JP2019054091A5 - - Google Patents
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- JP2019054091A5 JP2019054091A5 JP2017176838A JP2017176838A JP2019054091A5 JP 2019054091 A5 JP2019054091 A5 JP 2019054091A5 JP 2017176838 A JP2017176838 A JP 2017176838A JP 2017176838 A JP2017176838 A JP 2017176838A JP 2019054091 A5 JP2019054091 A5 JP 2019054091A5
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- 239000000758 substrate Substances 0.000 claims 27
- 239000004065 semiconductor Substances 0.000 claims 17
- 238000009792 diffusion process Methods 0.000 claims 10
- 238000002955 isolation Methods 0.000 claims 7
- 239000004020 conductor Substances 0.000 claims 6
- 238000006243 chemical reaction Methods 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 1
- 238000005468 ion implantation Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 1
- 229920005591 polysilicon Polymers 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017176838A JP6825520B2 (ja) | 2017-09-14 | 2017-09-14 | 半導体装置、半導体装置の製造方法、電力変換装置 |
| US15/951,262 US10505027B2 (en) | 2017-09-14 | 2018-04-12 | Semiconductor device, method of manufacturing semiconductor device and power conversion device |
| DE102018211354.8A DE102018211354A1 (de) | 2017-09-14 | 2018-07-10 | Halbleitervorrichtung, Verfahren zum Herstellen einer Halbleitervorrichtung und Leistungsumwandlungsvorrichtung |
| US16/596,950 US11239350B2 (en) | 2017-09-14 | 2019-10-09 | Semiconductor device, method of manufacturing semiconductor device, power conversion device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017176838A JP6825520B2 (ja) | 2017-09-14 | 2017-09-14 | 半導体装置、半導体装置の製造方法、電力変換装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019054091A JP2019054091A (ja) | 2019-04-04 |
| JP2019054091A5 true JP2019054091A5 (enExample) | 2020-01-30 |
| JP6825520B2 JP6825520B2 (ja) | 2021-02-03 |
Family
ID=65441665
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017176838A Active JP6825520B2 (ja) | 2017-09-14 | 2017-09-14 | 半導体装置、半導体装置の製造方法、電力変換装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US10505027B2 (enExample) |
| JP (1) | JP6825520B2 (enExample) |
| DE (1) | DE102018211354A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6720569B2 (ja) * | 2015-02-25 | 2020-07-08 | 株式会社デンソー | 半導体装置 |
| JP7120916B2 (ja) * | 2018-12-27 | 2022-08-17 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| DE102019210681A1 (de) * | 2019-05-31 | 2020-12-03 | Robert Bosch Gmbh | Leistungstransistorzelle und Leistungstransistor |
| JP7438080B2 (ja) * | 2020-10-30 | 2024-02-26 | 三菱電機株式会社 | 半導体装置 |
| JP7574743B2 (ja) * | 2021-05-28 | 2024-10-29 | 株式会社デンソー | 半導体装置およびその製造方法 |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MXPA03000602A (es) * | 2001-05-21 | 2003-05-14 | Marconi Comm Inc | Sistemas de energia, circuitos de potencia y compoenentes para sistemas de energia. |
| US6551881B1 (en) * | 2001-10-01 | 2003-04-22 | Koninklijke Philips Electronics N.V. | Self-aligned dual-oxide umosfet device and a method of fabricating same |
| JP4623956B2 (ja) | 2003-11-12 | 2011-02-02 | 株式会社豊田中央研究所 | Igbt |
| JP2005340626A (ja) | 2004-05-28 | 2005-12-08 | Toshiba Corp | 半導体装置 |
| JP2006303287A (ja) * | 2005-04-22 | 2006-11-02 | Toshiba Corp | 電力用半導体装置 |
| JP2008060416A (ja) | 2006-08-31 | 2008-03-13 | Toshiba Corp | 半導体装置 |
| JP5383009B2 (ja) * | 2007-07-17 | 2014-01-08 | 三菱電機株式会社 | 半導体装置の設計方法 |
| US8022474B2 (en) * | 2008-09-30 | 2011-09-20 | Infineon Technologies Austria Ag | Semiconductor device |
| JP5195357B2 (ja) * | 2008-12-01 | 2013-05-08 | トヨタ自動車株式会社 | 半導体装置 |
