JP5732512B2 - ドデカカルボニルトリルテニウムの製造方法及び製造装置 - Google Patents
ドデカカルボニルトリルテニウムの製造方法及び製造装置 Download PDFInfo
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- JP5732512B2 JP5732512B2 JP2013224211A JP2013224211A JP5732512B2 JP 5732512 B2 JP5732512 B2 JP 5732512B2 JP 2013224211 A JP2013224211 A JP 2013224211A JP 2013224211 A JP2013224211 A JP 2013224211A JP 5732512 B2 JP5732512 B2 JP 5732512B2
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- dcr
- sublimation
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- gas
- heating
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- VMDTXBZDEOAFQF-UHFFFAOYSA-N formaldehyde;ruthenium Chemical compound [Ru].O=C VMDTXBZDEOAFQF-UHFFFAOYSA-N 0.000 title claims description 171
- 238000000034 method Methods 0.000 title description 22
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 61
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 61
- 238000000859 sublimation Methods 0.000 claims description 60
- 230000008022 sublimation Effects 0.000 claims description 60
- 238000010438 heat treatment Methods 0.000 claims description 52
- 238000004519 manufacturing process Methods 0.000 claims description 26
- 239000012535 impurity Substances 0.000 claims description 24
- 238000000746 purification Methods 0.000 claims description 16
- 238000001704 evaporation Methods 0.000 claims description 12
- 230000008020 evaporation Effects 0.000 claims description 12
- 238000005229 chemical vapour deposition Methods 0.000 claims description 9
- 238000001556 precipitation Methods 0.000 claims description 9
- 150000003304 ruthenium compounds Chemical class 0.000 claims description 9
- 238000005092 sublimation method Methods 0.000 claims description 8
- 238000001914 filtration Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 5
- 238000007670 refining Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 45
- 238000012360 testing method Methods 0.000 description 21
- 239000010409 thin film Substances 0.000 description 13
- 239000002994 raw material Substances 0.000 description 12
- 238000005979 thermal decomposition reaction Methods 0.000 description 11
- 229910052707 ruthenium Inorganic materials 0.000 description 10
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000013078 crystal Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 238000001308 synthesis method Methods 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 150000003303 ruthenium Chemical class 0.000 description 4
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- -1 DCR Chemical class 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000000160 carbon, hydrogen and nitrogen elemental analysis Methods 0.000 description 1
- 230000006315 carbonylation Effects 0.000 description 1
- 238000005810 carbonylation reaction Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- OJLCQGGSMYKWEK-UHFFFAOYSA-K ruthenium(3+);triacetate Chemical compound [Ru+3].CC([O-])=O.CC([O-])=O.CC([O-])=O OJLCQGGSMYKWEK-UHFFFAOYSA-K 0.000 description 1
- GTCKPGDAPXUISX-UHFFFAOYSA-N ruthenium(3+);trinitrate Chemical compound [Ru+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O GTCKPGDAPXUISX-UHFFFAOYSA-N 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G55/00—Compounds of ruthenium, rhodium, palladium, osmium, iridium, or platinum
- C01G55/007—Compounds containing at least one carbonyl group
- C01G55/008—Carbonyls
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D7/00—Sublimation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Vapour Deposition (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
上記した昇華装置の焼結フィルター上に、DCR粗結晶を1.5kg配置し、供給ガス流量500sccm、加熱温度100℃、真空度26.6Paの条件にて昇華を行なった後、冷却水温度5℃でDCRを析出させた(試験No.1−4)。本実施形態における供給ガスは、COのみ(CO濃度100%)とした。また、表2に示すCOガス流量、加熱温度、昇華時間とした各実施例及び比較例についても、同様に昇華を行った。
焼結フィルターの厚みを3.0mm(試験No.2−1)及び1.7mm(試験No.2−2)とした昇華装置にて。粗DCRを精製した結果を表4に示す。昇華条件は第1実施形態の試験No.1−4と同様とした(DCR1500g、CO流量500sccm、加熱温度100℃、圧力26.6Pa、昇華時間18.5h)。試験No.2−2については、ICP−MSによる不純物元素の測定も行った。
