JP4552859B2 - 表面検査装置および表面検査方法 - Google Patents

表面検査装置および表面検査方法 Download PDF

Info

Publication number
JP4552859B2
JP4552859B2 JP2005515018A JP2005515018A JP4552859B2 JP 4552859 B2 JP4552859 B2 JP 4552859B2 JP 2005515018 A JP2005515018 A JP 2005515018A JP 2005515018 A JP2005515018 A JP 2005515018A JP 4552859 B2 JP4552859 B2 JP 4552859B2
Authority
JP
Japan
Prior art keywords
polarized light
linearly polarized
repeating
pattern
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2005515018A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2005040776A1 (ja
Inventor
和彦 深澤
宏一郎 小松
健雄 大森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JPWO2005040776A1 publication Critical patent/JPWO2005040776A1/ja
Application granted granted Critical
Publication of JP4552859B2 publication Critical patent/JP4552859B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • H10P74/00—
    • H10P74/203—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2005515018A 2003-10-27 2004-10-27 表面検査装置および表面検査方法 Expired - Lifetime JP4552859B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003366255 2003-10-27
JP2003366255 2003-10-27
PCT/JP2004/015925 WO2005040776A1 (ja) 2003-10-27 2004-10-27 表面検査装置および表面検査方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010117405A Division JP2010256359A (ja) 2003-10-27 2010-05-21 表面検査装置および表面検査方法

Publications (2)

Publication Number Publication Date
JPWO2005040776A1 JPWO2005040776A1 (ja) 2007-11-22
JP4552859B2 true JP4552859B2 (ja) 2010-09-29

Family

ID=34510228

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2005515018A Expired - Lifetime JP4552859B2 (ja) 2003-10-27 2004-10-27 表面検査装置および表面検査方法
JP2010117405A Pending JP2010256359A (ja) 2003-10-27 2010-05-21 表面検査装置および表面検査方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2010117405A Pending JP2010256359A (ja) 2003-10-27 2010-05-21 表面検査装置および表面検査方法

Country Status (5)

Country Link
US (4) US7298471B2 (enExample)
JP (2) JP4552859B2 (enExample)
KR (2) KR101346492B1 (enExample)
TW (1) TW200519373A (enExample)
WO (1) WO2005040776A1 (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005064322A1 (ja) * 2003-12-26 2005-07-14 Nikon Corporation 欠陥検査装置および欠陥検査方法
JP4802481B2 (ja) * 2004-11-09 2011-10-26 株式会社ニコン 表面検査装置および表面検査方法および露光システム
US20060099344A1 (en) 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material
US20080246966A1 (en) * 2005-12-14 2008-10-09 Nikon Corporation Surface-Inspecting Apparatus and Surface-Inspecting Method
JP2007192780A (ja) * 2006-01-23 2007-08-02 Ono Sokki Co Ltd 空間フィルタ方式の速度検出装置及び空間フィルタ方式の速度検出装置の速度検出方法
JP4635939B2 (ja) * 2006-03-30 2011-02-23 株式会社ニコン 表面検査装置
JP4605089B2 (ja) * 2006-05-10 2011-01-05 株式会社ニコン 表面検査装置
JP4548385B2 (ja) 2006-05-10 2010-09-22 株式会社ニコン 表面検査装置
JP4622933B2 (ja) * 2006-05-15 2011-02-02 株式会社ニコン 表面検査方法及び表面検査装置
JP4595881B2 (ja) * 2006-05-15 2010-12-08 株式会社ニコン 表面検査装置
JP4506723B2 (ja) * 2006-05-22 2010-07-21 株式会社ニコン 表面検査装置
JP4692892B2 (ja) * 2006-06-01 2011-06-01 株式会社ニコン 表面検査装置
JP4552202B2 (ja) * 2006-06-06 2010-09-29 株式会社ニコン 表面検査装置
KR101382020B1 (ko) * 2006-07-14 2014-04-04 가부시키가이샤 니콘 표면 검사 장치
JP5022648B2 (ja) * 2006-08-11 2012-09-12 東京エレクトロン株式会社 欠陥検査方法および欠陥検査装置
JP4910637B2 (ja) * 2006-10-31 2012-04-04 凸版印刷株式会社 基板検査装置及び基板検査方法
JP5024935B2 (ja) * 2007-01-16 2012-09-12 富士フイルム株式会社 光透過性部材の欠陥検出装置及び方法
WO2008105460A1 (ja) * 2007-02-28 2008-09-04 Nikon Corporation 観察方法、検査装置および検査方法
JP2008249386A (ja) * 2007-03-29 2008-10-16 Dainippon Screen Mfg Co Ltd 欠陥検査装置および欠陥検査方法
US7990546B2 (en) * 2007-07-16 2011-08-02 Applied Materials Israel, Ltd. High throughput across-wafer-variation mapping
WO2009048003A1 (ja) * 2007-10-12 2009-04-16 Nikon Corporation 表面検査装置
US8724882B2 (en) * 2008-07-29 2014-05-13 Applied Materials Israel, Ltd. Mapping variations of a surface
US8040510B2 (en) * 2008-08-22 2011-10-18 Novasolar Holdings Limited Spatially precise optical treatment or measurement of targets through intervening birefringent layers
WO2010138764A2 (en) * 2009-05-29 2010-12-02 Applied Materials, Inc. Substrate side marking and identification
KR101493133B1 (ko) * 2009-07-01 2015-02-12 가부시키가이샤 니콘 노광 상태 평가 방법 및 노광 상태 평가 장치
KR20120045774A (ko) * 2010-11-01 2012-05-09 삼성전자주식회사 웨이퍼 검사 방법
US10460998B2 (en) 2010-11-09 2019-10-29 Nikon Corporation Method for inspecting substrate, substrate inspection apparatus, exposure system, and method for producing semiconductor device
FR2994734B1 (fr) * 2012-08-21 2017-08-25 Fogale Nanotech Dispositif et procede pour faire des mesures dimensionnelles sur des objets multi-couches tels que des wafers.
US9485491B2 (en) * 2014-12-15 2016-11-01 Test Research, Inc. Optical system
US10594835B2 (en) 2015-06-05 2020-03-17 Apple Inc. Efficient context monitoring

