JP5531120B1 - ドデカカルボニルトリルテニウムの製造方法 - Google Patents
ドデカカルボニルトリルテニウムの製造方法 Download PDFInfo
- Publication number
- JP5531120B1 JP5531120B1 JP2013007977A JP2013007977A JP5531120B1 JP 5531120 B1 JP5531120 B1 JP 5531120B1 JP 2013007977 A JP2013007977 A JP 2013007977A JP 2013007977 A JP2013007977 A JP 2013007977A JP 5531120 B1 JP5531120 B1 JP 5531120B1
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- dcr
- amine
- ruthenium chloride
- yield
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 36
- VMDTXBZDEOAFQF-UHFFFAOYSA-N formaldehyde;ruthenium Chemical compound [Ru].O=C VMDTXBZDEOAFQF-UHFFFAOYSA-N 0.000 title claims abstract description 14
- 238000006243 chemical reaction Methods 0.000 claims abstract description 90
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 claims abstract description 40
- 150000001412 amines Chemical class 0.000 claims abstract description 36
- 229910002091 carbon monoxide Inorganic materials 0.000 claims abstract description 13
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000005810 carbonylation reaction Methods 0.000 claims abstract description 7
- 230000006315 carbonylation Effects 0.000 claims abstract description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 29
- 230000035484 reaction time Effects 0.000 claims description 18
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 13
- 239000000460 chlorine Substances 0.000 claims description 13
- 229910052801 chlorine Inorganic materials 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 7
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 14
- 239000002184 metal Substances 0.000 abstract description 14
- 239000012535 impurity Substances 0.000 abstract description 9
- 239000000126 substance Substances 0.000 abstract description 6
- 150000002739 metals Chemical class 0.000 abstract 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 33
- 238000000034 method Methods 0.000 description 22
- 238000003786 synthesis reaction Methods 0.000 description 19
- 239000000243 solution Substances 0.000 description 14
- 239000002904 solvent Substances 0.000 description 11
- 230000007423 decrease Effects 0.000 description 9
- 239000002994 raw material Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 150000003304 ruthenium compounds Chemical class 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 238000000746 purification Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000003197 catalytic effect Effects 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 4
- 229910052707 ruthenium Inorganic materials 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000000859 sublimation Methods 0.000 description 4
- 230000008022 sublimation Effects 0.000 description 4
- 238000005092 sublimation method Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 description 3
