JP5543754B2 - 半導体パッケージ及びその製造方法 - Google Patents
半導体パッケージ及びその製造方法 Download PDFInfo
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Description
本半導体パッケージは、能動面に突起電極が設けられた半導体チップ、及び該半導体チップ側面と前記能動面に前記突起電極の先端面を露出して設けられた封止樹脂を含む基体と、前記封止樹脂の表面に設けられた、絶縁層及び該絶縁層上に設けられた配線層を含む配線構造体と、を有し、前記絶縁層が感光性材料からなり、前記配線層と前記突起電極とが直接接続され、前記絶縁層に、前記絶縁層を貫通し、前記突起電極側の径より前記配線層側の径が小さい円錐台形状の開口部が設けられ、前記開口部周縁の前記絶縁層表面に前記突起電極の先端面が接しており、前記突起電極の先端面に前記開口部内に充填された前記配線層の構成材料が直接接続されていることを要件とする。
[第1の実施の形態に係る半導体パッケージの構造]
図4は、第1の実施の形態に係る半導体パッケージを例示する断面図である。図4を参照するに、半導体パッケージ10は、半導体チップ20及び封止樹脂30が形成する面に極薄の配線構造体40が形成され、更に配線構造体40上に外部接続端子49が形成された構造を有する。半導体パッケージ10の形状は例えば平面視して矩形の平板状であり、その寸法は、例えば幅40mm(X方向)×奥行き40mm(Y方向)×厚さ1mm(Z方向)程度とすることができる。
続いて、第1の実施の形態に係る半導体パッケージの製造方法について説明する。図5〜図18は、第1の実施の形態に係る半導体パッケージの製造工程を例示する図である。図5〜図18において、図4と同一部分については、同一符号を付し、その説明は省略する場合がある。
第1の実施の形態の変形例では、第1の実施の形態の図7及び図9に示す工程を図20及び図21に示す工程に置換した半導体パッケージの製造方法について説明する。
図19は、第1の実施の形態の変形例に係る半導体パッケージを例示する断面図である。図19において、図4と同一部分については、同一符号を付し、その説明は省略する場合がある。図19を参照するに、半導体パッケージ11は、半導体チップ20の主面と第1絶縁層41とが接してなく、半導体チップ20の主面と第1絶縁層41との間に封止樹脂30が形成されている点が半導体パッケージ10とは異なる。半導体パッケージ11において、半導体パッケージ10と同一構成部分についての説明は省略する。
図20及び図21は、第1の実施の形態の変形例に係る半導体パッケージの製造工程を例示する図である。図20及び図21において、図7及び図9と同一部分については、同一符号を付し、その説明は省略する場合がある。
第2の実施の形態では、第1の実施の形態の工程順序を変更した半導体パッケージの製造方法について説明する。
図22〜図24は、第2の実施の形態に係る半導体パッケージの製造工程を例示する図である。図22〜図24において、図5〜図18と同一部分については、同一符号を付し、その説明は省略する場合がある。
20 半導体チップ
21 半導体基板
22 電極パッド
23 突起電極
30 封止樹脂
40 配線構造体
41 第1絶縁層
41x、45x 開口部
42 第1配線層
43 第2絶縁層
43x ビアホール
44 第2配線層
45 ソルダーレジスト層
49 外部接続端子
50 支持体
57 ダイシングブレード
D 奥行き
T 厚さ
W 幅
Claims (18)
- 能動面に突起電極が設けられた半導体チップ、及び該半導体チップ側面と前記能動面に前記突起電極の先端面を露出して設けられた封止樹脂を含む基体と、
前記封止樹脂の表面に設けられた、絶縁層及び該絶縁層上に設けられた配線層を含む配線構造体と、を有し、
前記絶縁層が感光性材料からなり、
前記配線層と前記突起電極とが直接接続され、
前記絶縁層に、前記絶縁層を貫通し、前記突起電極側の径より前記配線層側の径が小さい円錐台形状の開口部が設けられ、
前記開口部周縁の前記絶縁層表面に前記突起電極の先端面が接しており、
