JP2015527188A - 粉末プラズマ処理装置 - Google Patents
粉末プラズマ処理装置 Download PDFInfo
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- JP2015527188A JP2015527188A JP2015520081A JP2015520081A JP2015527188A JP 2015527188 A JP2015527188 A JP 2015527188A JP 2015520081 A JP2015520081 A JP 2015520081A JP 2015520081 A JP2015520081 A JP 2015520081A JP 2015527188 A JP2015527188 A JP 2015527188A
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- 239000000843 powder Substances 0.000 title claims abstract description 44
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 238000009832 plasma treatment Methods 0.000 claims abstract 2
- 238000000034 method Methods 0.000 description 13
- 239000007789 gas Substances 0.000 description 7
- 238000009700 powder processing Methods 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Inorganic materials [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2431—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes using cylindrical electrodes, e.g. rotary drums
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2439—Surface discharges, e.g. air flow control
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0824—Details relating to the shape of the electrodes
- B01J2219/0826—Details relating to the shape of the electrodes essentially linear
- B01J2219/083—Details relating to the shape of the electrodes essentially linear cylindrical
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0879—Solid
Abstract
Description
111 基板型電極層
112 絶縁層
113 プラズマ発生電極
120 プラズマ電源装置
Claims (7)
- 円筒形面放電プラズマモジュールの粉末プラズマ処理装置であって、
前記円筒形面放電プラズマモジュールの外面は基板型電極層であり、
前記基板型電極層の内面側に絶縁層があり、
前記絶縁層上にプラズマ発生電極が位置し、
前記円筒形面放電プラズマモジュールは回転し、
前記プラズマ発生電極と前記基板型電極層に交流電圧が印加されて前記プラズマ発生電極周囲にプラズマが発生され、
プラズマ処理のための粉末は、前記円筒形面放電プラズマモジュール内で前記プラズマにより処理される、
粉末プラズマ処理装置。 - 前記基板型電極層には、高電圧が印加され、
前記プラズマ発生電極が接地電極である、
請求項1に記載の粉末プラズマ処理装置。 - 前記プラズマ発生電極には、高電圧が印加され、
前記基板型電極層が接地電極である、
請求項1に記載の粉末プラズマ処理装置。 - 前記プラズマ発生電極は前記絶縁層の上で、前記面放電プラズマモジュールの円周方向に沿って間隔をなして複数配列され、前記面放電プラズマモジュールの長手方向に沿って延長されている、
請求項1に記載の粉末プラズマ処理装置。 - 前記プラズマ発生電極は前記絶縁層の上で、前記面放電プラズマモジュールの長手方向に沿って間隔をなして複数配列され、前記面放電プラズマモジュールの円周方向に沿って延長されている、
請求項1に記載の粉末プラズマ処理装置。 - 駆動部を含み、
前記駆動部が、前記円筒形面放電プラズマモジュールが水平に載置された状態で前記円筒形面放電プラズマモジュールを回転させるように構成される、
請求項1乃至5のいずれか1項に記載の粉末プラズマ処理装置。 - 前記駆動部は回転速度制御部を含み、
前記回転速度制御部が、前記駆動部が前記円筒形面放電プラズマモジュールを回転させる速度を制御するように構成される、
請求項6に記載の粉末プラズマ処理装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120142764A KR101458411B1 (ko) | 2012-12-10 | 2012-12-10 | 분말 플라즈마 처리 장치 |
KR10-2012-0142764 | 2012-12-10 | ||
PCT/KR2013/011273 WO2014092395A1 (ko) | 2012-12-10 | 2013-12-06 | 분말 플라즈마 처리 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015527188A true JP2015527188A (ja) | 2015-09-17 |
JP5940215B2 JP5940215B2 (ja) | 2016-06-29 |
Family
ID=50934621
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015520081A Active JP5940215B2 (ja) | 2012-12-10 | 2013-12-06 | 粉末プラズマ処理装置 |
Country Status (8)
Country | Link |
---|---|
US (2) | US20150348760A1 (ja) |
EP (1) | EP2929932B1 (ja) |
JP (1) | JP5940215B2 (ja) |
KR (1) | KR101458411B1 (ja) |
CN (1) | CN104519993B (ja) |
