JP4611287B2 - 脂環式オキセタン化合物の製造方法 - Google Patents
脂環式オキセタン化合物の製造方法 Download PDFInfo
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- JP4611287B2 JP4611287B2 JP2006510193A JP2006510193A JP4611287B2 JP 4611287 B2 JP4611287 B2 JP 4611287B2 JP 2006510193 A JP2006510193 A JP 2006510193A JP 2006510193 A JP2006510193 A JP 2006510193A JP 4611287 B2 JP4611287 B2 JP 4611287B2
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- oxetane compound
- general formula
- alicyclic
- oxetane
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- -1 alicyclic oxetane compound Chemical class 0.000 title claims description 38
- 238000004519 manufacturing process Methods 0.000 title claims description 22
- 238000005984 hydrogenation reaction Methods 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 16
- 239000003054 catalyst Substances 0.000 claims description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 9
- 125000003566 oxetanyl group Chemical group 0.000 claims description 7
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 6
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 claims description 6
- 125000002723 alicyclic group Chemical group 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- 125000000654 isopropylidene group Chemical group C(C)(C)=* 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052762 osmium Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 description 22
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 13
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical group C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000004817 gas chromatography Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 0 *(C1CCCCC1)C1CCCCC1 Chemical compound *(C1CCCCC1)C1CCCCC1 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical group C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000001334 alicyclic compounds Chemical class 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 125000000062 cyclohexylmethoxy group Chemical group [H]C([H])(O*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- UNMJLQGKEDTEKJ-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methanol Chemical compound CCC1(CO)COC1 UNMJLQGKEDTEKJ-UHFFFAOYSA-N 0.000 description 1
- ILOBCCAMDOHZGW-UHFFFAOYSA-N 1,2-bis(chloromethyl)naphthalene Chemical compound C1=CC=CC2=C(CCl)C(CCl)=CC=C21 ILOBCCAMDOHZGW-UHFFFAOYSA-N 0.000 description 1
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 1
- PMIHHEJEQAQZET-UHFFFAOYSA-N 1,4-bis(chloromethyl)naphthalene Chemical compound C1=CC=C2C(CCl)=CC=C(CCl)C2=C1 PMIHHEJEQAQZET-UHFFFAOYSA-N 0.000 description 1
- HJTAZXHBEBIQQX-UHFFFAOYSA-N 1,5-bis(chloromethyl)naphthalene Chemical compound C1=CC=C2C(CCl)=CC=CC2=C1CCl HJTAZXHBEBIQQX-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- HDLOIGXXLIZACE-UHFFFAOYSA-N 3-[[8a-[(3-ethyloxetan-3-yl)methoxymethyl]-1,2,3,4,5,6,7,8-octahydronaphthalen-4a-yl]methoxymethyl]-3-ethyloxetane Chemical compound C(C)C1(COC1)COCC12CCCCC2(CCCC1)COCC1(COC1)CC HDLOIGXXLIZACE-UHFFFAOYSA-N 0.000 description 1
- DQMRIMNCVMLZGX-UHFFFAOYSA-N 3-ethyl-3-[[1-[(3-ethyloxetan-3-yl)methoxymethyl]naphthalen-2-yl]methoxymethyl]oxetane Chemical compound C=1C=C2C=CC=CC2=C(COCC2(CC)COC2)C=1COCC1(CC)COC1 DQMRIMNCVMLZGX-UHFFFAOYSA-N 0.000 description 1
- SNMPPPJCFKFWHP-UHFFFAOYSA-N 3-ethyl-3-[[4-[4-[(3-ethyloxetan-3-yl)methoxymethyl]cyclohexyl]cyclohexyl]methoxymethyl]oxetane Chemical group C1CC(C2CCC(COCC3(CC)COC3)CC2)CCC1COCC1(CC)COC1 SNMPPPJCFKFWHP-UHFFFAOYSA-N 0.000 description 1
- DCOXQQBTTNZJBI-UHFFFAOYSA-N 3-ethyl-3-[[4-[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]phenyl]methoxymethyl]oxetane Chemical group C=1C=C(C=2C=CC(COCC3(CC)COC3)=CC=2)C=CC=1COCC1(CC)COC1 DCOXQQBTTNZJBI-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical class OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- FGUUNXDRMVKHCF-UHFFFAOYSA-N bis(hydroxymethyl)tricyclo[5.2.1.0(2,6)]decane Chemical class C12CCCC2(CO)C2(CO)CC1CC2 FGUUNXDRMVKHCF-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical class CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 description 1
- 239000005548 dental material Substances 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000000434 field desorption mass spectrometry Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 150000002921 oxetanes Chemical class 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D305/00—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms
- C07D305/02—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings
- C07D305/04—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D305/06—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/42—Platinum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/44—Palladium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/46—Ruthenium, rhodium, osmium or iridium
- B01J23/462—Ruthenium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/46—Ruthenium, rhodium, osmium or iridium
- B01J23/464—Rhodium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/46—Ruthenium, rhodium, osmium or iridium
- B01J23/466—Osmium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/46—Ruthenium, rhodium, osmium or iridium
- B01J23/468—Iridium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/74—Iron group metals
- B01J23/75—Cobalt
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/74—Iron group metals
- B01J23/755—Nickel
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D407/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00
- C07D407/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings
- C07D407/08—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings linked by a carbon chain containing alicyclic rings
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Epoxy Compounds (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
本発明の製造方法で使用する出発原料は、一般式(1)で表される芳香族オキセタン化合物である。本発明の製造方法で得られる化合物は、一般式(2)で表される脂環式オキセタン化合物である
内容積200mlの電磁攪拌式オートクレーブに、4,4'−ビス[(3−エチル-オキセタン-3-イル)メトキシメチル]ビフェニル(宇部興産社製 ETERNACOLL OXBP 、(純度94.6%)に反応阻害物質除去のための前処理を施したもの)40g、溶媒として酢酸エチル60g、5%Ru―カーボン担持触媒(エヌ・イー ケムキャット社製、粉末)0.2gを入れ、密閉後、オートクレーブ内を窒素ガスで3回、水素ガスで3回置換し、水素ガスで6MPaまで昇圧した。攪拌を行いながら昇温し、内温140℃、内圧6MPaを保ちながら水素化反応を行い、水素吸収が認められなくなってから1時間後に攪拌を停止した。昇温開始から反応停止までに要した時間は約6時間であった。冷却後、反応液を抜き出し、ガスクロマトグラフィーで分析したところ、得られた化合物の純度は87.3%、うち、トランス−トランス体45.8%、トランス−シス体35.1%、シス−シス体6.4%であった。触媒を濾別後、溶媒及び分解副生物を減圧加熱下で溜去し、純度94.7%の無色透明な粘稠液体を得た。この粘稠液体の粘度(25℃)は1.4Pa・sであった。各種機器分析の結果を以下に示す。
