JP5686952B2 - 温度および放射率/パターン補償を含む膜形成装置および方法 - Google Patents
温度および放射率/パターン補償を含む膜形成装置および方法 Download PDFInfo
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- JP5686952B2 JP5686952B2 JP2008533387A JP2008533387A JP5686952B2 JP 5686952 B2 JP5686952 B2 JP 5686952B2 JP 2008533387 A JP2008533387 A JP 2008533387A JP 2008533387 A JP2008533387 A JP 2008533387A JP 5686952 B2 JP5686952 B2 JP 5686952B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- Organic Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Chemical Vapour Deposition (AREA)
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Description
Claims (15)
- 基板処理システムであって、
基板上に膜を形成するように適合されている処理チャンバであって、前記チャンバの周辺を囲む側壁を含む処理チャンバと、
前記システムに配置されており、かつ前記基板をサポートするように適合されている基板サポートと、
前記処理チャンバを包囲するように前記基板サポートの上方に配置されている上部カバーであって、前記基板サポートに向かって光を反射し返すための反射表面を備える上部カバーと、
膜形成プロセスに十分な温度に前記基板を加熱するために前記基板サポートの下方に配置されている加熱システムであって、前記基板のプロセス加熱が前記加熱システムによってのみ実行される加熱システムと、
前記反射表面に設けられた複数の開口を介して、前記基板から発せられた放射と、前記反射表面と前記基板とにより反射された放射と、が含まれた放射を測定する複数の光プローブと、
前記基板から発せられた放射のみを測定し、当該測定した放射と前記複数の光プローブのうちの少なくとも1つにより測定された放射に基づき前記基板の実際の放射率を算出する放射計と、を備え、
前記基板の温度が、前記算出された放射率と前記複数の光プローブのうち少なくとも1つの光プローブにより測定された放射とに基づき算出される、基板処理システム。 - 任意の光プローブの視界が前記基板を超えては延びず、
前記光プローブが高温計である、請求項1に記載の基板処理システム。 - 前記光プローブが信号処理エレクトロニクスに光接続され、
前記光プローブが前記基板の上方におよそ等距離に放射状に間隔をあけられている、
請求項1に記載の基板処理システム。 - 前記放射計が、
前記反射表面における開口と、
前記開口をカバーするホットミラーと、
前記基板から発せられた光を収集して前記ホットミラーを通過する光プローブと、
を備える、請求項1に記載の基板処理システム。 - 前記放射計の前記反射表面における前記開口が、前記反射表面によってもたらされた前記基板の増大された有効放射率を実質的に排除するのに十分大きな断面積を有する、請求項4に記載の基板処理システム。
- 前記側壁の第1の縁に接触しており、また、前記加熱システムからの光が前記上部カバーに達するのを防止するために、前記基板サポートの外縁部と重複する前記処理チャンバに延びる内周縁を有する周辺部材をさらに備え、
前記基板サポートが前記システムに回転可能に搭載されており、また前記外縁部が前記内周縁に接触していない、請求項1に記載の基板処理システム。 - 前記内周縁に面する前記外縁部の表面が、前記加熱システムからの光を光学的に吸収するように適合されている、請求項6に記載の基板処理システム。
- 前記内周縁部に面する前記外縁部の前記表面が複数の溝を備える、請求項7に記載の基板処理システム。
- 前記外縁部に面する前記内周縁の表面が、前記加熱システムからの光を吸収するように適合されている、請求項6に記載の基板処理システム。
- 前記外縁部に面する前記内周縁の前記表面が粗化表面を備え、
前記側壁に隣接しており、かつ前記内周縁および前記外縁部と重複するように前記処理チャンバに延びている第2の周辺部材をさらに備える、請求項6に記載の基板処理システム。 - 前記反射表面が、前記基板から発せられた光を前記基板に反射し返して前記基板の有効放射率を増大させるように適合されている、請求項1に記載の基板処理システム。
- 前記基板サポートが、前記基板を加熱するためのサセプタを備えており、前記サセプタの底部が、前記基板の底部表面を全体的にカバーし、かつ前記加熱システムによって加熱されるように適合されている、請求項11に記載の基板処理システム。
- 前記加熱システムが照射加熱システムであり、前記サセプタの前記底部が、複数のランプを備える前記照射加熱システムによって生成された光を吸収するように適合されており、前記ランプが前記基板全体に複数の加熱ゾーンを生成し、前記加熱ゾーンが、前記基板の実質的に均一な加熱分布を作成するように重複している、請求項12に記載の基板処理システム。
- 前記サセプタが、前記基板を均一に導電加熱するように、少なくとも100W/m℃の熱伝導率を具備する均一な材料から作られる、請求項12に記載の基板処理システム。
- 基板表面上に膜を形成するように適合されている処理チャンバにおいて温度を測定する方法であって、
第1の測定を提供するために、処理中に前記基板からのみ発光された放射を測定するステップと、
第2の測定を提供するために、前記処理チャンバから反射され、かつ前記基板から発光された放射を測定するステップと、
前記第1の測定および第2の測定に基づき、前記基板の実際の放射率を算出するステップと、
前記算出された放射率に基づき前記第2の測定を補正し、前記基板の温度値を取得するステップと、を備える方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US11/242,298 US7691204B2 (en) | 2005-09-30 | 2005-09-30 | Film formation apparatus and methods including temperature and emissivity/pattern compensation |
US11/242,298 | 2005-09-30 | ||
PCT/US2006/035031 WO2007040908A2 (en) | 2005-09-30 | 2006-09-11 | Film formation apparatus and methods including temperature and emissivity/pattern compensation |
Publications (3)
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JP2009510262A JP2009510262A (ja) | 2009-03-12 |
JP2009510262A5 JP2009510262A5 (ja) | 2009-09-10 |
JP5686952B2 true JP5686952B2 (ja) | 2015-03-18 |
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JP2008533387A Expired - Fee Related JP5686952B2 (ja) | 2005-09-30 | 2006-09-11 | 温度および放射率/パターン補償を含む膜形成装置および方法 |
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US (1) | US7691204B2 (ja) |
JP (1) | JP5686952B2 (ja) |
KR (1) | KR101047089B1 (ja) |
TW (1) | TWI367958B (ja) |
WO (1) | WO2007040908A2 (ja) |
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-
2005
- 2005-09-30 US US11/242,298 patent/US7691204B2/en not_active Expired - Fee Related
-
2006
- 2006-09-11 KR KR1020087010501A patent/KR101047089B1/ko active IP Right Grant
- 2006-09-11 JP JP2008533387A patent/JP5686952B2/ja not_active Expired - Fee Related
- 2006-09-11 WO PCT/US2006/035031 patent/WO2007040908A2/en active Application Filing
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Also Published As
Publication number | Publication date |
---|---|
KR101047089B1 (ko) | 2011-07-06 |
KR20080055972A (ko) | 2008-06-19 |
US7691204B2 (en) | 2010-04-06 |
JP2009510262A (ja) | 2009-03-12 |
WO2007040908A3 (en) | 2009-04-16 |
US20070077355A1 (en) | 2007-04-05 |
TW200724712A (en) | 2007-07-01 |
WO2007040908A2 (en) | 2007-04-12 |
TWI367958B (en) | 2012-07-11 |
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