JP5371978B2 - 高周波電流供給装置、とりわけプラズマ給電装置および高周波電流供給装置の駆動方法 - Google Patents
高周波電流供給装置、とりわけプラズマ給電装置および高周波電流供給装置の駆動方法 Download PDFInfo
- Publication number
- JP5371978B2 JP5371978B2 JP2010517277A JP2010517277A JP5371978B2 JP 5371978 B2 JP5371978 B2 JP 5371978B2 JP 2010517277 A JP2010517277 A JP 2010517277A JP 2010517277 A JP2010517277 A JP 2010517277A JP 5371978 B2 JP5371978 B2 JP 5371978B2
- Authority
- JP
- Japan
- Prior art keywords
- current supply
- line
- output power
- frequency current
- supply device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 12
- 238000004804 winding Methods 0.000 claims description 78
- 239000004020 conductor Substances 0.000 claims description 16
- 230000005291 magnetic effect Effects 0.000 claims description 9
- 230000002708 enhancing effect Effects 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 abstract 1
- 239000003990 capacitor Substances 0.000 description 26
- 239000007789 gas Substances 0.000 description 9
- 229910000859 α-Fe Inorganic materials 0.000 description 9
- 230000008878 coupling Effects 0.000 description 8
- 238000010168 coupling process Methods 0.000 description 8
- 238000005859 coupling reaction Methods 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 5
- 239000002800 charge carrier Substances 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 239000005328 architectural glass Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical group 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
- H01J37/32045—Circuits specially adapted for controlling the glow discharge
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R21/00—Arrangements for measuring electric power or power factor
- G01R21/06—Arrangements for measuring electric power or power factor by measuring current and voltage
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
- G01R23/02—Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
- H02M7/003—Constructional details, e.g. physical layout, assembly, wiring or busbar connections
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
- H02M7/42—Conversion of dc power input into ac power output without possibility of reversal
- H02M7/44—Conversion of dc power input into ac power output without possibility of reversal by static converters
- H02M7/48—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M7/53—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
- H02M7/537—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
- H02M7/5383—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a self-oscillating arrangement
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/38—Impedance-matching networks
- H03H7/40—Automatic matching of load impedance to source impedance
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
- H05B41/14—Circuit arrangements
- H05B41/26—Circuit arrangements in which the lamp is fed by power derived from dc by means of a converter, e.g. by high-voltage dc
- H05B41/28—Circuit arrangements in which the lamp is fed by power derived from dc by means of a converter, e.g. by high-voltage dc using static converters
- H05B41/2806—Circuit arrangements in which the lamp is fed by power derived from dc by means of a converter, e.g. by high-voltage dc using static converters with semiconductor devices and specially adapted for lamps without electrodes in the vessel, e.g. surface discharge lamps, electrodeless discharge lamps
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B20/00—Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Inverter Devices (AREA)
- Amplifiers (AREA)
- Drying Of Semiconductors (AREA)
- Control Of Amplification And Gain Control (AREA)
- Chemical Vapour Deposition (AREA)
- Dc-Dc Converters (AREA)
- Supply And Distribution Of Alternating Current (AREA)
- Arc Welding In General (AREA)
- Output Control And Ontrol Of Special Type Engine (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Nozzles (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Generation Of Surge Voltage And Current (AREA)
Description
Claims (12)
- 高周波電流供給装置であって、
当該装置は500W超の出力電力を3MHz超の出力周波数で形成し、
DC電流供給部に接続された少なくとも1つのインバータと少なくとも1つの出力電源網を備え、
前記インバータは少なくとも1つのスイッチング素子を有し、
該スイッチング素子の基準電位は、高周波数のクロックで変化する形式の高周波電流供給装置において、
付随線路(35,36;60,61)が、時間的に大きく変化する基準電位にある電気構成部材(7,9,11,13)を、電圧電位が時間的に変化しない入口点(30a、45,46)に接続し、
前記付随線路(35,36;60,61)は出力電源網線路(37,38,23,23a、23b)の領域に配置されており、該出力電源網線路には動作時に高周波電流が流れる、ことを特徴とする高周波電流供給装置。 - 請求項1記載の高周波電流供給装置において、
前記付随線路(35,36;60,61)は、前記出力電源網線路(37,38,23,23a、23b)の巻線の領域または出力電源網(15)の出力トランス(23,24)の一次巻線(23)の領域では付随巻線として構成されている、ことを特徴とする高周波電流供給装置。 - 請求項1または2記載の高周波電流供給装置において、
a) 前記付随線路(35,36;60,61)は前記出力電源網線路(37,38,23,23a、23b)と捩られており、および/または
b) 前記付随線路(35,36;60,61)は前記出力電源網線路(37,38,23,23a、23b)に対して平行に配置されており、および/または
c) 前記付随線路(35,36;60,61)は前記出力電源網線路(37,38,23,23a、23b)に対して二本巻きで配置されており、および/または
d) 前記付随線路(35,36;60,61)は前記出力電源網線路により空間的にまたは偏平に包囲または取り囲まれており、および/または
e) 前記出力電源網線路(37,38,23,23a、23b)は平坦に構成されており、
前記付随線路(35,36;60,61)は前記出力電源網線路(37,38)の中央に形成されており、および/または
f) 前記付随線路(35,36;60,61)はパイプ状の出力電源網線路(37,38)により取り囲まれており、および/または
g) 前記高周波電流供給装置は多層導体路基板(64,65,66,67)上に配置されており、
前記付随線路(35,36;60,61)は、高周波線路(37,38,23,23a、23b)の領域で平行な層に配置されている、ことを特徴とする高周波電流供給装置。 - 請求項1から3までのいずれか一項記載の高周波電流供給装置において、
前記付随線路(35,36;60,61)は、磁界を増強する出力トランス(23,24)の構成部材(69)を通って案内されている、ことを特徴とする高周波電流供給装置。 - 請求項1から4までのいずれか一項記載の高周波電流供給装置において、
前記付随線路(35,36)はドライバ電流供給線路であり、
該ドライバ電流供給線路は、ドライバ電流供給源(51)のドライバ供給電流出力電源網線路(37,38,23,23a、23b)に沿って、インバータ(3)のスイッチング素子(11,13)のドライバ(7,9)に導く、ことを特徴とする高周波電流供給装置。 - 請求項1から5までのいずれか一項記載の高周波電流供給装置において、
前記付随線路(35,36,60,61)の入口点(30a)は、前記出力電源網(15)の出力トランス(23,24)の一次巻線(23)の、電位が時間的に変化しない点(中間タップ30,30b)の近傍にある、ことを特徴とする高周波電流供給装置。 - 請求項1から6までのいずれか一項記載の高周波電流供給装置において、
前記インバータ(3)は2つのハーフブリッジ回路(5,6)を有し、
前記付随線路の入口点(30a、81,84)は前記出力トランス(23,24)の一次(23)の中間タップ(30)の領域に形成されている、ことを特徴とする高周波電流供給装置。 - 請求項1から7までのいずれか一項記載の高周波電流供給装置において、
