JP4071360B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP4071360B2 JP4071360B2 JP17827898A JP17827898A JP4071360B2 JP 4071360 B2 JP4071360 B2 JP 4071360B2 JP 17827898 A JP17827898 A JP 17827898A JP 17827898 A JP17827898 A JP 17827898A JP 4071360 B2 JP4071360 B2 JP 4071360B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- layer
- type
- silicon
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
- H10H20/818—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous within the light-emitting regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/826—Materials of the light-emitting regions comprising only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
Landscapes
- Led Devices (AREA)
- Electroluminescent Light Sources (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17827898A JP4071360B2 (ja) | 1997-08-29 | 1998-06-25 | 半導体装置 |
| EP98306936A EP0899796B1 (en) | 1997-08-29 | 1998-08-28 | Light emitting semiconductor device using nanocrystals |
| DE69836177T DE69836177T2 (de) | 1997-08-29 | 1998-08-28 | Lichtemittierende Halbleitervorrichtung, die Nanokristalle enthält |
| KR1019980035150A KR19990086981A (ko) | 1997-08-29 | 1998-08-28 | 반도체장치 |
| US09/143,106 US6157047A (en) | 1997-08-29 | 1998-08-28 | Light emitting semiconductor device using nanocrystals |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9-234284 | 1997-08-29 | ||
| JP23428497 | 1997-08-29 | ||
| JP17827898A JP4071360B2 (ja) | 1997-08-29 | 1998-06-25 | 半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11135830A JPH11135830A (ja) | 1999-05-21 |
| JPH11135830A5 JPH11135830A5 (enExample) | 2005-06-09 |
| JP4071360B2 true JP4071360B2 (ja) | 2008-04-02 |
Family
ID=26498509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17827898A Expired - Fee Related JP4071360B2 (ja) | 1997-08-29 | 1998-06-25 | 半導体装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6157047A (enExample) |
| EP (1) | EP0899796B1 (enExample) |
| JP (1) | JP4071360B2 (enExample) |
| KR (1) | KR19990086981A (enExample) |
| DE (1) | DE69836177T2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8653501B2 (en) | 2010-06-14 | 2014-02-18 | Canon Kabushiki Kaisha | Emitting device and manufacturing method therefor |
Families Citing this family (103)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997049119A1 (en) * | 1996-06-19 | 1997-12-24 | Matsushita Electric Industrial Co., Ltd. | Photoelectronic material, device using the same, and method for manufacturing the same |
| US6607829B1 (en) | 1997-11-13 | 2003-08-19 | Massachusetts Institute Of Technology | Tellurium-containing nanocrystalline materials |
| US6207392B1 (en) | 1997-11-25 | 2001-03-27 | The Regents Of The University Of California | Semiconductor nanocrystal probes for biological applications and process for making and using such probes |
| US20050146258A1 (en) | 1999-06-02 | 2005-07-07 | Shimon Weiss | Electronic displays using optically pumped luminescent semiconductor nanocrystals |
| US6864626B1 (en) * | 1998-06-03 | 2005-03-08 | The Regents Of The University Of California | Electronic displays using optically pumped luminescent semiconductor nanocrystals |
| EP0975027A2 (en) | 1998-07-23 | 2000-01-26 | Sony Corporation | Light emitting device and process for producing the same |
| KR100696353B1 (ko) * | 1998-07-23 | 2007-03-19 | 소니 가부시끼 가이샤 | 발광 소자 및 그 제조 방법 |
| US6639354B1 (en) * | 1999-07-23 | 2003-10-28 | Sony Corporation | Light emitting device, production method thereof, and light emitting apparatus and display unit using the same |
| WO2001014250A2 (en) * | 1999-08-23 | 2001-03-01 | University Of Hawaii | Synthesis of silicon nanoparticles and metal-centered silicon nanoparticles and applications thereof |
| TW474028B (en) * | 2000-02-18 | 2002-01-21 | Ching-Fu Lin | Light-emitting device based on indirect bandgap material |
| KR100411573B1 (ko) * | 2000-03-04 | 2003-12-18 | 주식회사 엔엠씨텍 | 콴텀홀을 이용한 반도체 발광소자의 제조방법 |
| DE10011258A1 (de) * | 2000-03-08 | 2001-09-20 | Rossendorf Forschzent | Integrierter Optokoppler und Verfahren zu seiner Herstellung |
| KR100319300B1 (ko) * | 2000-03-23 | 2002-01-04 | 윤종용 | 이종접합구조의 양자점 버퍼층을 가지는 반도체 소자 |
| US6797412B1 (en) * | 2000-04-11 | 2004-09-28 | University Of Connecticut | Full color display structures using pseudomorphic cladded quantum dot nanophosphor thin films |
| JP3806751B2 (ja) | 2000-05-23 | 2006-08-09 | 独立行政法人科学技術振興機構 | 量子サイズ効果型微小電子銃の製造方法 |
| US6303476B1 (en) * | 2000-06-12 | 2001-10-16 | Ultratech Stepper, Inc. | Thermally induced reflectivity switch for laser thermal processing |
| DE10104193A1 (de) * | 2001-01-31 | 2002-08-01 | Max Planck Gesellschaft | Verfahren zur Herstellung einer Halbleiterstruktur mit Siliziumclustern und/oder -nanokristallen und eine Halbleiterstruktur dieser Art |
| KR100828351B1 (ko) * | 2001-04-17 | 2008-05-08 | 삼성전자주식회사 | 발광 소자 및 이를 적용한 디스플레이 장치 |
| JP2002319701A (ja) * | 2001-04-20 | 2002-10-31 | Kansai Tlo Kk | 発光素子とその製造方法 |
| TW541710B (en) | 2001-06-27 | 2003-07-11 | Epistar Corp | LED having transparent substrate and the manufacturing method thereof |
| KR100446622B1 (ko) * | 2002-01-10 | 2004-09-04 | 삼성전자주식회사 | 실리콘 광소자 및 이를 적용한 발광 디바이스 장치 |
| KR100459894B1 (ko) * | 2002-02-09 | 2004-12-04 | 삼성전자주식회사 | 실리콘 수광소자 |
| KR100455288B1 (ko) * | 2002-03-08 | 2004-11-06 | 삼성전자주식회사 | 실리콘 발광소자를 이용한 평판형 표시장치 |
| US6759686B2 (en) * | 2002-03-15 | 2004-07-06 | Kok Wai Cheah | Silicon-based ultra-violet LED |
| CA2480518C (en) * | 2002-03-29 | 2016-07-19 | Massachusetts Institute Of Technology | Light emitting device including semiconductor nanocrystals |
| KR100491051B1 (ko) * | 2002-08-31 | 2005-05-24 | 한국전자통신연구원 | 이중 구조의 나노점을 갖는 광전소자 및 그 제조방법 |
| US7332211B1 (en) | 2002-11-07 | 2008-02-19 | Massachusetts Institute Of Technology | Layered materials including nanoparticles |
| US7132787B2 (en) * | 2002-11-20 | 2006-11-07 | The Regents Of The University Of California | Multilayer polymer-quantum dot light emitting diodes and methods of making and using thereof |
| CN1293643C (zh) * | 2002-12-30 | 2007-01-03 | 中国科学院半导体研究所 | Cmos结构的硅基发光器件 |
| US7807225B2 (en) * | 2003-01-31 | 2010-10-05 | Sharp Laboratories Of America, Inc. | High density plasma non-stoichiometric SiOxNy films |
| DE10313727B4 (de) * | 2003-03-27 | 2005-11-24 | Forschungszentrum Rossendorf E.V. | Verfahren zur Behandlung Silizium-basierter Lichtemitter |
| US7279832B2 (en) * | 2003-04-01 | 2007-10-09 | Innovalight, Inc. | Phosphor materials and illumination devices made therefrom |
| US20040252488A1 (en) * | 2003-04-01 | 2004-12-16 | Innovalight | Light-emitting ceiling tile |
