JP2020113702A - 抵抗変化型ランダムアクセスメモリ - Google Patents
抵抗変化型ランダムアクセスメモリ Download PDFInfo
- Publication number
- JP2020113702A JP2020113702A JP2019005316A JP2019005316A JP2020113702A JP 2020113702 A JP2020113702 A JP 2020113702A JP 2019005316 A JP2019005316 A JP 2019005316A JP 2019005316 A JP2019005316 A JP 2019005316A JP 2020113702 A JP2020113702 A JP 2020113702A
- Authority
- JP
- Japan
- Prior art keywords
- variable resistance
- resistance element
- bit line
- electrode
- variable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 230000008859 change Effects 0.000 claims description 17
- 230000002441 reversible effect Effects 0.000 claims description 8
- 229910000314 transition metal oxide Inorganic materials 0.000 claims description 5
- 230000010354 integration Effects 0.000 abstract description 11
- 229910052751 metal Inorganic materials 0.000 description 98
- 239000002184 metal Substances 0.000 description 98
- 239000010410 layer Substances 0.000 description 49
- 239000010408 film Substances 0.000 description 21
- 239000011229 interlayer Substances 0.000 description 19
- 238000010586 diagram Methods 0.000 description 14
- 238000009792 diffusion process Methods 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 7
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 6
- 229920005591 polysilicon Polymers 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000007772 electrode material Substances 0.000 description 3
- 238000003491 array Methods 0.000 description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0007—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising metal oxide memory material, e.g. perovskites
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/003—Cell access
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0023—Address circuits or decoders
- G11C13/0026—Bit-line or column circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0023—Address circuits or decoders
- G11C13/0028—Word-line or row circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0038—Power supply circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/004—Reading or sensing circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0097—Erasing, e.g. resetting, circuits or methods
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
- H10B63/84—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays arranged in a direction perpendicular to the substrate, e.g. 3D cell arrays
- H10B63/845—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays arranged in a direction perpendicular to the substrate, e.g. 3D cell arrays the switching components being connected to a common vertical conductor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/253—Multistable switching devices, e.g. memristors having three or more electrodes, e.g. transistor-like devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/841—Electrodes
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/004—Reading or sensing circuits or methods
- G11C2013/0045—Read using current through the cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
- G11C2013/0078—Write using current through the cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
- G11C2013/009—Write using potential difference applied between cell electrodes
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/72—Array wherein the access device being a diode
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/78—Array wherein the memory cells of a group share an access device, all the memory cells of the group having a common electrode and the access device being not part of a word line or a bit line driver
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/79—Array wherein the access device being a transistor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/82—Array having, for accessing a cell, a word line, a bit line and a plate or source line receiving different potentials
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Memories (AREA)
- Networks Using Active Elements (AREA)
Abstract
Description
110:メモリアレイ
120:行デコーダおよび駆動回路(X−DEC)
130:列デコーダおよび駆動回路(Y−DEC)
140:列選択回路(YMUX)