前記出力電源網線路(37,38,23,23a、23b)と前記付随線路(35,36;60,61)は相互に容量結合されている、ことを特徴とする高周波電流供給装置。 - 請求項1から8までのいずれか一項記載の高周波電流供給装置において、
制御線路として構成された前記付随線路(60,61)が前記入口点(30a、81,84)を介して前記インバータ(3)のスイッチング素子(11,13)の制御端子(G)に直接導かれている、ことを特徴とする高周波電流供給装置。 - 請求項1から9までのいずれか一項記載の高周波電流供給装置において、
前記付随線路(35,36,60,61)が、時間的に大きく変化する基準電位にある電気構成部材を、前記入口点(30a、81,84)を介して測定装置と接続し、
該測定装置は高周波ノイズの少ない電位にある、ことを特徴とする高周波電流供給装置。 - 高周波電流供給装置を駆動する方法であって、インバータ内にドライバのためのドライバ電流供給部を備え、
インバータに含まれるスイッチング素子の基準電位がアースに対して高周波電位にある方法において、
ドライバの供給電流は、出力電源網の高周波電位のない入口点へ付随線路を介して給電され、
前記付随線路は出力電源網線路の領域に案内されている、ことを特徴とする方法。 - 高周波電流供給装置を駆動する方法であって、インバータ内にドライバを備え、
インバータに含まれるスイッチング素子の基準電位がアースに対して、異なる電位間で往復的に跳躍する方法において、
スイッチング素子に対するドライバ出力信号が、出力電源網の電位が時間的に変化しない入口点に付随線路を介して供給され、
前記付随線路は出力電源網線路の領域に案内されている、ことを特徴とする方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US95139207P | 2007-07-23 | 2007-07-23 | |
US60/951,392 | 2007-07-23 | ||
PCT/EP2008/002657 WO2009012825A1 (de) | 2007-07-23 | 2008-04-03 | Hochfrequenzstromversorgungsanordnung, insbesondere eine plasmaversorgungseinrichtung und verfahren zum betreiben einer hochfrequenzstromversorgungseinrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010534456A JP2010534456A (ja) | 2010-11-04 |
JP5371978B2 true JP5371978B2 (ja) | 2013-12-18 |
Family
ID=39321543
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010517262A Expired - Fee Related JP5606312B2 (ja) | 2007-07-23 | 2007-10-04 | プラズマ給電装置 |
JP2010517277A Active JP5371978B2 (ja) | 2007-07-23 | 2008-04-03 | 高周波電流供給装置、とりわけプラズマ給電装置および高周波電流供給装置の駆動方法 |
JP2010517313A Active JP5631208B2 (ja) | 2007-07-23 | 2008-07-22 | プラズマ給電装置の作動方法およびプラズマ給電装置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010517262A Expired - Fee Related JP5606312B2 (ja) | 2007-07-23 | 2007-10-04 | プラズマ給電装置 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010517313A Active JP5631208B2 (ja) | 2007-07-23 | 2008-07-22 | プラズマ給電装置の作動方法およびプラズマ給電装置 |
Country Status (6)
Country | Link |
---|---|
US (11) | US8129653B2 (ja) |
EP (6) | EP2097920B1 (ja) |
JP (3) | JP5606312B2 (ja) |
AT (2) | ATE497251T1 (ja) |
DE (11) | DE112007003667A5 (ja) |
WO (15) | WO2009012735A1 (ja) |
Families Citing this family (140)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10161743B4 (de) * | 2001-12-15 | 2004-08-05 | Hüttinger Elektronik GmbH & Co. KG | Hochfrequenzanregungsanordnung |
EP2097920B1 (de) * | 2007-07-23 | 2017-08-09 | TRUMPF Hüttinger GmbH + Co. KG | Plasmaversorgungseinrichtung |
JP5171520B2 (ja) * | 2008-09-30 | 2013-03-27 | 日立オートモティブシステムズ株式会社 | 電力変換装置 |
GB2473598B (en) * | 2009-07-30 | 2013-03-06 | Pulse Electronics Avionics Ltd | Transient differential switching regulator |
DE102010002754B4 (de) * | 2010-03-11 | 2012-07-12 | Hüttinger Elektronik Gmbh + Co. Kg | Plasmaversorgungsanordnung mit Quadraturkoppler |
JP5565086B2 (ja) * | 2010-05-14 | 2014-08-06 | 日本電気株式会社 | 送信装置および送信装置の制御方法 |
DE102010031568B4 (de) | 2010-07-20 | 2014-12-11 | TRUMPF Hüttinger GmbH + Co. KG | Arclöschanordnung und Verfahren zum Löschen von Arcs |
AU2010361598B2 (en) * | 2010-09-30 | 2014-08-07 | Interdigital Vc Holdings, Inc. | Method and apparatus for encoding geometry patterns, and method and apparatus for decoding geometry patterns |
DE202010014176U1 (de) * | 2010-10-11 | 2012-01-16 | Tigres Dr. Gerstenberg Gmbh | Vorrichtung zum Behandeln von Oberflächen mit Entladungsüberwachung |
GB2491550A (en) * | 2011-01-17 | 2012-12-12 | Radiant Res Ltd | A hybrid power control system using dynamic power regulation to increase the dimming dynamic range and power control of solid-state illumination systems |
FR2971886B1 (fr) * | 2011-02-21 | 2014-01-10 | Nanotec Solution | Dispositif et procede d'interconnexion de systemes electroniques a des potentiels de reference differents |
FR2976724B1 (fr) * | 2011-06-16 | 2013-07-12 | Nanotec Solution | Dispositif pour generer une difference de tension alternative entre des potentiels de reference de systemes electroniques. |
EP2549645A1 (en) | 2011-07-21 | 2013-01-23 | Telefonaktiebolaget LM Ericsson (publ) | Transformer filter arrangement |
GB201116299D0 (en) * | 2011-09-21 | 2011-11-02 | Aker Subsea Ltd | Condition monitoring employing cross-correlation |
DE102011087106B4 (de) | 2011-11-25 | 2017-10-19 | TRUMPF Hüttinger GmbH + Co. KG | Hochfrequenz-Klasse-D-MOSFET-Verstärkermodul |
DE102011087807B4 (de) * | 2011-12-06 | 2015-11-12 | TRUMPF Hüttinger GmbH + Co. KG | Ausgangsnetzwerk für eine Plasmaversorgungseinrichtung und Plasmaversorgungseinrichtung |
US8903009B2 (en) * | 2012-01-06 | 2014-12-02 | Broadcom Corporation | Common-mode termination within communication systems |
DE102012200702B3 (de) * | 2012-01-19 | 2013-06-27 | Hüttinger Elektronik Gmbh + Co. Kg | Verfahren zum Phasenabgleich mehrerer HF-Leistungserzeugungseinheiten eines HF-Leistungsversorgungssystems und HF-Leistungsversorgungssystem |
US9279722B2 (en) | 2012-04-30 | 2016-03-08 | Agilent Technologies, Inc. | Optical emission system including dichroic beam combiner |
WO2014049818A1 (ja) * | 2012-09-28 | 2014-04-03 | 三洋電機株式会社 | 電力変換装置 |
US9082589B2 (en) * | 2012-10-09 | 2015-07-14 | Novellus Systems, Inc. | Hybrid impedance matching for inductively coupled plasma system |
DE102013100617B4 (de) * | 2013-01-22 | 2016-08-25 | Epcos Ag | Vorrichtung zur Erzeugung eines Plasmas und Handgerät mit der Vorrichtung |
US9536713B2 (en) * | 2013-02-27 | 2017-01-03 | Advanced Energy Industries, Inc. | Reliable plasma ignition and reignition |
JP6177012B2 (ja) * | 2013-06-04 | 2017-08-09 | 株式会社ダイヘン | インピーダンス整合装置 |
DE102013106702B4 (de) * | 2013-06-26 | 2017-08-31 | Sma Solar Technology Ag | Verfahren und Vorrichtung zum Erkennen eines Lichtbogens |
EP2849204B1 (de) * | 2013-09-12 | 2017-11-29 | Meyer Burger (Germany) AG | Plasmaerzeugungsvorrichtung |