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53106082A (en) * 1977-02-28 1978-09-14 Nippon Bunko Kogyo Kk Fluorescent polarization measuring device
JPS6219739A (ja) * 1985-07-19 1987-01-28 Hitachi Ltd 検査方法および装置
JPH01117024A (ja) * 1987-10-30 1989-05-09 Hitachi Ltd 異物検出方法及び装置
JPH0212002A (ja) * 1988-06-30 1990-01-17 Fujitsu Ltd パターン検査方法およびパターン検査装置
JPH063278A (ja) * 1992-06-17 1994-01-11 Olympus Optical Co Ltd 基板外観検査装置
JPH07128595A (ja) * 1993-10-28 1995-05-19 Prometrix Corp 光学顕微鏡を用いて緻密なライン幅構造を映像化する方法及び装置
JPH11295231A (ja) * 1998-04-07 1999-10-29 Advantest Corp 表面検査装置および方法
JP2000155099A (ja) * 1998-09-18 2000-06-06 Hitachi Ltd 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
JP2002116011A (ja) * 2000-10-05 2002-04-19 Toshiba Corp パターン評価装置及びパターン評価方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6270738A (ja) * 1985-09-25 1987-04-01 Hitachi Electronics Eng Co Ltd 異物検出方法
JPH01107139A (ja) * 1987-10-20 1989-04-25 Fujitsu Ltd パターン検知装置
US5046847A (en) 1987-10-30 1991-09-10 Hitachi Ltd. Method for detecting foreign matter and device for realizing same
JP3150203B2 (ja) * 1992-07-13 2001-03-26 株式会社日立製作所 パターン検出方法とその装置
US5432607A (en) * 1993-02-22 1995-07-11 International Business Machines Corporation Method and apparatus for inspecting patterned thin films using diffracted beam ellipsometry
JPH07120234A (ja) 1993-10-27 1995-05-12 Fujitsu Ltd 外観検査方法及び装置
JP3388285B2 (ja) * 1993-12-27 2003-03-17 株式会社ニュークリエイション 検査装置
US5777744A (en) 1995-05-16 1998-07-07 Canon Kabushiki Kaisha Exposure state detecting system and exposure apparatus using the same
US5835220A (en) * 1995-10-27 1998-11-10 Nkk Corporation Method and apparatus for detecting surface flaws
US6594012B2 (en) 1996-07-05 2003-07-15 Canon Kabushiki Kaisha Exposure apparatus
JP3692685B2 (ja) 1997-02-19 2005-09-07 株式会社ニコン 欠陥検査装置
US6034776A (en) * 1997-04-16 2000-03-07 The United States Of America As Represented By The Secretary Of Commerce Microroughness-blind optical scattering instrument
DE19914994A1 (de) 1998-04-03 1999-10-14 Advantest Corp Verfahren und Vorrichtung zur Oberflächenprüfung
US6690469B1 (en) 1998-09-18 2004-02-10 Hitachi, Ltd. Method and apparatus for observing and inspecting defects
JP4469047B2 (ja) * 2000-01-27 2010-05-26 株式会社日立ハイテクノロジーズ 表面検査装置
JP3425923B2 (ja) * 2000-03-27 2003-07-14 Ｎｅｃエレクトロニクス株式会社 異方性多層薄膜構造体の評価法及び評価装置
JP3858571B2 (ja) 2000-07-27 2006-12-13 株式会社日立製作所 パターン欠陥検査方法及びその装置
KR100856357B1 (ko) 2000-09-13 2008-09-04 가부시키가이샤 니콘 표면검사장치 및 표면검사방법
JP4591802B2 (ja) 2000-09-13 2010-12-01 株式会社ニコン 表面検査装置および方法
JP4662194B2 (ja) * 2001-06-22 2011-03-30 株式会社ニコン 検査装置
US6768543B1 (en) * 2001-11-01 2004-07-27 Arun Ananth Aiyer Wafer inspection apparatus with unique illumination methodology and method of operation
US7006224B2 (en) * 2002-12-30 2006-02-28 Applied Materials, Israel, Ltd. Method and system for optical inspection of an object