| US8247296B2 (en) * | 2009-12-09 | 2012-08-21 | Semiconductor Components Industries, Llc | Method of forming an insulated gate field effect transistor device having a shield electrode structure |
| JP2011176077A (ja) | 2010-02-24 | 2011-09-08 | Toshiba Corp | 半導体装置 |
| DE102011079747A1 (de) * | 2010-07-27 | 2012-02-02 | Denso Corporation | Halbleitervorrichtung mit Schaltelement und Freilaufdiode, sowie Steuerverfahren hierfür |
| JP5246302B2 (ja) * | 2010-09-08 | 2013-07-24 | 株式会社デンソー | 半導体装置 |
| JP5594276B2 (ja) | 2010-12-08 | 2014-09-24 | 株式会社デンソー | 絶縁ゲート型半導体装置 |
| JP5879732B2 (ja) | 2011-04-18 | 2016-03-08 | 富士電機株式会社 | トレンチ絶縁ゲート型半導体装置 |
| US9190503B2 (en) * | 2011-09-28 | 2015-11-17 | Toyota Jidosha Kabushiki Kaisha | IGBT and method of manufacturing the same |
| US9048118B2 (en) * | 2012-02-13 | 2015-06-02 | Maxpower Semiconductor Inc. | Lateral transistors with low-voltage-drop shunt to body diode |
| JP5844656B2 (ja) | 2012-02-20 | 2016-01-20 | ルネサスエレクトロニクス株式会社 | 半導体装置及び半導体装置の製造方法 |
| JP5579216B2 (ja) | 2012-03-26 | 2014-08-27 | 株式会社東芝 | 半導体装置及びその製造方法 |
| US9245985B2 (en) * | 2012-03-28 | 2016-01-26 | Infineon Technologies Americas Corp. | IGBT with buried emitter electrode |
| JP6072445B2 (ja) * | 2012-06-28 | 2017-02-01 | 株式会社 日立パワーデバイス | 半導体装置およびそれを用いた電力変換装置 |
| US9059256B2 (en) * | 2012-09-13 | 2015-06-16 | Infineon Technologies Ag | Method for producing a controllable semiconductor component |
| JP2014060362A (ja) * | 2012-09-19 | 2014-04-03 | Toshiba Corp | 半導体装置 |
| WO2014174911A1 (ja) | 2013-04-23 | 2014-10-30 | 三菱電機株式会社 | 半導体装置 |
| JP6119577B2 (ja) * | 2013-11-26 | 2017-04-26 | 三菱電機株式会社 | 半導体装置 |
| WO2015093190A1 (ja) | 2013-12-16 | 2015-06-25 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
| US9570542B2 (en) * | 2014-04-01 | 2017-02-14 | Infineon Technologies Ag | Semiconductor device including a vertical edge termination structure and method of manufacturing |
| US20170213908A1 (en) * | 2014-07-25 | 2017-07-27 | United Silicon Carbide, Inc. | Self-aligned shielded-gate trench mos-controlled silicon carbide switch with reduced miller capacitance and method of manufacturing the same |
| JP2016039170A (ja) * | 2014-08-05 | 2016-03-22 | 株式会社東芝 | 半導体装置 |
| JP2016111207A (ja) | 2014-12-08 | 2016-06-20 | 三菱電機株式会社 | 電力用半導体装置 |
| DE102014119543B4 (de) * | 2014-12-23 | 2018-10-11 | Infineon Technologies Ag | Halbleitervorrichtung mit transistorzellen und anreicherungszellen sowie leistungsmodul |
| CN106663692B (zh) | 2015-02-03 | 2020-03-06 | 富士电机株式会社 | 半导体装置及其制造方法 |
| JP6720569B2 (ja) * | 2015-02-25 | 2020-07-08 | 株式会社デンソー | 半導体装置 |
| KR101745776B1 (ko) * | 2015-05-12 | 2017-06-28 | 매그나칩 반도체 유한회사 | 전력용 반도체 소자 |
| DE102016118543B4 (de) * | 2015-10-15 | 2025-01-30 | Infineon Technologies Ag | Halbleiterbauelemente, leistungshalbleiterbauelemente und verfahren zum bilden eines halbleiterbauelements |
| DE102015122804B4 (de) * | 2015-12-23 | 2020-10-15 | Infineon Technologies Ag | Halbleitervorrichtung, enthaltend eine Wärmesenkenstruktur |
| DE102016120292A1 (de) * | 2016-10-25 | 2018-04-26 | Infineon Technologies Ag | Halbleitervorrichtung, die eine Transistorvorrichtung enthält |
| US10439054B2 (en) * | 2017-06-29 | 2019-10-08 | Kabushiki Kaisha Toshiba | Insulated gate bipolar transistor |
-
2017
- 2017-09-14 JP JP2017176838A patent/JP6825520B2/ja active Active
-
2018
- 2018-04-12 US US15/951,262 patent/US10505027B2/en active Active
- 2018-07-10 DE DE102018211354.8A patent/DE102018211354A1/de active Pending
-
2019
- 2019-10-09 US US16/596,950 patent/US11239350B2/en active Active
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