CN109873621B (zh) | 2013-11-14 | 2023-06-16 | 鹰港科技有限公司 | 高压纳秒脉冲发生器 |
US10978955B2 (en) | 2014-02-28 | 2021-04-13 | Eagle Harbor Technologies, Inc. | Nanosecond pulser bias compensation |
US11539352B2 (en) | 2013-11-14 | 2022-12-27 | Eagle Harbor Technologies, Inc. | Transformer resonant converter |
US10020800B2 (en) | 2013-11-14 | 2018-07-10 | Eagle Harbor Technologies, Inc. | High voltage nanosecond pulser with variable pulse width and pulse repetition frequency |
US9706630B2 (en) | 2014-02-28 | 2017-07-11 | Eagle Harbor Technologies, Inc. | Galvanically isolated output variable pulse generator disclosure |
US10892140B2 (en) | 2018-07-27 | 2021-01-12 | Eagle Harbor Technologies, Inc. | Nanosecond pulser bias compensation |
DE102013226537B4 (de) | 2013-12-18 | 2022-12-29 | TRUMPF Hüttinger GmbH + Co. KG | Leistungsversorgungssystem mit mehreren Verstärkerpfaden sowie Verfahren zur Anregung eines Plasmas |
DE102013226511B4 (de) * | 2013-12-18 | 2016-12-15 | TRUMPF Hüttinger GmbH + Co. KG | Leistungsversorgungssystem und Verfahren zur Erzeugung einer Leistung |
US9641095B1 (en) * | 2014-02-21 | 2017-05-02 | Pai Capital Llc | Power converter output stage using heat dissipating bus bars |
US10483089B2 (en) * | 2014-02-28 | 2019-11-19 | Eagle Harbor Technologies, Inc. | High voltage resistive output stage circuit |
US9952297B2 (en) * | 2014-05-08 | 2018-04-24 | Auburn University | Parallel plate transmission line for broadband nuclear magnetic resonance imaging |
US11051369B2 (en) | 2014-10-21 | 2021-06-29 | Ultraflex International, Inc. | Radio frequency heating apparatus using direct-digital radio frequency power control and fine-tune power control |
US10624158B2 (en) | 2014-10-21 | 2020-04-14 | Ultraflex International Inc. | Radio frequency heating apparatus using direct-digital radio frequency power control and fine-tune power control |
TWI574296B (zh) * | 2014-12-04 | 2017-03-11 | 萬機科技股份有限公司 | 功率輸出產生系統與適用於週期性波形之方法 |
US10049857B2 (en) * | 2014-12-04 | 2018-08-14 | Mks Instruments, Inc. | Adaptive periodic waveform controller |
DE102015212220A1 (de) | 2015-06-30 | 2017-01-05 | TRUMPF Hüttinger GmbH + Co. KG | Hochfrequenzverstärkeranordnung |
DE102015212232B4 (de) * | 2015-06-30 | 2020-03-05 | TRUMPF Hüttinger GmbH + Co. KG | Leistungscombiner zur Kopplung von Hochfrequenzsignalen und Leistungscombineranordnung mit einem solchen Leistungscombiner |
DE102015212152B4 (de) | 2015-06-30 | 2018-03-15 | TRUMPF Hüttinger GmbH + Co. KG | Nicht lineare Hochfrequenzverstärkeranordnung |
DE102015212247A1 (de) * | 2015-06-30 | 2017-01-05 | TRUMPF Hüttinger GmbH + Co. KG | Hochfrequenzverstärkeranordnung |
US10386962B1 (en) | 2015-08-03 | 2019-08-20 | Apple Inc. | Reducing touch node electrode coupling |
CN105116217A (zh) * | 2015-09-02 | 2015-12-02 | 盐城工学院 | 基于单片机的微弱信号频率和相位自动检测系统及其检测方法 |
CN105137246B (zh) * | 2015-09-21 | 2018-02-02 | 华中科技大学 | 重复频率脉冲下的金属化膜电容器的寿命测试方法 |
US11452982B2 (en) | 2015-10-01 | 2022-09-27 | Milton Roy, Llc | Reactor for liquid and gas and method of use |
EP4226999A3 (en) | 2015-10-01 | 2023-09-06 | Milton Roy, LLC | Plasma reactor for liquid and gas and related methods |
US10882021B2 (en) | 2015-10-01 | 2021-01-05 | Ion Inject Technology Llc | Plasma reactor for liquid and gas and method of use |
US10187968B2 (en) * | 2015-10-08 | 2019-01-22 | Ion Inject Technology Llc | Quasi-resonant plasma voltage generator |
DE102015220847A1 (de) * | 2015-10-26 | 2017-04-27 | TRUMPF Hüttinger GmbH + Co. KG | Verfahren zur Impedanzanpassung einer Last an die Ausgangsimpedanz eines Leistungsgenerators und Impedanzanpassungsanordnung |
US10046300B2 (en) | 2015-12-09 | 2018-08-14 | Ion Inject Technology Llc | Membrane plasma reactor |
DE102015226149A1 (de) * | 2015-12-21 | 2017-06-22 | Robert Bosch Gmbh | Antriebselektronik für einen Antrieb |
US9577516B1 (en) | 2016-02-18 | 2017-02-21 | Advanced Energy Industries, Inc. | Apparatus for controlled overshoot in a RF generator |
CN106026702B (zh) * | 2016-05-23 | 2019-10-25 | 安徽省金屹电源科技有限公司 | 一种大功率直流等离子体电源 |
DE102016110141A1 (de) * | 2016-06-01 | 2017-12-07 | TRUMPF Hüttinger GmbH + Co. KG | Verfahren und Vorrichtung zum Zünden einer Plasmalast |
US11004660B2 (en) | 2018-11-30 | 2021-05-11 | Eagle Harbor Technologies, Inc. | Variable output impedance RF generator |
US10903047B2 (en) | 2018-07-27 | 2021-01-26 | Eagle Harbor Technologies, Inc. | Precise plasma control system |
US11430635B2 (en) | 2018-07-27 | 2022-08-30 | Eagle Harbor Technologies, Inc. | Precise plasma control system |
CN109564485B (zh) | 2016-07-29 | 2022-04-01 | 苹果公司 | 具有多电源域芯片配置的触摸传感器面板 |
WO2018148182A1 (en) | 2017-02-07 | 2018-08-16 | Eagle Harbor Technologies, Inc. | Transformer resonant converter |
EP3813259B1 (en) * | 2017-03-31 | 2022-10-26 | Eagle Harbor Technologies, Inc. | High voltage resistive output stage circuit |
WO2019003345A1 (ja) * | 2017-06-28 | 2019-01-03 | 株式会社日立国際電気 | 高周波電源装置及びそれを用いたプラズマ処理装置 |
EP3616235B1 (en) * | 2017-07-07 | 2024-10-09 | Advanced Energy Industries, Inc. | Inter-period control system for plasma power delivery system and method of operating the same |
US11651939B2 (en) * | 2017-07-07 | 2023-05-16 | Advanced Energy Industries, Inc. | Inter-period control system for plasma power delivery system and method of operating same |
US11615943B2 (en) * | 2017-07-07 | 2023-03-28 | Advanced Energy Industries, Inc. | Inter-period control for passive power distribution of multiple electrode inductive plasma source |
WO2019012038A1 (en) * | 2017-07-13 | 2019-01-17 | Abb Schweiz Ag | SEMICONDUCTOR POWER MODULE GRID PILOT HAVING A COMMON MODE IN-MODE STOP COIL |
JP6902167B2 (ja) | 2017-08-25 | 2021-07-14 | イーグル ハーバー テクノロジーズ, インク.Eagle Harbor Technologies, Inc. | ナノ秒パルスを使用する任意波形の発生 |
