JP5277571B2 - ノズル基板の製造方法及び液滴吐出ヘッドの製造方法 - Google Patents

ノズル基板の製造方法及び液滴吐出ヘッドの製造方法 Download PDF

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Publication number
JP5277571B2
JP5277571B2 JP2007159811A JP2007159811A JP5277571B2 JP 5277571 B2 JP5277571 B2 JP 5277571B2 JP 2007159811 A JP2007159811 A JP 2007159811A JP 2007159811 A JP2007159811 A JP 2007159811A JP 5277571 B2 JP5277571 B2 JP 5277571B2
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Japan
Prior art keywords
nozzle
substrate
nozzle portion
silicon substrate
manufacturing
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Active
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JP2007159811A
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English (en)
Japanese (ja)
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JP2008307838A (ja
JP2008307838A5 (enExample
Inventor
和史 大谷
克治 荒川
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Seiko Epson Corp
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Seiko Epson Corp
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Priority to JP2007159811A priority Critical patent/JP5277571B2/ja
Priority to US12/120,403 priority patent/US8485640B2/en
Priority to CN2008101266702A priority patent/CN101327682B/zh
Publication of JP2008307838A publication Critical patent/JP2008307838A/ja
Publication of JP2008307838A5 publication Critical patent/JP2008307838A5/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/1433—Structure of nozzle plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/162—Manufacturing of the nozzle plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1626—Manufacturing processes etching
    • B41J2/1628—Manufacturing processes etching dry etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1626—Manufacturing processes etching
    • B41J2/1629—Manufacturing processes etching wet etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1631—Manufacturing processes photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1632—Manufacturing processes machining

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
JP2007159811A 2007-06-18 2007-06-18 ノズル基板の製造方法及び液滴吐出ヘッドの製造方法 Active JP5277571B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007159811A JP5277571B2 (ja) 2007-06-18 2007-06-18 ノズル基板の製造方法及び液滴吐出ヘッドの製造方法
US12/120,403 US8485640B2 (en) 2007-06-18 2008-05-14 Nozzle plate, droplet discharge head, method for manufacturing the same and droplet discharge device
CN2008101266702A CN101327682B (zh) 2007-06-18 2008-06-17 喷嘴基板、液滴喷头及其制造方法、以及液滴喷出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007159811A JP5277571B2 (ja) 2007-06-18 2007-06-18 ノズル基板の製造方法及び液滴吐出ヘッドの製造方法

Publications (3)

Publication Number Publication Date
JP2008307838A JP2008307838A (ja) 2008-12-25
JP2008307838A5 JP2008307838A5 (enExample) 2010-08-05
JP5277571B2 true JP5277571B2 (ja) 2013-08-28

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JP2007159811A Active JP5277571B2 (ja) 2007-06-18 2007-06-18 ノズル基板の製造方法及び液滴吐出ヘッドの製造方法

Country Status (3)

Country Link
US (1) US8485640B2 (enExample)
JP (1) JP5277571B2 (enExample)
CN (1) CN101327682B (enExample)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009260313A (ja) * 2008-03-26 2009-11-05 Semiconductor Energy Lab Co Ltd Ｓｏｉ基板の作製方法及び半導体装置の作製方法
CN102202797A (zh) * 2008-10-31 2011-09-28 富士胶卷迪马蒂克斯股份有限公司 成形喷嘴出口
US8197029B2 (en) 2008-12-30 2012-06-12 Fujifilm Corporation Forming nozzles
JP5623786B2 (ja) 2009-05-22 2014-11-12 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 薄膜蒸着装置
JP5620146B2 (ja) 2009-05-22 2014-11-05 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 薄膜蒸着装置
JP5328726B2 (ja) 2009-08-25 2013-10-30 三星ディスプレイ株式會社 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法
JP5677785B2 (ja) 2009-08-27 2015-02-25 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法
US8876975B2 (en) * 2009-10-19 2014-11-04 Samsung Display Co., Ltd. Thin film deposition apparatus
KR101084184B1 (ko) 2010-01-11 2011-11-17 삼성모바일디스플레이주식회사 박막 증착 장치
KR101174875B1 (ko) 2010-01-14 2012-08-17 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR101193186B1 (ko) 2010-02-01 2012-10-19 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR101156441B1 (ko) 2010-03-11 2012-06-18 삼성모바일디스플레이주식회사 박막 증착 장치
US8567910B2 (en) * 2010-03-31 2013-10-29 Fujifilm Corporation Durable non-wetting coating on fluid ejector
KR101202348B1 (ko) 2010-04-06 2012-11-16 삼성디스플레이 주식회사 박막 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법
US8894458B2 (en) 2010-04-28 2014-11-25 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
KR101223723B1 (ko) 2010-07-07 2013-01-18 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR101738531B1 (ko) 2010-10-22 2017-05-23 삼성디스플레이 주식회사 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR101723506B1 (ko) 2010-10-22 2017-04-19 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR20120045865A (ko) 2010-11-01 2012-05-09 삼성모바일디스플레이주식회사 유기층 증착 장치
KR20120065789A (ko) 2010-12-13 2012-06-21 삼성모바일디스플레이주식회사 유기층 증착 장치
KR101760897B1 (ko) 2011-01-12 2017-07-25 삼성디스플레이 주식회사 증착원 및 이를 구비하는 유기막 증착 장치
JP6024076B2 (ja) * 2011-01-13 2016-11-09 セイコーエプソン株式会社 シリコンデバイスの製造方法
KR101840654B1 (ko) 2011-05-25 2018-03-22 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR101852517B1 (ko) 2011-05-25 2018-04-27 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR101857249B1 (ko) 2011-05-27 2018-05-14 삼성디스플레이 주식회사 패터닝 슬릿 시트 어셈블리, 유기막 증착 장치, 유기 발광 표시장치제조 방법 및 유기 발광 표시 장치
KR101826068B1 (ko) 2011-07-04 2018-02-07 삼성디스플레이 주식회사 유기층 증착 장치
KR20130060500A (ko) * 2011-11-30 2013-06-10 삼성전기주식회사 실리콘 기판, 이의 제조 방법 및 잉크젯 프린트 헤드
JP6399862B2 (ja) * 2014-08-29 2018-10-03 キヤノン株式会社 液体吐出装置および液体吐出ヘッド
JP2017159565A (ja) * 2016-03-10 2017-09-14 セイコーエプソン株式会社 液体吐出ヘッド、および、液体吐出装置
CN117136139A (zh) * 2021-03-31 2023-11-28 柯尼卡美能达株式会社 喷嘴板的制造方法、喷嘴板及流体喷头
CN117769495A (zh) * 2021-07-27 2024-03-26 柯尼卡美能达株式会社 喷嘴板、液滴排出头、液滴排出装置及喷嘴板的制造方法
US20250206022A1 (en) * 2022-03-17 2025-06-26 Konica Minolta, Inc. Nozzle plate, droplet ejection head, droplet ejecting apparatus, and nozzle plate manufacturing method
WO2024063030A1 (ja) * 2022-09-22 2024-03-28 コニカミノルタ株式会社 ノズルプレートの製造方法
WO2024063031A1 (ja) * 2022-09-22 2024-03-28 コニカミノルタ株式会社 ノズルプレート、液滴吐出ヘッド及び液滴吐出装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56135075A (en) 1980-03-26 1981-10-22 Ricoh Co Ltd Nozzle plate
KR100311880B1 (ko) * 1996-11-11 2001-12-20 미다라이 후지오 관통구멍의제작방법,관통구멍을갖는실리콘기판,이기판을이용한디바이스,잉크제트헤드의제조방법및잉크제트헤드
JP3820747B2 (ja) 1997-05-14 2006-09-13 セイコーエプソン株式会社 噴射装置の製造方法
JPH10315461A (ja) 1997-05-14 1998-12-02 Seiko Epson Corp インクジェットヘッドおよびその製造方法
BE1012219A3 (fr) * 1998-10-05 2000-07-04 Solvay Catalyseur destine a la polymerisation des olefines, procede pour sa fabrication et utilisation.
JP2000203030A (ja) 1999-01-08 2000-07-25 Seiko Epson Corp インクジェットヘッドの製造方法とインクジェットヘッドとインクジェットプリンタ
US6260957B1 (en) * 1999-12-20 2001-07-17 Lexmark International, Inc. Ink jet printhead with heater chip ink filter
KR100499118B1 (ko) * 2000-02-24 2005-07-04 삼성전자주식회사 단결정 실리콘 웨이퍼를 이용한 일체형 유체 노즐어셈블리 및 그 제작방법
JP3800317B2 (ja) * 2001-01-10 2006-07-26 セイコーエプソン株式会社 インクジェット式記録ヘッド及びインクジェット式記録装置
CN1267261C (zh) * 2003-09-23 2006-08-02 南京林业大学 一种制备异氰酸树脂农作物秸秆板防止热压粘板的脱模剂
JP4665455B2 (ja) 2004-08-09 2011-04-06 富士ゼロックス株式会社 シリコン構造体製造方法、モールド金型製造方法、成形部材製造方法、シリコン構造体、インクジェット記録ヘッド、及び、画像形成装置
JP4660683B2 (ja) * 2005-07-28 2011-03-30 セイコーエプソン株式会社 ノズルプレートの製造方法及び液滴吐出ヘッドの製造方法
JP2007320254A (ja) 2006-06-02 2007-12-13 Seiko Epson Corp ノズルプレートの製造方法、ノズルプレート、液滴吐出ヘッドの製造方法、液滴吐出ヘッド、液滴吐出装置の製造方法及び液滴吐出装置

Also Published As

Publication number Publication date
JP2008307838A (ja) 2008-12-25
CN101327682A (zh) 2008-12-24
CN101327682B (zh) 2011-07-13
US8485640B2 (en) 2013-07-16
US20080309718A1 (en) 2008-12-18

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