13C−NMR(CDCl3溶媒、溶媒基準(77ppm)):δ(ppm);8.2(CH3−CH2)、25.7〜26.2(CH2(シクロヘキサン環))、26.4&26.8(CH3−CH2)、(CH2(シクロヘキサン環))、29.5〜30.2(CH2(シクロヘキサン環))、34.6〜41.6(CH(シクロヘキサン環))、43.5(C)、73.6(O−CH2−C(オキセタン環))、74.3&74.6(シクロヘキシル−CH2−O)、78.6(O−CH2−C(オキセタン環))。
FT−IR(キャストフィルム法):829、981cm−1(環状エーテル)、1110cm−1(鎖状エーテル)。
5%Ru‐アルミナ担持触媒(エヌ・イー ケムキャット社製;粉末)を用いた以外は実施例1と同様に反応を行った。昇温開始から反応停止までに要した時間は約6時間であった。反応液をガスクロマトグラフィーで分析したところ、得られた化合物の純度は88.1%、うち、トランス−トランス体44.6%、トランス−シス体36.5%、シス−シス体7.0%であった。
温度計、冷却器、攪拌装置及び滴下漏斗を備えた300mlの三つ口丸底フラスコに、純度98.5%の3-エチル-3-ヒドロキシメチルオキセタン12.8g(0.11mol)、純度97%のNaOH粉末4.5g(0.11mol)及びトルエン25mlを加え、90℃で30分間加熱攪拌した。これに、1,4-ビス(クロロメチル)ナフタレン45.5%、1,5-ビス(クロロメチル)ナフタレン53.4%からなるビス(クロロメチル)ナフタレン混合物11.5g(0.05mol)をトルエン175mlに溶解した液を、滴下漏斗から30分間かけて滴下した。更に90℃で10時間反応を続けた。反応終了後、反応混合物を室温まで冷却して析出物を濾別した。この濾液と析出物をトルエン20mlで2回洗浄して得られた洗浄液を一緒にして100mlの水で3回洗浄した。その油相を分離し、硫酸ナトリウムを加えて乾燥後、トルエンを減圧下で留去すると、淡黄色の結晶15.3gが得られた。ガスクロマトグラフィーで分析した結果、得られた化合物のビスオキセタン化合物としての純度は86.2%であり、収率は68.6%であった。この結晶10.0gをトルエン10.0gに加熱溶解し、室温まで冷却し、再結晶により精製した。結晶を濾別後、減圧乾燥すると、単黄色の結晶2.3gが得られた。ビスオキセタン化合物としての純度は95.6%(1,4-体:1,5-体=28:72)であった。
こうして得られたビス[(3−エチルオキセタン-3-イル)メトキシメチル]ナフタレン(1,4-体と1,5-体の混合物)2.0g、溶媒として酢酸エチル48gを用い、内圧10MPaとした以外は実施例2と同様に水素化反応を行った。昇温開始から反応停止までに要した時間は約12時間であった。反応液をガスクロマトグラフィーで分析したところ、ビス[(3−エチルオキセタン-3-イル)メトキシメチル]デカヒドロナフタレン(異性体混合物)の純度は75.5%であった。
Claims (3)
- 下記一般式(1)で表される少なくとも2つのオキセタン環を有する芳香族オキセタン化合物の芳香族環を核水素化することを特徴とする下記一般式(2)で表される脂環式オキセタン化合物の製造方法。
- 核水素化を、Ni、Co、Ru、Rh、Pd、Os、Ir及びPtからなる群から選ばれる少なくとも1種の金属を含有する触媒の存在下、1MPa(ゲージ圧)以上の水素ガスを存在させて、50〜250℃で行う請求項1又は2に記載のオキセタン化合物の製造方法。
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06329569A (ja) * | 1992-06-02 | 1994-11-29 | New Japan Chem Co Ltd | 水素化ビスフェノール類の製造方法 |
JPH10204002A (ja) * | 1997-01-20 | 1998-08-04 | Dainippon Ink & Chem Inc | 置換芳香族化合物の核水素化方法 |
JPH11106380A (ja) * | 1997-09-30 | 1999-04-20 | Ube Ind Ltd | オキセタン環を有するビフェニル誘導体 |
JPH11335314A (ja) * | 1998-03-23 | 1999-12-07 | Mitsui Chem Inc | アルキルシクロヘキサノ―ルアルキレンオキサイド付加物の製造方法 |
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US5463084A (en) * | 1992-02-18 | 1995-10-31 | Rensselaer Polytechnic Institute | Photocurable silicone oxetanes |
US6437194B2 (en) * | 1998-03-23 | 2002-08-20 | Mitsui Chemicals, Inc. | Process for preparing an alkylcyclohexanol alkylene oxide adduct |
JP3800858B2 (ja) * | 1999-04-26 | 2006-07-26 | 宇部興産株式会社 | ビスオキセタンエーテル化合物類の製造方法 |
JP2001031664A (ja) | 1999-07-15 | 2001-02-06 | Toagosei Co Ltd | オキセタン環を有するナフタレン誘導体 |
JP3775465B2 (ja) | 1999-07-15 | 2006-05-17 | 東亞合成株式会社 | オキセタン環を有するビフェニル誘導体 |
JP4380043B2 (ja) | 2000-09-06 | 2009-12-09 | 東亞合成株式会社 | オキセタン環を有するメチレンビスフェノール誘導体混合物 |
JP2002322268A (ja) | 2001-04-27 | 2002-11-08 | Toagosei Co Ltd | 多官能オキセタン化合物と環状カルボン酸無水物からなるオキセタン樹脂の製造方法 |
JP2003055359A (ja) | 2001-08-07 | 2003-02-26 | Toagosei Co Ltd | オキセタン環を有するビス(ヒドロキシメチル)−トリシクロ[5.2.1.02,6]デカン誘導体の製造方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06329569A (ja) * | 1992-06-02 | 1994-11-29 | New Japan Chem Co Ltd | 水素化ビスフェノール類の製造方法 |
JPH10204002A (ja) * | 1997-01-20 | 1998-08-04 | Dainippon Ink & Chem Inc | 置換芳香族化合物の核水素化方法 |
JPH11106380A (ja) * | 1997-09-30 | 1999-04-20 | Ube Ind Ltd | オキセタン環を有するビフェニル誘導体 |
JPH11335314A (ja) * | 1998-03-23 | 1999-12-07 | Mitsui Chem Inc | アルキルシクロヘキサノ―ルアルキレンオキサイド付加物の製造方法 |
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