CN107450645B (zh) * | 2017-09-07 | 2018-12-28 | 武汉驭波科技有限公司 | 射频电源 |
US10510575B2 (en) | 2017-09-20 | 2019-12-17 | Applied Materials, Inc. | Substrate support with multiple embedded electrodes |
WO2019067268A1 (en) | 2017-09-29 | 2019-04-04 | Apple Inc. | MULTIMODAL TOUCH CONTROL DEVICE |
WO2019067267A1 (en) | 2017-09-29 | 2019-04-04 | Apple Inc. | TACTILE DETECTION WITH MULTIPLE POWER DOMAINS |
US20190108976A1 (en) * | 2017-10-11 | 2019-04-11 | Advanced Energy Industries, Inc. | Matched source impedance driving system and method of operating the same |
KR102644960B1 (ko) | 2017-11-29 | 2024-03-07 | 코멧 테크놀로지스 유에스에이, 인크. | 임피던스 매칭 네트워크 제어를 위한 리튜닝 |
DE102018204587B4 (de) | 2018-03-26 | 2019-10-24 | TRUMPF Hüttinger GmbH + Co. KG | Verfahren zur Zündung eines Plasmas in einer Plasmakammer und Zündschaltung |
US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
CN110504149B (zh) * | 2018-05-17 | 2022-04-22 | 北京北方华创微电子装备有限公司 | 射频电源的脉冲调制系统及方法 |
US10515781B1 (en) * | 2018-06-13 | 2019-12-24 | Lam Research Corporation | Direct drive RF circuit for substrate processing systems |
DE102018116637A1 (de) | 2018-07-10 | 2020-01-16 | TRUMPF Hüttinger GmbH + Co. KG | Leistungsversorgungseinrichtung und Betriebsverfahren hierfür |
US10607814B2 (en) | 2018-08-10 | 2020-03-31 | Eagle Harbor Technologies, Inc. | High voltage switch with isolated power |
US11302518B2 (en) | 2018-07-27 | 2022-04-12 | Eagle Harbor Technologies, Inc. | Efficient energy recovery in a nanosecond pulser circuit |
US11222767B2 (en) | 2018-07-27 | 2022-01-11 | Eagle Harbor Technologies, Inc. | Nanosecond pulser bias compensation |
US11532457B2 (en) | 2018-07-27 | 2022-12-20 | Eagle Harbor Technologies, Inc. | Precise plasma control system |
EP3605115A1 (en) | 2018-08-02 | 2020-02-05 | TRUMPF Huettinger Sp. Z o. o. | Arc detector for detecting arcs, plasma system and method of detecting arcs |
CN112805920A (zh) | 2018-08-10 | 2021-05-14 | 鹰港科技有限公司 | 用于rf等离子体反应器的等离子体鞘控制 |
US11728137B2 (en) * | 2018-08-17 | 2023-08-15 | Lam Research Corporation | Direct frequency tuning for matchless plasma source in substrate processing systems |
US11016616B2 (en) | 2018-09-28 | 2021-05-25 | Apple Inc. | Multi-domain touch sensing with touch and display circuitry operable in guarded power domain |
WO2020068107A1 (en) * | 2018-09-28 | 2020-04-02 | Lam Research Corporation | Systems and methods for optimizing power delivery to an electrode of a plasma chamber |
US11476145B2 (en) | 2018-11-20 | 2022-10-18 | Applied Materials, Inc. | Automatic ESC bias compensation when using pulsed DC bias |
CN113906677A (zh) | 2019-01-08 | 2022-01-07 | 鹰港科技有限公司 | 纳秒脉冲发生器电路中的高效能量恢复 |
WO2020154310A1 (en) | 2019-01-22 | 2020-07-30 | Applied Materials, Inc. | Feedback loop for controlling a pulsed voltage waveform |
US11508554B2 (en) | 2019-01-24 | 2022-11-22 | Applied Materials, Inc. | High voltage filter assembly |
US11974385B2 (en) * | 2019-04-16 | 2024-04-30 | Atmospheric Plasma Solutions, Inc. | Waveform detection of states and faults in plasma inverters |
US11019714B1 (en) * | 2020-10-30 | 2021-05-25 | Atmospheric Plasma Solutions, Inc. | Waveform detection of states and faults in plasma inverters |
CA3136810A1 (en) * | 2019-04-16 | 2020-10-22 | Atmospheric Plasma Solutions, Inc. | Waveform detection of states and faults in plasma inverters |
KR20210149894A (ko) * | 2019-04-30 | 2021-12-09 | 램 리써치 코포레이션 | 듀얼 주파수, 직접 구동 유도 결합 플라즈마 소스 |
US11527385B2 (en) | 2021-04-29 | 2022-12-13 | COMET Technologies USA, Inc. | Systems and methods for calibrating capacitors of matching networks |
US11114279B2 (en) * | 2019-06-28 | 2021-09-07 | COMET Technologies USA, Inc. | Arc suppression device for plasma processing equipment |
US11107661B2 (en) | 2019-07-09 | 2021-08-31 | COMET Technologies USA, Inc. | Hybrid matching network topology |
US11596309B2 (en) | 2019-07-09 | 2023-03-07 | COMET Technologies USA, Inc. | Hybrid matching network topology |
JP2022546488A (ja) | 2019-08-28 | 2022-11-04 | コメット テクノロジーズ ユーエスエー インコーポレイテッド | 高出力低周波数コイル |
TWI778449B (zh) | 2019-11-15 | 2022-09-21 | 美商鷹港科技股份有限公司 | 高電壓脈衝電路 |
CN114762079A (zh) | 2019-12-02 | 2022-07-15 | 朗姆研究公司 | 射频辅助等离子体生成中的阻抗变换 |
KR20230150396A (ko) | 2019-12-24 | 2023-10-30 | 이글 하버 테크놀로지스, 인코포레이티드 | 플라즈마 시스템을 위한 나노초 펄서 rf 절연 |
US11830708B2 (en) | 2020-01-10 | 2023-11-28 | COMET Technologies USA, Inc. | Inductive broad-band sensors for electromagnetic waves |
US11887820B2 (en) | 2020-01-10 | 2024-01-30 | COMET Technologies USA, Inc. | Sector shunts for plasma-based wafer processing systems |
US12027351B2 (en) | 2020-01-10 | 2024-07-02 | COMET Technologies USA, Inc. | Plasma non-uniformity detection |
US11670488B2 (en) | 2020-01-10 | 2023-06-06 | COMET Technologies USA, Inc. | Fast arc detecting match network |
US11521832B2 (en) | 2020-01-10 | 2022-12-06 | COMET Technologies USA, Inc. | Uniformity control for radio frequency plasma processing systems |
US11961711B2 (en) | 2020-01-20 | 2024-04-16 | COMET Technologies USA, Inc. | Radio frequency match network and generator |
US11605527B2 (en) | 2020-01-20 | 2023-03-14 | COMET Technologies USA, Inc. | Pulsing control match network |
DE102020104090A1 (de) * | 2020-02-17 | 2021-08-19 | Comet Ag | Hochfrequenzverstärker-Anordnung für einen Hochfrequenzgenerator |
US11994542B2 (en) | 2020-03-27 | 2024-05-28 | Lam Research Corporation | RF signal parameter measurement in an integrated circuit fabrication chamber |
JP2021164289A (ja) * | 2020-03-31 | 2021-10-11 | 株式会社京三製作所 | D級フルブリッジ増幅器のドライバ装置 |
US11462389B2 (en) | 2020-07-31 | 2022-10-04 | Applied Materials, Inc. | Pulsed-voltage hardware assembly for use in a plasma processing system |
US11373844B2 (en) | 2020-09-28 | 2022-06-28 | COMET Technologies USA, Inc. | Systems and methods for repetitive tuning of matching networks |
US11798790B2 (en) | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US12057296B2 (en) | 2021-02-22 | 2024-08-06 | COMET Technologies USA, Inc. | Electromagnetic field sensing device |
US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
US20220399185A1 (en) | 2021-06-09 | 2022-12-15 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US11776788B2 (en) | 2021-06-28 | 2023-10-03 | Applied Materials, Inc. | Pulsed voltage boost for substrate processing |
US11923175B2 (en) | 2021-07-28 | 2024-03-05 | COMET Technologies USA, Inc. | Systems and methods for variable gain tuning of matching networks |
US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
US12106938B2 (en) | 2021-09-14 | 2024-10-01 | Applied Materials, Inc. | Distortion current mitigation in a radio frequency plasma processing chamber |
US11657980B1 (en) | 2022-05-09 | 2023-05-23 | COMET Technologies USA, Inc. | Dielectric fluid variable capacitor |
US12040139B2 (en) | 2022-05-09 | 2024-07-16 | COMET Technologies USA, Inc. | Variable capacitor with linear impedance and high voltage breakdown |
US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US12051549B2 (en) | 2022-08-02 | 2024-07-30 | COMET Technologies USA, Inc. | Coaxial variable capacitor |
US12111341B2 (en) | 2022-10-05 | 2024-10-08 | Applied Materials, Inc. | In-situ electric field detection method and apparatus |
DE102023104960A1 (de) * | 2023-02-28 | 2024-08-29 | TRUMPF Hüttinger GmbH + Co. KG | Impedanzanpassungsbaustein, Impedanzanpassungsschaltung, Plasmaprozessversorgungssystem und Plasmaprozesssystem |
DE102023104958A1 (de) | 2023-02-28 | 2024-08-29 | TRUMPF Hüttinger GmbH + Co. KG | Impedanzanpassungsbaustein, Impedanzanpassungsschaltung, Plasmaprozessversorgungssystem und Plasmaprozesssystem |
CN117559779B (zh) * | 2023-11-23 | 2024-07-09 | 深圳市恒运昌真空技术股份有限公司 | 一种射频电源的推挽式并联驱动输出系统 |
Family Cites Families (132)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT944469B (it) * | 1971-12-29 | 1973-04-20 | Honeywell Inf Systems | Circuito di pilotaggio a trasforma tore interruttore |
DE2519845C3 (de) * | 1975-05-03 | 1978-06-08 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Schaltungsanordnung zur Zusammenführung von Hochfrequenzleistungsanteilen |
US4215392A (en) * | 1978-12-19 | 1980-07-29 | Ncr Corporation | Inverter power supply |
JPS5582967A (en) * | 1978-12-19 | 1980-06-23 | Hitachi Cable Ltd | Measuring method for electric signal wave-form using optical-fiber |
US4489271A (en) * | 1979-01-15 | 1984-12-18 | Riblet Gordon P | Reflection coefficient measurements |
JPS5836169A (ja) * | 1981-08-28 | 1983-03-03 | Fuji Electric Co Ltd | サイリスタ監視装置 |
US4490684A (en) * | 1983-01-03 | 1984-12-25 | Motorola, Inc. | Adaptive quadrature combining apparatus |
JPS59202715A (ja) * | 1983-04-30 | 1984-11-16 | Shimadzu Corp | Icp分析用高周波電源装置 |
US6229718B1 (en) * | 1984-10-05 | 2001-05-08 | Ole K. Nilssen | Parallel-resonant bridge inverter |
US4701176A (en) * | 1985-09-06 | 1987-10-20 | Kimberly-Clark Corporation | Form-fitting self-adjusting disposable garment with fixed full-length fasteners |
US4656434A (en) * | 1986-02-03 | 1987-04-07 | Raytheon Company | RF power amplifier with load mismatch compensation |
US4733137A (en) * | 1986-03-14 | 1988-03-22 | Walker Magnetics Group, Inc. | Ion nitriding power supply |
US4701716A (en) * | 1986-05-07 | 1987-10-20 | Rca Corporation | Parallel distributed signal amplifiers |
JP2723516B2 (ja) * | 1987-04-30 | 1998-03-09 | ファナック 株式会社 | レーザ発振装置 |
JPS6450396A (en) * | 1987-08-20 | 1989-02-27 | Nippon Denshi Shomei Kk | Lighting device of fluorescent discharge lamp |
US4758941A (en) * | 1987-10-30 | 1988-07-19 | International Business Machines Corporation | MOSFET fullbridge switching regulator having transformer coupled MOSFET drive circuit |
US4860189A (en) * | 1988-03-21 | 1989-08-22 | International Business Machines Corp. | Full bridge power converter circuit |
ATE83067T1 (de) * | 1988-04-05 | 1992-12-15 | Heidenhain Gmbh Dr Johannes | Zeitbereichsreflektometriemessverfahren sowie anordnung zu dessen durchfuehrung. |
DE3906308A1 (de) | 1989-02-28 | 1990-09-20 | Gore W L & Ass Gmbh | Flachkabelspirale |
US4910452A (en) | 1989-05-16 | 1990-03-20 | American Telephone And Telegraph Company, At&T Bell Laboratories | High frequency AC magnetic devices with high efficiency |
US4980810A (en) * | 1989-05-25 | 1990-12-25 | Hughes Aircraft Company | VHF DC-DC power supply operating at frequencies greater than 50 MHz |
DE3942509A1 (de) * | 1989-12-22 | 1991-06-27 | Hirschmann Richard Gmbh Co | Hochfrequenzschaltung |
US5222246A (en) * | 1990-11-02 | 1993-06-22 | General Electric Company | Parallel amplifiers with combining phase controlled from combiner difference port |
US5598327A (en) * | 1990-11-30 | 1997-01-28 | Burr-Brown Corporation | Planar transformer assembly including non-overlapping primary and secondary windings surrounding a common magnetic flux path area |
GB2252208B (en) * | 1991-01-24 | 1995-05-03 | Burr Brown Corp | Hybrid integrated circuit planar transformer |
US5195045A (en) * | 1991-02-27 | 1993-03-16 | Astec America, Inc. | Automatic impedance matching apparatus and method |
US5392018A (en) * | 1991-06-27 | 1995-02-21 | Applied Materials, Inc. | Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits |
KR950000906B1 (ko) | 1991-08-02 | 1995-02-03 | 니찌덴 아넬바 가부시기가이샤 | 스퍼터링장치 |
US5225687A (en) * | 1992-01-27 | 1993-07-06 | Jason Barry L | Output circuit with optically coupled control signals |
US5523955A (en) * | 1992-03-19 | 1996-06-04 | Advanced Energy Industries, Inc. | System for characterizing AC properties of a processing plasma |
KR930021034A (ko) * | 1992-03-31 | 1993-10-20 | 다니이 아끼오 | 플라즈마발생방법 및 그 발생장치 |
US5418707A (en) * | 1992-04-13 | 1995-05-23 | The United States Of America As Represented By The United States Department Of Energy | High voltage dc-dc converter with dynamic voltage regulation and decoupling during load-generated arcs |
DE4244107C2 (de) * | 1992-12-24 | 1996-02-08 | Hirschmann Richard Gmbh Co | Hochfrequenz-Übertrager |
JPH0732078B2 (ja) * | 1993-01-14 | 1995-04-10 | 株式会社アドテック | 高周波プラズマ用電源及びインピーダンス整合装置 |
US5363020A (en) * | 1993-02-05 | 1994-11-08 | Systems And Service International, Inc. | Electronic power controller |
US5635762A (en) | 1993-05-18 | 1997-06-03 | U.S. Philips Corporation | Flip chip semiconductor device with dual purpose metallized ground conductor |
US5434527A (en) * | 1993-10-25 | 1995-07-18 | Caterpillar Inc. | Gate drive circuit |
US5438498A (en) * | 1993-12-21 | 1995-08-01 | Raytheon Company | Series resonant converter having a resonant snubber |
US5424691A (en) * | 1994-02-03 | 1995-06-13 | Sadinsky; Samuel | Apparatus and method for electronically controlled admittance matching network |
US5435881A (en) * | 1994-03-17 | 1995-07-25 | Ogle; John S. | Apparatus for producing planar plasma using varying magnetic poles |
US5563775A (en) * | 1994-06-16 | 1996-10-08 | Reliance Comm/Tech Corporation | Full bridge phase displaced resonant transition circuit for obtaining constant resonant transition current from 0° phase angle to 180° phase angle |
KR0157885B1 (ko) * | 1995-07-08 | 1999-03-20 | 문정환 | 전원 공급 감지 회로 |
US5810963A (en) * | 1995-09-28 | 1998-09-22 | Kabushiki Kaisha Toshiba | Plasma processing apparatus and method |
US6794301B2 (en) * | 1995-10-13 | 2004-09-21 | Mattson Technology, Inc. | Pulsed plasma processing of semiconductor substrates |
JP3163318B2 (ja) * | 1995-10-24 | 2001-05-08 | 長野日本無線株式会社 | 誘導性素子用コアおよび誘導性素子 |
US5875103A (en) * | 1995-12-22 | 1999-02-23 | Electronic Measurements, Inc. | Full range soft-switching DC-DC converter |
US5689215A (en) * | 1996-05-23 | 1997-11-18 | Lam Research Corporation | Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor |
US5882492A (en) * | 1996-06-21 | 1999-03-16 | Sierra Applied Sciences, Inc. | A.C. plasma processing system |
JP3736096B2 (ja) * | 1997-06-12 | 2006-01-18 | 株式会社日立製作所 | 照明用点灯装置及びこれを用いたランプ |
US6329757B1 (en) * | 1996-12-31 | 2001-12-11 | The Perkin-Elmer Corporation | High frequency transistor oscillator system |
JPH10215160A (ja) * | 1997-01-31 | 1998-08-11 | Matsushita Electric Ind Co Ltd | 保護機能付半導体スイッチング回路および溶接機および切断機 |
JP3733675B2 (ja) | 1997-01-31 | 2006-01-11 | 東芝ライテック株式会社 | インバータ装置、放電灯点灯装置及び照明装置 |
US5869817A (en) * | 1997-03-06 | 1999-02-09 | General Mills, Inc. | Tunable cavity microwave applicator |
SE521212C2 (sv) * | 1997-06-11 | 2003-10-14 | Abb Ab | Anordning för avkänning av läckage av kylvätska vid en högspänningsomriktarstation |
JP3674283B2 (ja) * | 1997-12-26 | 2005-07-20 | 富士電機ホールディングス株式会社 | 絶縁形電力変換装置 |
US5944942A (en) * | 1998-03-04 | 1999-08-31 | Ogle; John Seldon | Varying multipole plasma source |
US6038142A (en) | 1998-06-10 | 2000-03-14 | Lucent Technologies, Inc. | Full-bridge isolated Current Fed converter with active clamp |
US6313584B1 (en) * | 1998-09-17 | 2001-11-06 | Tokyo Electron Limited | Electrical impedance matching system and method |
JP3049427B2 (ja) | 1998-10-21 | 2000-06-05 | 株式会社ハイデン研究所 | 正負パルス式高周波スイッチング電源 |
DE19927368A1 (de) * | 1999-06-16 | 2000-12-21 | Merten Kg Pulsotronic | Vorrichtung zum Ausscheiden von Metallteilen |
US6166598A (en) * | 1999-07-22 | 2000-12-26 | Motorola, Inc. | Power amplifying circuit with supply adjust to control adjacent and alternate channel power |
WO2001008288A2 (en) | 1999-07-22 | 2001-02-01 | Eni Technology, Inc. | Power supplies having protection circuits |
US7180758B2 (en) * | 1999-07-22 | 2007-02-20 | Mks Instruments, Inc. | Class E amplifier with inductive clamp |
US6469919B1 (en) * | 1999-07-22 | 2002-10-22 | Eni Technology, Inc. | Power supplies having protection circuits |
US6160449A (en) * | 1999-07-22 | 2000-12-12 | Motorola, Inc. | Power amplifying circuit with load adjust for control of adjacent and alternate channel power |
JP3654089B2 (ja) * | 1999-10-26 | 2005-06-02 | 松下電工株式会社 | 電源装置 |
JP2001185443A (ja) * | 1999-12-22 | 2001-07-06 | Hitachi Ltd | 薄膜コンデンサ |
US6365868B1 (en) * | 2000-02-29 | 2002-04-02 | Hypertherm, Inc. | DSP based plasma cutting system |
TW507256B (en) * | 2000-03-13 | 2002-10-21 | Mitsubishi Heavy Ind Ltd | Discharge plasma generating method, discharge plasma generating apparatus, semiconductor device fabrication method, and semiconductor device fabrication apparatus |
US6297696B1 (en) * | 2000-06-15 | 2001-10-02 | International Business Machines Corporation | Optimized power amplifier |
US6344768B1 (en) * | 2000-08-10 | 2002-02-05 | International Business Machines Corporation | Full-bridge DC-to-DC converter having an unipolar gate drive |
US7294563B2 (en) * | 2000-08-10 | 2007-11-13 | Applied Materials, Inc. | Semiconductor on insulator vertical transistor fabrication and doping process |
US6494986B1 (en) * | 2000-08-11 | 2002-12-17 | Applied Materials, Inc. | Externally excited multiple torroidal plasma source |
US7037813B2 (en) * | 2000-08-11 | 2006-05-02 | Applied Materials, Inc. | Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage |
US7320734B2 (en) * | 2000-08-11 | 2008-01-22 | Applied Materials, Inc. | Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage |
US6246599B1 (en) * | 2000-08-25 | 2001-06-12 | Delta Electronics, Inc. | Constant frequency resonant inverters with a pair of resonant inductors |
AU2002243742A1 (en) * | 2001-02-01 | 2002-08-12 | Di/Dt, Inc. | Isolated drive circuitry used in switch-mode power converters |
JP2002237419A (ja) * | 2001-02-08 | 2002-08-23 | Eiwa:Kk | プレーナートランス |
DE10107609A1 (de) | 2001-02-17 | 2002-08-29 | Power One Ag Uster | Spannungsversorgungsmodul |
US6741446B2 (en) * | 2001-03-30 | 2004-05-25 | Lam Research Corporation | Vacuum plasma processor and method of operating same |
US6657394B2 (en) * | 2001-04-06 | 2003-12-02 | Eni Technology, Inc. | Reflection coefficient phase detector |
JP2003125586A (ja) * | 2001-10-15 | 2003-04-25 | Amada Eng Center Co Ltd | プラズマ発生用電源装置 |
CN1305353C (zh) * | 2001-12-10 | 2007-03-14 | 东京毅力科创株式会社 | 高频电源及其控制方法、和等离子体处理装置 |
DE10161743B4 (de) * | 2001-12-15 | 2004-08-05 | Hüttinger Elektronik GmbH & Co. KG | Hochfrequenzanregungsanordnung |
US6946847B2 (en) * | 2002-02-08 | 2005-09-20 | Daihen Corporation | Impedance matching device provided with reactance-impedance table |
DE10211609B4 (de) * | 2002-03-12 | 2009-01-08 | Hüttinger Elektronik GmbH & Co. KG | Verfahren und Leistungsverstärker zur Erzeugung von sinusförmigen Hochfrequenzsignalen zum Betreiben einer Last |
US6972972B2 (en) * | 2002-04-15 | 2005-12-06 | Airak, Inc. | Power inverter with optical isolation |
US6703080B2 (en) | 2002-05-20 | 2004-03-09 | Eni Technology, Inc. | Method and apparatus for VHF plasma processing with load mismatch reliability and stability |
JP3635538B2 (ja) | 2002-07-05 | 2005-04-06 | 株式会社京三製作所 | プラズマ発生用直流電源装置 |
JP3641785B2 (ja) | 2002-08-09 | 2005-04-27 | 株式会社京三製作所 | プラズマ発生用電源装置 |
US7025895B2 (en) * | 2002-08-15 | 2006-04-11 | Hitachi High-Technologies Corporation | Plasma processing apparatus and method |
JP3700785B2 (ja) * | 2002-12-03 | 2005-09-28 | オリジン電気株式会社 | 電力変換装置 |
US6971851B2 (en) * | 2003-03-12 | 2005-12-06 | Florida Turbine Technologies, Inc. | Multi-metered film cooled blade tip |
US7563748B2 (en) | 2003-06-23 | 2009-07-21 | Cognis Ip Management Gmbh | Alcohol alkoxylate carriers for pesticide active ingredients |
US7573000B2 (en) * | 2003-07-11 | 2009-08-11 | Lincoln Global, Inc. | Power source for plasma device |
US7403400B2 (en) * | 2003-07-24 | 2008-07-22 | Harman International Industries, Incorporated | Series interleaved boost converter power factor correcting power supply |
WO2005015964A1 (ja) * | 2003-08-07 | 2005-02-17 | Hitachi Kokusai Electric Inc. | 基板処理装置及び基板処理方法 |
US6992902B2 (en) * | 2003-08-21 | 2006-01-31 | Delta Electronics, Inc. | Full bridge converter with ZVS via AC feedback |
US7244343B2 (en) | 2003-08-28 | 2007-07-17 | Origin Electric Company Limited | Sputtering apparatus |
JP2005086622A (ja) * | 2003-09-10 | 2005-03-31 | Nec Engineering Ltd | 電力合成・分配器 |
DE10342611A1 (de) * | 2003-09-12 | 2005-04-14 | Hüttinger Elektronik Gmbh + Co. Kg | 90° Hybrid zum Splitten oder Zusammenführen von Hochfrequenzleistung |
JP2005092783A (ja) * | 2003-09-19 | 2005-04-07 | Rohm Co Ltd | 電源装置およびそれを備える電子機器 |
US7755300B2 (en) * | 2003-09-22 | 2010-07-13 | Mks Instruments, Inc. | Method and apparatus for preventing instabilities in radio-frequency plasma processing |
KR100877304B1 (ko) * | 2003-11-27 | 2009-01-09 | 가부시키가이샤 다이헨 | 고주파 전력 공급 시스템 |
US6909617B1 (en) * | 2004-01-22 | 2005-06-21 | La Marche Manufacturing Co. | Zero-voltage-switched, full-bridge, phase-shifted DC-DC converter with improved light/no-load operation |
EP1733467A1 (en) * | 2004-03-12 | 2006-12-20 | MKS Instruments, Inc. | Control circuit for switching power supply |
CN1906837B (zh) * | 2004-03-18 | 2011-02-23 | 三井物产株式会社 | 直流-直流转换器 |
WO2005094138A1 (ja) | 2004-03-29 | 2005-10-06 | Mitsubishi Denki Kabushiki Kaisha | プラズマ発生用電源装置 |
DE102004024805B4 (de) * | 2004-05-17 | 2015-11-12 | TRUMPF Hüttinger GmbH + Co. KG | Verfahren und Regelanordnung zur Regelung der Ausgangsleistung einer HF-Verstärkeranordnung |
US7512422B2 (en) * | 2004-05-28 | 2009-03-31 | Ixys Corporation | RF generator with commutation inductor |
US7214934B2 (en) * | 2004-07-22 | 2007-05-08 | Varian Australia Pty Ltd | Radio frequency power generator |
JP4035568B2 (ja) * | 2004-11-29 | 2008-01-23 | 株式会社エーイーティー | 大気圧大面積プラズマ発生装置 |
JP2006165438A (ja) * | 2004-12-10 | 2006-06-22 | Nec Tokin Corp | プリント基板 |
US7138861B2 (en) * | 2004-12-29 | 2006-11-21 | Telefonaktiebolaget L M Ericsson (Publ) | Load mismatch adaptation in coupler-based amplifiers |
KR101121418B1 (ko) * | 2005-02-17 | 2012-03-16 | 주성엔지니어링(주) | 토로이드형 코어를 포함하는 플라즈마 발생장치 |
EP1701376B1 (de) * | 2005-03-10 | 2006-11-08 | HÜTTINGER Elektronik GmbH + Co. KG | Vakuumplasmagenerator |
US6996892B1 (en) * | 2005-03-24 | 2006-02-14 | Rf Micro Devices, Inc. | Circuit board embedded inductor |
US7173467B2 (en) | 2005-03-31 | 2007-02-06 | Chang Gung University | Modified high-efficiency phase shift modulation method |
JP2006296032A (ja) * | 2005-04-07 | 2006-10-26 | Sumitomo Electric Ind Ltd | 電力変換器 |
US7477711B2 (en) * | 2005-05-19 | 2009-01-13 | Mks Instruments, Inc. | Synchronous undersampling for high-frequency voltage and current measurements |
DE102005046921A1 (de) * | 2005-09-30 | 2007-04-12 | Siemens Ag | Schaltungsanordnung zur Stromüberwachung |
EP1783904B1 (de) * | 2005-10-17 | 2008-04-16 | HÜTTINGER Elektronik GmbH + Co. KG | HF-Plasmaversorgungseinrichtung |
JP2007124007A (ja) * | 2005-10-25 | 2007-05-17 | Sumitomo Electric Ind Ltd | 電力変換器及び電圧制御方法 |
US7353771B2 (en) * | 2005-11-07 | 2008-04-08 | Mks Instruments, Inc. | Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator |
JP2007151331A (ja) * | 2005-11-29 | 2007-06-14 | Mitsubishi Electric Corp | 電力変換装置 |
EP2097920B1 (de) * | 2007-07-23 | 2017-08-09 | TRUMPF Hüttinger GmbH + Co. KG | Plasmaversorgungseinrichtung |
DE102007055010A1 (de) * | 2007-11-14 | 2009-05-28 | Forschungsverbund Berlin E.V. | Verfahren und Generatorschaltung zur Erzeugung von Plasmen mittels Hochfrequenzanregung |
