JP4478435B2 - 露光装置、およびデバイス製造方法 - Google Patents

露光装置、およびデバイス製造方法 Download PDF

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Publication number
JP4478435B2
JP4478435B2 JP2003386349A JP2003386349A JP4478435B2 JP 4478435 B2 JP4478435 B2 JP 4478435B2 JP 2003386349 A JP2003386349 A JP 2003386349A JP 2003386349 A JP2003386349 A JP 2003386349A JP 4478435 B2 JP4478435 B2 JP 4478435B2
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JP
Japan
Prior art keywords
offset
acceleration sensor
exposure apparatus
output
determination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2003386349A
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English (en)
Japanese (ja)
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JP2005147281A5 (https=
JP2005147281A (ja
Inventor
雅博 森貞
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Canon Inc
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Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003386349A priority Critical patent/JP4478435B2/ja
Priority to US10/987,029 priority patent/US7024284B2/en
Publication of JP2005147281A publication Critical patent/JP2005147281A/ja
Priority to US11/249,458 priority patent/US7069114B2/en
Priority to US11/432,619 priority patent/US20060206237A1/en
Publication of JP2005147281A5 publication Critical patent/JP2005147281A5/ja
Application granted granted Critical
Publication of JP4478435B2 publication Critical patent/JP4478435B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D19/00—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase
    • G05D19/02—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase characterised by the use of electric means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F2228/00—Functional characteristics, e.g. variability, frequency-dependence
    • F16F2228/10—Functional characteristics, e.g. variability, frequency-dependence with threshold or dead zone

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
JP2003386349A 2003-11-17 2003-11-17 露光装置、およびデバイス製造方法 Expired - Fee Related JP4478435B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003386349A JP4478435B2 (ja) 2003-11-17 2003-11-17 露光装置、およびデバイス製造方法
US10/987,029 US7024284B2 (en) 2003-11-17 2004-11-15 Anti-vibration technique
US11/249,458 US7069114B2 (en) 2003-11-17 2005-10-14 Anti-vibration technique
US11/432,619 US20060206237A1 (en) 2003-11-17 2006-05-12 Anti-vibration technique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003386349A JP4478435B2 (ja) 2003-11-17 2003-11-17 露光装置、およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005147281A JP2005147281A (ja) 2005-06-09
JP2005147281A5 JP2005147281A5 (https=) 2007-01-11
JP4478435B2 true JP4478435B2 (ja) 2010-06-09

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Family Applications (1)

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JP2003386349A Expired - Fee Related JP4478435B2 (ja) 2003-11-17 2003-11-17 露光装置、およびデバイス製造方法

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Country Link
US (3) US7024284B2 (https=)
JP (1) JP4478435B2 (https=)

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* Cited by examiner, † Cited by third party
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US7369345B1 (en) 2004-12-03 2008-05-06 Maxtor Corporation Mobile hard disk drive free fall detection and protection
US7350394B1 (en) * 2004-12-03 2008-04-01 Maxtor Corporation Zero-g offset identification of an accelerometer employed in a hard disk drive
DE502006005980D1 (de) * 2006-05-20 2010-03-11 Integrated Dynamics Eng Gmbh Aktives Schwingungsisolationssystem mit einem kombinierten Positionsaktor
TWI547771B (zh) * 2006-08-31 2016-09-01 尼康股份有限公司 Mobile body drive system and moving body driving method, pattern forming apparatus and method, exposure apparatus and method, component manufacturing method, and method of determining
EP1921502B1 (de) * 2006-11-08 2011-02-02 Integrated Dynamics Engineering GmbH Kombiniertes Motion-Control-System
KR101110892B1 (ko) * 2006-11-30 2012-03-13 미쓰비시덴키 가부시키가이샤 면진 제어 시스템
KR20090086566A (ko) * 2006-12-06 2009-08-13 신포니아 테크놀로지 가부시끼가이샤 제진 장치, 제진 장치의 제어 방법, 제진 장치의 오프셋 보정 방법 및 판 스프링
JP4442694B2 (ja) * 2008-02-29 2010-03-31 ソニー株式会社 部品実装装置、振動制御装置及び振動制御方法
JP5064316B2 (ja) * 2008-07-01 2012-10-31 特許機器株式会社 除振装置
EP2163906B1 (en) * 2008-09-16 2014-02-26 Mitutoyo Corporation Method of detecting a movement of a measuring probe and measuring instrument
EP2211187B1 (en) * 2009-01-14 2013-10-02 Mitutoyo Corporation Method of actuating a system, apparatus for modifying a control signal for actuation of a system and method of tuning such an apparatus
US20110094546A1 (en) * 2009-10-23 2011-04-28 John Valcore System and method for wafer carrier vibration reduction
JP5247782B2 (ja) * 2010-09-09 2013-07-24 キヤノン株式会社 光学機器及びそれを備えた撮像装置、光学機器の制御方法
CN102840910B (zh) * 2011-06-23 2014-05-14 启碁科技股份有限公司 具有振动测试功能的电子装置及建立振动测试算法的方法
US20130204572A1 (en) * 2012-02-07 2013-08-08 Seiko Epson Corporation State detection device, electronic apparatus, and program
DE102012004808A1 (de) * 2012-03-09 2013-09-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Beeinflussung der Schwingungsübertragung zwischen zwei Einheiten
DE102012011543B3 (de) * 2012-06-08 2013-09-19 INPRO Innovationsgesellschaft für fortgeschrittene Produktionssysteme in der Fahrzeugindustrie mbH Verfahren und Anlage zum Handhaben von Blechplatinen und umgeformten Blechen zwischen aufeinander folgenden Produktionsstationen wie aufeinander folgendenden Pressenstufen einer Kfz-Produktionslinie
KR102780259B1 (ko) * 2021-10-18 2025-03-14 엘지전자 주식회사 조립 장치

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US197845A (en) * 1877-12-04 Improvement in gates
US164930A (en) * 1875-06-29 Improvement in the manufacture of shears
US147062A (en) * 1874-02-03 Improvement in loom-shuttles
JPH06137371A (ja) 1992-10-30 1994-05-17 Shimadzu Corp 振動除去装置
JP3336781B2 (ja) * 1994-12-22 2002-10-21 日産自動車株式会社 防振支持装置
US5936710A (en) * 1996-01-05 1999-08-10 Canon Kabushiki Kaisha Scanning type exposure apparatus, position control apparatus, and method therefor
JPH1089403A (ja) * 1996-09-10 1998-04-07 Nikon Corp 防振装置
JPH10281215A (ja) 1997-04-02 1998-10-23 Nikon Corp 除振台の駆動制御装置
TW398029B (en) * 1997-04-18 2000-07-11 Nikon Corp Exposure device, method of manufacturing the same and the electric circuit
US6855929B2 (en) * 2000-12-01 2005-02-15 Ebara Corporation Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
JP2002289514A (ja) * 2000-12-22 2002-10-04 Nikon Corp 露光装置及び露光方法
US20020080339A1 (en) * 2000-12-25 2002-06-27 Nikon Corporation Stage apparatus, vibration control method and exposure apparatus
JP2002242983A (ja) * 2001-02-19 2002-08-28 Canon Inc 能動的除振装置
JP2003228422A (ja) 2002-02-04 2003-08-15 Canon Inc ステージ制御装置及び露光装置並びにデバイスの製造方法
JP3679767B2 (ja) 2002-02-26 2005-08-03 キヤノン株式会社 ステージ位置決め装置及びその制御方法、露光装置、半導体デバイスの製造方法
JP4109891B2 (ja) 2002-04-19 2008-07-02 キヤノン株式会社 能動制振装置、露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
US7024284B2 (en) 2006-04-04
US20060206237A1 (en) 2006-09-14
US7069114B2 (en) 2006-06-27
US20060036352A1 (en) 2006-02-16
JP2005147281A (ja) 2005-06-09
US20050119795A1 (en) 2005-06-02

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