TW200519373A - Surface inspection device and method - Google Patents

Surface inspection device and method

Info

Publication number
TW200519373A
TW200519373A TW093132843A TW93132843A TW200519373A TW 200519373 A TW200519373 A TW 200519373A TW 093132843 A TW093132843 A TW 093132843A TW 93132843 A TW93132843 A TW 93132843A TW 200519373 A TW200519373 A TW 200519373A
Authority
TW
Taiwan
Prior art keywords
repeated
light
polarized light
straight
repeated patterns
Prior art date
Application number
TW093132843A
Other languages
English (en)
Chinese (zh)
Other versions
TWI355488B (enExample
Inventor
Kazuhiko Fukazawa
Koichiro Komatsu
Takeo Oomori
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200519373A publication Critical patent/TW200519373A/zh
Application granted granted Critical
Publication of TWI355488B publication Critical patent/TWI355488B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • H10P74/00—
    • H10P74/203—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW093132843A 2003-10-27 2004-10-27 Surface inspection device and method TW200519373A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003366255 2003-10-27

Publications (2)

Publication Number Publication Date
TW200519373A true TW200519373A (en) 2005-06-16
TWI355488B TWI355488B (enExample) 2012-01-01

Family

ID=34510228

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093132843A TW200519373A (en) 2003-10-27 2004-10-27 Surface inspection device and method

Country Status (5)

Country Link
US (4) US7298471B2 (enExample)
JP (2) JP4552859B2 (enExample)
KR (2) KR101346492B1 (enExample)
TW (1) TW200519373A (enExample)
WO (1) WO2005040776A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI404155B (zh) * 2006-08-11 2013-08-01 東京威力科創股份有限公司 Defect inspection method and defect inspection device

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WO2005064322A1 (ja) * 2003-12-26 2005-07-14 Nikon Corporation 欠陥検査装置および欠陥検査方法
JP4802481B2 (ja) * 2004-11-09 2011-10-26 株式会社ニコン 表面検査装置および表面検査方法および露光システム
US20060099344A1 (en) 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material
US20080246966A1 (en) * 2005-12-14 2008-10-09 Nikon Corporation Surface-Inspecting Apparatus and Surface-Inspecting Method
JP2007192780A (ja) * 2006-01-23 2007-08-02 Ono Sokki Co Ltd 空間フィルタ方式の速度検出装置及び空間フィルタ方式の速度検出装置の速度検出方法
JP4635939B2 (ja) * 2006-03-30 2011-02-23 株式会社ニコン 表面検査装置
JP4605089B2 (ja) * 2006-05-10 2011-01-05 株式会社ニコン 表面検査装置
JP4548385B2 (ja) 2006-05-10 2010-09-22 株式会社ニコン 表面検査装置
JP4622933B2 (ja) * 2006-05-15 2011-02-02 株式会社ニコン 表面検査方法及び表面検査装置
JP4595881B2 (ja) * 2006-05-15 2010-12-08 株式会社ニコン 表面検査装置
JP4506723B2 (ja) * 2006-05-22 2010-07-21 株式会社ニコン 表面検査装置
JP4692892B2 (ja) * 2006-06-01 2011-06-01 株式会社ニコン 表面検査装置
JP4552202B2 (ja) * 2006-06-06 2010-09-29 株式会社ニコン 表面検査装置
KR101382020B1 (ko) * 2006-07-14 2014-04-04 가부시키가이샤 니콘 표면 검사 장치
JP4910637B2 (ja) * 2006-10-31 2012-04-04 凸版印刷株式会社 基板検査装置及び基板検査方法
JP5024935B2 (ja) * 2007-01-16 2012-09-12 富士フイルム株式会社 光透過性部材の欠陥検出装置及び方法
WO2008105460A1 (ja) * 2007-02-28 2008-09-04 Nikon Corporation 観察方法、検査装置および検査方法
JP2008249386A (ja) * 2007-03-29 2008-10-16 Dainippon Screen Mfg Co Ltd 欠陥検査装置および欠陥検査方法
US7990546B2 (en) * 2007-07-16 2011-08-02 Applied Materials Israel, Ltd. High throughput across-wafer-variation mapping
WO2009048003A1 (ja) * 2007-10-12 2009-04-16 Nikon Corporation 表面検査装置
US8724882B2 (en) * 2008-07-29 2014-05-13 Applied Materials Israel, Ltd. Mapping variations of a surface
US8040510B2 (en) * 2008-08-22 2011-10-18 Novasolar Holdings Limited Spatially precise optical treatment or measurement of targets through intervening birefringent layers
WO2010138764A2 (en) * 2009-05-29 2010-12-02 Applied Materials, Inc. Substrate side marking and identification
KR101493133B1 (ko) * 2009-07-01 2015-02-12 가부시키가이샤 니콘 노광 상태 평가 방법 및 노광 상태 평가 장치
KR20120045774A (ko) * 2010-11-01 2012-05-09 삼성전자주식회사 웨이퍼 검사 방법
US10460998B2 (en) 2010-11-09 2019-10-29 Nikon Corporation Method for inspecting substrate, substrate inspection apparatus, exposure system, and method for producing semiconductor device
FR2994734B1 (fr) * 2012-08-21 2017-08-25 Fogale Nanotech Dispositif et procede pour faire des mesures dimensionnelles sur des objets multi-couches tels que des wafers.
US9485491B2 (en) * 2014-12-15 2016-11-01 Test Research, Inc. Optical system
US10594835B2 (en) 2015-06-05 2020-03-17 Apple Inc. Efficient context monitoring

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JP3425923B2 (ja) * 2000-03-27 2003-07-14 Ｎｅｃエレクトロニクス株式会社 異方性多層薄膜構造体の評価法及び評価装置
JP3858571B2 (ja) 2000-07-27 2006-12-13 株式会社日立製作所 パターン欠陥検査方法及びその装置
KR100856357B1 (ko) 2000-09-13 2008-09-04 가부시키가이샤 니콘 표면검사장치 및 표면검사방법
JP4591802B2 (ja) 2000-09-13 2010-12-01 株式会社ニコン 表面検査装置および方法
JP4153652B2 (ja) * 2000-10-05 2008-09-24 株式会社東芝 パターン評価装置及びパターン評価方法
JP4662194B2 (ja) * 2001-06-22 2011-03-30 株式会社ニコン 検査装置
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI404155B (zh) * 2006-08-11 2013-08-01 東京威力科創股份有限公司 Defect inspection method and defect inspection device

Also Published As

Publication number Publication date
US8687182B2 (en) 2014-04-01
JPWO2005040776A1 (ja) 2007-11-22
US7298471B2 (en) 2007-11-20
JP4552859B2 (ja) 2010-09-29
KR101346492B1 (ko) 2013-12-31
KR101151077B1 (ko) 2012-06-01
US20080094628A1 (en) 2008-04-24
US20130100448A1 (en) 2013-04-25
US20100225906A1 (en) 2010-09-09
TWI355488B (enExample) 2012-01-01
KR20120031239A (ko) 2012-03-30
US20060192953A1 (en) 2006-08-31
JP2010256359A (ja) 2010-11-11
KR20060120145A (ko) 2006-11-24
WO2005040776A1 (ja) 2005-05-06
US8441627B2 (en) 2013-05-14
US7834993B2 (en) 2010-11-16

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