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53106082A (en) * 1977-02-28 1978-09-14 Nippon Bunko Kogyo Kk Fluorescent polarization measuring device
JPS6219739A (ja) * 1985-07-19 1987-01-28 Hitachi Ltd 検査方法および装置
JPH01117024A (ja) * 1987-10-30 1989-05-09 Hitachi Ltd 異物検出方法及び装置
JPH0212002A (ja) * 1988-06-30 1990-01-17 Fujitsu Ltd パターン検査方法およびパターン検査装置
JPH063278A (ja) * 1992-06-17 1994-01-11 Olympus Optical Co Ltd 基板外観検査装置
JPH07128595A (ja) * 1993-10-28 1995-05-19 Prometrix Corp 光学顕微鏡を用いて緻密なライン幅構造を映像化する方法及び装置
JPH11295231A (ja) * 1998-04-07 1999-10-29 Advantest Corp 表面検査装置および方法
JP2000155099A (ja) * 1998-09-18 2000-06-06 Hitachi Ltd 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
JP2002116011A (ja) * 2000-10-05 2002-04-19 Toshiba Corp パターン評価装置及びパターン評価方法

Also Published As

Publication number Publication date
US8687182B2 (en) 2014-04-01
JPWO2005040776A1 (ja) 2007-11-22
US7298471B2 (en) 2007-11-20
KR101346492B1 (ko) 2013-12-31
KR101151077B1 (ko) 2012-06-01
US20080094628A1 (en) 2008-04-24
US20130100448A1 (en) 2013-04-25
TW200519373A (en) 2005-06-16
US20100225906A1 (en) 2010-09-09
TWI355488B (enExample) 2012-01-01
KR20120031239A (ko) 2012-03-30
US20060192953A1 (en) 2006-08-31
JP2010256359A (ja) 2010-11-11
KR20060120145A (ko) 2006-11-24
WO2005040776A1 (ja) 2005-05-06
US8441627B2 (en) 2013-05-14
US7834993B2 (en) 2010-11-16

Similar Documents

Publication Publication Date Title
JP4552859B2 (ja) 表面検査装置および表面検査方法
JP5201350B2 (ja) 表面検査装置
TWI449898B (zh) Observation device, inspection device and inspection method
JP2006135211A (ja) 表面検査装置および表面検査方法および露光システム
US20100182603A1 (en) Surface Inspection Device
WO2007069457A1 (ja) 表面検査装置および表面検査方法
JP4462232B2 (ja) 表面検査装置
JP4506723B2 (ja) 表面検査装置
JP4696607B2 (ja) 表面検査装置
JP4605089B2 (ja) 表面検査装置
JP4552202B2 (ja) 表面検査装置
JP4635939B2 (ja) 表面検査装置
JP4462222B2 (ja) 表面検査装置
JP2008281502A (ja) 表面検査装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071005

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100323

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100521

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100622

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100705

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130723

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4552859

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130723

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term