JP5005603B2 - 半導体装置及びその製造方法 - Google Patents

半導体装置及びその製造方法 Download PDF

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Publication number
JP5005603B2
JP5005603B2 JP2008096800A JP2008096800A JP5005603B2 JP 5005603 B2 JP5005603 B2 JP 5005603B2 JP 2008096800 A JP2008096800 A JP 2008096800A JP 2008096800 A JP2008096800 A JP 2008096800A JP 5005603 B2 JP5005603 B2 JP 5005603B2
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semiconductor element
frame
tape
wiring layer
semiconductor
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Japanese (ja)
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JP2009252859A (ja
JP2009252859A5 (enExample
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直 荒井
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Shinko Electric Industries Co Ltd
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Shinko Electric Industries Co Ltd
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Priority to JP2008096800A priority Critical patent/JP5005603B2/ja
Priority to US12/402,862 priority patent/US7944039B2/en
Publication of JP2009252859A publication Critical patent/JP2009252859A/ja
Publication of JP2009252859A5 publication Critical patent/JP2009252859A5/ja
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    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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  • Engineering & Computer Science (AREA)
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  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
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  • Condensed Matter Physics & Semiconductors (AREA)
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  • Manufacturing & Machinery (AREA)
  • Wire Bonding (AREA)
JP2008096800A 2008-04-03 2008-04-03 半導体装置及びその製造方法 Active JP5005603B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008096800A JP5005603B2 (ja) 2008-04-03 2008-04-03 半導体装置及びその製造方法
US12/402,862 US7944039B2 (en) 2008-04-03 2009-03-12 Semiconductor device and method of manufacturing the same

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Application Number Priority Date Filing Date Title
JP2008096800A JP5005603B2 (ja) 2008-04-03 2008-04-03 半導体装置及びその製造方法

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JP2009252859A JP2009252859A (ja) 2009-10-29
JP2009252859A5 JP2009252859A5 (enExample) 2011-05-12
JP5005603B2 true JP5005603B2 (ja) 2012-08-22

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Cited By (1)

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KR20160011602A (ko) * 2014-07-22 2016-02-01 아피쿠 야마다 가부시키가이샤 성형 금형, 성형 장치, 성형품의 제조 방법 및 수지 몰드 방법

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JP4833307B2 (ja) * 2009-02-24 2011-12-07 インターナショナル・ビジネス・マシーンズ・コーポレーション 半導体モジュール、端子板、端子板の製造方法および半導体モジュールの製造方法
JP5543754B2 (ja) * 2009-11-04 2014-07-09 新光電気工業株式会社 半導体パッケージ及びその製造方法
JP5589598B2 (ja) * 2010-06-22 2014-09-17 富士通株式会社 半導体装置の製造方法
US8502372B2 (en) 2010-08-26 2013-08-06 Lsi Corporation Low-cost 3D face-to-face out assembly
WO2012029579A1 (ja) * 2010-08-30 2012-03-08 住友ベークライト株式会社 半導体パッケージおよび半導体装置
WO2012029549A1 (ja) * 2010-08-30 2012-03-08 住友ベークライト株式会社 半導体パッケージおよび半導体装置
JP5736714B2 (ja) * 2010-10-14 2015-06-17 富士通株式会社 半導体装置及びその製造方法
US8674235B2 (en) * 2011-06-06 2014-03-18 Intel Corporation Microelectronic substrate for alternate package functionality
US8476111B2 (en) * 2011-06-16 2013-07-02 Stats Chippac Ltd. Integrated circuit packaging system with intra substrate die and method of manufacture thereof
WO2013054504A1 (ja) * 2011-10-13 2013-04-18 住友ベークライト株式会社 半導体パッケージおよび半導体装置
KR20130054769A (ko) * 2011-11-17 2013-05-27 삼성전기주식회사 반도체 패키지 및 이를 포함하는 반도체 패키지 모듈
JP5895467B2 (ja) * 2011-11-18 2016-03-30 富士通株式会社 電子装置及びその製造方法
WO2013089754A1 (en) * 2011-12-15 2013-06-20 Intel Corporation Packaged semiconductor die with bumpless die-package interface for bumpless build-up layer (bbul) packages
US8716859B2 (en) * 2012-01-10 2014-05-06 Intel Mobile Communications GmbH Enhanced flip chip package
KR101384343B1 (ko) * 2012-05-24 2014-04-14 에스티에스반도체통신 주식회사 칩 패드가 없는 반도체 패키지 제조방법
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