US7679341B2 (en) * | 2007-12-12 | 2010-03-16 | Monolithic Power Systems, Inc. | External control mode step down switching regulator |
CN101488712B (zh) * | 2008-01-15 | 2011-01-26 | 天钰科技股份有限公司 | 电压转换器 |
US8298625B2 (en) * | 2008-01-31 | 2012-10-30 | Applied Materials, Inc. | Multiple phase RF power for electrode of plasma chamber |
US7872523B2 (en) * | 2008-07-01 | 2011-01-18 | Mks Instruments, Inc. | Radio frequency (RF) envelope pulsing using phase switching of switch-mode power amplifiers |
US9362089B2 (en) * | 2010-08-29 | 2016-06-07 | Advanced Energy Industries, Inc. | Method of controlling the switched mode ion energy distribution system |
-
2007
- 2007-10-04 EP EP07817617.9A patent/EP2097920B1/de active Active
- 2007-10-04 WO PCT/DE2007/001775 patent/WO2009012735A1/de active Application Filing
- 2007-10-04 DE DE112007003667T patent/DE112007003667A5/de not_active Withdrawn
- 2007-10-04 JP JP2010517262A patent/JP5606312B2/ja not_active Expired - Fee Related
- 2007-12-20 EP EP07856986A patent/EP2174339B1/de not_active Not-in-force
- 2007-12-20 DE DE112007003213.8T patent/DE112007003213B4/de not_active Expired - Fee Related
- 2007-12-20 AT AT07856986T patent/ATE497251T1/de active
- 2007-12-20 WO PCT/EP2007/011263 patent/WO2009012803A1/de active Application Filing
- 2007-12-20 WO PCT/EP2007/011264 patent/WO2009012804A1/de active Application Filing
- 2007-12-20 DE DE502007006404T patent/DE502007006404D1/de active Active
-
2008
- 2008-04-03 WO PCT/EP2008/002657 patent/WO2009012825A1/de active Application Filing
- 2008-04-03 WO PCT/EP2008/002660 patent/WO2009012826A1/de active Application Filing
- 2008-04-03 JP JP2010517277A patent/JP5371978B2/ja active Active
- 2008-04-03 DE DE112008000106.5T patent/DE112008000106B4/de active Active
- 2008-04-03 EP EP08748861A patent/EP2097921B1/de active Active
- 2008-06-11 WO PCT/EP2008/004650 patent/WO2009012848A1/de active Application Filing
- 2008-06-11 DE DE112008000105.7T patent/DE112008000105B4/de not_active Expired - Fee Related
- 2008-06-11 DE DE112008000092.1T patent/DE112008000092B4/de active Active
- 2008-06-11 WO PCT/EP2008/004651 patent/WO2009012849A1/de active Application Filing
- 2008-06-27 WO PCT/EP2008/005241 patent/WO2009012863A1/de active Application Filing
- 2008-06-27 DE DE112008000115.4T patent/DE112008000115B4/de active Active
- 2008-06-30 DE DE112008000120.0T patent/DE112008000120B4/de active Active
- 2008-06-30 WO PCT/EP2008/005313 patent/WO2009012866A1/en active Application Filing
- 2008-06-30 AT AT08784577T patent/ATE545945T1/de active
- 2008-06-30 WO PCT/EP2008/005318 patent/WO2009012868A1/de active Application Filing
- 2008-06-30 WO PCT/EP2008/005314 patent/WO2009012867A2/en active Application Filing
- 2008-06-30 EP EP08784577A patent/EP2174337B1/en active Active
- 2008-06-30 DE DE112008000107T patent/DE112008000107A5/de not_active Withdrawn
- 2008-07-02 US US12/166,963 patent/US8129653B2/en active Active
- 2008-07-22 US US12/177,809 patent/US8466622B2/en not_active Expired - Fee Related
- 2008-07-22 EP EP12004116A patent/EP2511940A3/de not_active Withdrawn
- 2008-07-22 WO PCT/EP2008/005991 patent/WO2009012973A2/de active Application Filing
- 2008-07-22 WO PCT/EP2008/005987 patent/WO2009012969A2/de active Application Filing
- 2008-07-22 DE DE112008000095.6T patent/DE112008000095B4/de active Active
- 2008-07-22 US US12/177,818 patent/US8222885B2/en active Active
- 2008-07-22 DE DE112008000104.9T patent/DE112008000104B4/de active Active
- 2008-07-22 EP EP08784945A patent/EP2174338B1/de active Active
- 2008-07-22 WO PCT/EP2008/005980 patent/WO2009012966A1/de active Application Filing
- 2008-07-22 JP JP2010517313A patent/JP5631208B2/ja active Active
- 2008-07-22 WO PCT/EP2008/005992 patent/WO2009012974A1/de active Application Filing
- 2008-07-23 US US12/178,414 patent/US8154897B2/en active Active
- 2008-07-23 US US12/178,372 patent/US8357874B2/en active Active
-
2010
- 2010-01-11 US US12/685,142 patent/US8436543B2/en active Active
- 2010-01-12 US US12/686,023 patent/US8421377B2/en active Active
- 2010-01-14 US US12/687,483 patent/US8482205B2/en active Active
- 2010-01-22 US US12/692,246 patent/US8643279B2/en active Active
-
2013
- 2013-03-21 US US13/848,319 patent/US8866400B2/en active Active
-
2014
- 2014-01-14 US US14/154,400 patent/US20140125315A1/en not_active Abandoned
Also Published As
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5371978B2 (ja) | 高周波電流供給装置、とりわけプラズマ給電装置および高周波電流供給装置の駆動方法 | |
US7161818B2 (en) | High frequency excitation system | |
JP2022539385A (ja) | ナノ秒パルサのrf絶縁 | |
KR100796475B1 (ko) | 진공 플라즈마 발생기 | |
CN112997401A (zh) | 高压滤波器组件 | |
JP2023120191A (ja) | プラズマシステム用ナノ秒パルサrf絶縁 | |
JP2009537829A (ja) | 分光分析用の発電機 | |
KR20050106409A (ko) | 플라즈마 챔버에서 이온 폭격 에너지를 최소화하는메커니즘 | |
JP2007524963A (ja) | プラズマ生成装置及び方法並びに可変デューティサイクルの高周波駆動回路 | |
KR20190112634A (ko) | 플라스마 처리 장치 | |
CN104641448B (zh) | 用于为等离子体处理产生并维持等离子体的装置 | |
KR101706775B1 (ko) | 공진 컨버터를 갖는 플라즈마 발생기용 전원 장치 | |
JP4365227B2 (ja) | プラズマ処理装置およびプラズマ処理方法 | |
KR100743842B1 (ko) | 자속 채널에 결합된 플라즈마 챔버를 구비한 플라즈마반응기 | |
US11333630B2 (en) | Waveform generator, system and method | |
US20200294769A1 (en) | Plasma ignition circuit | |
JP2001143888A (ja) | 無電極放電灯点灯装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20101228 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110401 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130123 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130125 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130408 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130819 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130917 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5371978 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |