JP2019516235A - セラミック材料、バリスタ、並びにセラミック材料及びバリスタの製造方法 - Google Patents
セラミック材料、バリスタ、並びにセラミック材料及びバリスタの製造方法 Download PDFInfo
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- JP2019516235A JP2019516235A JP2018548358A JP2018548358A JP2019516235A JP 2019516235 A JP2019516235 A JP 2019516235A JP 2018548358 A JP2018548358 A JP 2018548358A JP 2018548358 A JP2018548358 A JP 2018548358A JP 2019516235 A JP2019516235 A JP 2019516235A
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- 229910010293 ceramic material Inorganic materials 0.000 title claims abstract description 75
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000000919 ceramic Substances 0.000 claims abstract description 49
- 239000000654 additive Substances 0.000 claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 25
- 230000000996 additive effect Effects 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 18
- 150000001875 compounds Chemical class 0.000 claims abstract description 17
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 5
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 5
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 5
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 5
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims description 20
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 12
- 238000005245 sintering Methods 0.000 claims description 11
- 239000002002 slurry Substances 0.000 claims description 9
- 229910020599 Co 3 O 4 Inorganic materials 0.000 claims description 8
- 150000004767 nitrides Chemical class 0.000 claims description 8
- 229910044991 metal oxide Inorganic materials 0.000 claims description 7
- 150000004706 metal oxides Chemical class 0.000 claims description 7
- 150000001242 acetic acid derivatives Chemical class 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 239000008187 granular material Substances 0.000 claims description 5
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims description 4
- -1 Sb 2 O 3 Inorganic materials 0.000 claims description 3
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- 150000004677 hydrates Chemical class 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims 1
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- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
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- 230000003247 decreasing effect Effects 0.000 description 1
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- 229910052709 silver Inorganic materials 0.000 description 1
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Abstract
Description
0.40mol%≦b1≦0.55mol%、
1.10mol%≦s≦1.90mol%、
0.50mol%≦c1≦0.80mol%、
0.20mol%≦m≦0.30mol%、
0.70mol%≦n≦1.20mol%、
0.25mol%≦y≦0.45mol%、
0.00mol%≦c2≦0.10mol%、
0.003mol%≦a≦0.006mol%、及び
0.005mol%≦b2≦0.015mol%である。
F=(c1+5c2+2s+4y−m−250a)(1−z)/b1
20 電極層
30 絶縁層
A Y−Biリッチ相
B Biリッチ液相
C スピネルZn7Sb2O13相
F 組成係数
E1mA バリスタ勾配
s7 急峻性
Js リーク電流密度
Claims (14)
- 主成分であるZnOと、
Al3+含有溶液、Ba2+含有溶液、及び金属元素を含む少なくとも1種の化合物からなる群から選択される添加物とを含み、前記金属元素は、Bi、Sb、Co、Mn、Ni、Y及びCrからなる群から選択されるセラミック材料。 - セラミック材料中の添加物の含有量は、≦5mol%である請求項1に記載のセラミック材料。
- c1は、Co3O4中のCoの当量であり、mは、Mn3O4中のMnの当量であり、sは、Sb2O3中のSbの当量であり、c2は、Cr2O3中のCrの当量であり、
aは、Al3+の含有量であり、yは、Y2O3中のYの当量であり、b1は、Bi2O3中のBiの当量であり、nは、NiO中のNiの当量であり、b2は、Ba2+の含有量であり、
zは、ZnOの含有量であり、かつ、
0.4mol%≦b1≦0.55mol%、
1.10mol%≦s≦1.90mol%、
0.50mol%≦c1≦0.80mol%、
0.20mol%≦m≦0.30mol%、
0.70mol%≦n≦1.20mol%、
0.25mol%≦y≦0.45mol%、
0.00mol%≦c2≦0.10mol%、
0.003mol%≦a≦0.006mol%、及び
0.005mol%≦b2≦0.015mol%である先行する請求項の1つに記載のセラミック材料。 - (c1+5c2+2s+4y−m−250a)(1−z)/b1=Fであり、かつ0.27≦F≦0.43である先行する請求項に記載のセラミック材料。
- 少なくとも1つの化合物は、金属酸化物、金属炭酸塩、金属酢酸塩、金属窒化物及びそれらの混合物からなる群から選択される先行する請求項の1つに記載のセラミック材料。
- 少なくとも1つの化合物は、Bi2O3、Sb2O3、Co3O4、Mn3O4、NiO、Y2O3及びCr2O3からなる群から選択される先行する請求項の1つに記載のセラミック材料。
- Al3+含有溶液及びBa2+含有溶液は、
窒化物、酢酸塩、水和物及びそれらの混合物からなる群から選択される溶液である先行する請求項の1つに記載のセラミック材料。 - 1020℃以上1060℃以下の焼結温度を有する先行する請求項の1つに記載のセラミック材料。
- 先行する請求項の1つに記載の焼結セラミック材料を含むセラミック体(10)を含むバリスタ。
- 480V/mm以上640V/mm以下のバリスタ勾配E1mAを有する先行する請求項に記載のバリスタ。
- 添加物の第1の部分を秤量、混合及びボールミリングし、
ZnO及び添加物の第2の部分を添加し、
均一なスラリーを形成し、
スラリーを噴霧乾燥してセラミック材料の粒状物を形成する製造ステップを有する請求項1〜8の1つに記載のセラミック材料の製造方法。 - 添加物の第1の部分は、金属元素を含有する少なくとも1つの化合物であり、前記金属元素は、Bi、Sb、Co、Mn、Ni、Y、及びCrからなる群から選択され、前記添加物の第2の部分は、Al3+含有溶液及びBa2+含有溶液の少なくとも1つである先行する請求項に記載の方法。
- 請求項11又は12の1つに記載の方法で製造されたセラミック材料を含有するセラミック体(10)を形成し、
セラミック体(10)に電極層(20)を塗布する製造ステップを含み、前記セラミック材料は、1020℃以上1060℃以下の温度で焼結されてセラミック体を形成するバリスタの製造方法。 - 前記セラミック体(10)の形成は、
請求項11又は12の1つに記載の方法で製造されたセラミック材料の粒状物を乾式成形し、
セラミック材料を脱バインダ処理するステップをさらに含む先行する請求項に記載の方法。
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