JP2018113679A5 - - Google Patents
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- JP2018113679A5 JP2018113679A5 JP2017231535A JP2017231535A JP2018113679A5 JP 2018113679 A5 JP2018113679 A5 JP 2018113679A5 JP 2017231535 A JP2017231535 A JP 2017231535A JP 2017231535 A JP2017231535 A JP 2017231535A JP 2018113679 A5 JP2018113679 A5 JP 2018113679A5
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- JP
- Japan
- Prior art keywords
- substrate
- side wall
- forming
- wafer
- stopper layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 claims 34
- 239000000758 substrate Substances 0.000 claims 28
- 229910052751 metal Inorganic materials 0.000 claims 14
- 239000002184 metal Substances 0.000 claims 14
- 238000007789 sealing Methods 0.000 claims 14
- 230000002093 peripheral effect Effects 0.000 claims 9
- 238000005530 etching Methods 0.000 claims 8
- 239000000956 alloy Substances 0.000 claims 7
- 229910045601 alloy Inorganic materials 0.000 claims 7
- 238000009792 diffusion process Methods 0.000 claims 4
- 239000010408 film Substances 0.000 claims 4
- 239000007791 liquid phase Substances 0.000 claims 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- 239000010931 gold Substances 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 229910052738 indium Inorganic materials 0.000 claims 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 claims 2
- 238000009966 trimming Methods 0.000 claims 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 238000001312 dry etching Methods 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
Applications Claiming Priority (24)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662429223P | 2016-12-02 | 2016-12-02 | |
| US201662429186P | 2016-12-02 | 2016-12-02 | |
| US201662429183P | 2016-12-02 | 2016-12-02 | |
| US201662429188P | 2016-12-02 | 2016-12-02 | |
| US201662429218P | 2016-12-02 | 2016-12-02 | |
| US201662429190P | 2016-12-02 | 2016-12-02 | |
| US201662429179P | 2016-12-02 | 2016-12-02 | |
| US201662429226P | 2016-12-02 | 2016-12-02 | |
| US62/429,223 | 2016-12-02 | ||
| US62/429,190 | 2016-12-02 | ||
| US62/429,218 | 2016-12-02 | ||
| US62/429,226 | 2016-12-02 | ||
| US62/429,188 | 2016-12-02 | ||
| US62/429,179 | 2016-12-02 | ||
| US62/429,183 | 2016-12-02 | ||
| US62/429,186 | 2016-12-02 | ||
| US201762539871P | 2017-08-01 | 2017-08-01 | |
| US201762539863P | 2017-08-01 | 2017-08-01 | |
| US201762539873P | 2017-08-01 | 2017-08-01 | |
| US201762539861P | 2017-08-01 | 2017-08-01 | |
| US62/539,871 | 2017-08-01 | ||
| US62/539,861 | 2017-08-01 | ||
| US62/539,863 | 2017-08-01 | ||
| US62/539,873 | 2017-08-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2018113679A JP2018113679A (ja) | 2018-07-19 |
| JP2018113679A5 true JP2018113679A5 (enExample) | 2021-01-14 |
Family
ID=62240167
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017231535A Pending JP2018113679A (ja) | 2016-12-02 | 2017-12-01 | 基板間のキャビティ内に形成されてビアを含む電子デバイスを製造する方法 |
| JP2017231525A Pending JP2018113678A (ja) | 2016-12-02 | 2017-12-01 | 基板間のキャビティ内に形成されてビアを含む電子デバイス |
| JP2017231513A Pending JP2018110381A (ja) | 2016-12-02 | 2017-12-01 | 製造中の水侵入を防止する電子デバイスの製造方法 |