- XGLVDUUYFKXKPL-UHFFFAOYSA-N 2-(2-methoxyethoxy)-n,n-bis[2-(2-methoxyethoxy)ethyl]ethanamine Chemical compound COCCOCCN(CCOCCOC)CCOCCOC XGLVDUUYFKXKPL-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910019891 RuCl3 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 229940093476 ethylene glycol Drugs 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- -1 or the like Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 150000003303 ruthenium Chemical class 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- SWZDQOUHBYYPJD-UHFFFAOYSA-N tridodecylamine Chemical compound CCCCCCCCCCCCN(CCCCCCCCCCCC)CCCCCCCCCCCC SWZDQOUHBYYPJD-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/0006—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table compounds of the platinum group
- C07F15/0046—Ruthenium compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G55/00—Compounds of ruthenium, rhodium, palladium, osmium, iridium, or platinum
- C01G55/007—Compounds containing at least one carbonyl group
- C01G55/008—Carbonyls
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45553—Atomic layer deposition [ALD] characterized by the use of precursors specially adapted for ALD
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
1−プロパノール:60mL
アミン:いずれも塩素に対して1.3モル等量を添加
・プロピルアミン(1.57g)
・ジエチルアミン(1.94g)
・トリエチルアミン(2.69g)
・トリオクチルアミン(9.40g)
・トリドデシルアミン(13.87g)
・トリエタノールアミン(3.97g )
・トリス[2−(2−メトキシエトキシ)エチル]アミン(8.60g)
・N,N−ジメチルアニリン(3.22g)
・添加無し
反応圧:0.35MPa
反応温度:85℃
反応時間:15時間
攪拌速度:300rpm
トリエチルアミンの添加量を変化させてDCRの反応試験を行った。基本的な工程は、第1実施形態と同様である。反応条件は以下のようにした。この試験において、トリエチルアミンの添加量に対するDCRの収率の測定結果を表2に示す。
1−プロパノール:60mL
トリエチルアミン:0.5等量、0.6等量、0.8等量、1.0等量、1.3等量、1.5等量、1.8等量(塩素に対するモル等量)
反応圧:0.35MPa
反応温度:85℃
反応時間:15時間
攪拌速度:300rpm
合成反応の一酸化炭素の圧力について、その値を変化させてDCRの反応試験を行った。基本的な工程は、第1実施形態と同様である。反応条件は以下のようにした。この試験におけるDCRの収率の測定結果を表3に示す。
1−プロパノール:60mL
トリエチルアミン:1.3等量(塩素に対するモル等量)
反応圧:0.1MPa、0.2MPa、0.3MPa、0.35MPa、0.5MPa0.78MPa、0.9Mpa、1.0MPa
反応温度:85℃
反応時間:6時間
攪拌速度:300rpm
反応温度について、その値を変化させてDCRの反応試験を行った。基本的な工程は、第1実施形態と同様である。反応条件は以下のようにした。この試験におけるDCRの収率の測定結果を表4に示す。
1−プロパノール:60mL
トリエチルアミン:1.3等量(塩素に対するモル等量)
反応圧:0.35MPa
反応温度:40℃、50℃、75℃、80℃、85℃、90℃、100℃、110℃
反応時間:15時間
攪拌速度:300rpm
塩化ルテニウム溶液にトリエチルアミン、一酸化炭素を添加した後の反応時間を変化させてDCRの反応試験を行った。基本的な工程は、第1実施形態と同様である。反応条件は以下のようにした。この試験におけるDCRの収率の測定結果を図1に示す。
1−プロパノール:60mL
トリエチルアミン:1.3等量(塩素に対するモル等量)
反応圧:0.35MPa
反応温度:85℃
反応時間:11〜60時間
攪拌速度:300rpm
塩化ルテニウム溶液製造前の1−プロパノールについて、その含水量とDCRの収率との関係について検討した。その他のDCR製造工程は、第1実施形態と同様である。反応条件は以下のようにした。この試験におけるDCRの収率の測定結果を表5に示す。
1−プロパノール:60mL(含水量:乾燥、0.5wt%、1.0wt%、3.0wt%、5.0wt%、10wt%、30wt%
トリエチルアミン:1.3等量(塩素に対するモル等量)
反応圧:0.35MPa
反応温度:85℃
反応時間:10〜60時間
攪拌速度:300rpm
以上の各試験で製造したDCRについて、その成分分析をCHN元素分析法で行い、製造品中のルテニウム含有率及び炭素含有率を測定した。この結果を表6に示す。
Claims (5)
- 添加するアミンは、炭素数3〜36のアミンである請求項1記載のドデカカルボニルトリルテニウムの製造方法
- 反応時間を10〜30時間とする請求項1又は請求項2記載のドデカカルボニルトリルテニウムの製造方法。
- 塩化ルテニウムは、塩化ルテニウムと有機溶媒とからなる塩化ルテニウム溶液であり、前記有機溶媒は、メタノール、エタノール、プロパノール、ブタノールである請求項1〜請求項3のいずれかに記載のドデカカルボニルトリルテニウムの製造方法。
- 有機溶媒は、含水量が5質量%以下の有機溶媒である請求項3記載のドデカカルボニルトリルテニウムの製造方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013007977A JP5531120B1 (ja) | 2013-01-21 | 2013-01-21 | ドデカカルボニルトリルテニウムの製造方法 |
PCT/JP2014/050907 WO2014112613A1 (ja) | 2013-01-21 | 2014-01-20 | ドデカカルボニルトリルテニウムの製造方法 |