| DE10318440B3 (de) * | 2003-04-15 | 2005-02-03 | Hahn-Meitner-Institut Berlin Gmbh | Elektrochemisches Verfahren zur direkten nanostrukturierbaren Materialabscheidung auf einem Substrat und mit dem Verfahren hergestelltes Halbleiterbauelement |
| US7083694B2 (en) * | 2003-04-23 | 2006-08-01 | Integrated Materials, Inc. | Adhesive of a silicon and silica composite particularly useful for joining silicon parts |
| US7074630B2 (en) * | 2003-05-20 | 2006-07-11 | United Microelectronics Corp. | Method of forming light emitter layer |
| US7329902B2 (en) * | 2003-06-11 | 2008-02-12 | Stmicroelectronics S.R.L. | IR-light emitters based on SWNT's (single walled carbon nanotubes), semiconducting SWNTs-light emitting diodes and lasers |
| EP1671365B1 (en) * | 2003-10-06 | 2018-12-05 | Massachusetts Institute Of Technology | Non-volatile memory device |
| US7253452B2 (en) | 2004-03-08 | 2007-08-07 | Massachusetts Institute Of Technology | Blue light emitting semiconductor nanocrystal materials |
| US7998884B2 (en) * | 2004-03-15 | 2011-08-16 | Sharp Laboratories Of America, Inc. | Method of forming a light emitting device with a nanocrystalline silicon embedded insulator film |
| WO2005094271A2 (en) * | 2004-03-25 | 2005-10-13 | The Regents Of The University Of California | Colloidal quantum dot light emitting diodes |
| KR100549219B1 (ko) * | 2004-04-12 | 2006-02-03 | 한국전자통신연구원 | 실리콘 발광소자 및 그 제조방법 |
| US7229690B2 (en) * | 2004-07-26 | 2007-06-12 | Massachusetts Institute Of Technology | Microspheres including nanoparticles |
| US7750352B2 (en) | 2004-08-10 | 2010-07-06 | Pinion Technologies, Inc. | Light strips for lighting and backlighting applications |
| EP1626445A1 (en) * | 2004-08-12 | 2006-02-15 | Atomic Energy Council - Institute of Nuclear Energy Research | Red light-emitting device and method for preparing the same |
| EP1626444A1 (en) * | 2004-08-12 | 2006-02-15 | Atomic Energy Council - Institute of Nuclear Energy Research | Infra-red light-emitting device and method for preparing the same |
| US7163902B2 (en) | 2004-08-25 | 2007-01-16 | Atomic Energy Council-Institute Of Nuclear Energy Research | Infra-red light-emitting device and method for preparing the same |
| US7115427B2 (en) | 2004-08-25 | 2006-10-03 | Atomic Energy Council - Institute Of Nuclear Energy Research | Red light-emitting device and method for preparing the same |
| JP4383996B2 (ja) | 2004-09-29 | 2009-12-16 | 株式会社東芝 | 屈折率変化装置および屈折率変化方法 |
| US10225906B2 (en) | 2004-10-22 | 2019-03-05 | Massachusetts Institute Of Technology | Light emitting device including semiconductor nanocrystals |
| US7649196B2 (en) | 2004-11-03 | 2010-01-19 | Massachusetts Institute Of Technology | Light emitting device |
| WO2007018570A2 (en) * | 2004-11-03 | 2007-02-15 | Massachusetts Institute Of Technology | Absorbing film |
| KR100698014B1 (ko) * | 2004-11-04 | 2007-03-23 | 한국전자통신연구원 | 발광 소자용 실리콘 질화막, 이를 이용한 발광 소자 및발광 소자용 실리콘 질화막의 제조방법 |
| US8891575B2 (en) * | 2004-11-30 | 2014-11-18 | Massachusetts Institute Of Technology | Optical feedback structures and methods of making |
| KR20130007649A (ko) * | 2005-02-16 | 2013-01-18 | 매사추세츠 인스티튜트 오브 테크놀로지 | 반도체 나노결정을 포함하는 발광 디바이스 |
| US20060202269A1 (en) * | 2005-03-08 | 2006-09-14 | Semiconductor Energy Laboratory Co., Ltd. | Wireless chip and electronic appliance having the same |