| JP2017231501A Active JP7009186B2 (ja) | 2016-12-02 | 2017-12-01 | キャビティに形成される電子デバイスを製造する方法 |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017231525A Pending JP2018113678A (ja) | 2016-12-02 | 2017-12-01 | 基板間のキャビティ内に形成されてビアを含む電子デバイス |
| JP2017231513A Pending JP2018110381A (ja) | 2016-12-02 | 2017-12-01 | 製造中の水侵入を防止する電子デバイスの製造方法 |
| JP2017231501A Active JP7009186B2 (ja) | 2016-12-02 | 2017-12-01 | キャビティに形成される電子デバイスを製造する方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (5) | US10439587B2 (enExample) |
| JP (4) | JP2018113679A (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6270506B2 (ja) * | 2014-01-27 | 2018-01-31 | オリンパス株式会社 | 積層型超音波振動デバイスおよび超音波医療装置 |
| US10541152B2 (en) | 2014-07-31 | 2020-01-21 | Skyworks Solutions, Inc. | Transient liquid phase material bonding and sealing structures and methods of forming same |
| US10568213B2 (en) | 2014-07-31 | 2020-02-18 | Skyworks Solutions, Inc. | Multilayered transient liquid phase bonding |
| US10439587B2 (en) | 2016-12-02 | 2019-10-08 | Skyworks Solutions, Inc. | Methods of manufacturing electronic devices formed in a cavity |
| KR20180134238A (ko) * | 2017-06-08 | 2018-12-18 | (주)와이솔 | 웨이퍼레벨패키지 및 제조방법 |
| JP6791390B2 (ja) * | 2017-08-29 | 2020-11-25 | 株式会社村田製作所 | 弾性波装置、高周波フロントエンド回路及び通信装置 |
| US10418294B1 (en) * | 2018-05-15 | 2019-09-17 | Texas Instruments Incorporated | Semiconductor device package with a cap to selectively exclude contact with mold compound |
| US11496111B2 (en) | 2018-10-18 | 2022-11-08 | Skyworks Solutions, Inc. | Methods of plasma dicing bulk acoustic wave components |
| US10903186B2 (en) | 2018-10-19 | 2021-01-26 | Toyota Motor Engineering & Manufacturing North America, Inc. | Power electronic assemblies with solder layer and exterior coating, and methods of forming the same |
| US11430758B2 (en) * | 2018-12-29 | 2022-08-30 | Texas Instruments Incorporated | Creating 3D features through selective laser annealing and/or laser ablation |
| CN109795980B (zh) * | 2019-01-08 | 2020-09-29 | 上海华虹宏力半导体制造有限公司 | Mems器件的制造方法 |
| JP7246775B2 (ja) * | 2019-07-19 | 2023-03-28 | 中芯集成電路(寧波)有限公司上海分公司 | Baw共振器のパッケージングモジュールおよびパッケージング方法 |
| US11581870B2 (en) * | 2019-09-27 | 2023-02-14 | Skyworks Solutions, Inc. | Stacked acoustic wave resonator package with laser-drilled VIAS |
| CN111130493B (zh) * | 2019-12-31 | 2021-03-12 | 诺思(天津)微系统有限责任公司 | 具有叠置单元的半导体结构及制造方法、电子设备 |
| JP7456788B2 (ja) * | 2020-01-28 | 2024-03-27 | 太陽誘電株式会社 | 圧電デバイスおよびその製造方法 |
| CN111606297B (zh) * | 2020-04-28 | 2021-04-16 | 诺思(天津)微系统有限责任公司 | 器件结构及其制造方法、滤波器、电子设备 |
| CN111786647B (zh) * | 2020-08-07 | 2021-06-15 | 展讯通信(上海)有限公司 | 晶圆级声表面波滤波器与封装方法 |
| KR102881013B1 (ko) | 2020-11-23 | 2025-11-04 | 삼성전기주식회사 | 인쇄회로기판 |
| US12375057B2 (en) * | 2021-03-31 | 2025-07-29 | Skyworks Solutions, Inc. | Method of manufacturing a self-shielded acoustic wave device package |
| US12470201B2 (en) | 2021-08-27 | 2025-11-11 | Skyworks Solutions, Inc. | Packaged multilayer piezoelectric surface acoustic wave device with conductive pillar |
| US12407315B2 (en) | 2021-11-08 | 2025-09-02 | Skyworks Solutions, Inc. | Stacked filter package having multiple types of acoustic wave devices |
| US20230245978A1 (en) * | 2022-02-01 | 2023-08-03 | Skyworks Solutions, Inc. | Shielded wafer level chip scale package with shield connected to ground with vias through die |
