JP2011013145A5 - - Google Patents
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- Publication number
- JP2011013145A5 JP2011013145A5 JP2009158798A JP2009158798A JP2011013145A5 JP 2011013145 A5 JP2011013145 A5 JP 2011013145A5 JP 2009158798 A JP2009158798 A JP 2009158798A JP 2009158798 A JP2009158798 A JP 2009158798A JP 2011013145 A5 JP2011013145 A5 JP 2011013145A5
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- optical film
- light
- thickness meter
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 86
- 238000005259 measurement Methods 0.000 claims description 49
- 239000012788 optical film Substances 0.000 claims description 40
- 230000003287 optical effect Effects 0.000 claims description 18
- 239000010408 film Substances 0.000 claims description 16
- 239000010409 thin film Substances 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 6
- 238000007740 vapor deposition Methods 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 10
- 230000005540 biological transmission Effects 0.000 description 10
- 238000002834 transmittance Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000002356 single layer Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009158798A JP4878632B2 (ja) | 2009-07-03 | 2009-07-03 | 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 |
| KR1020127002789A KR101317536B1 (ko) | 2009-07-03 | 2010-06-29 | 광학식 막두께계 및 광학식 막두께계를 구비한 박막 형성장치 |
| US13/381,032 US8625111B2 (en) | 2009-07-03 | 2010-06-29 | Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter |
| PCT/JP2010/061041 WO2011001968A1 (ja) | 2009-07-03 | 2010-06-29 | 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 |
| HK12109090.6A HK1168417B (en) | 2009-07-03 | 2010-06-29 | Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter |
| CN201080029355.3A CN102472611B (zh) | 2009-07-03 | 2010-06-29 | 光学式膜厚计以及具有光学式膜厚计的薄膜形成装置 |
| EP10794137A EP2450662A1 (en) | 2009-07-03 | 2010-06-29 | Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter |
| TW099121613A TWI404908B (zh) | 2009-07-03 | 2010-07-01 | An optical film thickness gauge and a thin film forming apparatus having an optical film thickness gauge |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009158798A JP4878632B2 (ja) | 2009-07-03 | 2009-07-03 | 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011013145A JP2011013145A (ja) | 2011-01-20 |
| JP2011013145A5 true JP2011013145A5 (enExample) | 2011-04-28 |
| JP4878632B2 JP4878632B2 (ja) | 2012-02-15 |
Family
ID=43411040
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009158798A Active JP4878632B2 (ja) | 2009-07-03 | 2009-07-03 | 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8625111B2 (enExample) |
| EP (1) | EP2450662A1 (enExample) |
| JP (1) | JP4878632B2 (enExample) |
| KR (1) | KR101317536B1 (enExample) |
| CN (1) | CN102472611B (enExample) |
| TW (1) | TWI404908B (enExample) |
| WO (1) | WO2011001968A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5189711B1 (ja) * | 2012-02-15 | 2013-04-24 | 株式会社シンクロン | 光学式膜厚計測装置及び光学式膜厚計測装置を用いた薄膜形成装置 |
| KR101693397B1 (ko) * | 2012-02-27 | 2017-01-06 | 신크론 컴퍼니 리미티드 | Led 광원장치, 막두께 측정장치 및 박막 형성장치 |
| CN104395690B (zh) * | 2012-06-13 | 2017-05-31 | 株式会社新柯隆 | 膜厚测量装置和成膜装置 |
| CN104350380B (zh) * | 2012-09-10 | 2017-03-15 | 株式会社新柯隆 | 测量装置和成膜装置 |
| CN105143500B (zh) * | 2012-10-04 | 2017-10-10 | 康宁股份有限公司 | 光学涂覆方法、设备和产品 |
| KR101544968B1 (ko) | 2013-07-05 | 2015-08-19 | 한국표준과학연구원 | 두께 측정 장치 및 두께 측정 방법 |
| JP6800800B2 (ja) * | 2017-04-06 | 2020-12-16 | 株式会社ニューフレアテクノロジー | 成長速度測定装置および成長速度検出方法 |
| JP6923344B2 (ja) | 2017-04-13 | 2021-08-18 | 株式会社Ｓｃｒｅｅｎホールディングス | 周縁処理装置および周縁処理方法 |
| US11313670B2 (en) * | 2020-09-30 | 2022-04-26 | National Tsing Hua University | Inspection method for multilayer semiconductor device |
| CN115452337B (zh) * | 2022-08-24 | 2023-04-07 | 东莞艾塔极新材料科技有限公司 | 一种oca光学膜模切加工用的尺寸检验台 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5491263A (en) * | 1977-12-28 | 1979-07-19 | Ulvac Corp | Film thickness detector |
| JPS5644802A (en) * | 1979-09-20 | 1981-04-24 | Hideo Takada | System and method of measuring film thickness and coating varnish film thickness |
| JPS5972010A (ja) | 1982-10-19 | 1984-04-23 | Ulvac Corp | 光学膜形成装置における膜厚監視装置 |
| JPH0611442A (ja) * | 1992-06-29 | 1994-01-21 | Kurabo Ind Ltd | 赤外線光学装置 |
| US7304744B1 (en) | 1998-12-24 | 2007-12-04 | Sharp Kabushiki Kaisha | Apparatus and method for measuring the thickness of a thin film via the intensity of reflected light |
| JPWO2002063064A1 (ja) | 2001-02-07 | 2004-06-10 | 旭硝子株式会社 | スパッタ装置及びスパッタ成膜方法 |
| JP3737409B2 (ja) * | 2001-10-15 | 2006-01-18 | 日本電信電話株式会社 | 膜厚モニタリング装置および方法 |
| JP2004219108A (ja) * | 2003-01-09 | 2004-08-05 | Dainippon Printing Co Ltd | 着色膜の膜厚ムラ検査方法及び装置 |
| JP4547489B2 (ja) * | 2003-05-01 | 2010-09-22 | 株式会社昭和真空 | 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法 |
| JP2005301032A (ja) * | 2004-04-14 | 2005-10-27 | Olympus Corp | 光学薄膜成膜装置及び光学薄膜成膜方法並びに光学素子 |
| TWI252301B (en) | 2004-07-30 | 2006-04-01 | Delta Electronics Inc | Deposition system and film thickness monitoring device thereof |
| JP2006214935A (ja) * | 2005-02-04 | 2006-08-17 | Omron Corp | 薄膜検査装置および薄膜検査方法 |
| JP4792242B2 (ja) * | 2005-05-27 | 2011-10-12 | オリンパス株式会社 | 薄膜形成装置及び薄膜形成方法 |
-
2009
- 2009-07-03 JP JP2009158798A patent/JP4878632B2/ja active Active
-
2010
- 2010-06-29 EP EP10794137A patent/EP2450662A1/en not_active Withdrawn
- 2010-06-29 KR KR1020127002789A patent/KR101317536B1/ko active Active
- 2010-06-29 CN CN201080029355.3A patent/CN102472611B/zh active Active
- 2010-06-29 WO PCT/JP2010/061041 patent/WO2011001968A1/ja not_active Ceased
- 2010-06-29 US US13/381,032 patent/US8625111B2/en active Active
- 2010-07-01 TW TW099121613A patent/TWI404908B/zh active
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