JP4692892B2 - 表面検査装置 - Google Patents
表面検査装置 Download PDFInfo
- Publication number
- JP4692892B2 JP4692892B2 JP2006153724A JP2006153724A JP4692892B2 JP 4692892 B2 JP4692892 B2 JP 4692892B2 JP 2006153724 A JP2006153724 A JP 2006153724A JP 2006153724 A JP2006153724 A JP 2006153724A JP 4692892 B2 JP4692892 B2 JP 4692892B2
- Authority
- JP
- Japan
- Prior art keywords
- polarized light
- linearly polarized
- image
- test substrate
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9513—Liquid crystal panels
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Description
た被検基板の表面の画像の輝度の変化に基づいて繰り返しパターンの欠陥を検出するように構成される。
回転を受けない光の光量=cos2(θ) …(2)
=(cos45°・cosφ−sin45°・sinφ)2−cos245°
=1/2(cosφ−sinφ)2−1/2
=1/2(cos2φ−2cosφ・sinφ+sin2φ)−1/2
=−cosφ・sinφ …(5)
10 ウェハ(被検基板) 12 繰り返しパターン
20 アライメントステージ(保持手段) 30 照明光学系(照明手段)
40 撮像光学系 43 第2偏光板(偏光素子)
44 撮像カメラ(撮像手段)
50 画像処理装置 51 画像記憶部
52 画像処理部(画像処理手段) 53 画像出力部(画像出力手段)
70 表面検査装置(第1の変形例) 71 顕微鏡用アライメントステージ
72 偏光顕微鏡(偏光素子) 73 顕微鏡用撮像カメラ(撮像手段)
90 表面検査装置(第2の変形例) 91 画像表示部(画像表示手段)
L1 直線偏光(第1の直線偏光) L2 楕円偏光
L3 偏光成分 L4 直線偏光(第2の直線偏光)
Claims (3)
- 設計値としてのピッチが既知である繰り返しパターンが表面に形成された被検基板の表面を検査するための表面検査装置であって、
前記繰り返しパターンで回折光が発生しない程度の波長の第1の直線偏光を前記被検基板の表面に照射する照明手段と、
前記被検基板の表面からの反射光を受光して前記被検基板の表面の像を撮像する撮像手段と、
前記撮像手段により撮像された前記被検基板の表面の画像を表示する画像表示手段とを備え、
前記被検基板と前記撮像手段との間に、前記被検基板の表面からの反射光を透過させて第2の直線偏光にする偏光素子が配設され、前記第2の直線偏光による前記被検基板の表面の像を前記撮像手段が撮像するように構成されており、
前記第2の直線偏光の進行方向と垂直な面内における前記第2の直線偏光の振動方向が前記第1の直線偏光の進行方向と垂直な面内における前記第1の直線偏光の振動方向に対して約45度傾斜するように前記偏光素子が設定され、
前記画像表示手段に表示された前記被検基板の表面の画像の輝度の変化に基づいて前記繰り返しパターンの欠陥を検出するように構成されたことを特徴とする表面検査装置。 - 設計値としてのピッチが既知である繰り返しパターンが表面に形成された被検基板の表面を検査するための表面検査装置であって、
前記繰り返しパターンで回折光が発生しない程度の波長の第1の直線偏光を前記被検基板の表面に照射する照明手段と、
前記被検基板の表面からの反射光を受光して前記被検基板の表面の像を撮像する撮像手段と、
前記撮像手段により撮像された前記被検基板の表面の画像の輝度に基づいて前記被検基板に形成された前記繰り返しパターンの欠陥を検出する画像処理手段と、
前記画像処理手段による前記画像処理の結果を出力する画像出力手段とを備え、
前記被検基板と前記撮像手段との間に、前記被検基板の表面からの反射光を透過させて第2の直線偏光にする偏光素子が配設され、前記第2の直線偏光による前記被検基板の表面の像を前記撮像手段が撮像するように構成されており、
前記第2の直線偏光の進行方向と垂直な面内における前記第2の直線偏光の振動方向が前記第1の直線偏光の進行方向と垂直な面内における前記第1の直線偏光の振動方向に対して約45度傾斜するように前記偏光素子が設定され、
前記画像処理手段において、前記撮像手段により撮像された前記被検基板の表面の画像の輝度の変化に基づいて前記繰り返しパターンの欠陥を検出するように構成されたことを特徴とする表面検査装置。 - 前記被検基板の表面における前記第1の直線偏光の進行方向と前記繰り返しパターンの繰り返し方向とのなす角度が所定角度となるように前記被検基板を保持する保持手段を備え、
前記保持手段により前記所定角度が約45度に設定されることを特徴とする請求項1または2に記載の表面検査装置。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006153724A JP4692892B2 (ja) | 2006-06-01 | 2006-06-01 | 表面検査装置 |
CN200780020228.5A CN101460833A (zh) | 2006-06-01 | 2007-05-29 | 表面检查设备 |
KR1020087028914A KR20090016458A (ko) | 2006-06-01 | 2007-05-29 | 표면 검사 장치 |
PCT/JP2007/061252 WO2007139225A1 (ja) | 2006-06-01 | 2007-05-29 | 表面検査装置 |
TW096119455A TW200804758A (en) | 2006-06-01 | 2007-05-31 | Surface inspection device |
US12/292,393 US20090079983A1 (en) | 2006-06-01 | 2008-11-18 | Surface inspection device |
US12/749,438 US20100182603A1 (en) | 2006-06-01 | 2010-03-29 | Surface Inspection Device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006153724A JP4692892B2 (ja) | 2006-06-01 | 2006-06-01 | 表面検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007322272A JP2007322272A (ja) | 2007-12-13 |
JP4692892B2 true JP4692892B2 (ja) | 2011-06-01 |
Family
ID=38778737
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006153724A Expired - Fee Related JP4692892B2 (ja) | 2006-06-01 | 2006-06-01 | 表面検査装置 |
Country Status (6)
Country | Link |
---|---|
US (2) | US20090079983A1 (ja) |
JP (1) | JP4692892B2 (ja) |
KR (1) | KR20090016458A (ja) |
CN (1) | CN101460833A (ja) |
TW (1) | TW200804758A (ja) |
WO (1) | WO2007139225A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009099142A1 (ja) * | 2008-02-06 | 2009-08-13 | Nikon Corporation | 表面検査装置および表面検査方法 |
JP5198980B2 (ja) * | 2008-09-02 | 2013-05-15 | 株式会社モリテックス | 光学異方性パラメータ測定方法及び測定装置 |
KR101787765B1 (ko) | 2008-11-10 | 2017-11-15 | 가부시키가이샤 니콘 | 평가 장치 및 평가 방법 |
CN103918059A (zh) * | 2011-11-29 | 2014-07-09 | 株式会社尼康 | 测定装置、测定方法、及半导体元件制造方法 |
US20140340507A1 (en) * | 2013-05-17 | 2014-11-20 | Electro Scientific Industries, Inc. | Method of measuring narrow recessed features using machine vision |
KR101643357B1 (ko) * | 2013-08-26 | 2016-07-27 | 가부시키가이샤 뉴플레어 테크놀로지 | 촬상 장치, 검사 장치 및 검사 방법 |
CN106066562B (zh) * | 2015-04-21 | 2020-07-10 | 康代有限公司 | 具有扩展的角覆盖范围的检查系统 |
DE102015114065A1 (de) * | 2015-08-25 | 2017-03-02 | Brodmann Technologies GmbH | Verfahren und Einrichtung zur berührungslosen Beurteilung der Oberflächenbeschaffenheit eines Wafers |
US11499923B2 (en) * | 2020-09-30 | 2022-11-15 | Openlight Photonics, Inc. | On-chip photonic integrated circuit optical validation |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6219739A (ja) * | 1985-07-19 | 1987-01-28 | Hitachi Ltd | 検査方法および装置 |
JPH0530761U (ja) * | 1991-09-30 | 1993-04-23 | 京セラ株式会社 | 欠陥観察装置 |
JPH11211421A (ja) * | 1998-01-27 | 1999-08-06 | Nikon Corp | 線幅測定装置及び方法 |
JP2000131239A (ja) * | 1998-10-26 | 2000-05-12 | Nikon Corp | 欠陥検査装置 |
JP2000155099A (ja) * | 1998-09-18 | 2000-06-06 | Hitachi Ltd | 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置 |
JP2002116011A (ja) * | 2000-10-05 | 2002-04-19 | Toshiba Corp | パターン評価装置及びパターン評価方法 |
WO2005040776A1 (ja) * | 2003-10-27 | 2005-05-06 | Nikon Corporation | 表面検査装置および表面検査方法 |
JP2006105951A (ja) * | 2004-10-06 | 2006-04-20 | Nikon Corp | 欠陥検査方法 |
JP2006135211A (ja) * | 2004-11-09 | 2006-05-25 | Nikon Corp | 表面検査装置および表面検査方法および露光システム |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5835220A (en) * | 1995-10-27 | 1998-11-10 | Nkk Corporation | Method and apparatus for detecting surface flaws |
US6690469B1 (en) * | 1998-09-18 | 2004-02-10 | Hitachi, Ltd. | Method and apparatus for observing and inspecting defects |
US6020966A (en) * | 1998-09-23 | 2000-02-01 | International Business Machines Corporation | Enhanced optical detection of minimum features using depolarization |
US7006224B2 (en) * | 2002-12-30 | 2006-02-28 | Applied Materials, Israel, Ltd. | Method and system for optical inspection of an object |
US7643137B2 (en) * | 2003-03-26 | 2010-01-05 | Nikon Corporation | Defect inspection apparatus, defect inspection method and method of inspecting hole pattern |
EP1620712A1 (en) * | 2003-04-29 | 2006-02-01 | Surfoptic Limited | Measuring a surface characteristic |
-
2006
- 2006-06-01 JP JP2006153724A patent/JP4692892B2/ja not_active Expired - Fee Related
-
2007
- 2007-05-29 KR KR1020087028914A patent/KR20090016458A/ko not_active Application Discontinuation
- 2007-05-29 WO PCT/JP2007/061252 patent/WO2007139225A1/ja active Application Filing
- 2007-05-29 CN CN200780020228.5A patent/CN101460833A/zh active Pending
- 2007-05-31 TW TW096119455A patent/TW200804758A/zh unknown
-
2008
- 2008-11-18 US US12/292,393 patent/US20090079983A1/en not_active Abandoned
-
2010
- 2010-03-29 US US12/749,438 patent/US20100182603A1/en not_active Abandoned
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6219739A (ja) * | 1985-07-19 | 1987-01-28 | Hitachi Ltd | 検査方法および装置 |
JPH0530761U (ja) * | 1991-09-30 | 1993-04-23 | 京セラ株式会社 | 欠陥観察装置 |
JPH11211421A (ja) * | 1998-01-27 | 1999-08-06 | Nikon Corp | 線幅測定装置及び方法 |
JP2000155099A (ja) * | 1998-09-18 | 2000-06-06 | Hitachi Ltd | 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置 |
JP2000131239A (ja) * | 1998-10-26 | 2000-05-12 | Nikon Corp | 欠陥検査装置 |
JP2002116011A (ja) * | 2000-10-05 | 2002-04-19 | Toshiba Corp | パターン評価装置及びパターン評価方法 |
WO2005040776A1 (ja) * | 2003-10-27 | 2005-05-06 | Nikon Corporation | 表面検査装置および表面検査方法 |
JP2006105951A (ja) * | 2004-10-06 | 2006-04-20 | Nikon Corp | 欠陥検査方法 |
JP2006135211A (ja) * | 2004-11-09 | 2006-05-25 | Nikon Corp | 表面検査装置および表面検査方法および露光システム |
Also Published As
Publication number | Publication date |
---|---|
TW200804758A (en) | 2008-01-16 |
KR20090016458A (ko) | 2009-02-13 |
US20090079983A1 (en) | 2009-03-26 |
WO2007139225A1 (ja) | 2007-12-06 |
US20100182603A1 (en) | 2010-07-22 |
CN101460833A (zh) | 2009-06-17 |
JP2007322272A (ja) | 2007-12-13 |
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