TWI355488B - - Google Patents

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Publication number
TWI355488B
TWI355488B TW093132843A TW93132843A TWI355488B TW I355488 B TWI355488 B TW I355488B TW 093132843 A TW093132843 A TW 093132843A TW 93132843 A TW93132843 A TW 93132843A TW I355488 B TWI355488 B TW I355488B
Authority
TW
Taiwan
Prior art keywords
repeating pattern
repeating
light
polarized light
linearly polarized
Prior art date
Application number
TW093132843A
Other languages
English (en)
Chinese (zh)
Other versions
TW200519373A (en
Inventor
Kazuhiko Fukazawa
Komatsu Koichiro
Oomori Tekeo
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200519373A publication Critical patent/TW200519373A/zh
Application granted granted Critical
Publication of TWI355488B publication Critical patent/TWI355488B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW093132843A 2003-10-27 2004-10-27 Surface inspection device and method TW200519373A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003366255 2003-10-27

Publications (2)

Publication Number Publication Date
TW200519373A TW200519373A (en) 2005-06-16
TWI355488B true TWI355488B (enExample) 2012-01-01

Family

ID=34510228

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093132843A TW200519373A (en) 2003-10-27 2004-10-27 Surface inspection device and method

Country Status (5)

Country Link
US (4) US7298471B2 (enExample)
JP (2) JP4552859B2 (enExample)
KR (2) KR101346492B1 (enExample)
TW (1) TW200519373A (enExample)
WO (1) WO2005040776A1 (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
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TW200525141A (en) * 2003-12-26 2005-08-01 Nikon Corp Defect inspection device and defect inspection method
JP4802481B2 (ja) * 2004-11-09 2011-10-26 株式会社ニコン 表面検査装置および表面検査方法および露光システム
US20060099344A1 (en) 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material
JPWO2007069457A1 (ja) * 2005-12-14 2009-05-21 株式会社ニコン 表面検査装置および表面検査方法
JP2007192780A (ja) * 2006-01-23 2007-08-02 Ono Sokki Co Ltd 空間フィルタ方式の速度検出装置及び空間フィルタ方式の速度検出装置の速度検出方法
JP4635939B2 (ja) * 2006-03-30 2011-02-23 株式会社ニコン 表面検査装置
JP4605089B2 (ja) * 2006-05-10 2011-01-05 株式会社ニコン 表面検査装置
JP4548385B2 (ja) 2006-05-10 2010-09-22 株式会社ニコン 表面検査装置
JP4595881B2 (ja) * 2006-05-15 2010-12-08 株式会社ニコン 表面検査装置
JP4622933B2 (ja) * 2006-05-15 2011-02-02 株式会社ニコン 表面検査方法及び表面検査装置
JP4506723B2 (ja) * 2006-05-22 2010-07-21 株式会社ニコン 表面検査装置
JP4692892B2 (ja) * 2006-06-01 2011-06-01 株式会社ニコン 表面検査装置
JP4552202B2 (ja) * 2006-06-06 2010-09-29 株式会社ニコン 表面検査装置
KR101382020B1 (ko) 2006-07-14 2014-04-04 가부시키가이샤 니콘 표면 검사 장치
JP5022648B2 (ja) * 2006-08-11 2012-09-12 東京エレクトロン株式会社 欠陥検査方法および欠陥検査装置
JP4910637B2 (ja) * 2006-10-31 2012-04-04 凸版印刷株式会社 基板検査装置及び基板検査方法
JP5024935B2 (ja) * 2007-01-16 2012-09-12 富士フイルム株式会社 光透過性部材の欠陥検出装置及び方法
JPWO2008105460A1 (ja) * 2007-02-28 2010-06-03 株式会社ニコン 観察方法、検査装置および検査方法
JP2008249386A (ja) * 2007-03-29 2008-10-16 Dainippon Screen Mfg Co Ltd 欠陥検査装置および欠陥検査方法
US7990546B2 (en) * 2007-07-16 2011-08-02 Applied Materials Israel, Ltd. High throughput across-wafer-variation mapping
JP5370155B2 (ja) * 2007-10-12 2013-12-18 株式会社ニコン 表面検査装置及び表面検査方法
WO2010013232A1 (en) * 2008-07-29 2010-02-04 Applied Materials Israel Ltd. Mapping variations of a surface
US8040510B2 (en) * 2008-08-22 2011-10-18 Novasolar Holdings Limited Spatially precise optical treatment or measurement of targets through intervening birefringent layers
WO2010138764A2 (en) * 2009-05-29 2010-12-02 Applied Materials, Inc. Substrate side marking and identification
EP2738609A3 (en) * 2009-07-01 2018-01-17 Nikon Corporation Exposure condition determining method and surface inspection apparatus
KR20120045774A (ko) * 2010-11-01 2012-05-09 삼성전자주식회사 웨이퍼 검사 방법
US10460998B2 (en) 2010-11-09 2019-10-29 Nikon Corporation Method for inspecting substrate, substrate inspection apparatus, exposure system, and method for producing semiconductor device
FR2994734B1 (fr) * 2012-08-21 2017-08-25 Fogale Nanotech Dispositif et procede pour faire des mesures dimensionnelles sur des objets multi-couches tels que des wafers.
US9485491B2 (en) * 2014-12-15 2016-11-01 Test Research, Inc. Optical system
US10491708B2 (en) 2015-06-05 2019-11-26 Apple Inc. Context notifications

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JPH0743322B2 (ja) * 1985-07-19 1995-05-15 株式会社日立製作所 検査方法および装置
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JPH01107139A (ja) * 1987-10-20 1989-04-25 Fujitsu Ltd パターン検知装置
JPH0786465B2 (ja) * 1987-10-30 1995-09-20 株式会社日立製作所 異物検出方法及び装置
US5046847A (en) 1987-10-30 1991-09-10 Hitachi Ltd. Method for detecting foreign matter and device for realizing same
JPH0212002A (ja) * 1988-06-30 1990-01-17 Fujitsu Ltd パターン検査方法およびパターン検査装置
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US5432607A (en) 1993-02-22 1995-07-11 International Business Machines Corporation Method and apparatus for inspecting patterned thin films using diffracted beam ellipsometry
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JP3610837B2 (ja) * 1998-09-18 2005-01-19 株式会社日立製作所 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
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JP3858571B2 (ja) 2000-07-27 2006-12-13 株式会社日立製作所 パターン欠陥検査方法及びその装置
JP4591802B2 (ja) * 2000-09-13 2010-12-01 株式会社ニコン 表面検査装置および方法
KR100856357B1 (ko) 2000-09-13 2008-09-04 가부시키가이샤 니콘 표면검사장치 및 표면검사방법
JP4153652B2 (ja) * 2000-10-05 2008-09-24 株式会社東芝 パターン評価装置及びパターン評価方法
JP4662194B2 (ja) * 2001-06-22 2011-03-30 株式会社ニコン 検査装置
US6768543B1 (en) * 2001-11-01 2004-07-27 Arun Ananth Aiyer Wafer inspection apparatus with unique illumination methodology and method of operation
US7006224B2 (en) * 2002-12-30 2006-02-28 Applied Materials, Israel, Ltd. Method and system for optical inspection of an object

Also Published As

Publication number Publication date
JPWO2005040776A1 (ja) 2007-11-22
KR101151077B1 (ko) 2012-06-01
TW200519373A (en) 2005-06-16
US7834993B2 (en) 2010-11-16
WO2005040776A1 (ja) 2005-05-06
US8441627B2 (en) 2013-05-14
JP2010256359A (ja) 2010-11-11
US20130100448A1 (en) 2013-04-25
US20080094628A1 (en) 2008-04-24
KR101346492B1 (ko) 2013-12-31
KR20060120145A (ko) 2006-11-24
US20100225906A1 (en) 2010-09-09
US7298471B2 (en) 2007-11-20
KR20120031239A (ko) 2012-03-30
US8687182B2 (en) 2014-04-01
JP4552859B2 (ja) 2010-09-29
US20060192953A1 (en) 2006-08-31

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