TW103101935A TWI508921B (zh) | 2013-01-21 | 2014-01-20 | 十二羰基三釕之製造方法 |
KR1020157020483A KR101732834B1 (ko) | 2013-01-21 | 2014-01-20 | 도데카카르보닐 트리루테늄의 제조 방법 |
US14/655,076 US9266916B2 (en) | 2013-01-21 | 2014-01-20 | Production method for dodecacarbonyl triruthenium |
CN201480005368.5A CN104936903B (zh) | 2013-01-21 | 2014-01-20 | 十二羰基三钌的制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013007977A JP5531120B1 (ja) | 2013-01-21 | 2013-01-21 | ドデカカルボニルトリルテニウムの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP5531120B1 true JP5531120B1 (ja) | 2014-06-25 |
JP2014139111A JP2014139111A (ja) | 2014-07-31 |
Family
ID=51175845
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013007977A Active JP5531120B1 (ja) | 2013-01-21 | 2013-01-21 | ドデカカルボニルトリルテニウムの製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9266916B2 (ja) |
JP (1) | JP5531120B1 (ja) |
KR (1) | KR101732834B1 (ja) |
CN (1) | CN104936903B (ja) |
TW (1) | TWI508921B (ja) |
WO (1) | WO2014112613A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5732512B2 (ja) * | 2013-10-29 | 2015-06-10 | 田中貴金属工業株式会社 | ドデカカルボニルトリルテニウムの製造方法及び製造装置 |
CN107406686B (zh) * | 2015-03-17 | 2019-06-28 | 富士胶片株式会社 | 钌络合物色素、色素溶液、光电转换元件及色素增感太阳能电池 |
US11427887B2 (en) | 2017-11-27 | 2022-08-30 | The Board Of Trustees Of The University Of Illinois | Extraction of selected platinum-group metals from supported catalyst |
CN111054444B (zh) * | 2019-12-30 | 2023-04-07 | 苏州鼎驰金属材料有限公司 | 一种二羰基二亚硝基合钌及其制备方法和应用 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1060938A (en) * | 1963-02-01 | 1967-03-08 | Lonza Ag | A process for the production of trimeric ruthenium tetracarbonyl |
GB1160765A (en) * | 1966-08-10 | 1969-08-06 | Ici Ltd | Process for the Preparation of Ruthenium Carbonyl |
US3786132A (en) * | 1972-07-11 | 1974-01-15 | Eastman Kodak Co | Method for preparing carbonyls of ruthenium and osmium |
JPH01188429A (ja) * | 1988-01-22 | 1989-07-27 | Nkk Corp | ルテニウムカルボニル錯体類の製造方法 |
JPH07316175A (ja) * | 1994-05-25 | 1995-12-05 | Nippon Paint Co Ltd | ルテニウムカルボニル金属クラスター錯体 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3561924A (en) * | 1968-03-14 | 1971-02-09 | Ici Ltd | Process for the preparation of ruthenium carbonyl |
JP4051532B2 (ja) * | 2002-01-08 | 2008-02-27 | 三菱マテリアル株式会社 | 有機金属化学蒸着法用ルテニウム化合物の製造方法及び該方法により得られた有機金属化学蒸着法用ルテニウム化合物並びに該化合物により得られたルテニウム含有薄膜 |
JP2008244298A (ja) * | 2007-03-28 | 2008-10-09 | Tokyo Electron Ltd | 金属膜の成膜方法、多層配線構造の形成方法、半導体装置の製造方法、成膜装置 |
CN102341902A (zh) * | 2009-03-03 | 2012-02-01 | 东京毅力科创株式会社 | 载置台结构、成膜装置和原料回收方法 |
CN102177170B (zh) * | 2009-10-23 | 2014-06-11 | 高砂香料工业株式会社 | 具有三齿配体的新型羰基钌配合物、其制备方法和用途 |
CN101787045B (zh) * | 2010-02-08 | 2012-10-03 | 浙江大学 | 钌化合物催化硅氢加成反应的方法 |
CN101966457B (zh) * | 2010-09-25 | 2012-07-25 | 郴州高鑫铂业有限公司 | 一种高活性羰基加氢钌炭催化剂的制备方法 |
-
2013
- 2013-01-21 JP JP2013007977A patent/JP5531120B1/ja active Active
-
2014
- 2014-01-20 US US14/655,076 patent/US9266916B2/en active Active
- 2014-01-20 KR KR1020157020483A patent/KR101732834B1/ko active IP Right Grant
