JP2016539155A - ATRキナーゼ阻害剤として有用な2−アミノ−6−フルオロ−N−[5−フルオロ−ピリジン−3−イル]ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド化合物、その調製、その異なる固体形態および放射性標識された誘導体 - Google Patents
ATRキナーゼ阻害剤として有用な2−アミノ−6−フルオロ−N−[5−フルオロ−ピリジン−3−イル]ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド化合物、その調製、その異なる固体形態および放射性標識された誘導体 Download PDFInfo
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- JP2016539155A JP2016539155A JP2016536576A JP2016536576A JP2016539155A JP 2016539155 A JP2016539155 A JP 2016539155A JP 2016536576 A JP2016536576 A JP 2016536576A JP 2016536576 A JP2016536576 A JP 2016536576A JP 2016539155 A JP2016539155 A JP 2016539155A
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- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
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- A61K31/505—Pyrimidines; Hydrogenated pyrimidines, e.g. trimethoprim
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Abstract
Description
ATR(「ATMおよびRad3関連」)キナーゼは、DNA損傷に対する細胞応答に関与するプロテインキナーゼである。ATRキナーゼはATM(「毛細血管拡張性運動失調変異遺伝子」)キナーゼおよび多くの他のタンパク質と一緒に働いて、DNA損傷に対する細胞応答(一般に、DNA損傷応答(「DDR」)と呼ばれる)の調節を行う。DDRはDNA修復を刺激し、生存を促進し、細胞周期チェックポイントの活性化により細胞周期進行を失速させることで修復の時間を与える。DDRがない場合、細胞はDNA損傷に対してより敏感になり、DNA複製などの内因性細胞プロセスや、がん治療において一般的に使用される外因性DNA損傷因子により誘導されるDNA疾患によって容易に死滅する。
ATRペプチドは、文献で知られている様々な方法を用いて発現させ単離することができる(例えば、Uensal−Kacmazら,PNAS 99:10,pp6673−6678,2002年5月14日を参照のこと;Kumagaiら.Cell 124,pp943−955,2006年3月10日;Unsal−Kacmazら.Molecular and Cellular Biology,2004年2月,p1292−1300;およびHall−Jacksonら.Oncogene 1999,18,6707−6713もまた参照のこと)。
図2a:TGA化合物I−1・エタノール溶媒和物
図3a:DSC化合物I−1・エタノール溶媒和物
図4a:化合物I−1・エタノール溶媒和物の固体13C NMRスペクトル(12.5kHzで回転)
図5a:化合物I−1・エタノール溶媒和物の固体19F NMRスペクトル(12.5kHzで回転)
図1b:XRPD化合物I−1・水和物I
図2b:TGA化合物I−1・水和物I
図3b:DSC化合物I−1・水和物I
図4b:XRPD化合物I−1・水和物II
図5b:化合物I−1・水和物IIの固体13C NMRスペクトル(11kHzで回転)
図6b:化合物I−1・水和物IIの固体19F NMRスペクトル(11kHzで回転)
図1c:XRPD化合物I−I無水物形態A
図2c:TGA化合物I−I無水物形態A
図3c:DSC化合物I−I無水物形態A
図4cは、単結晶X線分析に基づく、化合物I−1・無水物形態Aの立体配座プロットである。
図5c:は、化合物I−1・無水物形態Aの積重ねの規則性を示す立体配座プロットである。
図6c:化合物I−1・無水物形態Aの固体13C NMRスペクトル(12.5kHzで回転)
図7c:化合物I−1・無水物形態Aの固体19F NMRスペクトル(12.5kHzで回転)
図1d:XRPD化合物I−1・無水物形態B
図2d:TGA化合物I−1・無水物形態B
図3d:DSC化合物I−1・無水物形態B
図4d:化合物I−1・無水物形態Bの固体13C NMRスペクトル(12.5kHzで回転)
図5d:化合物I−1・無水物形態Bの固体19F NMRスペクトル(12.5kHzで回転)
図1e:XRPD化合物I−1・無水物形態C
図2e:TGA化合物I−1・無水物形態C
図3e:DSC化合物I−1・無水物形態C
図4e:化合物I−1・無水物形態Cの固体13C NMRスペクトル(12.5kHzで回転)
図5e:化合物I−1・無水物形態Cの固体19F NMRスペクトル(12.5kHzで回転)
図1f:XRPD化合物I−1・非晶質形態
図2f:DSC化合物I−1・非晶質形態
図3f:化合物I−1・非晶質の固体13C NMRスペクトル(12.5kHzで回転)
図4f:化合物I−1・非晶質の固体19F NMRスペクトル(12.5kHzで回転)
図1g:XRPD化合物I−1・DMSO溶媒和物
図2g:TGA化合物I−1・DMSO溶媒和物
図3g:DSC化合物I−1・DMSO溶媒和物
図1h:XRPD化合物I−1・DMAC溶媒和物
図2h:TGA化合物I−1・DMAC溶媒和物
図3h:DSC化合物I−1・DMAC溶媒和物
図1i:XRPD化合物I−1・アセトン溶媒和物
図2i:TGA化合物I−1・アセトン溶媒和物
図3i:DSC化合物I−1・アセトン溶媒和物
図1j:XRPD化合物I−1・イソプロパノール溶媒和物
図2j:TGA化合物I−1・イソプロパノール溶媒和物
図3j:DSC化合物I−1・イソプロパノール溶媒和物
本発明は、ATR阻害剤の固体形態、ATR阻害剤を含有する組成物、およびジュウテリウム化ATR阻害剤に関する。本発明はまた、ATRキナーゼの阻害剤として有用な化合物(例えば、アミノ−ピラゾロピリミジン誘導体および関連分子)を調製するための、プロセスおよび中間体に関する。アミノ−ピラゾロピリミジン誘導体は、ATR阻害剤として有用であり、そしてまた、ATR阻害剤を調製するために有用である。
各Y1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は独立して、水素またはジュウテリウムであり;ただし、Y1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19のうちの少なくとも1つは、ジュウテリウムであり
各X1、X2、X4、X5、X6、X7、X8、およびX9は独立して、12Cまたは13Cから選択され;そして
X3は独立して、−12C(O)−または−13C(O)−から選択される。
本発明の他の局面は、本明細書中に記載される。
本願の目的で、用語実施形態、実施例、および局面は、交換可能に使用されることが理解される。
プロセス
の化合物を調製するプロセスを包含し、このプロセスは、式6:
R1は独立して、フルオロ、クロロ、または−C(J1)2CNから選択され;
J1は独立して、HまたはC1〜2アルキルから選択されるか;あるいは
J1の2個の存在は、これらが結合している炭素原子と一緒になって、3員〜4員の必要に応じて置換された炭素環式環を形成し;
R2は独立して、H;ハロ;−CN;NH2;0個〜3個の存在のフルオロで必要に応じて置換されているC1〜2アルキル;またはC1〜3脂肪族鎖から選択され、ここでこの脂肪族鎖の2個までのメチレン単位は、−O−、−NR−、−C(O)−、または−S(O)nで必要に応じて置き換えられており;
R3は独立して、H;ハロ;1個〜3個の存在のハロで必要に応じて置換されたC1〜4アルキル;C3〜4シクロアルキル;−CN;またはC1〜3脂肪族鎖から選択され、ここでこの脂肪族鎖の2個までのメチレン単位は、−O−、−NR−、−C(O)−、または−S(O)nで必要に応じて置き換えられており;
R4は独立して、Q1またはC1〜10脂肪族鎖から選択され、ここでこの脂肪族鎖の4個までのメチレン単位は、−O−、−NR−、−C(O)−、または−S(O)n−で必要に応じて置き換えられており;各R4は、0個〜5個の存在のJQで必要に応じて置換されているか;あるいは
R3およびR4は、これらが結合している原子と一緒になって、酸素、窒素もしくは硫黄から選択される0個〜2個のヘテロ原子を有する5員〜6員の芳香族または非芳香族の環を形成し;R3およびR4によって形成されたこの環は、0個〜3個の存在のJZで必要に応じて置換されており;
Q1は独立して、3員〜7員の完全飽和、部分不飽和、もしくは芳香族の単環式環であって、この3員〜7員の環は、酸素、窒素もしくは硫黄から選択される0個〜3個のヘテロ原子を有する、環;または酸素、窒素、もしくは硫黄から選択される0個〜5個のヘテロ原子を有する7員〜12員の完全飽和、部分不飽和、もしくは芳香族の二環式環から選択され;
Jzは独立して、C1〜6脂肪族、=O、ハロ、または→Oから選択され;
JQは独立して、−CN;ハロ;=O;Q2;またはC1〜8脂肪族鎖から選択され、ここでこの脂肪族鎖の3個までのメチレン単位は、−O−、−NR−、−C(O)−、または−S(O)n−で必要に応じて置き換えられており;JQの各存在は、0個〜3個の存在のJRによって必要に応じて置換されているか;あるいは
同じ原子上のJQの2個の存在は、これらが結合している原子と一緒になって、酸素、窒素、もしくは硫黄から選択される0個〜2個のヘテロ原子を有する3員〜6員の環を形成し;ここでJQの2個の存在によって形成されたこの環は、0個〜3個の存在のJXで必要に応じて置換されているか;あるいは
JQの2個の存在は、Q1と一緒になって、6員〜10員の飽和または部分不飽和の有橋環系を形成し;
Q2は独立して、酸素、窒素、もしくは硫黄から選択される0個〜3個のヘテロ原子を有する3員〜7員の完全飽和、部分不飽和、もしくは芳香族の単環式環;または酸素、窒素、もしくは硫黄から選択される0個〜5個のヘテロ原子を有する7員〜12員の完全飽和、部分不飽和、もしくは芳香族の二環式環から選択され;
JRは独立して、−CN;ハロ;=O;→O;Q3;またはC1〜6脂肪族鎖から選択され、ここでこの脂肪族鎖の3個までのメチレン単位は、−O−、−NR−、−C(O)−、または−S(O)n−で必要に応じて置き換えられており;各JRは、0個〜3個の存在のJTで必要に応じて置換されているか;あるいは
同じ原子上のJRの2個の存在は、これらが結合している原子と一緒になって、酸素、窒素、もしくは硫黄から選択される0個〜2個のヘテロ原子を有する3員〜6員の環を形成し;ここでJRの2個の存在によって形成されたこの環は、0個〜3個の存在のJXで必要に応じて置換されているか;あるいは
JRの2個の存在は、Q2と一緒になって、6員〜10員の飽和または部分不飽和の有橋環系を形成し;
Q3は、酸素、窒素、もしくは硫黄から選択される0個〜3個のヘテロ原子を有する3員〜7員の完全飽和、部分不飽和、もしくは芳香族の単環式環;または酸素、窒素、もしくは硫黄から選択される0個〜5個のヘテロ原子を有する7員〜12員の完全飽和、部分不飽和、もしくは芳香族の二環式環であり;
JXは独立して、−CN;=O;ハロ;またはC1〜4脂肪族鎖から選択され、ここでこの脂肪族鎖の2個までのメチレン単位は、−O−、−NR−、−C(O)−、または−S(O)n−で必要に応じて置き換えられており;
JTは独立して、ハロ、−CN;→O;=O;−OH;C1〜6脂肪族鎖であって、この脂肪族鎖の2個までのメチレン単位は、−O−、−NR−、−C(O)−、または−S(O)n−で必要に応じて置き換えられているもの;または酸素、窒素、もしくは硫黄から選択される0個〜2個のヘテロ原子を有する3員〜6員の非芳香環から選択され;JTの各存在は、0個〜3個の存在のJMで必要に応じて置換されているか;あるいは
同じ原子上のJTの2個の存在は、これらが結合している原子と一緒になって、酸素、窒素、もしくは硫黄から選択される0個〜2個のヘテロ原子を有する3員〜6員の環を形成するか;あるいは
JTの2個の存在は、Q3と一緒になって、6員〜10員の飽和または部分不飽和の有橋環系を形成し;
JMは独立して、ハロまたはC1〜6脂肪族から選択され;
Jは、HまたはClであり;
nは、0、1または2であり;そして
Rは独立して、HまたはC1〜4脂肪族から選択される。
反応条件
の化合物を調製するプロセスを包含し、このプロセスは、式5:
化合物I−1の合成
2)式32:
の化合物を調製するプロセスを提供し、このプロセスは、式33:
の化合物を式25:
の化合物と、アミド結合を形成するために適切な条件下で反応させる工程を包含する。
の化合物を調製するプロセスを提供し、このプロセスは:
a)式35:
b)式36の化合物を、求電子性フッ素化剤と反応させて、式38:
c)式38の化合物を、式3:
を包含する。
a)式6a*:
の化合物を式27:
の化合物と適切なアミド結合形成条件下で反応させて、式28:
の化合物を形成する工程;
b)式28の化合物を、適切なパラジウムイオン封鎖剤を使用して精製する工程;
c)式28の化合物を適切な脱保護条件下で反応させて、式30
の化合物を形成する工程;および
d)式30の化合物を式25:
の化合物と適切なアミド結合形成条件下で反応させて、式I−1の化合物を形成する工程
を包含する。
の化合物を調製するプロセスを提供し、このプロセスは:
a)式5a
式34において、Xはハロゲンである、工程;
b)式34の化合物を式27:
の化合物と、適切なアミド結合形成条件下で反応させて、式28の化合物を形成する工程
を包含する。
a)式5a
式34において、Xはハロゲンである、工程;
b)式34の化合物を式27:
の化合物と、適切なアミド結合形成条件下で反応させて、式28:
の化合物を形成する工程;
c)式28の化合物を適切な脱保護条件下で反応させて、式30
の化合物を形成する工程;
d)式30の化合物を式25:
の化合物と、適切なアミド結合形成条件下で反応させて、式I−1の化合物を形成する工程
