and power electronic apparatus and method of manufacturing the same |
US11145575B2 (en) * | 2018-11-07 | 2021-10-12 | UTAC Headquarters Pte. Ltd. | Conductive bonding layer with spacers between a package substrate and chip |
JP7190985B2 (ja) * | 2019-08-05 | 2022-12-16 | 三菱電機株式会社 | 半導体装置 |
JP7341078B2 (ja) * | 2020-02-07 | 2023-09-08 | 日立Astemo株式会社 | 半導体装置 |
JP7396118B2 (ja) * | 2020-02-28 | 2023-12-12 | 富士電機株式会社 | 半導体モジュール |
CN118039508B (zh) * | 2024-04-12 | 2024-06-14 | 无锡利普思半导体有限公司 | 功率模块内部连接工艺 |
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US5590144A (en) * | 1990-11-07 | 1996-12-31 | Fuji Electric Co., Ltd. | Semiconductor laser device |
JP2002110750A (ja) * | 2000-09-29 | 2002-04-12 | Mitsubishi Electric Corp | 電子部品の製造方法並びに接続構造 |
JP2003243608A (ja) * | 2002-02-15 | 2003-08-29 | Mitsubishi Electric Corp | 電力用モジュール |
JP4265578B2 (ja) * | 2005-06-30 | 2009-05-20 | オムロン株式会社 | 回路基板 |
JP4764692B2 (ja) | 2005-09-29 | 2011-09-07 | 日立オートモティブシステムズ株式会社 | 半導体モジュール |
JP2007335538A (ja) | 2006-06-13 | 2007-12-27 | Sanken Electric Co Ltd | 半導体装置の製法 |
JP5076440B2 (ja) * | 2006-10-16 | 2012-11-21 | 富士電機株式会社 | 半導体装置及び半導体装置の製造方法 |
WO2008074164A1 (fr) * | 2006-12-21 | 2008-06-26 | Abb Research Ltd | Module semi-conducteur |
JP4640345B2 (ja) | 2007-01-25 | 2011-03-02 | 三菱電機株式会社 | 電力用半導体装置 |
WO2009081723A1 (fr) | 2007-12-20 | 2009-07-02 | Fuji Electric Device Technology Co., Ltd. | Dispositif à semi-conducteurs et son procédé de fabrication |
JP5217013B2 (ja) | 2008-01-11 | 2013-06-19 | 日産自動車株式会社 | 電力変換装置およびその製造方法 |
JP4946959B2 (ja) | 2008-04-09 | 2012-06-06 | 株式会社デンソー | 半導体装置の製造方法 |
JP5119139B2 (ja) | 2008-12-12 | 2013-01-16 | 富士電機株式会社 | 半導体装置及び半導体装置の製造方法 |
JP2011086743A (ja) | 2009-10-15 | 2011-04-28 | Mitsubishi Electric Corp | 電力用半導体装置、及び該電力用半導体装置の製造方法 |
JP5185956B2 (ja) * | 2010-01-06 | 2013-04-17 | 三菱電機株式会社 | 電力用半導体装置 |
JP3163214U (ja) | 2010-05-17 | 2010-10-07 | 富士電機システムズ株式会社 | 半導体装置 |
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EP2698817A1 (fr) | 2014-02-19 |
EP2698817A4 (fr) | 2014-09-17 |
WO2013021726A1 (fr) | 2013-02-14 |
CN103534796B (zh) | 2016-06-01 |
CN103534796A (zh) | 2014-01-22 |
EP2698817B1 (fr) | 2018-10-24 |
US20140084438A1 (en) | 2014-03-27 |
US9076782B2 (en) | 2015-07-07 |
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