JP2015524577A5 - - Google Patents
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- Publication number
- JP2015524577A5 JP2015524577A5 JP2015522210A JP2015522210A JP2015524577A5 JP 2015524577 A5 JP2015524577 A5 JP 2015524577A5 JP 2015522210 A JP2015522210 A JP 2015522210A JP 2015522210 A JP2015522210 A JP 2015522210A JP 2015524577 A5 JP2015524577 A5 JP 2015524577A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- aqueous composition
- group
- independently selected
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims 10
- 239000000758 substrate Substances 0.000 claims 9
- 125000000217 alkyl group Chemical group 0.000 claims 8
- 238000000034 method Methods 0.000 claims 6
- 125000004103 aminoalkyl group Chemical group 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims 4
- 125000005842 heteroatom Chemical group 0.000 claims 4
- 229910052757 nitrogen Inorganic materials 0.000 claims 4
- 229910052760 oxygen Inorganic materials 0.000 claims 4
- 239000004065 semiconductor Substances 0.000 claims 4
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 3
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 3
- 239000000126 substance Substances 0.000 claims 3
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 238000007654 immersion Methods 0.000 claims 2
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims 2
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 1
- 125000002877 alkyl aryl group Chemical group 0.000 claims 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000002837 carbocyclic group Chemical group 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- 150000001924 cycloalkanes Chemical class 0.000 claims 1
- -1 cyclodecyl Chemical group 0.000 claims 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 125000002950 monocyclic group Chemical group 0.000 claims 1
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical compound C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229920006395 saturated elastomer Polymers 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 125000006168 tricyclic group Chemical group 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261671806P | 2012-07-16 | 2012-07-16 | |
| US61/671,806 | 2012-07-16 | ||
| PCT/IB2013/055728 WO2014013396A2 (en) | 2012-07-16 | 2013-07-12 | Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015524577A JP2015524577A (ja) | 2015-08-24 |
| JP2015524577A5 true JP2015524577A5 (enExample) | 2016-09-01 |
| JP6328630B2 JP6328630B2 (ja) | 2018-05-23 |
Family
ID=49949313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015522210A Active JP6328630B2 (ja) | 2012-07-16 | 2013-07-12 | フォトレジスト現像用組成物、組成物の使用方法並びに集積回路装置、光学装置、マイクロマシン及び機械精密装置の製造方法 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US20150192854A1 (enExample) |
| EP (1) | EP2875406A4 (enExample) |
| JP (1) | JP6328630B2 (enExample) |
| KR (1) | KR102107370B1 (enExample) |
| CN (1) | CN104471487B (enExample) |
| IL (1) | IL236457B (enExample) |
| MY (1) | MY171072A (enExample) |
| RU (1) | RU2015104902A (enExample) |
| SG (1) | SG11201500235XA (enExample) |
| TW (1) | TWI665177B (enExample) |
| WO (1) | WO2014013396A2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015028576A (ja) * | 2013-07-01 | 2015-02-12 | 富士フイルム株式会社 | パターン形成方法 |
| KR102374206B1 (ko) | 2017-12-05 | 2022-03-14 | 삼성전자주식회사 | 반도체 장치 제조 방법 |
| EP4179057A1 (en) * | 2020-07-09 | 2023-05-17 | Basf Se | Composition comprising a siloxane and an alkane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4628023A (en) * | 1981-04-10 | 1986-12-09 | Shipley Company Inc. | Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant |
| JP3707856B2 (ja) * | 1996-03-07 | 2005-10-19 | 富士通株式会社 | レジストパターンの形成方法 |
| JPH11218932A (ja) * | 1997-10-31 | 1999-08-10 | Nippon Zeon Co Ltd | ポリイミド系感光性樹脂組成物用現像液 |
| US6403289B1 (en) * | 1997-10-31 | 2002-06-11 | Nippon Zeon Co., Ltd. | Developer for photosensitive polyimide resin composition |
| JP4265741B2 (ja) * | 2003-02-28 | 2009-05-20 | 日本カーリット株式会社 | レジスト剥離剤 |
| JP3993549B2 (ja) * | 2003-09-30 | 2007-10-17 | 株式会社東芝 | レジストパターン形成方法 |
| US7157213B2 (en) * | 2004-03-01 | 2007-01-02 | Think Laboratory Co., Ltd. | Developer agent for positive type photosensitive compound |
| TWI391793B (zh) * | 2005-06-13 | 2013-04-01 | Tokuyama Corp | 光阻顯影液、及使用該顯影液之基板的製造方法 |
| JP5206304B2 (ja) * | 2008-10-15 | 2013-06-12 | 東ソー株式会社 | 第四級アンモニウム塩の回収方法 |
| EP2406212B1 (de) * | 2009-03-12 | 2013-05-15 | Basf Se | Verfahren zur herstellung von 1-adamantyltrimethylammoniumhydroxid |
| EP2427804B1 (en) * | 2009-05-07 | 2019-10-02 | Basf Se | Resist stripping compositions and methods for manufacturing electrical devices |
| JP5698922B2 (ja) | 2009-06-26 | 2015-04-08 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 電子デバイスを形成する方法 |
| CN101993377A (zh) * | 2009-08-07 | 2011-03-30 | 出光兴产株式会社 | 具有金刚烷骨架的胺类和季铵盐的制造方法 |
| JP2011145557A (ja) * | 2010-01-15 | 2011-07-28 | Tokyo Ohka Kogyo Co Ltd | フォトリソグラフィ用現像液 |
| JP6213296B2 (ja) * | 2013-04-10 | 2017-10-18 | 信越化学工業株式会社 | 現像液を用いたパターン形成方法 |
-
2013
- 2013-07-12 EP EP13819208.3A patent/EP2875406A4/en not_active Withdrawn
- 2013-07-12 MY MYPI2015000076A patent/MY171072A/en unknown
- 2013-07-12 KR KR1020157004223A patent/KR102107370B1/ko active Active
- 2013-07-12 JP JP2015522210A patent/JP6328630B2/ja active Active
- 2013-07-12 US US14/413,252 patent/US20150192854A1/en not_active Abandoned
- 2013-07-12 WO PCT/IB2013/055728 patent/WO2014013396A2/en not_active Ceased
- 2013-07-12 CN CN201380037762.2A patent/CN104471487B/zh active Active
- 2013-07-12 RU RU2015104902A patent/RU2015104902A/ru not_active Application Discontinuation
- 2013-07-12 SG SG11201500235XA patent/SG11201500235XA/en unknown
- 2013-07-15 TW TW102125198A patent/TWI665177B/zh active
-
2014
- 2014-12-25 IL IL236457A patent/IL236457B/en active IP Right Grant
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