- 2014-01-20 CN CN201480005368.5A patent/CN104936903B/zh active Active
- 2014-01-20 TW TW103101935A patent/TWI508921B/zh active
- 2014-01-20 WO PCT/JP2014/050907 patent/WO2014112613A1/ja active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1060938A (en) * | 1963-02-01 | 1967-03-08 | Lonza Ag | A process for the production of trimeric ruthenium tetracarbonyl |
GB1160765A (en) * | 1966-08-10 | 1969-08-06 | Ici Ltd | Process for the Preparation of Ruthenium Carbonyl |
US3786132A (en) * | 1972-07-11 | 1974-01-15 | Eastman Kodak Co | Method for preparing carbonyls of ruthenium and osmium |
JPH01188429A (ja) * | 1988-01-22 | 1989-07-27 | Nkk Corp | ルテニウムカルボニル錯体類の製造方法 |
JPH07316175A (ja) * | 1994-05-25 | 1995-12-05 | Nippon Paint Co Ltd | ルテニウムカルボニル金属クラスター錯体 |
Non-Patent Citations (1)
Title |
---|
JPN6014012908; M.I.Bruce and F.G.A.Stone: 'Chemistry of the Metal Carbonyls. Part XL. Carbonylation of Ruthenium Trichloride' J.Chem.Soc.(A) , 19670106, pages 1238-1241 * |
Also Published As
Publication number | Publication date |
---|---|
TWI508921B (zh) | 2015-11-21 |
US20150344510A1 (en) | 2015-12-03 |
CN104936903A (zh) | 2015-09-23 |
WO2014112613A1 (ja) | 2014-07-24 |
US9266916B2 (en) | 2016-02-23 |
CN104936903B (zh) | 2017-03-08 |
KR20150103700A (ko) | 2015-09-11 |
JP2014139111A (ja) | 2014-07-31 |
KR101732834B1 (ko) | 2017-05-04 |
TW201431790A (zh) | 2014-08-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Zhao et al. | Eco-friendly acetylcholine-carboxylate bio-ionic liquids for controllable N-methylation and N-formylation using ambient CO 2 at low temperatures | |
JP5531120B1 (ja) | ドデカカルボニルトリルテニウムの製造方法 | |
JP7109471B2 (ja) | D2からの重水素化エタノールの調製方法 | |
EP3275886A1 (en) | Method for producing dialkylaminosilane | |
KR101630098B1 (ko) | 화학 증착 원료용 유기 루테늄 화합물 및 그 유기 루테늄 화합물의 제조방법 | |
US9061960B2 (en) | Method for working up mixtures | |
CA3059585A1 (en) | Process for the preparation of deuterated ethanol from d2o | |
CN111302962A (zh) | 一种将脂肪族硝基化合物中的硝基还原成氨基的快捷方法 | |
JP6345531B2 (ja) | 一酸化炭素の製造方法 | |
CN113773200B (zh) | 戊二酸单叔丁酯的制备方法 | |
JP2010180142A (ja) | シクロヘキサンカルボニトリルの製造方法 | |
CN106458965A (zh) | 杂芳基羧酸酯衍生物的制造方法及其制造中间体 | |
CN117003733A (zh) | 一种具有催化性能的吡啶-吡唑甲酸金属铜配合物及其制备方法 | |
JP2023020020A (ja) | カルベン化合物及びその製造方法 | |
CN105037192A (zh) | 一步法辛烷值促进剂对甲酰胺基苯烷基醚合成方法 | |
JP4521632B2 (ja) | ジハロゲノシクロペンタジエニルイリジウムダイマーの製造方法 | |
JPS61502758A (ja) | ロジウム錯体触媒を用いる有機ぎ酸エステルからのカルボン酸の製造 | |
EP2848604B1 (en) | Method for producing branched chain aldehyde | |
JP5375288B2 (ja) | ピラゾリン誘導体の製造方法 | |
CN117510392A (zh) | 一种双吲哚基化合物的制备方法 | |
CN107501115A (zh) | 一种甲酰胺类化合物的制备方法 | |
JP2009137905A (ja) | 第三級アミンの製造方法 | |
JP2015523338A (ja) | 混合物を処理するための方法 | |
JPS599529B2 (ja) | エタノ−ルの製造方法 | |
JPS59190937A (ja) | アルコ−ルの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140328 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140421 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5531120 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |