JP4253365B2 - ウェハ搬送装置 - Google Patents

ウェハ搬送装置 Download PDF

Info

Publication number
JP4253365B2
JP4253365B2 JP28529097A JP28529097A JP4253365B2 JP 4253365 B2 JP4253365 B2 JP 4253365B2 JP 28529097 A JP28529097 A JP 28529097A JP 28529097 A JP28529097 A JP 28529097A JP 4253365 B2 JP4253365 B2 JP 4253365B2
Authority
JP
Japan
Prior art keywords
wafer
cassette
transfer arm
sensor
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP28529097A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11116045A5 (enExample
JPH11116045A (ja
Inventor
智生 加藤
桂司 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Priority to JP28529097A priority Critical patent/JP4253365B2/ja
Priority to US09/319,615 priority patent/US6208909B1/en
Priority to PCT/JP1998/004617 priority patent/WO1999020552A1/ja
Priority to CNB988015455A priority patent/CN1150119C/zh
Priority to KR1019997005304A priority patent/KR100322921B1/ko
Publication of JPH11116045A publication Critical patent/JPH11116045A/ja
Publication of JPH11116045A5 publication Critical patent/JPH11116045A5/ja
Application granted granted Critical
Publication of JP4253365B2 publication Critical patent/JP4253365B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/07Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers Not used, see H01L21/677
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • H01L21/67265Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/137Associated with semiconductor wafer handling including means for charging or discharging wafer cassette

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP28529097A 1997-10-17 1997-10-17 ウェハ搬送装置 Expired - Lifetime JP4253365B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP28529097A JP4253365B2 (ja) 1997-10-17 1997-10-17 ウェハ搬送装置
US09/319,615 US6208909B1 (en) 1997-10-17 1998-10-13 Wafer transport device
PCT/JP1998/004617 WO1999020552A1 (en) 1997-10-17 1998-10-13 Wafer transport device
CNB988015455A CN1150119C (zh) 1997-10-17 1998-10-13 晶片搬运装置
KR1019997005304A KR100322921B1 (ko) 1997-10-17 1998-10-13 웨이퍼 반송 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28529097A JP4253365B2 (ja) 1997-10-17 1997-10-17 ウェハ搬送装置

Publications (3)

Publication Number Publication Date
JPH11116045A JPH11116045A (ja) 1999-04-27
JPH11116045A5 JPH11116045A5 (enExample) 2005-06-30
JP4253365B2 true JP4253365B2 (ja) 2009-04-08

Family

ID=17689614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28529097A Expired - Lifetime JP4253365B2 (ja) 1997-10-17 1997-10-17 ウェハ搬送装置

Country Status (5)

