JP2018097367A - 発光ダイオードディスプレイの製造方法および発光ダイオードディスプレイ - Google Patents
発光ダイオードディスプレイの製造方法および発光ダイオードディスプレイ Download PDFInfo
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Abstract
【解決手段】本方法は、A)成長基板を設けるステップと;B)基板表面に直接または間接的に緩衝層4を形成するステップと;C)緩衝層4上または緩衝層4に複数の個別の成長点を形成するステップと;D)成長点を起点として個別の放射活性島部5を形成するステップであって、島部5は、それぞれ、少なくとも1つの活性領域55を有する無機半導体積層体50を含み、島部の基板表面の上面視における平均径が、50nm〜20μm(両端値を含む)である、ステップと、E)島部5を電気的に制御するために島部5をトランジスタ6に接続するステップと、を含む。
【選択図】図1J
Description
A)基板上面を有する成長基板を設けるステップと、
B)前記基板上面に間接的にまたは直接的に少なくとも1層の緩衝層を形成するステップと、
C)前記緩衝層上または前記緩衝層に複数の個別の成長点を形成するステップと、
D)前記成長点を起点として個々の放射活性島部を形成するステップであって、前記島部は、それぞれ、少なくとも1つの活性領域を有する無機半導体積層体を含み、前記島部それぞれの前記基板上面の上面視における平均径は、50nm〜20μm(両端値を含む)である、ステップと、
E)前記島部を電気的に作動させるために、前記島部とトランジスタとを相互接続するステップとを含む。
Claims (20)
- A)基板上面(20)を有する成長基板(2)を設けるステップと、
B)前記基板上面(20)に間接的にまたは直接的に少なくとも1層の緩衝層(3,4)を形成するステップと、
C)前記緩衝層(3,4)上または前記緩衝層(3,4)に複数の個別の成長点(45)を形成するステップと、
D)前記成長点(45)を起点として個々の放射活性島部(5)を形成するステップであって、前記島部(5)は、それぞれ、少なくとも1つの活性領域(55)を有する無機半導体積層体(50)を含み、前記島部(5)の前記基板上面(20)の上面視における平均径は、50nm〜20μm(両端値を含む)である、ステップと、
E)前記島部(5)を電気的に作動させるために、前記島部(5)とトランジスタ(6)とを相互接続するステップと、
を含む、発光ダイオードディスプレイ(1)の製造方法。 - 前記トランジスタ(6)は、それぞれ、正確に1つの前記島部(5)それぞれと関連付けられ、前記発光ダイオードディスプレイ(1)の画素が、前記島部(5)から形成され、
前記島部(5)は、前記活性領域(55)、n型導電層(51)、およびp型導電層(53)を含んで構成されるコアシェル構造を有し、前記半導体積層体(50)の前記p型導電層(53)および前記活性領域(55)が、コアを形成する前記n型導電層(51)のシェルを構成し、
隣り合う前記島部(5)間の領域は、充填化合物(8)により充填され、前記充填化合物(8)は、前記島部(5)間の光の結合を調整又は減少するように構成される、
請求項1に記載の方法。 - 前記成長点(45)は、前記緩衝層(3,4)上に形成され、前記島部(5)は、エピタキシャル成長によって前記成長点(45)を起点として形成される、
請求項1に記載の方法。 - ステップE)において、キャリア基板(9)が前記島部(5)の前記成長基板(2)とは反対側の面に形成され、次いで前記成長基板(2)は除去され、
前記トランジスタ(6)は、前記キャリア基板(9)に含まれる、
請求項1に記載の方法。 - 前記緩衝層(4)は、二次元的な構造化されていない層として形成され、
複数の開口部を有する電気絶縁材料で形成されるマスク層(7)が、ステップD)を行う前に前記緩衝層(4)上に堆積され、前記マスク層(7)は完成した前記発光ダイオードディスプレイ(1)内に残存し、前記島部(5)は前記マスク層(7)を越えて突出する、
請求項1〜4のいずれか一項に記載の方法。 - 前記成長点(45)は、前記緩衝層(4)の構造化によって形成され、
前記構造化は、マスク処理技術を用いて材料除去によって行われ、
前記構造化は、前記マスク層(7)を堆積させる前記ステップよりも前に行われる、
請求項1〜5のいずれか一項に記載の方法。 - 前記成長基板(2)は、シリコン基板であり、
遷移金属または希土類金属の酸化物または窒化物を有する第1緩衝層(3)が、前記成長基板(2)に直接形成され、
GaNまたはAlGaNをベースとする、前記第1緩衝層とは異なる第2緩衝層(4)が、ステップC)よりも前に前記第1緩衝層(3)に直接形成され、
前記島部(5)および前記半導体積層体(50)は、AlInGaNをベースとする、
請求項1〜6のいずれか一項に記載の方法。 - 隣り合う前記島部(5)間の領域が、ステップD)後、完全に前記充填化合物(8)によって充填される、
請求項2に記載の方法。 - 前記充填化合物(8)は、隣り合う前記島部(5)間の領域を部分的にのみ充填し、前記島部(5)の周囲にシェルのように配置される、
請求項2に記載の方法。 - 散乱粒子または蛍光体が、前記充填化合物(8)に付加された、
請求項8に記載の方法。 - 前記緩衝層(4)は、前記キャリア基板(9)とは反対側の面に、隣り合う前記島部(5)間の光の結合を減少させるように構造化されて設けられ、
前記緩衝層(4)の第1領域は、主出射方向における前記島部(5)の直下に配置され、光の減結合を向上させる構造を有し、
隣り合う前記島部(5)間の前記緩衝層(4)の領域同士は、互いに部分的に離隔する、
請求項4に記載の方法。 - 前記充填化合物(8)は、続いて平坦化され、前記成長基板(2)とは反対側の前記島部(5)の上面において、部分的に除去され、p側コンタクトが前記p型導電層(53)上に形成される、
請求項2に記載の方法。 - 複数のトランジスタ(6)を有するキャリア(2,9)と、
複数の個別の放射活性島部(5)と、を有する発光ダイオードディスプレイ(1)であって、
前記島部(5)は、それぞれ、少なくとも1つの活性領域(55)を有する無機半導体積層体(50)を含み、
前記島部(5)の前記キャリア(2,9)の上面視における平均径が、50nm〜20μm(両端値を含む)であり、
前記島部(5)の前記半導体積層体(50)の平均高さが、少なくとも1.5μm以上であり、
前記島部(5)は、前記トランジスタ(6)と電気的に相互接続される、
発光ダイオードディスプレイ。 - 前記島部(5)は、前記トランジスタ(6)のそれぞれが正確に1つの前記島部(5)それぞれと関連付けられ、且つ、前記発光ダイオードディスプレイ(1)の画素が前記島部(5)から形成されるように、前記トランジスタ(6)と電気的に相互接続され、
前記島部(5)は、前記活性領域(55)、n型導電層(51)、およびp型導電層(53)を含んで構成されるコアシェル構造を有し、前記半導体積層体(50)の前記p型導電層(53)および前記活性領域(55)が、コアを形成する前記n型導電層(51)のシェルを構成し、