HU (1) | HUE037466T2 (ja) |
PL (1) | PL2929932T3 (ja) |
WO (1) | WO2014092395A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017076603A (ja) * | 2015-10-16 | 2017-04-20 | 学校法人 中村産業学園 | プラズマ処理装置およびその方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109302790A (zh) * | 2018-06-01 | 2019-02-01 | 苏州海唐智能装备有限公司 | 一种新型等离子体粉体改性装置 |
CN110572924B (zh) * | 2019-08-15 | 2021-12-03 | 大连理工大学 | 一种滚动果蔬表面微生物控制的等离子体系统 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS58221203A (ja) * | 1982-06-18 | 1983-12-22 | Tdk Corp | 分散性を改良した磁性粉 |
JPS5932940A (ja) * | 1982-08-16 | 1984-02-22 | Sankyo Dengiyou Kk | 活性化装置 |
JPH04108534A (ja) * | 1990-08-29 | 1992-04-09 | Senichi Masuda | 沿面プラズマcvdによる微粒子の気相合成方法及び装置 |
JP2005135736A (ja) * | 2003-10-30 | 2005-05-26 | Nippon Spindle Mfg Co Ltd | 粉粒体用プラズマ処理装置 |
JP2011098313A (ja) * | 2009-11-09 | 2011-05-19 | Fuji Mach Mfg Co Ltd | プラズマ処理装置およびプラズマ処理方法 |
JP2011249014A (ja) * | 2010-05-21 | 2011-12-08 | Mitsui Chemicals Inc | 表面処理装置 |
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JPS5919539A (ja) * | 1982-07-21 | 1984-02-01 | Kyocera Corp | 容量結合型グロ−放電分解装置 |
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-
2012
- 2012-12-10 KR KR1020120142764A patent/KR101458411B1/ko active IP Right Grant
-
2013
- 2013-12-06 CN CN201380032767.6A patent/CN104519993B/zh active Active
- 2013-12-06 PL PL13862200T patent/PL2929932T3/pl unknown
- 2013-12-06 JP JP2015520081A patent/JP5940215B2/ja active Active
- 2013-12-06 EP EP13862200.6A patent/EP2929932B1/en active Active
- 2013-12-06 US US14/409,399 patent/US20150348760A1/en not_active Abandoned
- 2013-12-06 HU HUE13862200A patent/HUE037466T2/hu unknown
- 2013-12-06 WO PCT/KR2013/011273 patent/WO2014092395A1/ko active Application Filing
-
2017
- 2017-09-28 US US15/719,128 patent/US10418227B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58221203A (ja) * | 1982-06-18 | 1983-12-22 | Tdk Corp | 分散性を改良した磁性粉 |
JPS5932940A (ja) * | 1982-08-16 | 1984-02-22 | Sankyo Dengiyou Kk | 活性化装置 |
JPH04108534A (ja) * | 1990-08-29 | 1992-04-09 | Senichi Masuda | 沿面プラズマcvdによる微粒子の気相合成方法及び装置 |
JP2005135736A (ja) * | 2003-10-30 | 2005-05-26 | Nippon Spindle Mfg Co Ltd | 粉粒体用プラズマ処理装置 |
JP2011098313A (ja) * | 2009-11-09 | 2011-05-19 | Fuji Mach Mfg Co Ltd | プラズマ処理装置およびプラズマ処理方法 |
JP2011249014A (ja) * | 2010-05-21 | 2011-12-08 | Mitsui Chemicals Inc | 表面処理装置 |
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JP2017076603A (ja) * | 2015-10-16 | 2017-04-20 | 学校法人 中村産業学園 | プラズマ処理装置およびその方法 |
Also Published As
Publication number | Publication date |
---|---|
CN104519993A (zh) | 2015-04-15 |
PL2929932T3 (pl) | 2018-08-31 |
CN104519993B (zh) | 2016-08-17 |
US10418227B2 (en) | 2019-09-17 |
HUE037466T2 (hu) | 2018-08-28 |
JP5940215B2 (ja) | 2016-06-29 |
US20150348760A1 (en) | 2015-12-03 |
KR20140074612A (ko) | 2014-06-18 |
US20180019105A1 (en) | 2018-01-18 |
KR101458411B1 (ko) | 2014-11-07 |
EP2929932A4 (en) | 2016-07-13 |
EP2929932B1 (en) | 2018-04-04 |
EP2929932A1 (en) | 2015-10-14 |
WO2014092395A1 (ko) | 2014-06-19 |
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