| CN115276601B (zh) * | 2022-09-29 | 2023-01-06 | 苏州汉天下电子有限公司 | 一种测试用谐振器、制备方法及谐振器的测试方法 |
Family Cites Families (78)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3439231A (en) | 1967-02-13 | 1969-04-15 | Mallory & Co Inc P R | Hermetically encapsulated electronic device |
| EP0364214B1 (en) | 1988-10-11 | 1995-01-11 | Sony Corporation | Optical wavelength conversion devices |
| US5448014A (en) * | 1993-01-27 | 1995-09-05 | Trw Inc. | Mass simultaneous sealing and electrical connection of electronic devices |
| JPH1050638A (ja) * | 1996-07-29 | 1998-02-20 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
| US6521477B1 (en) | 2000-02-02 | 2003-02-18 | Raytheon Company | Vacuum package fabrication of integrated circuit components |
| US6578754B1 (en) | 2000-04-27 | 2003-06-17 | Advanpack Solutions Pte. Ltd. | Pillar connections for semiconductor chips and method of manufacture |
| JP2002289768A (ja) * | 2000-07-17 | 2002-10-04 | Rohm Co Ltd | 半導体装置およびその製法 |
| US6884313B2 (en) | 2001-01-08 | 2005-04-26 | Fujitsu Limited | Method and system for joining and an ultra-high density interconnect |
| KR100396551B1 (ko) * | 2001-02-03 | 2003-09-03 | 삼성전자주식회사 | 웨이퍼 레벨 허메틱 실링 방법 |
| TW560018B (en) | 2001-10-30 | 2003-11-01 | Asia Pacific Microsystems Inc | A wafer level packaged structure and method for manufacturing the same |
| US6793829B2 (en) | 2002-02-27 | 2004-09-21 | Honeywell International Inc. | Bonding for a micro-electro-mechanical system (MEMS) and MEMS based devices |
| US7832177B2 (en) | 2002-03-22 | 2010-11-16 | Electronics Packaging Solutions, Inc. | Insulated glazing units |
| JP2004095849A (ja) * | 2002-08-30 | 2004-03-25 | Fujikura Ltd | 貫通電極付き半導体基板の製造方法、貫通電極付き半導体デバイスの製造方法 |
| JP3892370B2 (ja) | 2002-09-04 | 2007-03-14 | 富士通メディアデバイス株式会社 | 弾性表面波素子、フィルタ装置及びその製造方法 |
| JP4766831B2 (ja) * | 2002-11-26 | 2011-09-07 | 株式会社村田製作所 | 電子部品の製造方法 |
| US7089635B2 (en) | 2003-02-25 | 2006-08-15 | Palo Alto Research Center, Incorporated | Methods to make piezoelectric ceramic thick film arrays and elements |
| US7183622B2 (en) * | 2004-06-30 | 2007-02-27 | Intel Corporation | Module integrating MEMS and passive components |
| JP4513513B2 (ja) * | 2004-11-09 | 2010-07-28 | 株式会社村田製作所 | 電子部品の製造方法 |
| JP2006197554A (ja) * | 2004-12-17 | 2006-07-27 | Seiko Epson Corp | 弾性表面波デバイス及びその製造方法、icカード、携帯用電子機器 |
| JP4692024B2 (ja) * | 2005-03-04 | 2011-06-01 | パナソニック株式会社 | 弾性表面波デバイス |
| US7400042B2 (en) | 2005-05-03 | 2008-07-15 | Rosemount Aerospace Inc. | Substrate with adhesive bonding metallization with diffusion barrier |
| US7538401B2 (en) | 2005-05-03 | 2009-05-26 | Rosemount Aerospace Inc. | Transducer for use in harsh environments |
| US7628309B1 (en) | 2005-05-03 | 2009-12-08 | Rosemount Aerospace Inc. | Transient liquid phase eutectic bonding |
| JP2006345170A (ja) * | 2005-06-08 | 2006-12-21 | Toshiba Corp | 薄膜圧電共振器 |
| JP2007019132A (ja) * | 2005-07-06 | 2007-01-25 | Seiko Epson Corp | 圧電振動装置の製造方法 |
| JP4517992B2 (ja) | 2005-09-14 | 2010-08-04 | セイコーエプソン株式会社 | 導通孔形成方法、並びに圧電デバイスの製造方法、及び圧電デバイス |
| JP4717573B2 (ja) * | 2005-09-26 | 2011-07-06 | ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー | Mri装置 |
| US7936062B2 (en) * | 2006-01-23 | 2011-05-03 | Tessera Technologies Ireland Limited | Wafer level chip packaging |
