JP4714945B2 - マグネシウム又はマグネシウム合金からなる製品の製造方法 - Google Patents

マグネシウム又はマグネシウム合金からなる製品の製造方法 Download PDF

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Publication number
JP4714945B2
JP4714945B2 JP2005513199A JP2005513199A JP4714945B2 JP 4714945 B2 JP4714945 B2 JP 4714945B2 JP 2005513199 A JP2005513199 A JP 2005513199A JP 2005513199 A JP2005513199 A JP 2005513199A JP 4714945 B2 JP4714945 B2 JP 4714945B2
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JP
Japan
Prior art keywords
magnesium
film
metal plating
magnesium alloy
plating film
Prior art date
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Expired - Fee Related
Application number
JP2005513199A
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English (en)
Japanese (ja)
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JPWO2005017235A1 (ja
Inventor
実 日野
実 平松
宏司 酒井
保廣 奥田
政男 高見沢
慧江 陳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HORI METAL FINISHING IND., LTD.
Okayama Prefectural Government
OM SANGYO CO Ltd
Original Assignee
HORI METAL FINISHING IND., LTD.
Okayama Prefectural Government
OM SANGYO CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by HORI METAL FINISHING IND., LTD., Okayama Prefectural Government, OM SANGYO CO Ltd filed Critical HORI METAL FINISHING IND., LTD.
Priority to JP2005513199A priority Critical patent/JP4714945B2/ja
Publication of JPWO2005017235A1 publication Critical patent/JPWO2005017235A1/ja
Application granted granted Critical
Publication of JP4714945B2 publication Critical patent/JP4714945B2/ja
Expired - Fee Related legal-status Critical Current
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/30—Anodisation of magnesium or alloys based thereon
JP2005513199A 2003-08-19 2004-08-18 マグネシウム又はマグネシウム合金からなる製品の製造方法 Expired - Fee Related JP4714945B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005513199A JP4714945B2 (ja) 2003-08-19 2004-08-18 マグネシウム又はマグネシウム合金からなる製品の製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003295147 2003-08-19
JP2003295147 2003-08-19
PCT/JP2004/011821 WO2005017235A1 (ja) 2003-08-19 2004-08-18 マグネシウム又はマグネシウム合金からなる製品及びその製造方法
JP2005513199A JP4714945B2 (ja) 2003-08-19 2004-08-18 マグネシウム又はマグネシウム合金からなる製品の製造方法

Publications (2)

Publication Number Publication Date
JPWO2005017235A1 JPWO2005017235A1 (ja) 2007-11-01
JP4714945B2 true JP4714945B2 (ja) 2011-07-06

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JP2005513199A Expired - Fee Related JP4714945B2 (ja) 2003-08-19 2004-08-18 マグネシウム又はマグネシウム合金からなる製品の製造方法

Country Status (4)

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JP (1) JP4714945B2 (ko)
KR (1) KR20060073941A (ko)
CN (1) CN1871377A (ko)
WO (1) WO2005017235A1 (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007068017A (ja) * 2005-09-01 2007-03-15 Pioneer Electronic Corp スピーカー装置用構成部材及びスピーカー装置
JP4901296B2 (ja) * 2006-05-09 2012-03-21 矢崎総業株式会社 マグネシウム部材の表面処理方法
JP2008056954A (ja) * 2006-08-29 2008-03-13 Toyota Motor Corp 金属部材及び金属部材の製造方法
JP5329848B2 (ja) * 2007-06-12 2013-10-30 ヤマハ発動機株式会社 マグネシウム合金部材の製造方法
JP4948366B2 (ja) * 2007-11-12 2012-06-06 株式会社高松メッキ マグネシウム合金素材のめっき方法及びそのめっき製品
JP2010080515A (ja) * 2008-09-24 2010-04-08 Toshiba Corp シールド部材とシールド部材を有する携帯端末
JP5498032B2 (ja) * 2009-02-17 2014-05-21 富士フイルム株式会社 微細構造体の製造方法および微細構造体
JP5613917B2 (ja) * 2009-05-26 2014-10-29 岡山県 マグネシウム又はマグネシウム合金からなる成形品の製造方法
JP2015229792A (ja) * 2014-06-05 2015-12-21 オリンパス株式会社 インプラントとその製造方法
JP6403199B2 (ja) * 2014-11-28 2018-10-10 堀金属表面処理工業株式会社 マグネシウム又はマグネシウム合金からなる製品の製造方法
JP6403198B2 (ja) * 2014-11-28 2018-10-10 堀金属表面処理工業株式会社 マグネシウム又はマグネシウム合金からなる製品の製造方法
DE112014007192T5 (de) * 2014-12-25 2017-08-24 Olympus Corporation Osteosynthetisches Implantat und Herstellungsverfahren hierfür
CN106757278A (zh) * 2017-01-17 2017-05-31 北京科技大学 一种用于航天器的镁合金表面热控膜层的制备方法
KR20210031685A (ko) * 2018-07-11 2021-03-22 넥스트 이노베이션 고도가이샤 절연층 형성 방법, 절연층을 가지는 부재, 저항 측정 방법 및 접합형 정류 소자
TW202142744A (zh) * 2020-04-24 2021-11-16 紐西蘭商西洛斯材料科學有限公司 在鎂上形成官能化塗層的方法
CN114375114B (zh) * 2020-10-15 2023-06-02 华为技术有限公司 铝镁双合金系复合体、终端金属壳体及其制造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002235182A (ja) * 2001-02-05 2002-08-23 Taiyo Kagaku Kogyo Kk マグネシウム主体金属成形材及びその製造方法
JP2003166098A (ja) * 2001-11-30 2003-06-13 Kasatani:Kk マグネシウム合金の陽極酸化処理用組成物および処理方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1231299B1 (en) * 1999-08-17 2012-01-18 Isle Coat Limited Light alloy-based composite protective multifunction coating

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002235182A (ja) * 2001-02-05 2002-08-23 Taiyo Kagaku Kogyo Kk マグネシウム主体金属成形材及びその製造方法
JP2003166098A (ja) * 2001-11-30 2003-06-13 Kasatani:Kk マグネシウム合金の陽極酸化処理用組成物および処理方法

Also Published As

Publication number Publication date
WO2005017235A1 (ja) 2005-02-24
CN1871377A (zh) 2006-11-29
JPWO2005017235A1 (ja) 2007-11-01
KR20060073941A (ko) 2006-06-29

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