JP5175823B2 - 半導体パッケージの製造方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims description 250
- 238000004519 manufacturing process Methods 0.000 title claims description 52
- 229920005989 resin Polymers 0.000 claims description 95
- 239000011347 resin Substances 0.000 claims description 95
- 238000007789 sealing Methods 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 46
- 229910000679 solder Inorganic materials 0.000 claims description 38
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- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 238000005530 etching Methods 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 8
- 238000005520 cutting process Methods 0.000 claims description 3
- 238000000227 grinding Methods 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims 1
- 239000010410 layer Substances 0.000 description 189
- 239000010949 copper Substances 0.000 description 37
- 229910052802 copper Inorganic materials 0.000 description 28
- 239000000463 material Substances 0.000 description 26
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 24
- 239000000758 substrate Substances 0.000 description 18
- 239000003822 epoxy resin Substances 0.000 description 15
- 229920000647 polyepoxide Polymers 0.000 description 15
- 229920001721 polyimide Polymers 0.000 description 13
- 239000009719 polyimide resin Substances 0.000 description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 238000010586 diagram Methods 0.000 description 11
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- 229910045601 alloy Inorganic materials 0.000 description 8
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- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- 229910052718 tin Inorganic materials 0.000 description 6
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- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
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- 230000004907 flux Effects 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
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- 239000012298 atmosphere Substances 0.000 description 1
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- 239000000945 filler Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
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- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
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- 230000009467 reduction Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
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- 238000004544 sputter deposition Methods 0.000 description 1
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- 239000011800 void material Substances 0.000 description 1
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/96—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being encapsulated in a common layer, e.g. neo-wafer or pseudo-wafer, said common layer being separable into individual assemblies after connecting
