JP5321600B2 - 半導体装置の製造方法および半導体装置 - Google Patents
半導体装置の製造方法および半導体装置 Download PDFInfo
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- JP5321600B2 JP5321600B2 JP2010543342A JP2010543342A JP5321600B2 JP 5321600 B2 JP5321600 B2 JP 5321600B2 JP 2010543342 A JP2010543342 A JP 2010543342A JP 2010543342 A JP2010543342 A JP 2010543342A JP 5321600 B2 JP5321600 B2 JP 5321600B2
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- electrode plate
- semiconductor element
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Description
ここで、エポキシ樹脂などの熱硬化性樹脂は、高温で硬化するときに樹脂が架橋反応することにより体積が収縮する硬化収縮という特性や、高温状態から冷却されることにより体積が収縮する熱収縮という特性を有する。
また、半導体装置の使用環境下における冷熱サイクルにおいても、同様に、封止樹脂と電極板とが剥離してしまい、半導体装置の信頼性が低下するおそれがある。
また、ポリアミド樹脂やポリイミド樹脂などのコーティング樹脂を付与しなくてもよいので、製造コストが抑制され、かつ製造作業の煩雑さが軽減される。
なお、半導体素子部の実施態様には、半導体素子とブロック電極板との接合体も含まれるものとする。
また、余分な第2接合材は貫通穴から溢れるので、第2接合材の供給量の制御精度を緩和できる。
また、ポリアミド樹脂やポリイミド樹脂などのコーティング樹脂を付与しなくてもよいので、製造コストが抑制され、かつ製造作業の煩雑さが軽減される。
さらに、半導体素子部の第2面に第2電極板の第1面に設けられた凸部を圧接することにより、半導体素子部と第2電極板を接続できるので、半導体素子部と第2電極板とを接合するための接合材や加熱工程が不要になり、製造コストを抑制することができる。
まず、半導体装置の構成概要について説明する。図1は半導体装置の上面図を示し、図2は図1のA−A断面図を示す。図1と図2とに示すように、半導体装置1は、主に、素子下電極板10、パワー素子12、上面電極板14、ブロック電極板16、制御用端子18、封止樹脂20、制御用配線22などを有する。
パワー素子12は、半導体素子部を構成する一例であって、大電力をスイッチングする半導体スイッチング素子であり、本実施例では、パワー素子12としてIGBT26(トランジスタ)やダイオード28を備えている。なお、図2では、このパワー素子12のうちIGBT26を代表して示している。パワー素子12の両面には不図示の電極が設けられ、素子下電極板10の内面30(本発明における第1電極板の第1面の一例)がはんだ層32によってパワー素子12の面33(本発明における半導体素子部の第1面の一例)の電極に接合されている。
素子下電極板10、上面電極板14、ブロック電極板16、制御用端子18は、銅板であり、さらにニッケルめっきを施してもよい。あるいは、ニッケルめっきを施したアルミ板であってもよい。
以上が、半導体装置の構成概要についての説明であり、以下、半導体装置の製造方法について説明する。
図3〜図5は、実施例1の製造方法を示す図である。図3〜図5では、パワー素子12のうちIGBT26の部分の断面を示しているが、ダイオード28の部分の断面についても以下の内容と同様に説明できるものとする。
これにより、半導体装置2が製造される。
なお、ポリアミド樹脂56の代わりにポリイミド樹脂を使用してもよい。
図10〜図12は、実施例2の製造方法を示す図である。
実施例2では、実施例1の製造方法のうち、上面電極板14とブロック電極板16との間のはんだ接合の接合方法に特徴を有する。具体的には、図10に示すように、封止接合体54を予備加熱ヒータ60により予備加熱しておく。このとき、はんだ層32やはんだ層36に使用したはんだの融点以下であって、かつ、封止樹脂20の耐熱温度以下の温度で、予備加熱しておく。一例として、はんだ層32やはんだ層36に使用したはんだの融点が230℃以上260℃以下であって、封止樹脂20の耐熱温度が180℃の場合には、封止接合体54を120℃以上180℃未満の温度で予備加熱しておく。
また、減圧下で脱気しながらはんだ層42を形成すれば、はんだ層42内におけるボイドの発生を防止することができる。
また、溶融状態のはんだが徐々に凝結しながら毛細管力によりブロック電極板16の面44と上面電極板14の内面40との間に濡れ広がることにより、はんだ層42を形成することができる。
また、上面電極板14に貫通穴62を設ける必要がなくなり、さらに製造コストを抑制できる。
ここで、封止接合体54において、ブロック電極板16の面44と封止樹脂20の面66とが面一の場合や、ブロック電極板16の面44が封止樹脂20の面66よりも突出している場合を考える。すると、これらの場合において、ブロック電極板16の面44と上面電極板14の内面40との間にはんだ層42を形成すると、図15に示すように、上面電極板14の内面40と封止樹脂20の面66との間に隙間68が生じる。そして、このような隙間68が生じると、上面電極板14が外力を受けたときに、図15に示すような矢印方向の力が作用して、はんだ層42に大きな応力が発生するおそれがある。
また、上面電極板14と封止樹脂20との間に不図示の接着剤を付与して、上面電極板14と封止樹脂20との間の密着性を強化してもよい。
図18〜図21は、実施例4の製造方法を示す図である。
本実施例では、実施例1と異なる点として上面電極板14とブロック電極板16との間を接合させずに、ブロック電極板16に上面電極板14を圧接させることにより半導体装置1を形成している。
ブロック電極板16に上面電極板14を圧接していない状態の接合体50の周囲を封止樹脂20により封止して封止接合体54を形成した後に、ブロック電極板16に上面電極板14を圧接している。そのため、封止樹脂20の収縮による素子下電極板10と封止樹脂20との接着部分での剥離を防止できる。なお、同様に、パワー素子12と封止樹脂20との間の接着部分での剥離や、ブロック電極板16と封止樹脂20との間の接着部分での剥離についても防止できる。
10 素子下電極板
12 パワー素子
14 上面電極板
16 ブロック電極板
18 制御用端子
20 封止樹脂
22 制御用配線
26 IGBT
28 ダイオード
30 内面
32 はんだ層
33 面
34 面
36 はんだ層
37 面
38 バスバー
40 内面
42 はんだ層
44 面
46 外面
48 外面
50 接合体
52 面
54 封止接合体
56 ポリアミド樹脂
58 ディスペンサ
59 接合体
60 予備加熱ヒータ
61 封止接合体
62 貫通穴
64 加熱ヒータ
66 面
70 凹み
72 面
76 放熱用シリコーングリス
78 凸部
82 圧接前接合体
84 冷却チューブ
Claims (12)
- 第1電極板の第1面と半導体素子部の第1面とを接合する第1接合工程と、前記半導体素子部の第2面と第2電極板の第1面とを接合する第2接合工程と、を有する半導体装置の製造方法において、
前記第1接合工程により形成された前記第1電極板と前記半導体素子部との接合体における面のうち前記第1電極板の第2面と前記半導体素子部の第2面とを除いた封止面を樹脂で覆うことにより封止接合体を形成する封止工程を有し、
前記第2接合工程は、前記封止工程の後に行うこと、
を特徴とする半導体装置の製造方法。 - 請求項1に記載する半導体装置の製造方法において、
前記封止工程では、前記接合体における前記封止面と前記半導体素子部の第2面とを前記樹脂で覆った後に、前記半導体素子部の第2面を覆った部分の前記樹脂を除去することにより前記封止接合体を形成すること、
を特徴とする半導体装置の製造方法。 - 請求項1または2に記載する半導体装置の製造方法において、
前記第2接合工程では、前記樹脂の耐熱温度以下であり、かつ、前記第1電極板の第1面と前記半導体素子部の第1面とを接合する第1接合材の融点以下の温度に、前記封止接合体を加熱すること、
を特徴とする半導体装置の製造方法。 - 請求項3に記載する半導体装置の製造方法において、
前記第2接合工程では、前記第2電極板に第1面と第2面とを貫通する貫通穴を設けておき、前記貫通穴から前記半導体素子部の第2面と前記第2電極板の第1面とを接合する第2接合材を供給すること、
を特徴とする半導体装置の製造方法。 - 請求項3に記載する半導体装置の製造方法において、
前記第2接合工程では、前記第2電極板を前記半導体素子部の第2面と前記第2電極板の第1面とを接合する第2接合材の融点以上に加熱しておき、前記第2接合材を前記第2電極板の第1面に付与すること、
を特徴とする半導体装置の製造方法。 - 請求項1乃至5のいずれか一項に記載する半導体装置の製造方法において、
前記封止工程では、前記第1電極板と前記半導体素子部との配列方向にて前記樹脂の面よりも前記半導体素子部の第2面が凹むように前記封止接合体に凹部を形成し、
前記第2接合工程では、前記凹部に前記半導体素子部の第2面と前記第2電極板の第1面とを接合する接合層を形成すること、
を特徴とする半導体装置の製造方法。 - 第1電極板の第1面と半導体素子部の第1面とを接合する第1接合工程を有する半導体装置の製造方法において、
前記第1接合工程により形成された前記第1電極板と前記半導体素子部との接合体における面のうち前記第1電極板の第2面と前記半導体素子部の第2面とを除いた封止面を樹脂で覆うことにより封止接合体を形成する封止工程と、
前記封止接合体における前記半導体素子部の第2面に第2電極板の第1面に設けられた凸部を圧接する圧接工程と、
を有することを特徴とする半導体装置の製造方法。 - 請求項7に記載する半導体装置の製造方法において、
前記半導体素子部と前記第2電極板との間に放熱材を付与する放熱材付与工程を有すること、
を特徴とする半導体装置の製造方法。 - 第1電極板の第1面と半導体素子部の第1面とが接合し、前記半導体素子部の第2面と第2電極板の第1面とが接合する半導体装置において、
前記第1電極板と前記半導体素子部との接合体における面のうち前記第1電極板の第2面と前記半導体素子部の第2面とを除いた封止面を樹脂で覆うことにより形成された封止接合体を有し、
前記封止接合体の樹脂部分は前記第2電極板の第1面に接着しておらず、かつ前記半導体素子部と前記第2電極板との配列方向にて前記第2電極板の第1面の位置よりも前記半導体素子部が配置される側の位置に設けられていること、
を特徴とする半導体装置。 - 請求項9に記載する半導体装置において、
前記第2電極板は、第1面と第2面とを貫通する貫通穴を備えること、
を特徴とする半導体装置。 - 請求項9または10に記載する半導体装置において、
前記封止接合体は、前記第1電極板と前記半導体素子部との配列方向にて前記樹脂の面よりも前記半導体素子部の第2面が凹むように形成された凹部を備え、
前記凹部に前記半導体素子部の第2面と前記第2電極板の第1面とを接合する接合層が形成されていること、
を特徴とする半導体装置。 - 第1電極板の第1面と半導体素子部の第1面とが接合する半導体装置において、
前記半導体素子部の第2面に圧接する凸部が形成された第1面を備えた第2電極板と、
前記第1電極板と前記半導体素子部との接合体における面のうち前記第1電極板の第2面と前記半導体素子部の第2面とを除いた封止面を樹脂で覆うことにより形成された封止接合体とを有し、
前記封止接合体の樹脂部分は前記第2電極板の第1面に接着しておらず、かつ前記半導体素子部と前記第2電極板との配列方向にて前記第2電極板の第1面の位置よりも前記半導体素子部が配置される側の位置に設けられていること、
を特徴とする半導体装置。
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WO2016030955A1 (ja) * | 2014-08-25 | 2016-03-03 | ルネサスエレクトロニクス株式会社 | 半導体装置および電子装置 |
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JP6973023B2 (ja) * | 2017-12-19 | 2021-11-24 | 株式会社デンソー | 半導体装置 |
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