JP4317125B2 - フッ素化ホスホン酸 - Google Patents

フッ素化ホスホン酸 Download PDF

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Publication number
JP4317125B2
JP4317125B2 JP2004509694A JP2004509694A JP4317125B2 JP 4317125 B2 JP4317125 B2 JP 4317125B2 JP 2004509694 A JP2004509694 A JP 2004509694A JP 2004509694 A JP2004509694 A JP 2004509694A JP 4317125 B2 JP4317125 B2 JP 4317125B2
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JP
Japan
Prior art keywords
carbon atoms
mixture
alkylene group
nonafluorobutyl
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2004509694A
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English (en)
Japanese (ja)
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JP2005528446A (ja
JP2005528446A5 (https=
Inventor
ディー. ボードマン,ラリー
ジェイ. ペルライト,マーク
ジン,ネイヨン
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of JP2005528446A publication Critical patent/JP2005528446A/ja
Publication of JP2005528446A5 publication Critical patent/JP2005528446A5/ja
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/38Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/38Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/3804Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)] not used, see subgroups
    • C07F9/3808Acyclic saturated acids which can have further substituents on alkyl
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/38Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/40Esters thereof
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M105/00Lubricating compositions characterised by the base-material being a non-macromolecular organic compound
    • C10M105/74Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing phosphorus
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2223/00Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
    • C10M2223/06Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-carbon bonds
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2223/00Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
    • C10M2223/06Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-carbon bonds
    • C10M2223/061Metal salts
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/06Oiliness; Film-strength; Anti-wear; Resistance to extreme pressure
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2050/00Form in which the lubricant is applied to the material being lubricated
    • C10N2050/015Dispersions of solid lubricants
    • C10N2050/02Dispersions of solid lubricants dissolved or suspended in a carrier which subsequently evaporates to leave a lubricant coating
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2060/00Chemical after-treatment of the constituents of the lubricating composition
    • C10N2060/08Halogenation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/3154Of fluorinated addition polymer from unsaturated monomers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Molecular Biology (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2004509694A 2002-05-31 2003-05-20 フッ素化ホスホン酸 Expired - Fee Related JP4317125B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/161,258 US6824882B2 (en) 2002-05-31 2002-05-31 Fluorinated phosphonic acids
PCT/US2003/015686 WO2003102003A1 (en) 2002-05-31 2003-05-20 Fluorinated phosphonic acids

Publications (3)

Publication Number Publication Date
JP2005528446A JP2005528446A (ja) 2005-09-22
JP2005528446A5 JP2005528446A5 (https=) 2006-07-06
JP4317125B2 true JP4317125B2 (ja) 2009-08-19

Family

ID=29709753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004509694A Expired - Fee Related JP4317125B2 (ja) 2002-05-31 2003-05-20 フッ素化ホスホン酸

Country Status (10)

Country Link
US (1) US6824882B2 (https=)
EP (1) EP1509536B1 (https=)
JP (1) JP4317125B2 (https=)
KR (1) KR100966660B1 (https=)
CN (1) CN100369923C (https=)
AT (1) ATE404572T1 (https=)
AU (1) AU2003248533A1 (https=)
CA (1) CA2486165A1 (https=)
DE (1) DE60322889D1 (https=)
WO (1) WO2003102003A1 (https=)

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US7815963B2 (en) 1996-10-17 2010-10-19 The Trustees Of Princeton University Enhanced bonding layers on titanium materials
US7396594B2 (en) * 2002-06-24 2008-07-08 The Trustees Of Princeton University Carrier applied coating layers
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US20040090516A1 (en) * 2002-09-09 2004-05-13 Heidelberger Druckmaschinen Ag Print substrate contacting element having an ink-repellent coating and method for coating a print substrate-contacting element
US7189479B2 (en) * 2003-08-21 2007-03-13 3M Innovative Properties Company Phototool coating
US7678426B2 (en) * 2003-08-21 2010-03-16 3M Innovative Properties Company Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof
EP1533657B1 (en) * 2003-11-21 2011-03-09 Obducat AB Multilayer nano imprint lithography
JP2007526912A (ja) 2004-01-30 2007-09-20 グレート・レークス・ケミカル・コーポレーション 製造方法並びにシステム、組成物、界面活性剤、モノマー単位、金属錯体、燐酸エステル、グリコール、水性皮膜形成フォーム、及びフォーム安定剤
US7148360B2 (en) 2004-01-30 2006-12-12 3M Innovative Properties Company Perfluoropolyether benzotriazole compounds
EP1600811A1 (en) 2004-05-28 2005-11-30 Obducat AB Modified metal molds for use in imprinting processes
JP2008500914A (ja) * 2004-05-28 2008-01-17 オブデュキャット、アクチボラグ インプリント方法に使用する変性された金属製成形型
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JP4604743B2 (ja) * 2005-02-01 2011-01-05 セイコーエプソン株式会社 機能性基板の製造方法、機能性基板、微細パターンの形成方法、導電膜配線、電子光学装置および電子機器
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US7824755B2 (en) * 2006-06-29 2010-11-02 3M Innovative Properties Company Fluorinated leveling agents
WO2008024475A2 (en) * 2006-08-24 2008-02-28 Aculon, Inc. Optical articles with thin hydrophobic layers
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WO2008083201A1 (en) * 2006-12-29 2008-07-10 3M Innovative Properties Company Process for preparing long-chain polymethylene halide telomers
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US8115920B2 (en) * 2007-11-14 2012-02-14 3M Innovative Properties Company Method of making microarrays
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CN102596382B (zh) * 2009-11-04 2014-09-17 优迈特株式会社 聚氟烷基膦酸盐乳化剂和以该乳化剂作为有效成分的脱模剂
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US10167356B2 (en) 2014-12-18 2019-01-01 3M Innovative Properties Company Fluorinated polymers comprising phosphonic moieties
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Also Published As

Publication number Publication date
KR20050004254A (ko) 2005-01-12
CA2486165A1 (en) 2003-12-11
WO2003102003A1 (en) 2003-12-11
DE60322889D1 (de) 2008-09-25
AU2003248533A1 (en) 2003-12-19
US6824882B2 (en) 2004-11-30
JP2005528446A (ja) 2005-09-22
CN1656108A (zh) 2005-08-17
EP1509536A1 (en) 2005-03-02
US20030228469A1 (en) 2003-12-11
KR100966660B1 (ko) 2010-06-30
ATE404572T1 (de) 2008-08-15
CN100369923C (zh) 2008-02-20
EP1509536B1 (en) 2008-08-13

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