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/12105—Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L2224/19—Manufacturing methods of high density interconnect preforms
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1517—Multilayer substrate
- H01L2924/15172—Fan-out arrangement of the internal vias
- H01L2924/15174—Fan-out arrangement of the internal vias in different layers of the multilayer substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
- H01L2924/1816—Exposing the passive side of the semiconductor or solid-state body
- H01L2924/18162—Exposing the passive side of the semiconductor or solid-state body of a chip with build-up interconnect
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
図4は、本実施の形態に係る半導体パッケージを例示する断面図である。図4を参照するに、半導体パッケージ10は、半導体チップ20及び封止樹脂30が形成する面の上に極薄の配線構造体40が形成され、更に配線構造体40上に外部接続端子49が形成された構造を有する。半導体パッケージ10の平面形状は例えば矩形状であり、その寸法は、例えば幅15mm(X方向)×奥行き15mm(Y方向)×厚さ0.35mm(Z方向)程度とすることができる。但し、厚さ(Z方向)は、0.3〜0.5mm程度と薄型に形成することができる。
続いて、本実施の形態に係る半導体パッケージの製造方法について説明する。図5〜図21は、本実施の形態に係る半導体パッケージの製造工程を例示する図である。図5〜図21において、図4と同一部分については、同一符号を付し、その説明は省略する場合がある。
20 半導体チップ
20a、50a 面
21 半導体基板
22 電極パッド
23 突起電極
30 封止樹脂
31、32 絶縁樹脂
40 配線構造体
41 第1絶縁層
41x 第1ビアホール
42 第1配線層
43 第2絶縁層
43x 第2ビアホール
44 第2配線層
45 ソルダーレジスト層
45x 開口部
49 外部接続端子
50 第1支持体
50x 凹部
51、53 両面粘着剤
52 空隙部
54 第2支持体
57 ダイシングブレード
D 奥行き
H 深さ
T 厚さ
W 幅
Claims (12)
- 一方の面に凹部が設けられた第1支持体を準備し、
前記凹部に、主面の側に電極が形成された半導体チップを、前記電極が前記凹部の開口部から露出するように配置する第1工程と、
前記第1支持体の前記一方の面及び前記半導体チップの前記主面に絶縁層及び配線層を含む配線構造体を形成する第2工程と、
前記配線構造体上に第2支持体を配置する第3工程と、
前記第1支持体を除去する第4工程と、
前記半導体チップの前記主面と接する前記配線構造体の面に、前記半導体チップを封止する封止樹脂を形成する第5工程と、
前記封止樹脂及び前記半導体チップを、前記半導体チップの裏面側から研削して薄型化する第6工程と、
前記第2支持体を除去する第7工程と、を有する半導体パッケージの製造方法。 - 前記第2工程は、前記電極を覆うように、前記第1支持体の前記一方の面及び前記半導体チップの前記主面に前記絶縁層を形成する第2A工程と、
前記絶縁層上に前記電極と電気的に接続する前記配線層を形成する第2B工程と、
前記配線層を覆うように、前記絶縁層上に前記配線層の一部を露出する開口部を有するソルダーレジスト層を形成する第2C工程と、を含み
前記第3工程では、前記配線構造体の前記ソルダーレジスト層上に第2支持体を配置する請求項1記載の半導体パッケージの製造方法。 - 前記第2A工程では、液状又はペースト状の樹脂を用いて前記絶縁層を形成し、
前記液状又はペースト状の樹脂は、前記半導体チップの側面と前記凹部の内壁面とが形成する空隙部を充填し、
前記第5工程では、前記半導体チップの前記主面と接する前記配線構造体の面に、前記空隙部を充填した樹脂及び前記半導体チップの裏面を封止する封止樹脂を形成する請求項2記載の半導体パッケージの製造方法。 - 前記第2A工程では、前記半導体チップの側面と前記凹部の内壁面とが形成する空隙部を残したまま、フィルム状の樹脂を用いて前記絶縁層を形成し、
前記第5工程では、前記半導体チップの前記主面と接する前記配線構造体の面に、前記半導体チップの前記側面及び裏面を封止する封止樹脂を形成する請求項2記載の半導体パッケージの製造方法。 - 前記第2B工程では、前記絶縁層に、前記絶縁層を貫通して前記電極を露出する貫通孔を形成し、前記貫通孔を介して前記電極と電気的に接続する前記配線層を形成する請求項2乃至4の何れか一項記載の半導体パッケージの製造方法。
- 前記ソルダーレジスト層の前記開口部から露出する前記配線層上に外部接続端子を形成する第8工程を更に有する請求項2乃至5の何れか一項記載の半導体パッケージの製造方法。
- 前記外部接続端子は、平面視において前記半導体チップよりも外側の領域を含む領域に形成される請求項6記載の半導体パッケージの製造方法。
- 隣接する前記外部接続端子のピッチは、隣接する前記電極のピッチよりも広い請求項7記載の半導体パッケージの製造方法。
- 前記第1工程と前記第2工程との間に、前記半導体チップの側面と前記凹部の内壁面とが形成する空隙部に樹脂を充填する第9工程を更に有する請求項1又は2記載の半導体パッケージの製造方法。
- 前記第1支持体及び前記第2支持体は金属であり、前記第4工程及び前記第7工程において、それぞれ前記第1支持体及び前記第2支持体をエッチングにより除去する請求項1乃至9の何れか一項記載の半導体パッケージの製造方法。
- 前記第6工程では、前記半導体チップの裏面が前記封止樹脂から露出する請求項1乃至10の何れか一項記載の半導体パッケージの製造方法。
- 前記第1工程では、一方の面に複数の凹部が設けられた第1支持体を準備し、
前記複数の凹部に、主面の側に電極が形成された半導体チップを、前記電極が前記複数の凹部の開口部から露出するように配置し、
その後、前記第2工程から前記第7工程を含む工程を行い、
更に、少なくとも一つの前記半導体チップを有するように、前記配線構造体と前記封止樹脂を切断し、複数の半導体パッケージを作製する第10工程を行う請求項1乃至11の何れか一項記載の半導体パッケージの製造方法。
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