隣り合う前記島部(5)間の領域は、充填化合物(8)により充填され、前記充填化合物(8)は、前記島部(5)間の光の結合を調整又は減少するように構成される、
請求項13に記載の発光ダイオードディスプレイ。 - 前記充填化合物(8)は、放射に対する不透明性、放射低減性、放射吸収性を有する、
請求項13に記載の発光ダイオードディスプレイ。 - 前記充填化合物(8)は、放射透過性を有すると共に、光活性材料を含有する、
請求項13に記載の発光ダイオードディスプレイ。 - 構造化された緩衝層(3,4)が、前記キャリア(9)とは反対側の前記島部(5)の側に設けられ、
前記緩衝層の第1領域は、主出射方向における前記島部(5)の直下に配置され、光の減結合を向上させる構造を有し、
隣り合う前記島部(5)間の前記緩衝層の領域同士は、互いに部分的に離隔する、
請求項13に記載の発光ダイオードディスプレイ。 - 前記充填化合物(8)は、前記充填化合物(8)が、前記島部(5)の周囲に島のように配置され、前記充填化合物(8)が複数の分離した領域によって構成されるように隣り合う前記島部(5)間の領域を埋め、
前記充填化合物(8)の分離した領域のそれぞれは、前記島部(5)の一つと正確に関連付けられている、
請求項13に記載の発光ダイオードディスプレイ。 - 前記充填化合物(8)は、隣り合う前記島部(5)間の領域を充填し、
充填された前記充填化合物(8)が、前記島部(5)の周囲に島のように配置された、
請求項13に記載の発光ダイオードディスプレイ。 - 隣り合う前記島部(5)間の領域は、電気的絶縁材料によって充填され、
当該電気的絶縁材料が、前記島部(5)と直接接触し、密着して適合するように前記島部(5)を封入する、
請求項13に記載の発光ダイオードディスプレイ。
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020017730A (ja) * | 2018-07-25 | 2020-01-30 | 株式会社ジェイマイクロJmicro Inc. | 透明発光ディスプレイフィルム、透明発光ディスプレイフィルムの製造方法、及び透明発光ディスプレイフィルムを用いた透明発光サイネージ |
WO2021014972A1 (ja) * | 2019-07-25 | 2021-01-28 | 日亜化学工業株式会社 | 画像表示装置の製造方法および画像表示装置 |
Families Citing this family (70)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11792898B2 (en) | 2012-07-01 | 2023-10-17 | Ideal Industries Lighting Llc | Enhanced fixtures for area lighting |
US11160148B2 (en) | 2017-06-13 | 2021-10-26 | Ideal Industries Lighting Llc | Adaptive area lamp |
CN104641453B (zh) * | 2012-10-12 | 2018-03-30 | 住友电气工业株式会社 | Iii族氮化物复合衬底及其制造方法以及制造iii族氮化物半导体器件的方法 |
DE102013211707B4 (de) | 2013-06-20 | 2024-03-28 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Anordnung mit einem Träger, Array mit mehreren Anordnungen und Verfahren zum Herstellen einer Anordnung |
DE102013114691A1 (de) | 2013-12-20 | 2015-06-25 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauteil und adaptiver Scheinwerfer für ein Kraftfahrzeug |
DE102014100542A1 (de) | 2014-01-20 | 2015-07-23 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung einer lateral strukturierten Schicht und optoelektronisches Halbleiterbauteil mit einer solchen Schicht |
DE102014105734A1 (de) | 2014-04-23 | 2015-10-29 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauteil und Verfahren zur Herstellung eines optoelektronischen Halbleiterbauteils |
CN113035850B (zh) * | 2014-06-18 | 2022-12-06 | 艾克斯展示公司技术有限公司 | 微组装led显示器 |
DE102015104144A1 (de) * | 2015-03-19 | 2016-09-22 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterkörper und Verfahren zur Herstellung eines optoelektronischen Halbleiterkörpers |
FR3033939B1 (fr) * | 2015-03-20 | 2018-04-27 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif optoelectronique a diode electroluminescente |
FR3041148A1 (fr) * | 2015-09-14 | 2017-03-17 | Valeo Vision | Source lumineuse led comprenant un circuit electronique |
DE102015119653A1 (de) * | 2015-11-13 | 2017-05-18 | Osram Opto Semiconductors Gmbh | Modul für eine Videowand |
US10529696B2 (en) | 2016-04-12 | 2020-01-07 | Cree, Inc. | High density pixelated LED and devices and methods thereof |
KR20170129983A (ko) | 2016-05-17 | 2017-11-28 | 삼성전자주식회사 | 발광소자 패키지, 이를 이용한 디스플레이 장치 및 그 제조방법 |