Country Link
US (1) US6208909B1 (enExample)
JP (1) JP4253365B2 (enExample)
KR (1) KR100322921B1 (enExample)
CN (1) CN1150119C (enExample)
WO (1) WO1999020552A1 (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6483102B1 (en) * 2000-07-18 2002-11-19 Advanced Micro Devices, Inc. Method and apparatus for inspection of misplaced integrated circuits in a tray stack
US6591162B1 (en) 2000-08-15 2003-07-08 Asyst Technologies, Inc. Smart load port with integrated carrier monitoring and fab-wide carrier management system
JP4244555B2 (ja) * 2002-02-25 2009-03-25 東京エレクトロン株式会社 被処理体の支持機構
US6905300B1 (en) * 2004-01-16 2005-06-14 Dmetrix, Inc. Slide feeder with air bearing conveyor
US7824498B2 (en) * 2004-02-24 2010-11-02 Applied Materials, Inc. Coating for reducing contamination of substrates during processing
JP2006074004A (ja) * 2004-08-02 2006-03-16 Disco Abrasive Syst Ltd ワーク搬送収納装置,およびそのワーク搬送収納装置を備えた切削装置
WO2006023838A2 (en) * 2004-08-19 2006-03-02 Brooks Automation, Inc. Reduced capacity carrier and method of use
JP4794882B2 (ja) * 2005-03-25 2011-10-19 キヤノン株式会社 走査型露光装置、走査型露光方法
JP5155517B2 (ja) 2005-04-21 2013-03-06 株式会社荏原製作所 ウエハ受渡装置及びポリッシング装置
EP1902465A2 (en) 2005-07-08 2008-03-26 Asyst Technologies, Inc. Workpiece support structures and apparatus for accessing same
CN101310377B (zh) * 2005-11-17 2010-11-17 Oc欧瑞康巴尔斯公司 用于盘形的工件的输送装置
DE102007042138A1 (de) 2007-09-05 2009-03-12 Carl Zeiss Microimaging Gmbh Verfahren und Einrichtung zur automatischen Probenzuführung
CN101431040B (zh) * 2007-11-07 2011-11-09 沈阳芯源微电子设备有限公司 提升器结构
US20090175707A1 (en) * 2008-01-03 2009-07-09 Bonora Anthony C Controlled deflection of large area semiconductor substrates for shipping and manufacturing containers
DE102010018465B4 (de) * 2010-04-27 2020-02-06 Centrotherm Photovoltaics Ag Vorrichtung und Verfahren zum Ermitteln der räumlichen Lage von Plattenelementen eines Waferbootes sowie Beladevorrichtung und Verfahren zum Be- und/oder Entladen eines solchen Waferbootes
JP5447431B2 (ja) * 2011-05-09 2014-03-19 株式会社安川電機 ロボットシステム
JP6033009B2 (ja) * 2012-09-04 2016-11-30 株式会社ミマキエンジニアリング 格納制御装置、印刷装置、プログラム及び記録媒体
JP5935676B2 (ja) * 2012-12-07 2016-06-15 東京エレクトロン株式会社 基板処理装置、基板装置の運用方法及び記憶媒体
JP6098217B2 (ja) * 2013-02-20 2017-03-22 株式会社村田製作所 回路基板およびその製造方法
JP6360762B2 (ja) * 2014-09-26 2018-07-18 株式会社ディスコ 加工装置
KR101771391B1 (ko) * 2016-01-19 2017-08-25 로체 시스템즈(주) 이송로봇 티칭장치
JP6689539B2 (ja) * 2016-08-12 2020-04-28 株式会社ディスコ 判定装置
KR101970780B1 (ko) * 2017-04-13 2019-04-22 삼성디스플레이 주식회사 기판 처리 시스템 및 기판 반송 방법
JP7126809B2 (ja) * 2017-04-13 2022-08-29 浜松ホトニクス株式会社 画像取得装置及び画像取得方法
US11031266B2 (en) * 2018-07-16 2021-06-08 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer handling equipment and method thereof
CN110265324A (zh) * 2019-06-03 2019-09-20 福建省福联集成电路有限公司 一种晶圆检测装置
CN110379735B (zh) * 2019-06-28 2021-10-26 福建省福联集成电路有限公司 一种晶圆斜插检测装置
JP7324667B2 (ja) * 2019-09-20 2023-08-10 株式会社Screenホールディングス 基板処理装置
CN110767563B (zh) * 2019-10-25 2022-05-27 上海华力集成电路制造有限公司 检测晶圆完整性的方法、rtp机台
CN111180378B (zh) * 2019-12-31 2023-12-29 中芯集成电路(宁波)有限公司 一种检测晶舟内晶圆斜插的方法及装置
US12002696B2 (en) * 2020-06-30 2024-06-04 Brooks Automation Us, Llc Substrate mapping apparatus and method therefor
CN114446843B (zh) * 2020-11-02 2025-05-27 上海华力集成电路制造有限公司 晶圆传送模块及其传送预传送的晶圆的方法
CN115101430B (zh) * 2021-12-22 2022-12-27 沈阳新松机器人自动化股份有限公司 一种多尺寸晶圆兼容开盒器的检测方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6018288A (ja) * 1983-07-11 1985-01-30 Nippon Steel Corp レ−ザ加工装置のモニタ−リング方法
JPS61188331A (ja) * 1985-02-15 1986-08-22 Nippon Texas Instr Kk 物体取出装置
JPS6245036A (ja) 1985-08-23 1987-02-27 Canon Inc ウエハ処理装置
JPH07115773B2 (ja) * 1986-01-29 1995-12-13 株式会社ニコン 基板搬送装置
US4895486A (en) * 1987-05-15 1990-01-23 Roboptek, Inc. Wafer monitoring device
JP2868645B2 (ja) * 1991-04-19 1999-03-10 東京エレクトロン株式会社 ウエハ搬送装置、ウエハの傾き検出方法、およびウエハの検出方法
JPH06244268A (ja) * 1993-02-16 1994-09-02 Tokyo Electron Tohoku Ltd 移載装置
US5642978A (en) * 1993-03-29 1997-07-01 Jenoptik Gmbh Device for handling disk-shaped objects in a handling plane of a local clean room
JPH07297264A (ja) 1994-04-22 1995-11-10 Toshiba Corp ウェハ位置検出装置
JPH08213447A (ja) * 1995-02-06 1996-08-20 Tokyo Electron Ltd 被移載体の検出装置
KR100315007B1 (ko) * 1995-11-22 2002-02-28 이시다 아키라 카세트내의 기판 검출 및 반송장치와 그 방법
US6060721A (en) * 1998-05-06 2000-05-09 Taiwan Semiconductor Manufacturing Co., Ltd Apparatus for detecting correct positioning of a wafer cassette

