JP2005147281A5 - - Google Patents

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Publication number
JP2005147281A5
JP2005147281A5 JP2003386349A JP2003386349A JP2005147281A5 JP 2005147281 A5 JP2005147281 A5 JP 2005147281A5 JP 2003386349 A JP2003386349 A JP 2003386349A JP 2003386349 A JP2003386349 A JP 2003386349A JP 2005147281 A5 JP2005147281 A5 JP 2005147281A5
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JP
Japan
Prior art keywords
determination
output
acceleration sensor
offset
vibration isolation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003386349A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005147281A (ja
JP4478435B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003386349A priority Critical patent/JP4478435B2/ja
Priority claimed from JP2003386349A external-priority patent/JP4478435B2/ja
Priority to US10/987,029 priority patent/US7024284B2/en
Publication of JP2005147281A publication Critical patent/JP2005147281A/ja
Priority to US11/249,458 priority patent/US7069114B2/en
Priority to US11/432,619 priority patent/US20060206237A1/en
Publication of JP2005147281A5 publication Critical patent/JP2005147281A5/ja
Application granted granted Critical
Publication of JP4478435B2 publication Critical patent/JP4478435B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003386349A 2003-11-17 2003-11-17 露光装置、およびデバイス製造方法 Expired - Fee Related JP4478435B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003386349A JP4478435B2 (ja) 2003-11-17 2003-11-17 露光装置、およびデバイス製造方法
US10/987,029 US7024284B2 (en) 2003-11-17 2004-11-15 Anti-vibration technique
US11/249,458 US7069114B2 (en) 2003-11-17 2005-10-14 Anti-vibration technique
US11/432,619 US20060206237A1 (en) 2003-11-17 2006-05-12 Anti-vibration technique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003386349A JP4478435B2 (ja) 2003-11-17 2003-11-17 露光装置、およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005147281A JP2005147281A (ja) 2005-06-09
JP2005147281A5 true JP2005147281A5 (https=) 2007-01-11
JP4478435B2 JP4478435B2 (ja) 2010-06-09

Family

ID=34616130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003386349A Expired - Fee Related JP4478435B2 (ja) 2003-11-17 2003-11-17 露光装置、およびデバイス製造方法

Country Status (2)

Country Link
US (3) US7024284B2 (https=)
JP (1) JP4478435B2 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
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US7369345B1 (en) 2004-12-03 2008-05-06 Maxtor Corporation Mobile hard disk drive free fall detection and protection
US7350394B1 (en) * 2004-12-03 2008-04-01 Maxtor Corporation Zero-g offset identification of an accelerometer employed in a hard disk drive
EP1857878B1 (de) * 2006-05-20 2010-01-20 Integrated Dynamics Engineering GmbH Aktives Schwingungsisolationssystem mit einem kombinierten Positionsaktor
KR101669785B1 (ko) * 2006-08-31 2016-10-27 가부시키가이샤 니콘 이동체 구동 시스템 및 이동체 구동 방법, 패턴 형성 장치 및 방법, 노광 장치 및 방법, 디바이스 제조 방법, 그리고 결정 방법
DE502006008851D1 (de) * 2006-11-08 2011-03-17 Integrated Dynamics Eng Gmbh Kombiniertes Motion-Control-System
US8138693B2 (en) * 2006-11-30 2012-03-20 Mitsubishi Electric Corporation Vibration isolation control system
CN102654170A (zh) * 2006-12-06 2012-09-05 翔风技术有限公司 减振装置及减振装置的偏移校正方法
JP4442694B2 (ja) * 2008-02-29 2010-03-31 ソニー株式会社 部品実装装置、振動制御装置及び振動制御方法
JP5064316B2 (ja) * 2008-07-01 2012-10-31 特許機器株式会社 除振装置
EP2163906B1 (en) * 2008-09-16 2014-02-26 Mitutoyo Corporation Method of detecting a movement of a measuring probe and measuring instrument
EP2211187B1 (en) * 2009-01-14 2013-10-02 Mitutoyo Corporation Method of actuating a system, apparatus for modifying a control signal for actuation of a system and method of tuning such an apparatus
US20110094546A1 (en) * 2009-10-23 2011-04-28 John Valcore System and method for wafer carrier vibration reduction
JP5247782B2 (ja) * 2010-09-09 2013-07-24 キヤノン株式会社 光学機器及びそれを備えた撮像装置、光学機器の制御方法
CN102840910B (zh) * 2011-06-23 2014-05-14 启碁科技股份有限公司 具有振动测试功能的电子装置及建立振动测试算法的方法
US20130204572A1 (en) * 2012-02-07 2013-08-08 Seiko Epson Corporation State detection device, electronic apparatus, and program
DE102012004808A1 (de) * 2012-03-09 2013-09-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Beeinflussung der Schwingungsübertragung zwischen zwei Einheiten
DE102012011543B3 (de) * 2012-06-08 2013-09-19 INPRO Innovationsgesellschaft für fortgeschrittene Produktionssysteme in der Fahrzeugindustrie mbH Verfahren und Anlage zum Handhaben von Blechplatinen und umgeformten Blechen zwischen aufeinander folgenden Produktionsstationen wie aufeinander folgendenden Pressenstufen einer Kfz-Produktionslinie
CN118120048B (zh) * 2021-10-18 2025-03-14 Lg电子株式会社 组装装置

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US164930A (en) * 1875-06-29 Improvement in the manufacture of shears
US147062A (en) * 1874-02-03 Improvement in loom-shuttles
US197845A (en) * 1877-12-04 Improvement in gates
JPH06137371A (ja) 1992-10-30 1994-05-17 Shimadzu Corp 振動除去装置
JP3336781B2 (ja) * 1994-12-22 2002-10-21 日産自動車株式会社 防振支持装置
US5936710A (en) 1996-01-05 1999-08-10 Canon Kabushiki Kaisha Scanning type exposure apparatus, position control apparatus, and method therefor
JPH1089403A (ja) * 1996-09-10 1998-04-07 Nikon Corp 防振装置
JPH10281215A (ja) 1997-04-02 1998-10-23 Nikon Corp 除振台の駆動制御装置
KR20010006467A (ko) * 1997-04-18 2001-01-26 오노 시게오 노광 장치, 해당 장치를 이용한 노광 방법 및 회로 장치 제조 방법
EP1339100A1 (en) * 2000-12-01 2003-08-27 Ebara Corporation Inspection method and apparatus using electron beam, and device production method using it
US6710850B2 (en) * 2000-12-22 2004-03-23 Nikon Corporation Exposure apparatus and exposure method
US20020080339A1 (en) * 2000-12-25 2002-06-27 Nikon Corporation Stage apparatus, vibration control method and exposure apparatus
JP2002242983A (ja) 2001-02-19 2002-08-28 Canon Inc 能動的除振装置
JP2003228422A (ja) 2002-02-04 2003-08-15 Canon Inc ステージ制御装置及び露光装置並びにデバイスの製造方法
JP3679767B2 (ja) 2002-02-26 2005-08-03 キヤノン株式会社 ステージ位置決め装置及びその制御方法、露光装置、半導体デバイスの製造方法
JP4109891B2 (ja) 2002-04-19 2008-07-02 キヤノン株式会社 能動制振装置、露光装置及びデバイス製造方法

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