DE102016220915A1 (de) | 2016-10-25 | 2018-04-26 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung von optoelektronischen Halbleiterbauteilen und optoelektronisches Halbleiterbauteil |
FR3061608B1 (fr) * | 2016-12-29 | 2019-05-31 | Aledia | Dispositif optoelectronique a diodes electroluminescentes |
DE102017107201A1 (de) * | 2017-04-04 | 2018-10-04 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen eines optoelektronischen Halbleiterbauelements und optoelektronisches Halbleiterbauelement |
DE102017113745A1 (de) * | 2017-06-21 | 2018-12-27 | Osram Opto Semiconductors Gmbh | Halbleiterdisplay, optoelektronisches Halbleiterbauteil und Verfahren zur Herstellung solcher |
US10734363B2 (en) | 2017-08-03 | 2020-08-04 | Cree, Inc. | High density pixelated-LED chips and chip array devices |
EP3662514A1 (en) * | 2017-08-03 | 2020-06-10 | Cree, Inc. | High density pixelated-led chips and chip array devices, and fabrication methods |
JPWO2019031183A1 (ja) * | 2017-08-10 | 2020-08-20 | シャープ株式会社 | 半導体モジュール、表示装置、及び半導体モジュールの製造方法 |
US10439101B2 (en) * | 2017-08-18 | 2019-10-08 | Intel Corporation | Micro light-emitting diode (LED) elements and display |
EP3796389B1 (en) * | 2017-10-19 | 2023-08-09 | Tectus Corporation | Ultra-dense led projector |
WO2019079381A1 (en) | 2017-10-19 | 2019-04-25 | Spy Eye, Llc | ULTRA-DENSE LED PROJECTOR |
US20190198564A1 (en) * | 2017-12-20 | 2019-06-27 | Lumileds Llc | Monolithic segmented led array architecture with islanded epitaxial growth |
US11749790B2 (en) * | 2017-12-20 | 2023-09-05 | Lumileds Llc | Segmented LED with embedded transistors |
US11961875B2 (en) | 2017-12-20 | 2024-04-16 | Lumileds Llc | Monolithic segmented LED array architecture with islanded epitaxial growth |
US11054112B2 (en) | 2017-12-22 | 2021-07-06 | Lumileds Llc | Ceramic phosphor with lateral light barriers |
US20190198720A1 (en) | 2017-12-22 | 2019-06-27 | Lumileds Llc | Particle systems and patterning for monolithic led arrays |
FR3077653A1 (fr) * | 2018-02-06 | 2019-08-09 | Aledia | Dispositif optoelectronique avec des composants electroniques au niveau de la face arriere du substrat et procede de fabrication |
US10529773B2 (en) | 2018-02-14 | 2020-01-07 | Cree, Inc. | Solid state lighting devices with opposing emission directions |
WO2019168187A1 (ja) * | 2018-03-02 | 2019-09-06 | 株式会社 東芝 | 発光ダイオードシート、表示装置、発光装置、表示装置の製造方法及び発光装置の製造方法 |
DE102018105786A1 (de) * | 2018-03-13 | 2019-09-19 | Osram Opto Semiconductors Gmbh | Multipixelchip und Verfahren zur Herstellung eines Multipixelchips |
US10652963B2 (en) | 2018-05-24 | 2020-05-12 | Lumiode, Inc. | LED display structures and fabrication of same |
KR20190137458A (ko) | 2018-06-01 | 2019-12-11 | 삼성전자주식회사 | Led를 이용한 디스플레이 모듈 제조방법 |
KR102530068B1 (ko) | 2018-06-26 | 2023-05-08 | 삼성전자주식회사 | 발광 소자 패키지, 이를 포함하는 디스플레이 장치, 및 그 제조 방법 |
KR102534248B1 (ko) | 2018-07-17 | 2023-05-18 | 삼성전자주식회사 | 발광 소자 패키지 |
US11271033B2 (en) | 2018-09-27 | 2022-03-08 | Lumileds Llc | Micro light emitting devices |
US10964845B2 (en) | 2018-09-27 | 2021-03-30 | Lumileds Llc | Micro light emitting devices |