| FR2883418B1 (fr) * | 2005-03-15 | 2007-06-01 | Commissariat Energie Atomique | Procede de fabrication d'une diode electroluminescente a jonction pn nanostructuree et diode obtenue par un tel procede |
| TW200642109A (en) * | 2005-05-20 | 2006-12-01 | Ind Tech Res Inst | Solid light-emitting display and its manufacturing method |
| US7166485B1 (en) * | 2005-07-05 | 2007-01-23 | Sharp Laboratories Of America, Inc. | Superlattice nanocrystal Si-SiO2 electroluminescence device |
| JP2007043016A (ja) * | 2005-08-05 | 2007-02-15 | Hitachi Maxell Ltd | 結晶シリコン素子、およびその製造方法 |
| WO2007018076A1 (ja) * | 2005-08-05 | 2007-02-15 | Hitachi Maxell, Ltd. | 結晶シリコン素子、およびその製造方法 |
| JP2007311545A (ja) * | 2006-05-18 | 2007-11-29 | Hitachi Maxell Ltd | 結晶シリコン素子及び結晶シリコン素子の製造方法 |
| JP2007043006A (ja) * | 2005-08-05 | 2007-02-15 | Hitachi Maxell Ltd | 結晶シリコン素子、およびその製造方法 |
| KR20070035341A (ko) | 2005-09-27 | 2007-03-30 | 삼성전자주식회사 | 간극을 채운 반도체 나노결정층을 함유하는 발광소자 및 그제조방법 |
| JP4954535B2 (ja) * | 2005-11-29 | 2012-06-20 | 日揮触媒化成株式会社 | 電界発光素子 |
| JP2007158067A (ja) * | 2005-12-06 | 2007-06-21 | Opnext Japan Inc | 半導体素子およびその製造方法、ならびに、半導体レーザおよびその製造方法 |
| KR100714123B1 (ko) * | 2005-12-08 | 2007-05-02 | 한국전자통신연구원 | 실리콘 발광소자 |
| US8093604B2 (en) * | 2005-12-28 | 2012-01-10 | Group Iv Semiconductor, Inc. | Engineered structure for solid-state light emitters |
| US8835941B2 (en) | 2006-02-09 | 2014-09-16 | Qd Vision, Inc. | Displays including semiconductor nanocrystals and methods of making same |
| KR100833489B1 (ko) * | 2006-02-21 | 2008-05-29 | 한국전자통신연구원 | 실리콘 나노 점을 이용한 반도체 발광 소자 및 그 제조방법 |
| WO2007143197A2 (en) | 2006-06-02 | 2007-12-13 | Qd Vision, Inc. | Light-emitting devices and displays with improved performance |
| WO2007117668A2 (en) | 2006-04-07 | 2007-10-18 | Qd Vision, Inc. | Methods and articles including nanomaterial |
| US8941299B2 (en) * | 2006-05-21 | 2015-01-27 | Massachusetts Institute Of Technology | Light emitting device including semiconductor nanocrystals |
| US7777290B2 (en) * | 2006-06-13 | 2010-08-17 | Wisconsin Alumni Research Foundation | PIN diodes for photodetection and high-speed, high-resolution image sensing |
| WO2008111947A1 (en) | 2006-06-24 | 2008-09-18 | Qd Vision, Inc. | Methods and articles including nanomaterial |
| US8643058B2 (en) * | 2006-07-31 | 2014-02-04 | Massachusetts Institute Of Technology | Electro-optical device including nanocrystals |
| JP2010508620A (ja) | 2006-09-12 | 2010-03-18 | キユーデイー・ビジヨン・インコーポレーテツド | 所定のパターンを表示するために有用なエレクトロルミネセントディスプレイ |
| US8080824B2 (en) * | 2006-11-15 | 2011-12-20 | Academia Sinica | Suppressing recombination in an electronic device |
| WO2008063652A1 (en) | 2006-11-21 | 2008-05-29 | Qd Vision, Inc. | Blue emitting semiconductor nanocrystals and compositions and devices including same |
| WO2008063658A2 (en) | 2006-11-21 | 2008-05-29 | Qd Vision, Inc. | Semiconductor nanocrystals and compositions and devices including same |
| US9577137B2 (en) * | 2007-01-25 | 2017-02-21 | Au Optronics Corporation | Photovoltaic cells with multi-band gap and applications in a low temperature polycrystalline silicon thin film transistor panel |
| US20080179762A1 (en) * | 2007-01-25 | 2008-07-31 | Au Optronics Corporation | Layered structure with laser-induced aggregation silicon nano-dots in a silicon-rich dielectric layer, and applications of the same |
| JP2008187038A (ja) * | 2007-01-30 | 2008-08-14 | Hitachi Maxell Ltd | 結晶シリコン素子 |
| US8183566B2 (en) * | 2007-03-01 | 2012-05-22 | Hewlett-Packard Development Company, L.P. | Hetero-crystalline semiconductor device and method of making same |
| US20080266689A1 (en) * | 2007-04-26 | 2008-10-30 | Sharp Laboratories Of America, Inc. | Non-stoichiometric SiOxNy optical filters |
| JP4904207B2 (ja) * | 2007-06-06 | 2012-03-28 | シャープ株式会社 | 発光素子、半導体チップ、チップモジュール、発光素子の製造方法 |
| JP2008306135A (ja) * | 2007-06-11 | 2008-12-18 | Hitachi Maxell Ltd | 結晶シリコン素子 |
| EP2223361A1 (en) | 2007-11-28 | 2010-09-01 | National University of Singapore | Multilayer heterostructures for application in oleds and photovoltaic devices |
| KR100928202B1 (ko) * | 2007-12-10 | 2009-11-25 | 한국전자통신연구원 | 실리콘 바이오 센서 및 그의 제조 방법 |
| JP5059628B2 (ja) * | 2008-01-10 | 2012-10-24 | 株式会社日立製作所 | 半導体装置 |
| JP5205983B2 (ja) * | 2008-01-18 | 2013-06-05 | 富士通セミコンダクター株式会社 | 半導体装置のデータ作成方法、および電子線露光システム |
| US9525148B2 (en) | 2008-04-03 | 2016-12-20 | Qd Vision, Inc. | Device including quantum dots |
| KR20110008206A (ko) | 2008-04-03 | 2011-01-26 | 큐디 비젼, 인크. | 양자점들을 포함하는 발광 소자 |
| US20100200880A1 (en) * | 2008-06-06 | 2010-08-12 | Hong Kong Applied Science And Technology Research Institute Co. Ltd. | Semiconductor wafers and semiconductor devices and methods of making semiconductor wafers and devices |
| JP5310528B2 (ja) * | 2008-12-24 | 2013-10-09 | 株式会社豊田中央研究所 | シリコン材料構造体及びその製法 |
| US8000571B2 (en) * | 2009-04-29 | 2011-08-16 | Sharp Laboratories Of America, Inc. | Light emitting device and planar waveguide with single-sided periodically stacked interface |
| TWI408834B (zh) * | 2010-04-02 | 2013-09-11 | Miin Jang Chen | 基於奈米晶粒之光電元件及其製造方法 |
| WO2012071107A1 (en) * | 2010-11-23 | 2012-05-31 | Qd Vision, Inc. | Device including semiconductor nanocrystals & method |
| CN102544136B (zh) * | 2012-01-12 | 2014-12-17 | 南京大学 | 一种纳米材料电子与光电子器件及制备方法 |
| WO2013118248A1 (ja) * | 2012-02-06 | 2013-08-15 | 株式会社日立製作所 | 発光素子 |
| CN106848018B (zh) * | 2017-03-02 | 2018-11-23 | 京东方科技集团股份有限公司 | Led组件、发光装置和电子设备 |
| JP6790004B2 (ja) * | 2018-02-20 | 2020-11-25 | 株式会社東芝 | 半導体受光素子およびその製造方法 |
| CN112687777B (zh) * | 2020-12-18 | 2021-12-03 | 华灿光电(苏州)有限公司 | 发光二极管外延片及其制备方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6050979A (ja) * | 1983-08-30 | 1985-03-22 | Semiconductor Energy Lab Co Ltd | 発光半導体装置 |
| JPH02216877A (ja) * | 1989-02-17 | 1990-08-29 | Canon Inc | 発光ダイオード |
| US5293050A (en) * | 1993-03-25 | 1994-03-08 | International Business Machines Corporation | Semiconductor quantum dot light emitting/detecting devices |
| EP0892445B1 (en) * | 1993-11-02 | 2004-04-07 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device comprising an aggregate of semiconductor micro-needles |
| US5539214A (en) * | 1995-02-06 | 1996-07-23 | Regents Of The University Of California | Quantum bridges fabricated by selective etching of superlattice structures |
| GB9506735D0 (en) * | 1995-03-31 | 1995-05-24 | Univ Dundee | Light emitters and detectors |
| JP3666683B2 (ja) * | 1995-04-27 | 2005-06-29 | シャープ株式会社 | 発光素子およびその製造方法 |
| WO1997049119A1 (en) * | 1996-06-19 | 1997-12-24 | Matsushita Electric Industrial Co., Ltd. | Photoelectronic material, device using the same, and method for manufacturing the same |
-
1998
