JP5273135B2 - 露光方法、及びデバイス製造方法 - Google Patents

露光方法、及びデバイス製造方法 Download PDF

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Publication number
JP5273135B2
JP5273135B2 JP2010272004A JP2010272004A JP5273135B2 JP 5273135 B2 JP5273135 B2 JP 5273135B2 JP 2010272004 A JP2010272004 A JP 2010272004A JP 2010272004 A JP2010272004 A JP 2010272004A JP 5273135 B2 JP5273135 B2 JP 5273135B2
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liquid
substrate
supply
optical system
exposure
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JP2011049607A (ja
JP2011049607A5 (OSRAM
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博之 長坂
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010272004A 2003-07-09 2010-12-06 露光方法、及びデバイス製造方法 Expired - Fee Related JP5273135B2 (ja)

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JP2010272004A JP5273135B2 (ja) 2003-07-09 2010-12-06 露光方法、及びデバイス製造方法

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JP2003272616 2003-07-09
JP2003272616 2003-07-09
JP2010272004A JP5273135B2 (ja) 2003-07-09 2010-12-06 露光方法、及びデバイス製造方法

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JP2004200318A Division JP4729876B2 (ja) 2003-07-09 2004-07-07 露光装置、露光方法、並びにデバイス製造方法

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JP2011049607A JP2011049607A (ja) 2011-03-10
JP2011049607A5 JP2011049607A5 (OSRAM) 2012-04-19
JP5273135B2 true JP5273135B2 (ja) 2013-08-28

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JP2012043916A Pending JP2012109617A (ja) 2003-07-09 2012-02-29 露光装置、露光方法、並びにデバイス製造方法

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US (4) US7379157B2 (OSRAM)
JP (2) JP5273135B2 (OSRAM)
KR (1) KR101296501B1 (OSRAM)
TW (1) TWI433209B (OSRAM)
WO (1) WO2005006418A1 (OSRAM)

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