US10923628B2 (en) | 2018-09-27 | 2021-02-16 | Lumileds Llc | Micrometer scale light emitting diode displays on patterned templates and substrates |
US10811460B2 (en) | 2018-09-27 | 2020-10-20 | Lumileds Holding B.V. | Micrometer scale light emitting diode displays on patterned templates and substrates |
US11251341B2 (en) * | 2018-10-12 | 2022-02-15 | Boe Technology Group Co., Ltd. | Micro light emitting diode display panel, micro light emitting diode display apparatus, and method of fabricating micro light emitting diode display panel |
JPWO2020121449A1 (ja) * | 2018-12-12 | 2021-10-21 | 堺ディスプレイプロダクト株式会社 | マイクロledデバイスおよびその製造方法 |
US11380252B2 (en) | 2018-12-21 | 2022-07-05 | Lumiode, Inc. | Addressing for emissive displays |
US10903265B2 (en) | 2018-12-21 | 2021-01-26 | Cree, Inc. | Pixelated-LED chips and chip array devices, and fabrication methods |
JPWO2020136846A1 (ja) * | 2018-12-27 | 2021-11-04 | 堺ディスプレイプロダクト株式会社 | マイクロledデバイスおよびその製造方法 |
US20220013689A1 (en) * | 2018-12-27 | 2022-01-13 | Sakai Display Products Corporation | Micro-led device and manufacturing method thereof |
EP3906581A4 (en) * | 2019-01-02 | 2022-11-16 | Lumiode, Inc. | SYSTEM AND METHOD FOR MANUFACTURING DISPLAY STRUCTURES |
DE102019100521A1 (de) * | 2019-01-10 | 2020-07-16 | Osram Opto Semiconductors Gmbh | Verfahren zur herstellung eines optoelektronischen bauteils und optoelektronisches bauteil |
DE102019107030A1 (de) * | 2019-03-19 | 2020-09-24 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronische halbleitervorrichtung mit einer vielzahl von bildelementen und trennelementen und verfahren zur herstellung der optoelektronischen halbleitervorrichtung |
JPWO2020194387A1 (ja) * | 2019-03-22 | 2020-10-01 | ||
WO2020255348A1 (ja) * | 2019-06-20 | 2020-12-24 | 堺ディスプレイプロダクト株式会社 | マイクロledデバイスおよびその製造方法 |
WO2020255347A1 (ja) * | 2019-06-20 | 2020-12-24 | 堺ディスプレイプロダクト株式会社 | マイクロledデバイスおよびその製造方法 |
KR102158510B1 (ko) * | 2019-07-17 | 2020-09-22 | 연세대학교 산학협력단 | 전이금속 화합물 트랜지스터가 집적된 발광다이오드 및 이의 제조방법 |
WO2021087109A1 (en) | 2019-10-29 | 2021-05-06 | Cree, Inc. | Texturing for high density pixelated-led chips |
US11404473B2 (en) | 2019-12-23 | 2022-08-02 | Lumileds Llc | III-nitride multi-wavelength LED arrays |
US11923398B2 (en) | 2019-12-23 | 2024-03-05 | Lumileds Llc | III-nitride multi-wavelength LED arrays |
US11942507B2 (en) | 2020-03-11 | 2024-03-26 | Lumileds Llc | Light emitting diode devices |
US11735695B2 (en) | 2020-03-11 | 2023-08-22 | Lumileds Llc | Light emitting diode devices with current spreading layer |
US11569415B2 (en) | 2020-03-11 | 2023-01-31 | Lumileds Llc | Light emitting diode devices with defined hard mask opening |
US11848402B2 (en) | 2020-03-11 | 2023-12-19 | Lumileds Llc | Light emitting diode devices with multilayer composite film including current spreading layer |
US11437548B2 (en) | 2020-10-23 | 2022-09-06 | Creeled, Inc. | Pixelated-LED chips with inter-pixel underfill materials, and fabrication methods |
US11626538B2 (en) | 2020-10-29 | 2023-04-11 | Lumileds Llc | Light emitting diode device with tunable emission |
US11901491B2 (en) | 2020-10-29 | 2024-02-13 | Lumileds Llc | Light emitting diode devices |
US11631786B2 (en) | 2020-11-12 | 2023-04-18 | Lumileds Llc | III-nitride multi-wavelength LED arrays with etch stop layer |
US11955583B2 (en) | 2020-12-01 | 2024-04-09 | Lumileds Llc | Flip chip micro light emitting diodes |
US11705534B2 (en) | 2020-12-01 | 2023-07-18 | Lumileds Llc | Methods of making flip chip micro light emitting diodes |
US11600656B2 (en) | 2020-12-14 | 2023-03-07 | Lumileds Llc | Light emitting diode device |
US11424287B2 (en) | 2020-12-17 | 2022-08-23 | Uif (University Industry Foundation), Yonsei University | Light emitting diode integrated with transition metal dichalcogenide transistor and method for manufacturing the same |
US11935987B2 (en) | 2021-11-03 | 2024-03-19 | Lumileds Llc | Light emitting diode arrays with a light-emitting pixel area |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5893721A (en) * | 1997-03-24 | 1999-04-13 | Motorola, Inc. | Method of manufacture of active matrix LED array |
JP2000036620A (ja) * | 1998-06-05 | 2000-02-02 | Hewlett Packard Co <Hp> | 窒化物エピタキシのための多層インジウム含有窒化物緩衝層 |
JP2002100804A (ja) * | 2000-07-18 | 2002-04-05 | Sony Corp | 半導体発光素子及び半導体発光装置 |
US20020153529A1 (en) * | 2001-04-24 | 2002-10-24 | Jin-Shown Shie | LED array with optical isolation structure and method of manufacturing the same |
JP2006196693A (ja) * | 2005-01-13 | 2006-07-27 | Sony Corp | 半導体素子の形成方法および半導体素子のマウント方法 |
JP2008124376A (ja) * | 2006-11-15 | 2008-05-29 | Canon Inc | 素子基板の接続方法 |
JP2008277409A (ja) * | 2007-04-26 | 2008-11-13 | Matsushita Electric Ind Co Ltd | 半導体発光装置の製造方法 |
JP2009542560A (ja) * | 2006-03-10 | 2009-12-03 | エステイーシー.ユーエヌエム | III族窒化物半導体基板材料及びデバイスにおけるGaNナノワイヤーのパルス状成長及び応用 |
US20100033561A1 (en) * | 2007-04-25 | 2010-02-11 | Hersee Stephen D | Solid-state microscope |
JP2011014896A (ja) * | 2009-06-05 | 2011-01-20 | Sumitomo Chemical Co Ltd | 光デバイス、半導体基板、光デバイスの製造方法、および半導体基板の製造方法 |
WO2011014490A2 (en) * | 2009-07-30 | 2011-02-03 | 3M Innovative Properties Company | Pixelated led |
JP2011527519A (ja) * | 2008-07-07 | 2011-10-27 | グロ アーベー | ナノ構造のled |
Family Cites Families (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52147087A (en) | 1976-06-01 | 1977-12-07 | Mitsubishi Electric Corp | Semiconductor light emitting display device |
US4774205A (en) * | 1986-06-13 | 1988-09-27 | Massachusetts Institute Of Technology | Monolithic integration of silicon and gallium arsenide devices |
US5177405A (en) * | 1989-07-25 | 1993-01-05 | Nippon Sheet Glass Co., Ltd. | Self-scanning, light-emitting device |
US5910706A (en) * | 1996-12-18 | 1999-06-08 | Ultra Silicon Technology (Uk) Limited | Laterally transmitting thin film electroluminescent device |
US5789766A (en) * | 1997-03-20 | 1998-08-04 | Motorola, Inc. | Led array with stacked driver circuits and methods of manfacture |
JP2000022128A (ja) * | 1998-07-06 | 2000-01-21 | Murata Mfg Co Ltd | 半導体発光素子、および光電子集積回路素子 |
US6242324B1 (en) * | 1999-08-10 | 2001-06-05 | The United States Of America As Represented By The Secretary Of The Navy | Method for fabricating singe crystal materials over CMOS devices |