150:制御回路
160:センスアンプ
170:書込みドライバ・読出しバイアス回路170
Claims (9)
- 可逆性かつ不揮発性の可変抵抗素子にデータを記憶する抵抗変化型メモリであって、
基板表面に形成された複数のアクセス用トランジスタと、
基板表面上に垂直方向に積層された複数の可変抵抗素子であって、1つのアクセス用トランジスタの一方の電極には、複数の可変抵抗素子のそれぞれの一方の電極が電気的に共通に接続される、前記複数の可変抵抗素子とを有し、
前記複数の可変抵抗素子のそれぞれの他方の電極にビット線が電気的に接続され、前記複数のアクセス用トランジスタのそれぞれの他方の電極にソース線が電気的に接続され、行方向のアクセス用トランジスタの各ゲートにワード線が共通に接続される、抵抗変化型メモリ。 - 前記複数の可変抵抗素子のそれぞれには、一定以上のバイアスが印加されたときに電流を流すダイオードが接続される、請求項1に記載の抵抗変化型メモリ。
- 前記ダイオードは、順方向バイアスが印加されたとき順方向の電流を流し、逆方向バイアスが印加されたとき逆方向の電流を流す、請求項2に記載の抵抗変化型メモリ。
- 複数の可変抵抗素子は、多層配線構造の各階層の配線上に可変抵抗素子がそれぞれ形成される、請求項1ないし3いずれか1つに記載の抵抗変化型メモリ。
- 複数の可変抵抗素子は、各階層において互いに異なる位置に形成される、請求項1に記載の可変抵抗型メモリ。
- 可変抵抗素子とダイオードは、ビアコンタクト内に積層される、請求項2ないし5いずれか1つに記載の抵抗変化型メモリ。
- 可変抵抗素子は、遷移金属酸化物を含む、請求項1ないし6いずれか1つに記載の抵抗変化型メモリ。
- 前記複数のビット線と前記複数のソース線は、メモリセルアレイ上において平行である、請求項1に記載の抵抗変化型メモリ。
- 前記複数のビット線と前記複数のソース線は、メモリセルアレイ上において直交する、請求項1に記載の抵抗変化型メモリ。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019005316A JP6829733B2 (ja) | 2019-01-16 | 2019-01-16 | 抵抗変化型ランダムアクセスメモリ |
TW108131685A TWI771611B (zh) | 2019-01-16 | 2019-09-03 | 電阻式記憶體 |
CN201910919104.5A CN111445937B (zh) | 2019-01-16 | 2019-09-26 | 电阻式存储器 |
KR1020190134606A KR102414814B1 (ko) | 2019-01-16 | 2019-10-28 | 저항형 메모리 |
US16/666,421 US11222923B2 (en) | 2019-01-16 | 2019-10-29 | Resistance variable memory |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019005316A JP6829733B2 (ja) | 2019-01-16 | 2019-01-16 | 抵抗変化型ランダムアクセスメモリ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020113702A true JP2020113702A (ja) | 2020-07-27 |
JP6829733B2 JP6829733B2 (ja) | 2021-02-10 |
Family
ID=71517971
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019005316A Active JP6829733B2 (ja) | 2019-01-16 | 2019-01-16 | 抵抗変化型ランダムアクセスメモリ |
Country Status (5)
Country | Link |
---|---|
US (1) | US11222923B2 (ja) |
JP (1) | JP6829733B2 (ja) |
KR (1) | KR102414814B1 (ja) |
CN (1) | CN111445937B (ja) |
TW (1) | TWI771611B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021039815A (ja) * | 2019-09-05 | 2021-03-11 | キオクシア株式会社 | 半導体記憶装置 |
US11417375B2 (en) * | 2019-12-17 | 2022-08-16 | Micron Technology, Inc. | Discharge current mitigation in a memory array |
US11711926B2 (en) * | 2020-09-18 | 2023-07-25 | Macronix International Co., Ltd. | Memory array and memory structure |
US20220399059A1 (en) * | 2021-06-10 | 2022-12-15 | National Central University | Memory circuit, memory device and operation method thereof |
US11776595B2 (en) * | 2022-01-25 | 2023-10-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Memory device with source line control |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003249073A (ja) * | 2001-12-21 | 2003-09-05 | Toshiba Corp | 磁気ランダムアクセスメモリ |
JP2005203463A (ja) * | 2004-01-14 | 2005-07-28 | Sharp Corp | 不揮発性半導体記憶装置 |
JP2006127747A (ja) * | 2004-10-26 | 2006-05-18 | Samsung Electronics Co Ltd | 半導体メモリ装置とそのプログラミング方法 |
WO2007023569A1 (ja) * | 2005-08-26 | 2007-03-01 | Fujitsu Limited | 不揮発性半導体記憶装置及びその書き込み方法 |
JP2008269741A (ja) * | 2007-04-24 | 2008-11-06 | Spansion Llc | 不揮発性記憶装置およびその制御方法 |
JP2009224778A (ja) * | 2008-03-13 | 2009-10-01 | Samsung Electronics Co Ltd | 抵抗物質および内部電極を使用する不揮発性メモリ装置、これの製造方法、およびこれを含むプロセシングシステム |
JP2010108595A (ja) * | 2003-12-26 | 2010-05-13 | Panasonic Corp | 記憶素子 |
WO2011152061A1 (ja) * | 2010-06-03 | 2011-12-08 | パナソニック株式会社 | クロスポイント型抵抗変化不揮発性記憶装置 |
US20150070966A1 (en) * | 2013-09-12 | 2015-03-12 | Sandisk 3D Llc | Method of operating fet low current 3d re-ram |
JP2016134193A (ja) * | 2015-01-21 | 2016-07-25 | 力旺電子股▲分▼有限公司 | 抵抗変化型ランダムアクセスメモリのメモリセルアレイ |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5623795A (en) | 1979-08-03 | 1981-03-06 | Hitachi Ltd | Device for arranging circular part |
CN1764982B (zh) * | 2003-03-18 | 2011-03-23 | 株式会社东芝 | 相变存储器装置及其制造方法 |
JP2005203389A (ja) * | 2004-01-13 | 2005-07-28 | Sharp Corp | 不揮発性半導体記憶装置の製造方法 |
US7719913B2 (en) * | 2008-09-12 | 2010-05-18 | Macronix International Co., Ltd. | Sensing circuit for PCRAM applications |
US9042153B2 (en) * | 2010-08-20 | 2015-05-26 | Shine C. Chung | Programmable resistive memory unit with multiple cells to improve yield and reliability |
