JP4163174B2 - 発光薄膜及びその光デバイス - Google Patents
発光薄膜及びその光デバイス Download PDFInfo
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- JP4163174B2 JP4163174B2 JP2004344140A JP2004344140A JP4163174B2 JP 4163174 B2 JP4163174 B2 JP 4163174B2 JP 2004344140 A JP2004344140 A JP 2004344140A JP 2004344140 A JP2004344140 A JP 2004344140A JP 4163174 B2 JP4163174 B2 JP 4163174B2
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- 230000003287 optical effect Effects 0.000 title claims description 134
- 239000010409 thin film Substances 0.000 title claims description 50
- 239000000758 substrate Substances 0.000 claims description 96
- 230000005540 biological transmission Effects 0.000 claims description 52
- 238000006243 chemical reaction Methods 0.000 claims description 38
- 230000008878 coupling Effects 0.000 claims description 30
- 238000010168 coupling process Methods 0.000 claims description 30
- 238000005859 coupling reaction Methods 0.000 claims description 30
- 238000004544 sputter deposition Methods 0.000 claims description 27
- 238000000137 annealing Methods 0.000 claims description 24
- 238000005401 electroluminescence Methods 0.000 claims description 19
- 239000001301 oxygen Substances 0.000 claims description 17
- 229910052760 oxygen Inorganic materials 0.000 claims description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 16
- 239000007789 gas Substances 0.000 claims description 12
- 229910004283 SiO 4 Inorganic materials 0.000 claims description 9
- 239000010419 fine particle Substances 0.000 claims description 7
- 238000000295 emission spectrum Methods 0.000 claims description 5
- 230000003595 spectral effect Effects 0.000 claims description 4
- 239000010408 film Substances 0.000 description 143
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 82
- 239000004065 semiconductor Substances 0.000 description 28
- 238000010586 diagram Methods 0.000 description 27
- 229910004298 SiO 2 Inorganic materials 0.000 description 26
- 238000004519 manufacturing process Methods 0.000 description 25
- 238000000034 method Methods 0.000 description 21
- 230000006870 function Effects 0.000 description 17
- 239000013081 microcrystal Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 8
- 238000000151 deposition Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 239000002086 nanomaterial Substances 0.000 description 7
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910052788 barium Inorganic materials 0.000 description 6
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 6
- 239000005388 borosilicate glass Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000000059 patterning Methods 0.000 description 6
- 230000007704 transition Effects 0.000 description 6
- 230000007547 defect Effects 0.000 description 5
- 238000005468 ion implantation Methods 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 5
- 238000002294 plasma sputter deposition Methods 0.000 description 5
- 239000000969 carrier Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 230000010354 integration Effects 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000005477 sputtering target Methods 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000012769 display material Substances 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910021426 porous silicon Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 238000001894 space-charge-limited current method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910018251 LaSi 2 Inorganic materials 0.000 description 1
- 229910017028 MnSi Inorganic materials 0.000 description 1
- 229910017855 NH 4 F Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 1
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- -1 and in particular Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001194 electroluminescence spectrum Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
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- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Electroluminescent Light Sources (AREA)
- Luminescent Compositions (AREA)
Description
S.Fukatsu,H.Yoshida,A.Fujiwara,Y.Takahashi,Y.Shiraki,and R.Ito,Appl.Phys.Lett.61,804(1992). H.Takagi,H.Ogawa,Y.Yamazaki,A.Ishizaki,and T.Nakagiri,Appl.Phys.Lett.56,2379(1990). L.T.Canham,Appl.Phys.Lett.57,1046(1990). P.Bealloul et al.,Appl.Phys.Lett.63,1954(1993).