US6410942B1 (en) * | 1999-12-03 | 2002-06-25 | Cree Lighting Company | Enhanced light extraction through the use of micro-LED arrays |
JP2001249626A (ja) * | 2000-03-03 | 2001-09-14 | Sharp Corp | 表示装置および表示装置の製造方法 |
JP2001339060A (ja) | 2000-05-29 | 2001-12-07 | Kyocera Corp | 半導体発光装置 |
JP3906653B2 (ja) * | 2000-07-18 | 2007-04-18 | ソニー株式会社 | 画像表示装置及びその製造方法 |
JP3882539B2 (ja) * | 2000-07-18 | 2007-02-21 | ソニー株式会社 | 半導体発光素子およびその製造方法、並びに画像表示装置 |
JP4649745B2 (ja) * | 2001-02-01 | 2011-03-16 | ソニー株式会社 | 発光素子の転写方法 |
JP2003078127A (ja) | 2001-08-31 | 2003-03-14 | Kyocera Corp | 半導体装置およびその製造方法 |
JP2003077940A (ja) * | 2001-09-06 | 2003-03-14 | Sony Corp | 素子の転写方法及びこれを用いた素子の配列方法、画像表示装置の製造方法 |
JP4055405B2 (ja) * | 2001-12-03 | 2008-03-05 | ソニー株式会社 | 電子部品及びその製造方法 |
US6759262B2 (en) * | 2001-12-18 | 2004-07-06 | Agilent Technologies, Inc. | Image sensor with pixel isolation system and manufacturing method therefor |
JP2003345267A (ja) | 2002-05-30 | 2003-12-03 | Canon Inc | 表示装置及びその製造方法 |
GB0219771D0 (en) * | 2002-08-24 | 2002-10-02 | Koninkl Philips Electronics Nv | Manufacture of electronic devices comprising thin-film circuit elements |
JP5022552B2 (ja) * | 2002-09-26 | 2012-09-12 | セイコーエプソン株式会社 | 電気光学装置の製造方法及び電気光学装置 |
US20060223211A1 (en) * | 2004-12-02 | 2006-10-05 | The Regents Of The University Of California | Semiconductor devices based on coalesced nano-rod arrays |
JP4992282B2 (ja) * | 2005-06-10 | 2012-08-08 | ソニー株式会社 | 発光ダイオード、発光ダイオードの製造方法、発光ダイオードバックライト、発光ダイオード照明装置、発光ダイオードディスプレイおよび電子機器 |
CN101443887B (zh) | 2006-03-10 | 2011-04-20 | Stc.Unm公司 | Gan纳米线的脉冲式生长及在族ⅲ氮化物半导体衬底材料中的应用和器件 |
JP4899675B2 (ja) * | 2006-07-12 | 2012-03-21 | ソニー株式会社 | 実装方法、電子機器の製造方法および発光ダイオードディスプレイの製造方法 |
JP4920330B2 (ja) * | 2006-07-18 | 2012-04-18 | ソニー株式会社 | 実装構造体の実装方法、発光ダイオードディスプレイの実装方法、発光ダイオードバックライトの実装方法および電子機器の実装方法 |
JP4535053B2 (ja) * | 2006-10-12 | 2010-09-01 | ソニー株式会社 | 発光ダイオードの配線の形成方法、発光ダイオード実装基板、ディスプレイ、バックライト、照明装置および電子機器 |
US9024349B2 (en) | 2007-01-22 | 2015-05-05 | Cree, Inc. | Wafer level phosphor coating method and devices fabricated utilizing method |
US8941566B2 (en) | 2007-03-08 | 2015-01-27 | 3M Innovative Properties Company | Array of luminescent elements |
US8809126B2 (en) * | 2007-05-31 | 2014-08-19 | Nthdegree Technologies Worldwide Inc | Printable composition of a liquid or gel suspension of diodes |
KR100904588B1 (ko) | 2007-07-05 | 2009-06-25 | 삼성전자주식회사 | 코어/쉘 형태의 나노와이어를 제조하는 방법, 그에 의해제조된 나노와이어 및 이를 포함하는 나노와이어 소자 |
US20090039375A1 (en) | 2007-08-07 | 2009-02-12 | Cree, Inc. | Semiconductor light emitting devices with separated wavelength conversion materials and methods of forming the same |
US8441018B2 (en) * | 2007-08-16 | 2013-05-14 | The Trustees Of Columbia University In The City Of New York | Direct bandgap substrates and methods of making and using |
KR100877293B1 (ko) * | 2007-08-31 | 2009-01-07 | 주식회사 동부하이텍 | 이미지 센서 및 그 제조방법 |
WO2009090780A1 (ja) * | 2008-01-15 | 2009-07-23 | Sharp Kabushiki Kaisha | 半導体装置、その製造方法及び表示装置 |
KR101496151B1 (ko) | 2008-06-25 | 2015-02-27 | 삼성전자주식회사 | 산화물 다이오드를 이용한 디스플레이 장치 |
US9082673B2 (en) * | 2009-10-05 | 2015-07-14 | Zena Technologies, Inc. | Passivated upstanding nanostructures and methods of making the same |
US8791470B2 (en) * | 2009-10-05 | 2014-07-29 | Zena Technologies, Inc. | Nano structured LEDs |
US8735797B2 (en) * | 2009-12-08 | 2014-05-27 | Zena Technologies, Inc. | Nanowire photo-detector grown on a back-side illuminated image sensor |
JP2010073841A (ja) * | 2008-09-18 | 2010-04-02 | Sony Corp | 光学パッケージ素子、表示装置、および電子機器 |
KR101533817B1 (ko) | 2008-12-31 | 2015-07-09 | 서울바이오시스 주식회사 | 복수개의 비극성 발광셀들을 갖는 발광 소자 및 그것을 제조하는 방법 |
KR101557362B1 (ko) | 2008-12-31 | 2015-10-08 | 서울바이오시스 주식회사 | 복수개의 비극성 발광셀들을 갖는 발광 소자 및 그것을 제조하는 방법 |
JP2011023713A (ja) * | 2009-06-19 | 2011-02-03 | Sumitomo Chemical Co Ltd | 発光デバイスおよび発光デバイスの製造方法 |
CN102341740B (zh) * | 2009-06-22 | 2015-09-16 | 财团法人工业技术研究院 | 发光单元阵列、其制造方法和投影设备 |
JP5636655B2 (ja) * | 2009-09-16 | 2014-12-10 | 富士ゼロックス株式会社 | 発光チップ、プリントヘッドおよび画像形成装置 |
FR2951875B1 (fr) * | 2009-10-23 | 2012-05-18 | Commissariat Energie Atomique | Procede de fabrication d?un ecran a tres haute resolution utilisant une couche conductrice anisotropique et emissive |
US8895958B2 (en) * | 2009-12-01 | 2014-11-25 | National University Corporation Hokkaido University | Light emitting element and method for manufacturing same |
WO2011071559A1 (en) | 2009-12-09 | 2011-06-16 | Nano And Advanced Materials Institute Limited | Method for manufacturing a monolithic led micro-display on an active matrix panel using flip-chip technology and display apparatus having the monolithic led micro-display |
US9329433B2 (en) * | 2010-03-12 | 2016-05-03 | Sharp Kabushiki Kaisha | Light-emitting device manufacturing method, light-emitting device, lighting device, backlight, liquid-crystal panel, display device, display device manufacturing method, display device drive method and liquid-crystal display device |
DE102010012711A1 (de) | 2010-03-25 | 2011-09-29 | Osram Opto Semiconductors Gmbh | Strahlungsemittierendes Halbleiterbauelement und Verfahren zur Herstellung eines strahlungsemittierenden Halbleiterbauelements |
KR101274068B1 (ko) * | 2010-05-25 | 2013-06-12 | 서울대학교산학협력단 | 양자점 발광 소자 및 이를 이용한 디스플레이 |
WO2012008253A1 (ja) * | 2010-07-14 | 2012-01-19 | シャープ株式会社 | 微細な物体の配置方法、配列装置、照明装置および表示装置 |
TWI478319B (zh) * | 2010-07-20 | 2015-03-21 | Epistar Corp | 整合式發光裝置及其製造方法 |
KR20130093115A (ko) * | 2010-09-01 | 2013-08-21 | 샤프 가부시키가이샤 | 발광 소자 및 그 제조 방법, 발광 장치의 제조 방법, 조명 장치, 백라이트, 표시 장치 및 다이오드 |
US8389348B2 (en) * | 2010-09-14 | 2013-03-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mechanism of forming SiC crystalline on Si substrates to allow integration of GaN and Si electronics |
KR101709959B1 (ko) * | 2010-11-17 | 2017-02-27 | 삼성전자주식회사 | 범프 구조물, 이를 갖는 반도체 패키지 및 반도체 패키지의 제조 방법 |
US9087812B2 (en) * | 2011-07-15 | 2015-07-21 | International Rectifier Corporation | Composite semiconductor device with integrated diode |
US8703587B2 (en) * | 2011-07-15 | 2014-04-22 | Technische Universitaet Braunschweig Carolo-Wilhelmina | Method of manufacturing of a semi-conductor element and semi-conductor element |