101 載置台
102 ヒーター
200 焼結フィルター
201 粗DCR
202 内側容器
400 トラップフィルター
V 加熱蒸発部
D DCR析出部
Claims (5)
- 次式で示されるドデカカルボニルトリルテニウム(DCR)からなる化学蒸着原料用の有機ルテニウム化合物の製造方法において、
前記精製工程では、ろ過精度5〜30μmの焼結フィルターの上方に配置した粗DCRに対し、焼結フィルター下方よりCOガスを供給し、一酸化炭素濃度30〜100%の雰囲気下で粗DCRを加熱して昇華させた後、冷却してDCRを析出させるDCRの製造方法。 - 粗DCRの昇華は、温度100〜130℃に加熱して行う請求項1に記載されたDCRの製造方法。
- 粗DCRの昇華は、一酸化炭素を150〜1000sccm流通させて行う請求項1又は請求項2に記載されたDCRの製造方法。
- 請求項1〜3のいずれかに記載されたDCRの製造方法の精製工程に適用される昇華装置において、
粗DCRが配置される載置手段と、粗DCRに一酸化炭素を供給するCOガス供給手段と、前記載置手段を加熱する手段と、を有する加熱蒸発部と、
前記加熱蒸発部に接続され、冷却器を有するDCR析出部と、
前記加熱蒸発部及び前記DCR析出部内の気体を吸引する圧力調整手段と、を備え、
前記加熱蒸発部の載置手段に、ろ過精度5〜30μmの焼結フィルターが設置された昇華装置。 - 加熱蒸発部には、不純物元素のトラップフィルターをさらに備える請求項4に記載された昇華装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013224211A JP5732512B2 (ja) | 2013-10-29 | 2013-10-29 | ドデカカルボニルトリルテニウムの製造方法及び製造装置 |
TW103134716A TWI532744B (zh) | 2013-10-29 | 2014-10-06 | 十二羰基三釕的製造方法及製造裝置 |
CN201480059221.4A CN105683410B (zh) | 2013-10-29 | 2014-10-14 | 十二羰基三钌的制造方法及制造装置 |
KR1020167012228A KR101723353B1 (ko) | 2013-10-29 | 2014-10-14 | 도데카카르보닐트리루테늄의 제조 방법 및 제조 장치 |
PCT/JP2014/077322 WO2015064353A1 (ja) | 2013-10-29 | 2014-10-14 | ドデカカルボニルトリルテニウムの製造方法及び製造装置 |
US15/030,084 US9499411B2 (en) | 2013-10-29 | 2014-10-14 | Device for producing and method for producing dodecacarbonyl triruthenium |
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JP2013224211A JP5732512B2 (ja) | 2013-10-29 | 2013-10-29 | ドデカカルボニルトリルテニウムの製造方法及び製造装置 |
Publications (2)
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JP2015086410A JP2015086410A (ja) | 2015-05-07 |
JP5732512B2 true JP5732512B2 (ja) | 2015-06-10 |
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Country Status (6)
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US (1) | US9499411B2 (ja) |
JP (1) | JP5732512B2 (ja) |
KR (1) | KR101723353B1 (ja) |
CN (1) | CN105683410B (ja) |
TW (1) | TWI532744B (ja) |
WO (1) | WO2015064353A1 (ja) |
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CN116282240A (zh) * | 2023-05-12 | 2023-06-23 | 研峰科技(北京)有限公司 | 一种十二羰基三钌的纯化方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
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US7270848B2 (en) * | 2004-11-23 | 2007-09-18 | Tokyo Electron Limited | Method for increasing deposition rates of metal layers from metal-carbonyl precursors |
JP4317174B2 (ja) * | 2005-09-21 | 2009-08-19 | 東京エレクトロン株式会社 | 原料供給装置および成膜装置 |
US7459395B2 (en) | 2005-09-28 | 2008-12-02 | Tokyo Electron Limited | Method for purifying a metal carbonyl precursor |
US7297719B2 (en) * | 2006-03-29 | 2007-11-20 | Tokyo Electron Limited | Method and integrated system for purifying and delivering a metal carbonyl precursor |
JP2008244298A (ja) * | 2007-03-28 | 2008-10-09 | Tokyo Electron Ltd | 金属膜の成膜方法、多層配線構造の形成方法、半導体装置の製造方法、成膜装置 |
CN101787045B (zh) * | 2010-02-08 | 2012-10-03 | 浙江大学 | 钌化合物催化硅氢加成反应的方法 |
JP5140184B1 (ja) | 2011-08-03 | 2013-02-06 | 田中貴金属工業株式会社 | 化学蒸着原料用の有機ルテニウム化合物及び該有機ルテニウム化合物の製造方法 |
JP5531120B1 (ja) * | 2013-01-21 | 2014-06-25 | 田中貴金属工業株式会社 | ドデカカルボニルトリルテニウムの製造方法 |
-
2013
- 2013-10-29 JP JP2013224211A patent/JP5732512B2/ja active Active
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2014
- 2014-10-06 TW TW103134716A patent/TWI532744B/zh active
- 2014-10-14 CN CN201480059221.4A patent/CN105683410B/zh active Active
- 2014-10-14 US US15/030,084 patent/US9499411B2/en active Active
- 2014-10-14 KR KR1020167012228A patent/KR101723353B1/ko active IP Right Grant
- 2014-10-14 WO PCT/JP2014/077322 patent/WO2015064353A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
CN105683410A (zh) | 2016-06-15 |
JP2015086410A (ja) | 2015-05-07 |
KR101723353B1 (ko) | 2017-04-05 |
KR20160070110A (ko) | 2016-06-17 |
TWI532744B (zh) | 2016-05-11 |
CN105683410B (zh) | 2017-12-05 |
WO2015064353A1 (ja) | 2015-05-07 |
TW201522351A (zh) | 2015-06-16 |
US9499411B2 (en) | 2016-11-22 |
US20160251232A1 (en) | 2016-09-01 |
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