JP2016066044A5 - - Google Patents
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- Publication number
- JP2016066044A5 JP2016066044A5 JP2015026284A JP2015026284A JP2016066044A5 JP 2016066044 A5 JP2016066044 A5 JP 2016066044A5 JP 2015026284 A JP2015026284 A JP 2015026284A JP 2015026284 A JP2015026284 A JP 2015026284A JP 2016066044 A5 JP2016066044 A5 JP 2016066044A5
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- substrate
- nozzle
- anisotropy improving
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000007788 liquid Substances 0.000 claims description 147
- 239000000758 substrate Substances 0.000 claims description 93
- 238000000034 method Methods 0.000 claims description 23
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims description 20
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 229940116333 ethyl lactate Drugs 0.000 claims description 10
- 238000003672 processing method Methods 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 3
- 238000005192 partition Methods 0.000 claims 1
- 241000255777 Lepidoptera Species 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510097408.XA CN104898324B (zh) | 2014-03-07 | 2015-03-05 | 接液处理装置、接液处理方法、基板处理装置及基板处理方法 |
| TW104107224A TWI604896B (zh) | 2014-03-07 | 2015-03-06 | A wet processing apparatus, a wet processing method, a substrate processing apparatus and a substrate processing method |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014044601 | 2014-03-07 | ||
| JP2014044601 | 2014-03-07 | ||
| JP2014201213 | 2014-09-30 | ||
| JP2014201213 | 2014-09-30 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017173573A Division JP6623198B2 (ja) | 2014-03-07 | 2017-09-08 | 接液処理装置、接液処理方法、基板処理装置および基板処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016066044A JP2016066044A (ja) | 2016-04-28 |
| JP2016066044A5 true JP2016066044A5 (enExample) | 2017-04-20 |
| JP6290117B2 JP6290117B2 (ja) | 2018-03-07 |
Family
ID=55805525
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015026284A Active JP6290117B2 (ja) | 2014-03-07 | 2015-02-13 | 接液処理装置および接液処理方法 |
| JP2017173573A Active JP6623198B2 (ja) | 2014-03-07 | 2017-09-08 | 接液処理装置、接液処理方法、基板処理装置および基板処理方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017173573A Active JP6623198B2 (ja) | 2014-03-07 | 2017-09-08 | 接液処理装置、接液処理方法、基板処理装置および基板処理方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (2) | JP6290117B2 (enExample) |
| TW (1) | TWI604896B (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106672627B (zh) * | 2017-01-22 | 2019-05-21 | 深圳市华星光电技术有限公司 | 一种传送基板的滚轮 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1144877A (ja) * | 1997-07-24 | 1999-02-16 | Nec Kagoshima Ltd | 基板洗浄装置 |
| JP2000279900A (ja) * | 1999-03-30 | 2000-10-10 | Matsushita Electric Ind Co Ltd | 化学処理装置 |
| JP2005157196A (ja) * | 2003-11-28 | 2005-06-16 | Optrex Corp | 液晶表示素子の基板洗浄方法およびその装置 |
| JP2006255556A (ja) * | 2005-03-16 | 2006-09-28 | Sharp Corp | 液処理装置および液晶表示装置 |
| JP2007011100A (ja) * | 2005-07-01 | 2007-01-18 | Seiko Epson Corp | 電気光学装置用基板の洗浄装置、電気光学装置用基板の洗浄方法、及び電気光学装置の製造方法 |
| JP5060835B2 (ja) * | 2006-07-26 | 2012-10-31 | 芝浦メカトロニクス株式会社 | 基板の処理装置 |
| KR100854624B1 (ko) * | 2007-08-13 | 2008-08-27 | (주) 디바이스이엔지 | 배향막 인쇄 수지판 세정장치 |
| JP5630808B2 (ja) * | 2010-03-26 | 2014-11-26 | 住友精密工業株式会社 | 搬送式基板処理装置における節水型洗浄システム |
| KR101951507B1 (ko) * | 2011-09-15 | 2019-02-22 | 닛산 가가쿠 가부시키가이샤 | 액정 배향막의 제조 방법, 액정 배향막, 및 액정 표시 소자 |
| JP6347917B2 (ja) * | 2013-05-27 | 2018-06-27 | 株式会社ジャパンディスプレイ | 液晶表示装置およびその製造方法 |
-
2015
- 2015-02-13 JP JP2015026284A patent/JP6290117B2/ja active Active
- 2015-03-06 TW TW104107224A patent/TWI604896B/zh not_active IP Right Cessation
-
2017
- 2017-09-08 JP JP2017173573A patent/JP6623198B2/ja active Active
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