US9281388B2 (en) * | 2011-07-15 | 2016-03-08 | Infineon Technologies Americas Corp. | Composite semiconductor device with a SOI substrate having an integrated diode |
US8350251B1 (en) * | 2011-09-26 | 2013-01-08 | Glo Ab | Nanowire sized opto-electronic structure and method for manufacturing the same |
KR101269053B1 (ko) * | 2011-11-09 | 2013-06-04 | 삼성전자주식회사 | 나노 로드 발광 소자 및 그 제조 방법 |
KR101347896B1 (ko) * | 2012-06-26 | 2014-01-10 | 엘지디스플레이 주식회사 | 퀀텀 로드 발광 표시장치 |
KR101383551B1 (ko) * | 2012-07-16 | 2014-04-10 | 엘지디스플레이 주식회사 | 퀀텀 로드 발광 표시장치 |
-
2012
- 2012-10-04 DE DE102012109460.8A patent/DE102012109460B4/de active Active
-
2013
- 2013-09-30 JP JP2015534972A patent/JP6262745B2/ja active Active
- 2013-09-30 WO PCT/EP2013/070352 patent/WO2014053445A1/de active Application Filing
- 2013-09-30 CN CN201380052303.1A patent/CN104704634B/zh active Active
- 2013-09-30 US US14/433,379 patent/US9859330B2/en active Active
-
2017
- 2017-11-27 US US15/823,431 patent/US10770506B2/en active Active
- 2017-12-14 JP JP2017239765A patent/JP2018097367A/ja active Pending
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5893721A (en) * | 1997-03-24 | 1999-04-13 | Motorola, Inc. | Method of manufacture of active matrix LED array |
JP2000036620A (ja) * | 1998-06-05 | 2000-02-02 | Hewlett Packard Co <Hp> | 窒化物エピタキシのための多層インジウム含有窒化物緩衝層 |
JP2002100804A (ja) * | 2000-07-18 | 2002-04-05 | Sony Corp | 半導体発光素子及び半導体発光装置 |
US20020153529A1 (en) * | 2001-04-24 | 2002-10-24 | Jin-Shown Shie | LED array with optical isolation structure and method of manufacturing the same |
JP2006196693A (ja) * | 2005-01-13 | 2006-07-27 | Sony Corp | 半導体素子の形成方法および半導体素子のマウント方法 |
JP2009542560A (ja) * | 2006-03-10 | 2009-12-03 | エステイーシー.ユーエヌエム | III族窒化物半導体基板材料及びデバイスにおけるGaNナノワイヤーのパルス状成長及び応用 |
JP2008124376A (ja) * | 2006-11-15 | 2008-05-29 | Canon Inc | 素子基板の接続方法 |
US20100033561A1 (en) * | 2007-04-25 | 2010-02-11 | Hersee Stephen D | Solid-state microscope |
JP2008277409A (ja) * | 2007-04-26 | 2008-11-13 | Matsushita Electric Ind Co Ltd | 半導体発光装置の製造方法 |
JP2011527519A (ja) * | 2008-07-07 | 2011-10-27 | グロ アーベー | ナノ構造のled |
JP2011014896A (ja) * | 2009-06-05 | 2011-01-20 | Sumitomo Chemical Co Ltd | 光デバイス、半導体基板、光デバイスの製造方法、および半導体基板の製造方法 |
WO2011014490A2 (en) * | 2009-07-30 | 2011-02-03 | 3M Innovative Properties Company | Pixelated led |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020017730A (ja) * | 2018-07-25 | 2020-01-30 | 株式会社ジェイマイクロJmicro Inc. | 透明発光ディスプレイフィルム、透明発光ディスプレイフィルムの製造方法、及び透明発光ディスプレイフィルムを用いた透明発光サイネージ |
WO2021014972A1 (ja) * | 2019-07-25 | 2021-01-28 | 日亜化学工業株式会社 | 画像表示装置の製造方法および画像表示装置 |
JP7428919B2 (ja) | 2019-07-25 | 2024-02-07 | 日亜化学工業株式会社 | 画像表示装置の製造方法および画像表示装置 |
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US20180090540A1 (en) | 2018-03-29 |
CN104704634B (zh) | 2018-09-11 |
DE102012109460A1 (de) | 2014-04-10 |
JP6262745B2 (ja) | 2018-01-17 |
JP2016502123A (ja) | 2016-01-21 |
US20150279902A1 (en) | 2015-10-01 |
US9859330B2 (en) | 2018-01-02 |
WO2014053445A1 (de) | 2014-04-10 |
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US10770506B2 (en) | 2020-09-08 |
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