- 1998-06-25 JP JP17827898A patent/JP4071360B2/ja not_active Expired - Fee Related
- 1998-08-28 EP EP98306936A patent/EP0899796B1/en not_active Expired - Lifetime
- 1998-08-28 KR KR1019980035150A patent/KR19990086981A/ko not_active Abandoned
- 1998-08-28 US US09/143,106 patent/US6157047A/en not_active Expired - Fee Related
- 1998-08-28 DE DE69836177T patent/DE69836177T2/de not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8653501B2 (en) | 2010-06-14 | 2014-02-18 | Canon Kabushiki Kaisha | Emitting device and manufacturing method therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0899796A3 (en) | 2001-04-04 |
| DE69836177T2 (de) | 2007-08-23 |
| US6157047A (en) | 2000-12-05 |
| DE69836177D1 (de) | 2006-11-30 |
| EP0899796A2 (en) | 1999-03-03 |
| EP0899796B1 (en) | 2006-10-18 |
| JPH11135830A (ja) | 1999-05-21 |
| KR19990086981A (ko) | 1999-12-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4071360B2 (ja) | 半導体装置 | |
| CN102197596B (zh) | 电像素化发光装置 | |
| JPH0613655A (ja) | 半導体発光素子および半導体表示装置 | |
| US20230132423A1 (en) | Light emitting diode array with inactive implanted isolation regions and methods of forming the same | |
| KR20010068216A (ko) | 질화물 반도체 백색 발광소자 | |
| JPH05315647A (ja) | 窒化物系半導体素子およびその製造方法 | |
| JP5205729B2 (ja) | 半導体レーザ装置及びその製造方法 | |
| JP3212686B2 (ja) | 半導体発光素子 | |
| JP2009140975A (ja) | 半導体発光装置およびそれを用いる照明装置ならびに半導体発光装置の製造方法 | |
| JPH04118916A (ja) | 半導体装置およびその製造方法 | |
| JP3637236B2 (ja) | 発光薄膜及びその光デバイスの製造方法 | |
| JP3260502B2 (ja) | 電子放出素子 | |
| US6011291A (en) | Video display with integrated control circuitry formed on a dielectric substrate | |
| JP5388954B2 (ja) | 発光素子及びその製造方法 | |
| JPH0846237A (ja) | シリコン発光ダイオード | |
| JPH06140669A (ja) | 発光素子及びその製造方法 | |
| JP3282950B2 (ja) | 電界放出型電子素子及びその製造方法 | |
| JP4163174B2 (ja) | 発光薄膜及びその光デバイス | |
| CN119947376B (zh) | 一种全彩Micro LED显示器件及其制备方法 | |
| JP3514542B2 (ja) | 輝度変調型ダイヤモンド発光素子 | |
| JP2021132092A (ja) | 半導体発光素子アレイ | |
| JP4277363B2 (ja) | Iii族窒化物半導体発光素子 | |
| JPH0669539A (ja) | 発光半導体装置およびその製造方法 | |
| US5945687A (en) | Quantization functional device, quantization functional apparatus utilizing the same, and method for producing the same | |
| JP2007043016A (ja) | 結晶シリコン素子、およびその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040826 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040826 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20040826 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20040826 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070301 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070306 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070427 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20070710 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070907 |
|
| A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20070914 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20071120 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071212 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080115 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080117 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110125 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120125 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130125 Year of fee payment: 5 |
|
| LAPS | Cancellation because of no payment of annual fees |