JP4878632B2 - 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 - Google Patents

光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 Download PDF

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Publication number
JP4878632B2
JP4878632B2 JP2009158798A JP2009158798A JP4878632B2 JP 4878632 B2 JP4878632 B2 JP 4878632B2 JP 2009158798 A JP2009158798 A JP 2009158798A JP 2009158798 A JP2009158798 A JP 2009158798A JP 4878632 B2 JP4878632 B2 JP 4878632B2
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Japan
Prior art keywords
light
film thickness
optical film
actual substrate
substrate
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JP2009158798A
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English (en)
Japanese (ja)
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JP2011013145A (ja
JP2011013145A5 (enExample
Inventor
旭陽 佐井
陽平 日向
芳幸 大瀧
友松 姜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shincron Co Ltd
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Shincron Co Ltd
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Publication date
Priority to JP2009158798A priority Critical patent/JP4878632B2/ja
Application filed by Shincron Co Ltd filed Critical Shincron Co Ltd
Priority to EP10794137A priority patent/EP2450662A1/en
Priority to HK12109090.6A priority patent/HK1168417B/xx
Priority to US13/381,032 priority patent/US8625111B2/en
Priority to PCT/JP2010/061041 priority patent/WO2011001968A1/ja
Priority to KR1020127002789A priority patent/KR101317536B1/ko
Priority to CN201080029355.3A priority patent/CN102472611B/zh
Priority to TW099121613A priority patent/TWI404908B/zh
Publication of JP2011013145A publication Critical patent/JP2011013145A/ja
Publication of JP2011013145A5 publication Critical patent/JP2011013145A5/ja
Application granted granted Critical
Publication of JP4878632B2 publication Critical patent/JP4878632B2/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
JP2009158798A 2009-07-03 2009-07-03 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 Active JP4878632B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2009158798A JP4878632B2 (ja) 2009-07-03 2009-07-03 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置
HK12109090.6A HK1168417B (en) 2009-07-03 2010-06-29 Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter
US13/381,032 US8625111B2 (en) 2009-07-03 2010-06-29 Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter
PCT/JP2010/061041 WO2011001968A1 (ja) 2009-07-03 2010-06-29 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置
EP10794137A EP2450662A1 (en) 2009-07-03 2010-06-29 Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter
KR1020127002789A KR101317536B1 (ko) 2009-07-03 2010-06-29 광학식 막두께계 및 광학식 막두께계를 구비한 박막 형성장치
CN201080029355.3A CN102472611B (zh) 2009-07-03 2010-06-29 光学式膜厚计以及具有光学式膜厚计的薄膜形成装置
TW099121613A TWI404908B (zh) 2009-07-03 2010-07-01 An optical film thickness gauge and a thin film forming apparatus having an optical film thickness gauge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009158798A JP4878632B2 (ja) 2009-07-03 2009-07-03 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置

Publications (3)

Publication Number Publication Date
JP2011013145A JP2011013145A (ja) 2011-01-20
JP2011013145A5 JP2011013145A5 (enExample) 2011-04-28
JP4878632B2 true JP4878632B2 (ja) 2012-02-15

Family

ID=43411040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009158798A Active JP4878632B2 (ja) 2009-07-03 2009-07-03 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置

Country Status (7)

Country Link
US (1) US8625111B2 (enExample)
EP (1) EP2450662A1 (enExample)
JP (1) JP4878632B2 (enExample)
KR (1) KR101317536B1 (enExample)
CN (1) CN102472611B (enExample)
TW (1) TWI404908B (enExample)
WO (1) WO2011001968A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8922790B2 (en) * 2012-02-15 2014-12-30 Shincron Co., Ltd. Optical film thickness measuring device and thin film forming apparatus using the optical film thickness measuring device
HK1204491A1 (en) * 2012-02-27 2015-11-20 株式会社新柯隆 Led light source apparatus, film thickness measuring apparatus, and thin-film forming apparatus
WO2013186879A1 (ja) * 2012-06-13 2013-12-19 株式会社シンクロン 膜厚測定装置及び成膜装置
WO2014038090A1 (ja) * 2012-09-10 2014-03-13 株式会社シンクロン 測定装置及び成膜装置
CN105143500B (zh) * 2012-10-04 2017-10-10 康宁股份有限公司 光学涂覆方法、设备和产品
KR101544968B1 (ko) 2013-07-05 2015-08-19 한국표준과학연구원 두께 측정 장치 및 두께 측정 방법
JP6800800B2 (ja) * 2017-04-06 2020-12-16 株式会社ニューフレアテクノロジー 成長速度測定装置および成長速度検出方法
JP6923344B2 (ja) 2017-04-13 2021-08-18 株式会社Ｓｃｒｅｅｎホールディングス 周縁処理装置および周縁処理方法
US11313670B2 (en) * 2020-09-30 2022-04-26 National Tsing Hua University Inspection method for multilayer semiconductor device
CN115452337B (zh) * 2022-08-24 2023-04-07 东莞艾塔极新材料科技有限公司 一种oca光学膜模切加工用的尺寸检验台

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5491263A (en) * 1977-12-28 1979-07-19 Ulvac Corp Film thickness detector
JPS5644802A (en) * 1979-09-20 1981-04-24 Hideo Takada System and method of measuring film thickness and coating varnish film thickness
JPS5972010A (ja) 1982-10-19 1984-04-23 Ulvac Corp 光学膜形成装置における膜厚監視装置
JPH0611442A (ja) * 1992-06-29 1994-01-21 Kurabo Ind Ltd 赤外線光学装置
TW428079B (en) 1998-12-24 2001-04-01 Sharp Kk Thickness measurement apparatus of thin film using light interference method
DE60233931D1 (de) * 2001-02-07 2009-11-19 Asahi Glass Co Ltd Verfahren zur herstellung eines sputterfilms
JP3737409B2 (ja) * 2001-10-15 2006-01-18 日本電信電話株式会社 膜厚モニタリング装置および方法
JP2004219108A (ja) * 2003-01-09 2004-08-05 Dainippon Printing Co Ltd 着色膜の膜厚ムラ検査方法及び装置
JP4547489B2 (ja) * 2003-05-01 2010-09-22 株式会社昭和真空 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法
JP2005301032A (ja) * 2004-04-14 2005-10-27 Olympus Corp 光学薄膜成膜装置及び光学薄膜成膜方法並びに光学素子
TWI252301B (en) 2004-07-30 2006-04-01 Delta Electronics Inc Deposition system and film thickness monitoring device thereof
JP2006214935A (ja) * 2005-02-04 2006-08-17 Omron Corp 薄膜検査装置および薄膜検査方法
JP4792242B2 (ja) * 2005-05-27 2011-10-12 オリンパス株式会社 薄膜形成装置及び薄膜形成方法

Also Published As

Publication number Publication date
WO2011001968A1 (ja) 2011-01-06
CN102472611B (zh) 2015-06-17
HK1168417A1 (en) 2012-12-28
KR20120052270A (ko) 2012-05-23
EP2450662A1 (en) 2012-05-09
TWI404908B (zh) 2013-08-11
TW201109617A (en) 2011-03-16
US8625111B2 (en) 2014-01-07
CN102472611A (zh) 2012-05-23
JP2011013145A (ja) 2011-01-20
US20120105872A1 (en) 2012-05-03
KR101317536B1 (ko) 2013-10-15

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