| US7892972B2 (en) * | 2006-02-03 | 2011-02-22 | Micron Technology, Inc. | Methods for fabricating and filling conductive vias and conductive vias so formed |
| JP2007266294A (ja) * | 2006-03-28 | 2007-10-11 | Kyocera Corp | 半導体素子集積デバイス、半導体装置およびその製造方法 |
| JP2008252351A (ja) * | 2007-03-29 | 2008-10-16 | Murata Mfg Co Ltd | 弾性表面波素子及びその製造方法 |
| US20090004500A1 (en) | 2007-06-26 | 2009-01-01 | Daewoong Suh | Multilayer preform for fast transient liquid phase bonding |
| CN101878527B (zh) | 2007-11-30 | 2012-09-26 | 斯盖沃克斯瑟路申斯公司 | 使用倒装芯片安装的晶片级封装 |
| JP5262136B2 (ja) * | 2008-01-28 | 2013-08-14 | 株式会社村田製作所 | 電子部品の製造方法 |
| WO2009104293A1 (ja) * | 2008-02-18 | 2009-08-27 | セイコーインスツル株式会社 | 圧電振動子の製造方法、圧電振動子、発振器、電子機器及び電波時計 |
| JP2009200093A (ja) * | 2008-02-19 | 2009-09-03 | Murata Mfg Co Ltd | 中空型の電子部品 |
| DE102008025202B4 (de) | 2008-05-27 | 2014-11-06 | Epcos Ag | Hermetisch geschlossenes Gehäuse für elektronische Bauelemente und Herstellungsverfahren |
| JP5610177B2 (ja) * | 2008-07-09 | 2014-10-22 | 国立大学法人東北大学 | 機能デバイス及びその製造方法 |
| JPWO2010021267A1 (ja) * | 2008-08-21 | 2012-01-26 | 株式会社村田製作所 | 電子部品装置およびその製造方法 |
| CN102474239B (zh) * | 2009-07-30 | 2014-10-29 | 日本碍子株式会社 | 复合基板及其制造方法 |
| US8348139B2 (en) | 2010-03-09 | 2013-01-08 | Indium Corporation | Composite solder alloy preform |
| JP2011223234A (ja) * | 2010-04-08 | 2011-11-04 | Seiko Epson Corp | 圧電振動子、圧電デバイス、貫通電極構造、半導体装置、半導体パッケージ |
| JP5640610B2 (ja) | 2010-09-29 | 2014-12-17 | 三菱マテリアル株式会社 | パワーモジュール用基板の製造装置 |
| US8592986B2 (en) | 2010-11-09 | 2013-11-26 | Rohm Co., Ltd. | High melting point soldering layer alloyed by transient liquid phase and fabrication method for the same, and semiconductor device |
| DE102011016554B4 (de) * | 2011-04-08 | 2018-11-22 | Snaptrack, Inc. | Waferlevel-Package und Verfahren zur Herstellung |
| US8513806B2 (en) | 2011-06-30 | 2013-08-20 | Rohm Co., Ltd. | Laminated high melting point soldering layer formed by TLP bonding and fabrication method for the same, and semiconductor device |
| JP5510613B2 (ja) * | 2011-07-08 | 2014-06-04 | 株式会社村田製作所 | 回路モジュール |
| JP2013055632A (ja) * | 2011-08-11 | 2013-03-21 | Nippon Dempa Kogyo Co Ltd | 気密封止パッケージ及びこの気密封止パッケージの製造方法 |
| JP5588419B2 (ja) * | 2011-10-26 | 2014-09-10 | 株式会社東芝 | パッケージ |
| US9773750B2 (en) | 2012-02-09 | 2017-09-26 | Apple Inc. | Method of transferring and bonding an array of micro devices |
| JP5837845B2 (ja) * | 2012-02-23 | 2015-12-24 | 京セラ株式会社 | 電子部品の製造方法及び電子部品 |
| US10058951B2 (en) | 2012-04-17 | 2018-08-28 | Toyota Motor Engineering & Manufacturing North America, Inc. | Alloy formation control of transient liquid phase bonding |
| US9044822B2 (en) | 2012-04-17 | 2015-06-02 | Toyota Motor Engineering & Manufacturing North America, Inc. | Transient liquid phase bonding process for double sided power modules |
| KR102061695B1 (ko) * | 2012-10-17 | 2020-01-02 | 삼성전자주식회사 | 웨이퍼 가공 방법 |
| DE102012110542B4 (de) | 2012-11-05 | 2017-04-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Selbstaktivierender Dünnschichtgetter in reaktiven Mehrschichtsystemen |
| DE102012112058B4 (de) * | 2012-12-11 | 2020-02-27 | Snaptrack, Inc. | MEMS-Bauelement und Verfahren zur Verkapselung von MEMS-Bauelementen |