US8315079B2 (en) * | 2010-10-07 | 2012-11-20 | Crossbar, Inc. | Circuit for concurrent read operation and method therefor |
EP2608210B1 (en) | 2011-12-23 | 2019-04-17 | IMEC vzw | Stacked RRAM array with integrated transistor selector |
US9087572B2 (en) * | 2012-11-29 | 2015-07-21 | Rambus Inc. | Content addressable memory |
KR20140113024A (ko) | 2013-03-15 | 2014-09-24 | 에스케이하이닉스 주식회사 | 저항 변화 메모리 장치 및 그 구동방법 |
JP2015026998A (ja) * | 2013-07-26 | 2015-02-05 | 株式会社東芝 | マルチコンテキストコンフィグレーションメモリ |
US20150070965A1 (en) * | 2013-09-12 | 2015-03-12 | Sandisk 3D Llc | FET LOW CURRENT 3D ReRAM NON-VOLATILE STORAGE |
JP5748877B1 (ja) | 2014-03-07 | 2015-07-15 | ウィンボンド エレクトロニクス コーポレーション | 抵抗変化型メモリ |
KR102275540B1 (ko) * | 2014-12-18 | 2021-07-13 | 삼성전자주식회사 | 가변 저항 메모리 소자 |
CN106205681A (zh) | 2015-04-29 | 2016-12-07 | 复旦大学 | 用于三维竖直堆叠阻变存储器抑制IR drop电压降和读写干扰的架构和操作算法 |
FR3038132B1 (fr) * | 2015-06-23 | 2017-08-11 | St Microelectronics Crolles 2 Sas | Cellule memoire resistive ayant une structure compacte |
US9514810B1 (en) * | 2016-02-08 | 2016-12-06 | Freescale Semiconductor, Inc. | Resistive non-volatile memory cell and method for programming same |
JP6430576B2 (ja) * | 2017-04-19 | 2018-11-28 | ウィンボンド エレクトロニクス コーポレーション | 抵抗変化型ランダムアクセスメモリ |
-
2019
- 2019-01-16 JP JP2019005316A patent/JP6829733B2/ja active Active
- 2019-09-03 TW TW108131685A patent/TWI771611B/zh active
- 2019-09-26 CN CN201910919104.5A patent/CN111445937B/zh active Active
- 2019-10-28 KR KR1020190134606A patent/KR102414814B1/ko active IP Right Grant
- 2019-10-29 US US16/666,421 patent/US11222923B2/en active Active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003249073A (ja) * | 2001-12-21 | 2003-09-05 | Toshiba Corp | 磁気ランダムアクセスメモリ |
JP2010108595A (ja) * | 2003-12-26 | 2010-05-13 | Panasonic Corp | 記憶素子 |
JP2005203463A (ja) * | 2004-01-14 | 2005-07-28 | Sharp Corp | 不揮発性半導体記憶装置 |
JP2006127747A (ja) * | 2004-10-26 | 2006-05-18 | Samsung Electronics Co Ltd | 半導体メモリ装置とそのプログラミング方法 |
WO2007023569A1 (ja) * | 2005-08-26 | 2007-03-01 | Fujitsu Limited | 不揮発性半導体記憶装置及びその書き込み方法 |
JP2008269741A (ja) * | 2007-04-24 | 2008-11-06 | Spansion Llc | 不揮発性記憶装置およびその制御方法 |
JP2009224778A (ja) * | 2008-03-13 | 2009-10-01 | Samsung Electronics Co Ltd | 抵抗物質および内部電極を使用する不揮発性メモリ装置、これの製造方法、およびこれを含むプロセシングシステム |
WO2011152061A1 (ja) * | 2010-06-03 | 2011-12-08 | パナソニック株式会社 | クロスポイント型抵抗変化不揮発性記憶装置 |
US20150070966A1 (en) * | 2013-09-12 | 2015-03-12 | Sandisk 3D Llc | Method of operating fet low current 3d re-ram |
JP2016134193A (ja) * | 2015-01-21 | 2016-07-25 | 力旺電子股▲分▼有限公司 | 抵抗変化型ランダムアクセスメモリのメモリセルアレイ |
Also Published As
Publication number | Publication date |
---|---|
CN111445937A (zh) | 2020-07-24 |
KR102414814B1 (ko) | 2022-06-30 |
KR20200089590A (ko) | 2020-07-27 |
US11222923B2 (en) | 2022-01-11 |
JP6829733B2 (ja) | 2021-02-10 |
TW202029195A (zh) | 2020-08-01 |
CN111445937B (zh) | 2022-03-08 |
TWI771611B (zh) | 2022-07-21 |
US20200227476A1 (en) | 2020-07-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11011580B2 (en) | Memory device | |
JP6829733B2 (ja) | 抵抗変化型ランダムアクセスメモリ | |
JP5222761B2 (ja) | 抵抗変化型不揮発性記憶装置 | |
US8963115B2 (en) | Memory device and method of manufacturing memory device | |
JP6810725B2 (ja) | 抵抗変化型ランダムアクセスメモリ | |
JP2016167332A (ja) | 記憶装置 | |
US10991760B2 (en) | Memory device having PUC structure | |
JP2009199713A5 (ja) | ||
JP2018181395A (ja) | 抵抗変化型ランダムアクセスメモリ | |
JP4004103B2 (ja) | マスクrom | |
CN113078183B (zh) | 可变电阻式存储装置及其制造方法 | |
US11744088B2 (en) | Memory device | |
US10734449B2 (en) | Storage device | |
JP5700602B1 (ja) | 不揮発性半導体メモリ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190117 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200212 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200422 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200826 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20201029 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210120 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20210122 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6829733 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |