JP5408827B2 - プラズマチャンバ部品のための酸化皮膜を有するエロージョン耐性イットリウム含有金属 - Google Patents
プラズマチャンバ部品のための酸化皮膜を有するエロージョン耐性イットリウム含有金属 Download PDFInfo
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- JP5408827B2 JP5408827B2 JP2010539435A JP2010539435A JP5408827B2 JP 5408827 B2 JP5408827 B2 JP 5408827B2 JP 2010539435 A JP2010539435 A JP 2010539435A JP 2010539435 A JP2010539435 A JP 2010539435A JP 5408827 B2 JP5408827 B2 JP 5408827B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32467—Material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
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- General Chemical & Material Sciences (AREA)
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- Other Surface Treatments For Metallic Materials (AREA)
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- Physical Vapour Deposition (AREA)
Description
本発明の実施形態は、イットリウム金属基体を含むエロージョン耐性半導体処理部品に関する。このような部品を作製するための方法についても記載する。
この項では、本発明で開示の実施形態に関連した背景となる主題について説明する。この項で論じる背景技術が先行技術を法的に構成すると表明又は含意する意図はない。
図1は、試験片(寸法:1〜4インチ(2.5cmx10.1cm)x1〜4インチ(2.4cmx10.1cm)x厚さ約0.1インチ(0.25cm)〜0.25インチ(0.6cm)を有する)の表面上で金属イットリウムから酸化イットリウム(Y2O3)に転化する際の処理時間及び温度を示すグラフ100である。試験片は、イットリウム金属の大きな棒材から作製され、上記の寸法に機械加工された。機械加工された試験片の平均表面粗さは約0.1μmRaであったが、最高1.0μmRaの表面粗さまで良好な結果が得られた。これは、本発明の熱酸化処理を使用したイットリウム金属基体表面上へのイットリウム含有酸化物生成方法の驚くべき利点である。図2から見て取ることができるように、イットリウム金属基体と基体表面上の熱酸化によって形成された酸化イットリウム皮膜との界面にはボイドや亀裂がなく、イットリウム金属の表面に沿っている。
プロファイルを調節して、イットリウム金属含有基体の組成における変化を説明する。例えば、基体が純粋な金属ではなく、Nd、Sm、Tb、Dy、Er、Yb、Sc、Hf、Nb及びこれらの組み合わせ(例であって、これらに限定するものではない)から成る群から選択される別の元素を含有する場合がある。イットリウム金属含有基体中に存在し得るその他の元素の量は、0重量%から最高約50重量%である。更に、その他の金属を上で挙げた類の金属の1つとの合金にすることによって、改善された機械的又は電気的性質を得てもよい。例えば、アルミニウムを上で挙げた金属又は金属の組み合わせとの合金にする。
図3A及び3Bは、当該分野で既知の類のプラズマ溶射法を使用して形成される従来の酸化イットリウム皮膜の粗い表面302(図3A)と、本発明の熱酸化法によって成長させた酸化イットリウム皮膜の滑らかな表面(図3B)との違いを示す。
図4A〜4Eは、機械加工により金属イットリウム基体を貫通する開口部を形成した領域における、金属イットリウム基体の表面上の保護酸化イットリウム皮膜の成長の様々な態様を示す。
図5Aは、イットリウム金属基体502のある領域の側部断面の顕微鏡写真500であり、界面501及び酸化イットリウム皮膜504も写っている。この顕微鏡写真上の目盛りは5μmを表す。図5Bは、図5Aより離れた距離から撮影した(倍率が小さい)、酸化イットリウム皮膜の全体のテクスチャをより良く示す、酸化イットリウム皮膜504のある領域の側部断面の顕微鏡写真510である。この顕微鏡写真上の目盛りは20μmを表す。図5Cは、図5Aより近い距離から撮影した(倍率が大きい)、酸化イットリウム皮膜結晶全般の柱状構造522をより良く示す、酸化イットリウム皮膜504のある領域の側部断面の顕微鏡写真520である。この顕微鏡写真上の目盛りは2.0μmを表す。上述したように、より厚みのある酸化イットリウム膜の形成を可能にするのはこの柱状構造であり、この柱状構造内の結晶粒のサイズを、皮膜の上面で大きくなり、イットリウム金属基体との界面で小さくなるように制御する。
Claims (10)
- 化学的に活性なプラズマによるコロージョン又はエロージョンに耐性の物品であって、
イットリウム、ネオジム、サマリウム、テルビウム、ジスプロシウム、エルビウム、イッテルビウム、スカンジウム、ハフニウム、ニオブ又はこれらの組み合わせから成る群より選択される金属と、酸化ジルコニウム、酸化ハフニウム、酸化スカンジウム、酸化ニオブ、酸化サマリウム、酸化イッテルビウム、酸化エルビウム、酸化セリウム、酸化ネオジム、酸化テルビウム、酸化ジスプロシウム及びこれらの組み合わせから成る群から選択される少なくとも1つのドーパントを含む金属又は合金基体と、