| TW201427113A (zh) | 2012-12-21 | 2014-07-01 | 財團法人工業技術研究院 | 發光二極體封裝的固晶方法和固晶結構 |
| US9406577B2 (en) * | 2013-03-13 | 2016-08-02 | Globalfoundries Singapore Pte. Ltd. | Wafer stack protection seal |
| JP6061248B2 (ja) | 2013-03-29 | 2017-01-18 | 国立研究開発法人産業技術総合研究所 | 接合方法及び半導体モジュールの製造方法 |
| JP6385648B2 (ja) * | 2013-05-14 | 2018-09-05 | 太陽誘電株式会社 | 弾性波デバイス、及び弾性波デバイスの製造方法 |
| JP6374240B2 (ja) * | 2013-07-05 | 2018-08-15 | トヨタ モーター エンジニアリング アンド マニュファクチャリング ノース アメリカ,インコーポレイティド | 両面パワーモジュールのための液相拡散接合プロセス |
| JP6158676B2 (ja) | 2013-10-15 | 2017-07-05 | 新光電気工業株式会社 | 配線基板、半導体装置及び配線基板の製造方法 |
| JP6335476B2 (ja) * | 2013-11-06 | 2018-05-30 | 太陽誘電株式会社 | モジュール |
| US9634641B2 (en) * | 2013-11-06 | 2017-04-25 | Taiyo Yuden Co., Ltd. | Electronic module having an interconnection substrate with a buried electronic device therein |
| US9793877B2 (en) | 2013-12-17 | 2017-10-17 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Encapsulated bulk acoustic wave (BAW) resonator device |
| US9768345B2 (en) | 2013-12-20 | 2017-09-19 | Apple Inc. | LED with current injection confinement trench |
| US10541152B2 (en) | 2014-07-31 | 2020-01-21 | Skyworks Solutions, Inc. | Transient liquid phase material bonding and sealing structures and methods of forming same |
| US10568213B2 (en) | 2014-07-31 | 2020-02-18 | Skyworks Solutions, Inc. | Multilayered transient liquid phase bonding |
| DE112015003845T5 (de) | 2014-08-22 | 2017-05-18 | Kabushiki Kaisha Toyota Jidoshokki | Bondaufbau, Bondmaterieal und Bondverfahren |
| US9893116B2 (en) * | 2014-09-16 | 2018-02-13 | Toshiba Memory Corporation | Manufacturing method of electronic device and manufacturing method of semiconductor device |
| US10196745B2 (en) | 2014-10-31 | 2019-02-05 | General Electric Company | Lid and method for sealing a non-magnetic package |
| JP2016096265A (ja) * | 2014-11-14 | 2016-05-26 | 株式会社東芝 | デバイスの製造方法 |
| US9847310B2 (en) * | 2015-07-18 | 2017-12-19 | Semiconductor Components Industries, Llc | Flip chip bonding alloys |
| TW201730994A (zh) * | 2015-12-08 | 2017-09-01 | 天工方案公司 | 使用一載體晶圓以在晶圓級晶片尺寸封裝中提供保護空腔及整合式被動組件之方法 |
| JP6718837B2 (ja) * | 2016-04-01 | 2020-07-08 | スカイワークスフィルターソリューションズジャパン株式会社 | 電子部品とその製造方法、及び電子装置とその製造方法 |
| US10439587B2 (en) * | 2016-12-02 | 2019-10-08 | Skyworks Solutions, Inc. | Methods of manufacturing electronic devices formed in a cavity |
| KR102064380B1 (ko) * | 2018-06-22 | 2020-01-10 | (주)와이솔 | 표면 탄성파 소자 패키지 및 그 제조 방법 |
| US11496111B2 (en) * | 2018-10-18 | 2022-11-08 | Skyworks Solutions, Inc. | Methods of plasma dicing bulk acoustic wave components |
-
2017
- 2017-12-01 US US15/828,625 patent/US10439587B2/en active Active
- 2017-12-01 JP JP2017231535A patent/JP2018113679A/ja active Pending
- 2017-12-01 US US15/828,631 patent/US10763820B2/en active Active
- 2017-12-01 US US15/828,637 patent/US10965269B2/en active Active
- 2017-12-01 US US15/828,616 patent/US20180159502A1/en not_active Abandoned
- 2017-12-01 JP JP2017231525A patent/JP2018113678A/ja active Pending
- 2017-12-01 JP JP2017231513A patent/JP2018110381A/ja active Pending
- 2017-12-01 JP JP2017231501A patent/JP7009186B2/ja active Active
-
2019
- 2019-09-25 US US16/582,010 patent/US11050407B2/en active Active
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