Also Published As

Publication number Publication date
WO1999020552A8 (en) 1999-07-01
US6208909B1 (en) 2001-03-27
KR20000069466A (ko) 2000-11-25
CN1242753A (zh) 2000-01-26
KR100322921B1 (ko) 2002-02-09
JPH11116045A (ja) 1999-04-27
WO1999020552A1 (en) 1999-04-29
CN1150119C (zh) 2004-05-19

Similar Documents

Publication Publication Date Title
JP4253365B2 (ja) ウェハ搬送装置
US10434661B2 (en) Workpiece support structures and apparatus for accessing same
JPH11116045A5 (enExample)
JP2017139251A (ja) 基板受け渡し位置の教示方法及び基板処理システム
JP6478878B2 (ja) 基板処理装置及び基板搬送方法並びに基板搬送プログラムを記憶したコンピュータ読み取り可能な記憶媒体
JPH07231031A (ja) 位置検出/案内装置
JPH05294410A (ja) 荷保管設備
JPH11195686A (ja) ウエハ搬送装置
JP2005285799A (ja) カセット内基板位置検出装置、ならびにそれを用いた基板搬出装置および基板処理装置
JP2024048078A (ja) 荷卸し装置
JPH04107841A (ja) 半導体ウェハー搬送装置および搬送方法
US6244422B1 (en) Apparatus for sensing and controlling tipping movement of a semiconductor boat
JP2011003695A (ja) 基板搬送装置
JPH05286526A (ja) ウエハ移載装置
JP6656441B2 (ja) 基板処理装置及び基板搬送方法並びに基板搬送プログラムを記憶したコンピュータ読み取り可能な記憶媒体
JPH0610688Y2 (ja) ウエハ搬送装置
JP2010278044A (ja) 基板搬送装置
JPH05238513A (ja) 半導体ウェハー収納カセットと半導体ウェハー搬送機構との位置決め方法
JPH04154144A (ja) 基板入出機構
JP2011040569A (ja) 基板搬送装置
JP2003109997A (ja) 基板処理装置
US20060182561A1 (en) Wafer transfer device and method thereof
JPH10294356A (ja) ウェーハカセットのステージ装置
KR20250168239A (ko) 기판 취출 방법, 및 기판 이송 시스템
JP2555728Y2 (ja) ウエハの移し替え装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041015

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20041015

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080325

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080523

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090106

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090126

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120130

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130130

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140130

Year of fee payment: 5

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

EXPY Cancellation because of completion of term