前記少なくとも1つのドーパントを含む金属又は合金の熱酸化物である酸化物皮膜とを備え、前記酸化物皮膜の構造が柱状構造であり、前記酸化物皮膜内の結晶の粒径が、前記酸化物皮膜と前記金属又は合金基体との界面より前記酸化物皮膜の露出面でより大きく、前記酸化物皮膜が、前記酸化物皮膜と前記金属又は合金基体との前記界面で圧縮状態にある物品。 - 前記金属又は合金が更にアルミニウムを含む請求項1記載の物品。
- 前記金属がイットリウムである請求項1記載の物品。
- 前記合金がイットリウムを含む請求項1記載の物品。
- 前記酸化物皮膜の厚さが約1μm〜約500μmである請求項1記載の物品。
- 前記皮膜の外面が、前記少なくとも1つのドーパントを含む金属又は合金の熱酸化物であり、約0.1μmRa〜約10μmRaの表面粗さを有する請求項1記載の物品。
- 化学的に活性なプラズマによるコロージョン又はエロージョンに耐性の物品であって、
イットリウム、ネオジム、サマリウム、テルビウム、ジスプロシウム、エルビウム、イッテルビウム、スカンジウム、ハフニウム、ニオブ又はこれらの組み合わせから成る群より選択される金属と、マグネシウム、アルミニウム、銅、カルシウム及びこれらの組み合わせから成る群から選択される少なくとも1つのドーパントを含む金属又は合金基体と、
前記少なくとも1つのドーパントを含む金属又は合金の熱酸化物である酸化物皮膜とを備え、前記酸化物皮膜の構造が柱状構造であり、前記酸化物皮膜内の結晶の粒径が、前記酸化物皮膜と前記金属又は合金基体との界面より前記酸化物皮膜の露出面でより大きく、前記酸化物皮膜が、前記酸化物皮膜と前記金属又は合金基体との前記界面で圧縮状態にある物品。 - 前記酸化物皮膜の厚さが約1μm〜約500μmである請求項7記載の物品。
- 前記ドーパントが、マグネシウム、アルミニウム、銅及びカルシウムの組み合わせを含み、マグネシウムの濃度範囲が約10重量ppm〜約30重量ppmであり、アルミニウムの濃度範囲が約10重量ppm〜約110重量ppmであり、銅の濃度範囲が約50重量ppm〜約300重量ppmであり、カルシウムの濃度範囲が約10重量ppm〜約800重量ppmである請求項7記載の物品。
- 前記皮膜の外面が、前記少なくとも1つのドーパントを含む金属又は合金の熱酸化物であり、約0.1μmRa〜約10μmRaの表面粗さを有する請求項7記載の物品。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/004,907 US8129029B2 (en) | 2007-12-21 | 2007-12-21 | Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating |
US12/004,907 | 2007-12-21 | ||
PCT/US2008/013589 WO2009085117A2 (en) | 2007-12-21 | 2008-12-10 | Erosion resistant yttrium comprising metal with oxidized coating for plasma chamber components |
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JP2011509343A JP2011509343A (ja) | 2011-03-24 |
JP2011509343A5 JP2011509343A5 (ja) | 2012-11-29 |
JP5408827B2 true JP5408827B2 (ja) | 2014-02-05 |
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JP2010539435A Expired - Fee Related JP5408827B2 (ja) | 2007-12-21 | 2008-12-10 | プラズマチャンバ部品のための酸化皮膜を有するエロージョン耐性イットリウム含有金属 |
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US (2) | US8129029B2 (ja) |
JP (1) | JP5408827B2 (ja) |
KR (1) | KR101289815B1 (ja) |
CN (2) | CN101903558B (ja) |
TW (1) | TWI461572B (ja) |
WO (1) | WO2009085117A2 (ja) |
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CN102732857A (zh) | 2012-10-17 |
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CN101903558A (zh) | 2010-12-01 |
KR20100099318A (ko) | 2010-09-10 |
US20120125488A1 (en) | 2012-05-24 |
CN101903558B (zh) | 2012-07-11 |
US20090162647A1 (en) | 2009-06-25 |
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US8129029B2 (en) | 2012-03-06 |
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