前記突起電極の先端面に前記開口部内に充填された前記配線層の構成材料が直接接続されている半導体パッケージ。 - 前記絶縁層上に前記配線層を覆うように他の絶縁層が積層され、
前記他の絶縁層に、前記他の絶縁層を貫通して前記配線層を露出する、前記配線層側の径より前記配線層とは反対側の径が大きいビアホールが設けられている請求項1記載の半導体パッケージ。 - 前記絶縁層及び前記配線層上に他の絶縁層及び配線層が積層されており、
前記他の絶縁層は、熱硬化性樹脂からなる請求項1又は2記載の半導体パッケージ。 - 最上層の配線層上に、前記配線層の一部を露出する開口部を有するソルダーレジスト層が設けられ、
前記開口部から露出する前記配線層上に外部接続端子が設けられ、
前記外部接続端子は、平面視において前記半導体チップよりも外側の領域にも形成され、
隣接する前記外部接続端子のピッチは、隣接する前記電極のピッチよりも広い請求項1乃至3の何れか一項記載の半導体パッケージ。 - 前記半導体チップの裏面が前記封止樹脂から露出している請求項1乃至4の何れか一項記載の半導体パッケージ。
- 支持体上に、感光性材料から構成された半硬化状態の絶縁層を形成する第1工程と、
フォトリソグラフィ法により、前記絶縁層に前記支持体を露出する開口部を形成する第2工程と、
半導体チップの電極の位置が前記開口部と合うように前記半導体チップを前記絶縁層上に配置し、前記絶縁層を加熱して硬化させることにより、前記半導体チップを前記絶縁層表面に接着する第3工程と、
前記絶縁層の前記半導体チップ側の面に、前記半導体チップを封止する封止樹脂を形成する第4工程と、
前記支持体を除去する第5工程と、
前記絶縁層の前記半導体チップ側の面とは反対側の面に、前記開口部内に露出する前記電極と電気的に接続する配線層を設け、前記絶縁層及び前記配線層を含む配線構造体を形成する第6工程と、を有する半導体パッケージの製造方法。 - 前記電極は突起電極であり、
前記第3工程において、前記突起電極が前記開口部内に挿入され、前記半導体チップの能動面が前記絶縁層表面に接着される請求項6記載の半導体パッケージの製造方法。 - 前記電極は突起電極であり、
前記第3工程において、前記突起電極の先端面が前記開口部周縁の前記絶縁層表面に接着され、
前記第4工程において、前記半導体チップの能動面と前記絶縁層との間に封止樹脂が形成される請求項6記載の半導体パッケージの製造方法。 - 前記第6工程において、前記絶縁層及び前記配線層上に他の絶縁層及び配線層を積層する工程を有し、
前記他の絶縁層は、熱硬化性樹脂からなる請求項6乃至8の何れか一項記載の半導体パッケージの製造方法。 - 前記第1工程では、フィルム状の前記感光性材料を真空雰囲気中でラミネートして前記絶縁層を形成する請求項6乃至9の何れか一項記載の半導体パッケージの製造方法。
- 前記第1工程では、ペースト状又は液状の前記感光性材料を塗布して前記絶縁層を形成する請求項6乃至9の何れか一項記載の半導体パッケージの製造方法。
- 前記感光性材料は、アクリル、エポキシ、ポリイミドの何れかを主成分とする請求項6乃至11の何れか一項記載の半導体パッケージの製造方法。
- 前記第6工程において、前記配線層は、無電解めっき法、スパッタ法、蒸着法、及び電解めっき法のうちの少なくとも1つを含む方法により形成する請求項6乃至12の何れか一項記載の半導体パッケージの製造方法。
- 前記配線層の一部を露出する開口部を有するソルダーレジスト層を形成する第7工程を更に有する請求項6乃至13の何れか一項記載の半導体パッケージの製造方法。
- 前記ソルダーレジスト層の前記開口部から露出する前記配線層上に外部接続端子を形成する第8工程を更に有する請求項14記載の半導体パッケージの製造方法。
- 前記外部接続端子は、平面視において前記半導体チップよりも外側の領域に形成する請求項15記載の半導体パッケージの製造方法。
- 隣接する前記外部接続端子のピッチは、隣接する前記電極のピッチよりも広い請求項16記載の半導体パッケージの製造方法。
- 前記封止樹脂を研磨して前記半導体チップの裏面を露出する第9工程を更に有する請求項6乃至17の何れか一項記載の半導体パッケージの製造方法。
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