JP2020528670A5 - - Google Patents

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JP2020528670A5
JP2020528670A5 JP2020503041A JP2020503041A JP2020528670A5 JP 2020528670 A5 JP2020528670 A5 JP 2020528670A5 JP 2020503041 A JP2020503041 A JP 2020503041A JP 2020503041 A JP2020503041 A JP 2020503041A JP 2020528670 A5 JP2020528670 A5 JP 2020528670A5
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JP
Japan
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amorphous silicon
silicon layer
substrate
patterned
patterned features
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JP2020503041A
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Japanese (ja)
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JP2020528670A (ja
JP7242631B2 (ja
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Priority claimed from PCT/US2018/034439 external-priority patent/WO2019022826A1/en
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Publication of JP2020528670A5 publication Critical patent/JP2020528670A5/ja
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JP2020503041A 2017-07-24 2018-05-24 酸化ケイ素上の超薄型アモルファスシリコン膜の連続性を向上させるための前処理手法 Active JP7242631B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762536275P 2017-07-24 2017-07-24
US62/536,275 2017-07-24
PCT/US2018/034439 WO2019022826A1 (en) 2017-07-24 2018-05-24 PRETREATMENT APPARATUS FOR IMPROVING THE CONTINUITY OF ULTRA-THIN AMORPHOUS SILICON FILM ON SILICON OXIDE

Publications (3)

Publication Number Publication Date
JP2020528670A JP2020528670A (ja) 2020-09-24
JP2020528670A5 true JP2020528670A5 (enExample) 2021-07-26
JP7242631B2 JP7242631B2 (ja) 2023-03-20

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JP2020503041A Active JP7242631B2 (ja) 2017-07-24 2018-05-24 酸化ケイ素上の超薄型アモルファスシリコン膜の連続性を向上させるための前処理手法

Country Status (5)

Country Link
US (1) US10559465B2 (enExample)
JP (1) JP7242631B2 (enExample)
KR (1) KR102509390B1 (enExample)
CN (2) CN110709967B (enExample)
WO (1) WO2019022826A1 (enExample)

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