を包含する。
ジュウテリウム化化合物
各Y1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は独立して、水素またはジュウテリウムであり;ただし、Y1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19のうちの少なくとも1つは、ジュウテリウムであり
各X1、X2、X4、X5、X6、X7、X8、およびX9は独立して、12Cまたは13Cから選択され;そして
X3は独立して、−12C(O)−または−13C(O)−から選択される。
・2,2,3,3,5,5,6,6−オクタジュウテロピペラジン;
・2,3,5,6−テトラ−13C−ピペラジン;
・2,2,3,3,4,5,5,6,6−ノナジュウテロピペリジン−4−カルボン酸;
・1,2−ジ13C−2−シアノ酢酸;
・1−13C−2−シアノ(13C)酢酸エチルエステル;および
・2−13C−2−シアノ(13C)酢酸エチルエステル。
・2−13C−オキセタン−3−オン;
・3−13C−オキセタン−3−オン;
・2,2,3,3−テトラジュウテロピペラジン;
・2,2,5,5−テトラジュウテロピペラジン;
・4−ジュウテロピペリジン−4−カルボン酸エチルエステル;
・2−シアノ(13C)酢酸;
・1−13C−2−シアノ酢酸;
・2−13C−2−シアノ酢酸;および
・1−ジュウテロ−3−(ジエチルアミノ)−2−フルオロアクリルアルデヒド;
X3は−12C(O)−である。さらに他の実施形態において、X1、X4、X5、X6、X7、X8、およびX9は12Cであり;X3は−13C(O)−であり;そしてX2は13Cである。
化合物I−1・エタノール溶媒和物
化合物I−1・水和物I
化合物I−1・水和物II
化合物I−1・無水物形態A
a=15.29(3)Å α=90°
b=12.17(2)Å β=107.22(3)°
c=14.48(3)Å γ=90°
を有する、化合物I−1の結晶形態として特徴付けられる。
化合物I−1・無水物形態B
化合物I−1・無水物形態C
化合物I−1・非晶質
化合物I−1・DMSO溶媒和物
化合物I−1・DMAC溶媒和物
化合物I−1・アセトン溶媒和物
化合物I−1・イソプロパノール溶媒和物
製剤
a)1用量あたり約5mgの量の、化合物I−1もしくは形態A、または上記化合物の薬学的に受容可能な塩;
b)1用量あたり約10mgの量の、化合物I−1もしくは形態A、または上記化合物の薬学的に受容可能な塩;
c)1用量あたり約20mgの量の、化合物I−1もしくは形態A、または上記化合物の薬学的に受容可能な塩;
d)1用量あたり約30mgの量の、化合物I−1もしくは形態A、または上記化合物の薬学的に受容可能な塩;
e)1用量あたり約50mgの量の、化合物I−1もしくは形態A、または上記化合物の薬学的に受容可能な塩;
f)1用量あたり約60mgの量の、化合物I−1もしくは形態A、または上記化合物の薬学的に受容可能な塩;
g)1用量あたり約80mgの量の、化合物I−1もしくは形態A、または上記化合物の薬学的に受容可能な塩;あるいは
h)1用量あたり約100mgの量の、化合物I−1もしくは形態A、または上記化合物の薬学的に受容可能な塩
で投与され得る。
化合物の使用
併用療法
処置の方法
用語
と描かれる置換基は、
もまた表す。
略語
DMSO ジメチルスルホキシド
DCM ジクロロメタン
ATP アデノシン三リン酸
TFA トリフルオロ酢酸
1HNMR プロトン核磁気共鳴
HPLC 高速液体クロマトグラフィー
LCMS 液体クロマトグラフィー−質量分析
Rt 保持時間
MTBE メチルtert−ブチルエーテル
XRPD X線粉末回折
DSC 示差走査熱量分析
TGA 熱重量分析
RT 室温
NMP N−メチル−2−ピロリドン
Bp 沸点
DMF ジメチルホルムアミド
PTSA p−トルエンスルホン酸
DIPEA N,N−ジイソプロピルエチルアミン
HOBT ヒドロキシベンゾトリアゾール
HATU 1−[ビス(ジメチルアミノ)メチレン]−1H−1,2,3−トリアゾロ[4,5−b]ピリジニウム3−オキシドヘキサフルオロホスフェート
TBTU 2−(1H−ベンゾトリアゾール−1−イル)−1,1,3,3−テトラメチルウロニウムテトラフルオロボレート
T3P プロピルホスホン酸無水物
COMU 1−[(1−(シアノ−2−エトキシ−2−オキソエチリデンアミノオキシ)−ジメチルアミノ−モルホリノ)]ウロニウムヘキサフルオロホスフェート
TCTU [(6−クロロベンゾトリアゾール−1−イル)オキシ−(ジメチルアミノ)メチレン]−ジメチル−アンモニウム テトラフルオロボレート
HBTU O−ベンゾトリアゾール−N,N,N’,N’−テトラメチル−ウロニウム−ヘキサフルオロ−ホスフェート
ECDI 1−エチル−3−(3−ジメチルアミノプロピル)カルボジイミド
LDA ジイソプロピルアミンリチウム
CDI 1,1’−カルボニルジイミダゾール。
プロセス
スキームA
工程1
工程2
工程3
工程4
工程5
工程6
スキームB
工程1
工程2
工程3
全ての市販の溶媒および試薬を、そのまま使用した。マイクロ波反応を、CEM Discoveryマイクロ波を使用して行った。フラッシュクロマトグラフィーを、例えば、ISCO(C)CombiflashR CompanionTMシステムで、0%から100%のEtOAc/石油エーテルの勾配で溶出して行った。当該分野において公知である他の方法もまた、フラッシュクロマトグラフィーを実施するために利用した。サンプルを、シリカに予め吸収させて用いた。記載される場合、超臨界流体クロマトグラフィー(SFC)を、Berger Minigram SFC機で行った。全ての1H NMRスペクトルを、Bruker Avance III 500機器を使用して、500MHzで記録した。MSサンプルを、Waters SQD質量分析計で、正イオンモードと負イオンモードとで動作するエレクトロスプレーイオン化操作を用いて分析した。クロマトグラフィーを使用して、サンプルをこの質量分析計に導入した。実験の詳細に他に記載されない限り、全ての最終生成物は、95%以上の純度を有した。HPLC純度を、Waters Acquity UPLCシステムで、Waters UPLC BEH C8 1.7μm,2.1×50mmカラムおよびVanguard BEH C8 1.7μm,2.1×5mm保護カラムを備え付けたWaters SQD MS機器を用いて測定した。
HPLC方法
機器:Waters Acquity UPLC−MS;
カラム:Vanguard BEH C8 1.7μm,2.1×5mm保護カラムを備えるWaters UPLC BEH C8 1.7μm,2.1×50mm;
カラム温度:45℃;
移動相A:水中10mMのギ酸アンモニウム:アセトニトリル95:5,pH9;
移動相B:アセトニトリル;
検出:210〜400nm;
勾配:0〜0.40分間:2%のB,0.40〜4.85分間:2%のBから98%のB,4.85〜4.90分間:98%のBから2%のB,4.90〜5.00分間:2%のBで保持;
流量:0.6mL/分。
調製1:3,5−ジアミノ−1H−ピラゾール−4−カルボン酸アリル
工程2:3,5−ジアミノ−1H−ピラゾール−4−カルボン酸アリル3
調製2a:2−アミノ−6−フルオロピラゾロ[1,5−a]ピリミジン−3−カルボン酸1H−ベンゾ[d][1,2,3]トリアゾール−1−イル
反応2
反応3
工程2:2−アミノ−6−フルオロ−ピラゾロ[1,5−a]ピリミジン−3−カルボン酸5a
工程3:2−アミノ−6−フルオロピラゾロ[1,5−a]ピリミジン−3−カルボン酸1H−ベンゾ[d][1,2,3]トリアゾール−1−イル6a
調製2b:(6−クロロベンゾトリアゾール−1−イル)−2−アミノ−6−フルオロ−ピラゾロ[1,5−a]ピリミジン−3−カルボキシレート
調製3:2−アミノ−6−クロロピラゾロ[1,5−a]ピリミジン−3−カルボン酸1H−ベンゾ[d][1,2,3]トリアゾール−1−イル
工程2:2−アミノ−6−クロロ−ピラゾロ[1,5−a]ピリミジン−3−カルボン酸5b
工程3:2−アミノ−6−クロロピラゾロ[1,5−a]ピリミジン−3−カルボン酸1H−ベンゾ[d][1,2,3]トリアゾール−1−イル6b
調製4:2−アミノ−6−(シアノメチル)ピラゾロ[1,5−a]ピリミジン−3−カルボン酸1H−ベンゾ[d][1,2,3]トリアゾール−1−イル
工程2:2−アミノ−6−(シアノメチル)−ピラゾロ[1,5−a]ピリミジン−3−カルボン酸5c
工程3:2−アミノ−6−(シアノメチル)ピラゾロ[1,5−a]ピリミジン−3−カルボン酸1H−ベンゾ[d][1,2,3]トリアゾール−1−イル6c
実施例1:2−アミノ−6−フルオロ−N−[5−フルオロ−4−[4−[4−(オキセタン−3−イル)ピペラジン−1−カルボニル]−1−ピペリジル]−3−ピリジル]ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド(化合物I−1)の合成
工程2:1−[3−[(2−アミノ−6−フルオロ−ピラゾロ[1,5−a]ピリミジン−3−カルボニル)アミノ]−5−フルオロ−4−ピリジル]ピペリジン−4−カルボン酸トリフルオロ酢酸塩29
工程3:1−[3−[(2−アミノ−6−フルオロ−ピラゾロ[1,5−a]ピリミジン−3−カルボニル)アミノ]−5−フルオロ−4−ピリジル]ピペリジン−4−カルボン酸塩酸塩30
工程4:2−アミノ−6−フルオロ−N−[5−フルオロ−4−[4−[4−(オキセタン−3−イル)ピペラジン−1−カルボニル]−1−ピペリジル]−3−ピリジル]ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド(化合物I−1)
実施例2:2−アミノ−6−フルオロ−N−[5−フルオロ−4−[4−[4−(オキセタン−3−イル)ピペラジン−1−カルボニル]−1−ピペリジル]−3−ピリジル]ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド(化合物I−1)の合成のための代替のアプローチ
工程1a:1−[3−[(2−アミノ−6−フルオロ−ピラゾロ[1,5−a]ピリミジン−3−カルボニル)アミノ]−5−フルオロ−4−ピリジル]ピペリジン−4−カルボン酸tert−ブチル28の精製
工程2:1−(3−(2−アミノ−6−フルオロピラゾロ[1,5−a]ピリミジン−3−カルボキサミド)−5−フルオロピリジン−4−イル)ピペリジン−4−カルボン酸塩酸塩30
工程3:2−アミノ−6−フルオロ−N−[5−フルオロ−4−[4−[4−(オキセタン−3−イル)ピペラジン−1−カルボニル]−1−ピペリジル]−3−ピリジル]ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド(化合物I−1・非晶質)
調製5:1−(3−(2−アミノ−6−フルオロピラゾロ[1,5−a]ピリミジン−3−カルボキサミド)−5−フルオロピリジン−4−イル)ピペリジン−4−カルボン酸tert−ブチル(化合物28)の合成のための代替のアプローチ
工程2:1−(3−(2−アミノ−6−フルオロピラゾロ[1,5−a]ピリミジン−3−カルボキサミド)−5−フルオロピリジン−4−イル)ピペリジン−4−カルボン酸tert−ブチル28
実施例3:2−アミノ−6−フルオロ−N−[5−フルオロ−4−[4−[4−(オキセタン−3−イル)ピペラジン−1−カルボニル]−1−ピペリジル]−3−ピリジル]ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド(化合物I−1)の合成のための代替のアプローチ
工程2:1−[3−[(2−アミノ−6−フルオロ−ピラゾロ[1,5−a]ピリミジン−3−カルボニル)アミノ]−5−フルオロ−4−ピリジル]ピペリジン−4−カルボン酸メシレート33
工程3:2−アミノ−6−フルオロ−N−[5−フルオロ−4−[4−[4−(オキセタン−3−イル)ピペラジン−1−カルボニル]−1−ピペリジル]−3−ピリジル]ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド(化合物I−1非晶質)
調製6:ブタンニトリル中間体の調製
工程2:3−(ジメトキシメチル)−4,4−ジメトキシ−2−メチルブタンニトリル12aおよび3−(ジメトキシメチル)−4,4−ジメトキシ−2,2−ジメチルブタンニトリル13a
工程3:3−(ジメトキシメチル)−2−エチル−4,4−ジメトキシブタンニトリル12bおよび3−(ジメトキシメチル)−2−ジエチル−4,4−ジメトキシブタンニトリル13b
調製7a:1−(3−アミノ−5−フルオロ−4−ピリジル)ピペリジン−4−カルボン酸tert−ブチルの合成
工程2:1−(3−アミノ−5−フルオロ−4−ピリジル)ピペリジン−4−カルボン酸tert−ブチル27
スキーム7b:1−(3−アミノ−5−フルオロ−4−ピリジル)ピペリジン−4−カルボン酸tert−ブチルを合成するための代替のアプローチ
工程2:1−(3−ブロモ−5−フルオロピリジン−4−イル)ピペリジン−4−カルボン酸tert−ブチル26
工程3:1−(3−アミノ−5−フルオロピリジン−4−イル)ピペリジン−4−カルボン酸tert−ブチル27
調製8:ピペリジン−4−カルボン酸tert−ブチルの合成
工程1:ピペリジン−1,4−ジカルボン酸1−ベンジル4−tert−ブチル21
工程2:ピペリジン−4−カルボン酸tert−ブチル22
調製9:1−(オキセタン−3−イル)ピペラジンの合成
工程2:1−(オキセタン−3−イル)ピペラジン25
実施例4:2−アミノ−6−フルオロ−N−(5−フルオロ−4−(4−(2,2,3,3,5,5,6,6−オクタジュウテロ−ピペラジン−1−カルボニル)ピペリジン−1−イル)−3−ピリジル)ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド(化合物I−2)および2−アミノ−6−フルオロ−N−(5−フルオロ−4−(4−(2,2,3,3,5,5,6,6−オクタジュウテロ−4−(オキセタン−3−イル)ピペラジン−1−カルボニル)ピペリジン−1−イル)−3−ピリジル)ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド(化合物I−3)の合成
工程2:1−(3−(2−アミノ−6−フルオロピラゾロ[1,5−a]ピリミジン−3−カルボキサミド)−5−フルオロピリジン−4−イル)ピペリジン−4−カルボン酸29
工程3:2−アミノ−6−フルオロ−N−(5−フルオロ−4−(4−(2,2,3,3,5,5,6,6−オクタジュウテロ−ピペラジン−1−カルボニル)ピペリジン−1−イル)−3−ピリジル)ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド(化合物I−2)
工程4:2−アミノ−6−フルオロ−N−(5−フルオロ−4−(4−(2,2,3,3,5,5,6,6−オクタジュウテロ−4−(オキセタン−3−イル)ピペラジン−1−カルボニル)ピペリジン−1−イル)ピリジン−3−イル)ピラゾロ[1,5−a]ピリミジン−3−カルボキサミド(化合物I−3)
実施例5:化合物I−1(エタノール溶媒和物)
化合物I−1(エタノール溶媒和物)のXRPD
化合物I−1(エタノール溶媒和物)の示差走査熱量分析
化合物I−1(エタノール溶媒和物)のssNMR
化合物I−1(水和物I)のXRPD
化合物I−1(水和物I)の示差走査熱量分析
実施例6b:化合物I−1(水和物II)
化合物I−1(水和物II)のXRPD
化合物I−1(無水物形態A)の示差走査熱量分析
無水物形態Aを含有する活性錠剤の組成および調製
形態Aの10mgの錠剤の組成
工程I.顆粒化前の混合:
工程II.乾式顆粒化:
工程III.最後のブレンド:
工程IV.錠剤圧縮:
形態Aの結晶実験:
化合物I−1(無水物形態A)のssNMR
化合物I−1(無水物形態B)のXRPD
化合物I−1(無水物形態B)の示差走査熱量分析
ssNMR化合物I−1(無水物形態B)
化合物I−1・無水物形態Bの固体13C NMRスペクトルを図4dに示す。表6bは、関連するピークの化学シフトを与える。
化合物I−1(無水物形態C)のXRPD
化合物I−1(無水物形態C)の示差走査熱量分析
ssNMR
化合物I−1(非晶質形態)のXRPD
化合物I−1(非晶質形態)の示差走査熱量分析
化合物I−1(非晶質)のssNMR
化合物I−1(DMSO溶媒和物)のXRPD
化合物I−1(DMSO溶媒和物)の示差走査熱量分析
実施例12:化合物I−1(DMAC溶媒和物)
化合物I−1(DMAC溶媒和物)のXRPD
化合物I−1(DMAC溶媒和物)の示差走査熱量分析
実施例13:化合物I−1(アセトン溶媒和物)
化合物I−1(アセトン溶媒和物)のXRPD
化合物I−1(アセトン溶媒和物)の示差走査熱量分析
実施例14:化合物I−1(イソプロパノール溶媒和物)
化合物I−1(イソプロパノール溶媒和物)のXRPD
化合物I−1(イソプロパノール溶媒和物)の示差走査熱量分析
実施例15:細胞ATR阻害アッセイ:
実施例16:ATR阻害アッセイ:
実施例17:シスプラチン感作アッセイ
実施例18:単剤HCT116活性
実施例19:ATR複合体阻害アッセイ
Claims (141)
- 式I−B:
各Y1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は独立して、水素またはジュウテリウムであり;ただし、Y1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19のうちの少なくとも1つは、ジュウテリウムであり、
各X1、X2、X4、X5、X6、X7、X8、およびX9は独立して、12Cまたは13Cから選択され;そして
X3は独立して、−12C(O)−または−13C(O)−から選択される、
化合物またはその薬学的に受容可能な塩。 - Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19はジュウテリウムであり、そしてY1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、およびY11は独立して、水素またはジュウテリウムから選択される、請求項1に記載の化合物。
- Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19はジュウテリウムであり、そしてY1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、およびY11は水素である、請求項2に記載の化合物。
- X1、X2、X4、X5、X6、X7、X8、およびX9は12Cであり;そして
X3は−12C(O)−である、
請求項3に記載の化合物。 - X1、X4、X5、X6、X7、X8、およびX9は12Cであり;
X3は−13C(O)−であり;そして
X2は13Cである、
請求項3に記載の化合物。 - Y11、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19はジュウテリウムであり、そしてY1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、およびY10は独立して、水素またはジュウテリウムから選択される、請求項1に記載の化合物。
- Y11、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19はジュウテリウムであり、そしてY1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、およびY10は水素である、請求項6に記載の化合物。
- Y2、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19はジュウテリウムであり、そしてY1、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、およびY11は独立して、水素またはジュウテリウムから選択される、請求項1に記載の化合物。
- Y2、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19はジュウテリウムであり、そしてY1、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、およびY11は水素である、請求項8に記載の化合物。
- Y12、Y13、Y18、およびY19はジュウテリウムであり、そしてY1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11、Y14、Y15、Y16、およびY17は、水素またはジュウテリウムである、請求項1に記載の化合物。
- Y12、Y13、Y18、およびY19はジュウテリウムであり、そしてY1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11、Y14、Y15、Y16、およびY17は水素である、請求項10に記載の化合物。
- Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、およびY11はジュウテリウムであり、そしてY1、Y2、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は独立して、ジュウテリウムまたは水素から選択される、請求項1に記載の化合物。
- Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、およびY11はジュウテリウムであり、そしてY1、Y2、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は水素である、請求項12に記載の化合物。
- Y2およびY11はジュウテリウムであり、そしてY1、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は、ジュウテリウムまたは水素である、請求項1に記載の化合物。
- Y2およびY11はジュウテリウムであり、そしてY1、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は水素である、請求項14に記載の化合物。
- Y2はジュウテリウムであり、そしてY1、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は、ジュウテリウムまたは水素である、請求項1に記載の化合物。
- Y2はジュウテリウムであり、そしてY1、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は水素である、請求項16に記載の化合物。
- X1、X2、X4、X5、X6、X7、およびX8は12Cであり;
X3は−12C(O)−であり;そして
X9は13Cである、
請求項17に記載の化合物。 - X1、X2、X8、およびX9は12Cであり;
X3は−12C(O)−であり;そして
X4、X5、X6、およびX7は13Cである、
請求項17に記載の化合物。 - X2、X4、X5、X6、X7、X8、およびX9は12Cであり;
X3は−12C(O)−であり;そして
X1は13Cである、
請求項17に記載の化合物。 - X2、X4、X5、X6、X7、およびX9は12Cであり;
X3は−13C(O)−であり;そして
X1およびX8は13Cである、
請求項17に記載の化合物。 - Y11はジュウテリウムであり、そしてY1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は独立して、水素またはジュウテリウムから選択される、請求項1に記載の化合物。
- Y11はジュウテリウムであり、そしてY1、Y2、Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y12、Y13、Y14、Y15、Y16、Y17、Y18、およびY19は水素である、請求項21に記載の化合物。
- X1、X4、X5、X6、X7、X8、およびX9は12Cであり;
X3は−12C(O)−であり;そして
X2は13Cである、
請求項22に記載の化合物。 - 前記形態は、化合物I−1のエタノール溶媒和物である、請求項26に記載の固体形態。
- 前記形態は、結晶性の化合物I−1のエタノール溶媒和物である、請求項26に記載の固体形態。
- 前記結晶性の化合物I−1のエタノール溶媒和物は、約1:0.72の、化合物I−1対エタノールの比を有する、請求項28に記載の固体形態。
- 約166℃〜約219℃の温度範囲で、約5.76%からの減量によって特徴付けられる、請求項28に記載の固体形態。
- Cu Kα放射線を使用して得られるX線粉末回折パターンにおいて、2θ±0.2で表される約17.2°、19.7°、23.8°、24.4°、および29.0°の1つまたはより多くのピークによって特徴付けられる、請求項28に記載の固体形態。
- 図1aに示されるものと実質的に同じX線粉末回折パターンを有すると特徴付けられる、請求項28に記載の固体形態。
- C13 ssNMRスペクトルにおいて、175.4±0.3ppm、138.0±0.3ppm、123.1±0.3ppm、57.8±0.3ppm、44.0±0.3ppm、および19.5±0.3ppmに対応する1つまたはより多くのピークを有すると特徴付けられる、請求項28に記載の固体形態。
- F19 ssNMRスペクトルにおいて、−136.0±0.3ppmおよび−151.6±0.3ppmに対応する1つまたはより多くのピークを有すると特徴付けられる、請求項28に記載の固体形態。
- 前記形態は、化合物I−1・水和物Iである、請求項26に記載の固体形態。
- 前記形態は、結晶性の化合物I−1・水和物Iである、請求項26に記載の固体形態。
- 前記結晶性のI−1・水和物Iは、約1:4.5の、化合物I−1対H2Oの比を有する、請求項36に記載の固体形態。
- 約25℃〜約100℃の温度範囲で、約14.56%からの減量によって特徴付けられる、請求項36に記載の固体形態。
- Cu Kα放射線を使用して得られるX線粉末回折パターンにおいて、2θ±0.2で表される約6.5°、12.5°、13.7°、18.8°、および26.0°の1つまたはより多くのピークによって特徴付けられる、請求項36に記載の固体形態。
- 図1bに示されるものと実質的に同じX線粉末回折パターンを有すると特徴付けられる、請求項36に記載の固体形態。
- 前記形態は、化合物I−1・水和物IIである、請求項26に記載の固体形態。
- 前記形態は、結晶性の化合物I−1・水和物IIである、請求項26に記載の固体形態。
- Cu Kα放射線を使用して得られるX線粉末回折パターンにおいて、2θ±0.2で表される約10.1°、11.3°、11.9°、20.2°、および25.1°の1つまたはより多くのピークによって特徴付けられる、請求項42に記載の固体形態。
- C13 ssNMRスペクトルにおいて、177.0±0.3ppm、158.2±0.3ppm、142.9±0.3ppm、85.1±0.3ppm、58.9±0.3ppm、および31.9±0.3ppmに対応する1つまたはより多くのピークを有すると特徴付けられる、請求項42に記載の固体形態。
- F19 ssNMRスペクトルにおいて、−138.0±0.3ppmおよび−152.7±0.3ppmに対応する1つまたはより多くのピークを有すると特徴付けられる、請求項42に記載の固体形態。
- 前記形態は、化合物I−1・無水物形態Aである、請求項26に記載の固体形態。
- 前記形態は、結晶性の化合物I−1・無水物形態Aである、請求項26に記載の固体形態。
- 約25℃〜約265℃の温度範囲で、約0.96%からの減量によって特徴付けられる、請求項47に記載の固体形態。
- Cu Kα放射線を使用して得られるX線粉末回折パターンにおいて、2θ±0.2で表される、約6.1°、12.2°、14.5°、22.3°、および31.8°の1つまたはより多くのピークによって特徴付けられる、請求項47に記載の固体形態。
- 図1cに示されるものと実質的に同じX線粉末回折パターンを有すると特徴付けられる、請求項47に記載の固体形態。
- C13 ssNMRスペクトルにおいて、175.9±0.3ppm、138.9±0.3ppm、74.1±0.3ppm、42.8±0.3ppm、および31.5±0.3ppmに対応する1つまたはより多くのピークを有すると特徴付けられる、請求項47に記載の固体形態。
- F19 ssNMRスペクトルにおいて、−136.8±0.3ppmおよび−155.7±0.3ppmに対応する1つまたはより多くのピークを有すると特徴付けられる、請求項47に記載の固体形態。
- 前記形態は、化合物I−1・無水物形態Bである、請求項26に記載の固体形態。
- 前記形態は、結晶性の化合物I−1・無水物形態Bである、請求項26に記載の固体形態。
- 約25℃〜約175℃の温度範囲で、約2.5%からの減量によって特徴付けられる、請求項54に記載の固体形態。
- Cu Kα放射線を使用して得られるX線粉末回折パターンにおいて、2θ±0.2で表される、約7.2°、8.3°、12.9°、19.5°、および26.6°の1つまたはより多くのピークによって特徴付けられる、請求項54に記載の固体形態。
- 図1dに示されるものと実質的に同じX線粉末回折パターンを有すると特徴付けられる、請求項54に記載の固体形態。
- C13 ssNMRスペクトルにおいて、173.4±0.3ppm、164.5±0.3ppm、133.5±0.3ppm、130.8±0.3ppm、67.7±0.3ppm、45.3±0.3ppm、および25.9±0.3ppmに対応する1つまたはより多くのピークを有すると特徴付けられる、請求項54に記載の固体形態。
- F19 ssNMRスペクトルにおいて、−138.0±0.3ppmおよび−153.5±0.3ppmに対応する1つまたはより多くのピークを有すると特徴付けられる、請求項42に記載の固体形態。
- 前記形態は、化合物I−1・無水物形態Cである、請求項26に記載の固体形態。
- 前記形態は、結晶性の化合物I−1・無水物形態Cである、請求項26に記載の固体形態。
- Cu Kα放射線を使用して得られるX線粉末回折パターンにおいて、2θ±0.2で表される、約6.8°、13.4°、15.9°、30.9°、および32.9°の1つまたはより多くのピークによって特徴付けられる、請求項61に記載の固体形態。
- 図1eに示されるものと実質的に同じX線粉末回折パターンを有すると特徴付けられる、請求項61に記載の固体形態。
- C13 ssNMRスペクトルにおいて、175.2±0.3ppm、142.5±0.3ppm、129.6±0.3ppm、73.5±0.3ppm、54.0±0.3ppm、および46.7±0.3ppmに対応する1つまたはより多くのピークを有すると特徴付けられる、請求項61に記載の固体形態。
- F19 ssNMRスペクトルにおいて、−131.2±0.3ppmおよび−150.7±0.3ppmに対応する1つまたはより多くのピークを有すると特徴付けられる、請求項61に記載の固体形態。
- 前記形態は、化合物I−1・DMSO溶媒和物である、請求項26に記載の固体形態。
- 前記形態は、結晶性の化合物I−1・DMSO溶媒和物である、請求項26に記載の固体形態。
- 前記結晶性の化合物I−1・DMSO溶媒和物は、約1:1の、化合物I−1対DMSOの比を有する、請求項67に記載の固体形態。
- 約146℃〜約156℃の温度範囲で、約12.44%からの減量によって特徴付けられる、請求項67に記載の固体形態。
- Cu Kα放射線を使用して得られるX線粉末回折パターンにおいて、2θ±0.2で表される、約8.9°、14.8°、16.5°、18.6°、20.9°、22.2°、および23.4°の1つまたはより多くのピークによって特徴付けられる、請求項67に記載の固体形態。
- 図1gに示されるものと実質的に同じX線粉末回折パターンを有すると特徴付けられる、請求項67に記載の固体形態。
- 前記形態は、化合物I−1・DMAC溶媒和物である、請求項26に記載の固体形態。
- 前記形態は、結晶性の化合物I−1・DMAC溶媒和物である、請求項26に記載の固体形態。
- 前記結晶性の化合物I−1・DMAC溶媒和物は、約1:1.3の、化合物I−1対DMACの比を有する、請求項75に記載の固体形態。
- 約85℃〜約100℃の温度範囲で、約17.76%からの減量によって特徴付けられる、請求項75に記載の固体形態。
- Cu Kα放射線を使用して得られるX線粉末回折パターンにおいて、2θ±0.2で表される、約6.0°、15.5°、17.7°、18.1°、20.4°、および26.6°の1つまたはより多くのピークによって特徴付けられる、請求項75に記載の固体形態。
- 図1hに示されるものと実質的に同じX線粉末回折パターンを有すると特徴付けられる、請求項75に記載の固体形態。
- 前記形態は、化合物I−1・アセトン溶媒和物である、請求項26に記載の固体形態。
- 前記形態は、結晶性の化合物I−1・アセトン溶媒和物である、請求項26に記載の固体形態。
- 前記結晶性の化合物I−1・アセトン溶媒和物は、約1:0.44の、化合物I−1対アセトンの比を有する、請求項79に記載の固体形態。
- 約124℃〜約151℃の温度範囲で、約4.55%からの減量によって特徴付けられる、請求項79に記載の固体形態。
- Cu Kα放射線を使用して得られるX線粉末回折パターンにおいて、2θ±0.2で表される、約8.9°、15.5°、15.8°、16.7°、22.3°、25.7°、および29.0°の1つまたはより多くのピークによって特徴付けられる、請求項79に記載の固体形態。
- 図1iに示されるものと実質的に同じX線粉末回折パターンを有すると特徴付けられる、請求項79に記載の固体形態。
- 前記形態は、化合物I−1・イソプロパノール溶媒和物である、請求項26に記載の固体形態。
- 前記形態は、結晶性の化合物I−1・イソプロパノール溶媒和物である、請求項26に記載の固体形態。
- 前記結晶性の化合物I−1・イソプロパノール溶媒和物は、約1:0.35の、化合物I−1対イソプロパノールの比を有する、請求項85に記載の固体形態。
- 約136℃〜約180℃の温度範囲で、約3.76%からの減量によって特徴付けられる、請求項85に記載の固体形態。
- Cu Kα放射線を使用して得られるX線粉末回折パターンにおいて、2θ±0.2で表される、約6.9°、17.1°、17.2°、19.1°、19.6°、23.7°、24.4°、および28.9°の1つまたはより多くのピークによって特徴付けられる、請求項85に記載の固体形態。
- 図1jに示されるものと実質的に同じX線粉末回折パターンを有すると特徴付けられる、請求項85に記載の固体形態。
- 前記1種またはより多くの賦形剤は、1種またはより多くの充填剤、1種またはより多くの湿潤剤、1種またはより多くの滑沢剤、および1種またはより多くの崩壊剤からなる群より選択される1種またはより多くを含有する、請求項90に記載の組成物。
- 前記1種またはより多くの賦形剤は、1種またはより多くの充填剤を含有する、請求項90または91に記載の組成物。
- 前記1種またはより多くの充填剤は、前記組成物の総重量に基づいて、約10wt%〜約88wt%の範囲の量で存在する、請求項92に記載の組成物。
- 前記1種またはより多くの充填剤は、マンニトール、ラクトース、スクロース、デキストロース、マルトデキストリン、ソルビトール、キシリトール、粉末セルロース、微結晶性セルロース、ケイ化微結晶性セルロース、メチルセルロース、エチルセルロース、ヒドロキシエチルセルロース、メチルヒドロキシエチルセルロース、デンプン、アルファデンプン、第二リン酸カルシウム、硫酸カルシウムおよび炭酸カルシウムからなる群より選択される、請求項92または93に記載の組成物。
- 前記1種またはより多くの充填剤は、微結晶性セルロースおよびラクトースから選択される、請求項94に記載の組成物。
- 前記1種またはより多くの賦形剤は、1種またはより多くの崩壊剤を含有する、請求項90〜95のいずれか1項に記載の組成物。
- 1種またはより多くの崩壊剤は、前記組成物の総重量に基づいて、約1wt%〜約15wt%の範囲の量で存在する、請求項96に記載の組成物。
- 前記1種またはより多くの崩壊剤は、クロスカルメロースナトリウム、アルギン酸ナトリウム、アルギン酸カルシウム、アルギン酸、デンプン、アルファデンプン、デンプングリコール酸ナトリウム、クロスポビドン、セルロースおよびその誘導体、カルボキシメチルセルロースカルシウム、カルボキシメチルセルロースナトリウム、ダイズ多糖類、ガーゴム、イオン交換樹脂、食品酸とアルカリ炭酸塩成分とに基づく発泡系、および重炭酸ナトリウムからなる群より選択される、請求項96または97に記載の組成物。
- 前記1種またはより多くの崩壊剤はクロスカルメロースナトリウムである、請求項98に記載の組成物。
- 前記1種またはより多くの賦形剤は、1種またはより多くの滑沢剤を含有する、請求項90〜99のいずれか1項に記載の組成物。
- 前記1種またはより多くの滑沢剤は、前記組成物の総重量に基づいて、約0.1wt%〜約10wt%の範囲の量で存在する、請求項100に記載の組成物。
- 前記1種またはより多くの滑沢剤は、滑石、脂肪酸、ステアリン酸、ステアリン酸マグネシウム、ステアリン酸カルシウム、ステアリン酸ナトリウム、モノステアリン酸グリセリル、ラウリル硫酸ナトリウム、ステアリルフマル酸ナトリウム、硬化油、脂肪アルコール、脂肪酸エステル、ベヘン酸グリセリル、鉱油、植物油、ロイシン、安息香酸ナトリウム、およびこれらの組み合わせからなる群より選択される、請求項100または101に記載の組成物。
- 前記1種またはより多くの滑沢剤はステアリルフマル酸ナトリウムである、請求項102に記載の組成物。
- a)前記組成物の総重量に基づいて、約5wt%〜約50wt%の範囲の量の化合物I−1;
b)該組成物の総重量に基づいて、約0.1wt%〜約10wt%の範囲の量の、1種またはより多くの滑沢剤;
c)該組成物の総重量に基づいて、約1wt%〜約15wt%の範囲の量の、1種またはより多くの崩壊剤;および
d)該組成物の総重量に基づいて、約10wt%〜約90wt%の範囲の量の、1種またはより多くの充填剤
を含有する、請求項90〜103のいずれか1項に記載の組成物。 - a)前記組成物の総重量に基づいて、約10wt%の量の化合物I−1;
b)該組成物の総重量に基づいて、約28wt%の量のラクトース一水和物;
c)該組成物の総重量に基づいて、約55wt%の量のAvicel PH−101(微結晶性セルロース);
d)該組成物の総重量に基づいて、約5wt%の量のAc−Di−Sol(クロスカルメロースナトリウム);および
e)該組成物の総重量に基づいて、約3wt%の量のステアリルフマル酸ナトリウム
を含有する、請求項90〜104のいずれか1項に記載の組成物。 - 重量基準で実質的に全ての化合物I−1が形態Aである、請求項90〜105のいずれか1項に記載の組成物。
- 化合物I−1の少なくとも90重量%が形態Aである、請求項106に記載の組成物。
- 化合物I−1の少なくとも95%が形態Aである、請求項107に記載の組成物。
- 化合物I−1の少なくとも98%が形態Aである、請求項108に記載の組成物。
- 単斜晶系の結晶系、P21/cの対称中心が存在する空間群、および以下の単位胞パラメータ:
a=15.29(3)Å α=90°
b=12.17(2)Å β=107.22(3)°
c=14.48(3)Å γ=90°
を有する、化合物I−1の結晶形態。 - 化合物I−1・無水物形態Aを調製するプロセスであって、化合物I−1・エタノール溶媒和物およびテトラヒドロフランを含有する懸濁物を撹拌する工程を包含する、プロセス。
- 化合物I−1・無水物形態Aを調製するプロセスであって、化合物I−1・非晶質、イソプロパノール、および水を含有する懸濁物を撹拌する工程を包含する、プロセス。
- 前記懸濁物は、約65℃〜約80℃まで加熱される、請求項112に記載のプロセス。
- 前記懸濁物は、約70℃〜約75℃まで加熱される、請求項115に記載のプロセス。
- R°は独立して、メチル、エチル、プロピル、イソプロピル、ブチル、およびペンチルから選択される、請求項115に記載のプロセス。
- R°は独立して、メチルまたはエチルから選択される、請求項116に記載のプロセス。
- 前記求電子性フッ素化剤は、1−(クロロメチル)−4−フルオロ−1,4−ジアゾニアビシクロ[2.2.2]オクタンジテトラフルオロボレートである、請求項115に記載のプロセス。
- 前記求電子性フッ素化剤はフッ素ガスである、請求項115に記載のプロセス。
- 前記適切な縮合条件は、前記式38の化合物を前記式3の化合物と溶媒の存在下で反応させることを包含する、請求項115に記載のプロセス。
- 前記溶媒は、DMFまたはDMSOから選択される、請求項120に記載のプロセス。
- 前記アミド結合を形成するための適切な条件は、前記式30の化合物を前記式25の化合物と、アミドカップリングパートナー、非プロトン性溶媒、および塩基の存在下で反応させることを包含する、請求項122に記載のプロセス。
- 前記非プロトン性溶媒は独立して、NMP、DMF、またはテトラヒドロフランから選択される、請求項123に記載の化合物。
- 前記非プロトン性溶媒はテトラヒドロフランである、請求項124に記載のプロセス。
- 前記塩基は脂肪族アミンである、請求項123に記載のプロセス。
- 前記塩基はDIPEAである、請求項126に記載のプロセス。
- 前記アミドカップリングパートナーは独立して、CDI、TBTU、またはTCTUから選択される、請求項123〜127のいずれか1項に記載のプロセス。
- 前記アミドカップリングパートナーはTCTUである、請求項128に記載のプロセス。
- 前記アミドカップリングパートナーはCDIである、請求項128に記載のプロセス。
- 適切な脱保護条件は、前記式28の化合物を、溶媒の存在下で酸と反応させることを包含する、請求項122に記載のプロセス。
- 前記酸はHClである、請求項131に記載のプロセス。
- 前記溶媒は1,4−ジオキサンである、請求項131に記載のプロセス。
- 前記前記アミド結合を形成するための適切な条件は、前記式6a*の化合物を前記式27の化合物と、加熱下で非プロトン性溶媒中で反応させることを包含する、請求項122に記載のプロセス。
- 前記非プロトン性溶媒は独立して、NMP、ピリジン、またはDMFから選択される、請求項134に記載のプロセス。
- 前記非プロトン性溶媒はピリジンである、請求項135に記載のプロセス。
- 前記反応は、少なくとも80℃の温度で行われる、請求項136のいずれか1項に記載のプロセス。
- 前記パラジウムスカベンジャーは独立して、プロパン−1,2−ジアミン;エタン−1,2−ジアミン;エタン−1,2−ジアミン;プロパン−1,3−ジアミン;テトラメチルエチレンジアミン;エチレングリコール;1,3−ビス(ジフェニルホスファニル)プロパン;1,4−ビス(ジフェニルホスファニル)ブタン;および1,2−ビス(ジフェニルホスファニル)エタン/Pr−1,2−ジアミンから選択される、請求項122に記載のプロセス。
- 前記パラジウムスカベンジャーはプロパン−1,2−ジアミンである、請求項138に記載のプロセス。
Applications Claiming Priority (7)
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