〔1〕発光薄膜において、Si基板上に、EuSi2 をSiと共にスパッタし、次いでアニーリング処理を施し、前記スパッタリング時又はアニーリング時は酸素を加えた雰囲気ガス中で処理を行ったEuSiO3 とEu2 SiO4 の微粒子の集合体からなり、波長400nmから800nmの発光スペクトル幅を有するエレクトロルミネッセンスを有することを特徴とする。
2 発光薄膜
3,13,16,86b ITO透明電極
4,17,34,35,86a Al電極
E 直流電源
10,24,42,92,100,102 p型単結晶Si基板
11,84,104,204 発光素子
12,23,43,96,103 ESO膜
14,26,71 受光素子
15,30 ESO膜またはn型の微結晶を含有する非晶質SiC層
18 石英ガラス
19 バリウムホウケイ酸ガラス
21 光結合回路素子
22,41,41A 光送信素子
28 下部ITO膜
29,32,51,111,118 SiO2 膜
31 上部ITO膜
33 透明な接着剤
36 パルス発振器
37 電流計
42a,102a Al(又はAu)層
44 光送信部
45 スイッチング変調素子
47,107 ITO膜
48 FET
49 入力信号
52,53 n+ 層
54,114 内部電極層
55,115,215 ソース電極
56,116 ドレイン電極
57,117,222 ゲート電極
58 SiO2 膜(又はSi3 N4 膜)
60,61,62,121,122 金属電極
70 受光部
82 ホトダイオード
82a ホトトランジスタ
94 n+ 型単結晶Si層
99 n型単結晶Si層
101,101A,101B,101C 表示装置
105 スイッチ素子
108 トランジスタ
112,113 n+ 層
205 選択素子
331 水平シフトレジスタ
332 垂直シフトレジスタ
333 メモリ
Claims (7)
- Si基板上に、EuSi2 をSiと共にスパッタし、次いでアニーリング処理を施し、前記スパッタリング時又はアニーリング時は酸素を加えた雰囲気ガス中で処理を行ったEuSiO3 とEu2 SiO4 の微粒子の集合体からなり、波長400nmから800nmの発光スペクトル幅を有する白色エレクトロルミネッセンスを有することを特徴とする発光薄膜。
- Si基板上に、EuSi2 をSiと共にスパッタし、次いでアニーリング処理を施し、前記スパッタリング時又はアニーリング時は酸素を加えた雰囲気ガス中で処理を行ったEuSiO3 とEu2 SiO4 の微粒子の集合体からなり、波長400nmから800nmの発光スペクトル幅を有する白色エレクトロルミネッセンスを有する発光薄膜と、該発光薄膜上に形成されるITO電極を具備することを特徴とする光デバイス。
- 請求項1記載の発光薄膜を発光部に備え、前記Si基板を共通にするとともに、光導波路を介して水平方向に集積される受光部を具備する光結合素子機能を有することを特徴とする光デバイス。
- 請求項1記載の発光薄膜を発光部に備え、該発光部に垂直方向に集積される受光部を具備する光結合回路素子機能を有することを特徴とする光デバイス。
- 請求項1記載の発光薄膜を発光部に備え、前記Si基板を共通にするとともに、水平方向に集積されるスイッチング変調素子を前記発光部に直列接続する光送信素子機能を有することを特徴とする光デバイス。
- 請求項1記載の発光薄膜を発光部に備え、該発光部に垂直方向に集積される受光部を具備する光−光変換素子機能を有することを特徴とする光デバイス。
- 請求項1記載の発光薄膜を発光部に備え、前記Si基板を共通にするとともに、水平方向に集積されるスイッチング素子を前記発光部に直列接続する表示装置機能を有することを特徴とする光デバイス。
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JP4163174B2 true JP4163174B2 (ja) | 2008-10-08 |
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US8179033B2 (en) | 2006-09-14 | 2012-05-15 | Panasonic Corporation | Display apparatus |
JP5103513B2 (ja) * | 2010-10-08 | 2012-12-19 | シャープ株式会社 | 発光装置 |
CN104465411B (zh) * | 2013-09-17 | 2017-05-17 | 中芯国际集成电路制造(上海)有限公司 | 晶圆级封装方法 |
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