SG11201500235XA - Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices - Google Patents

Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices

Info

Publication number
SG11201500235XA
SG11201500235XA SG11201500235XA SG11201500235XA SG11201500235XA SG 11201500235X A SG11201500235X A SG 11201500235XA SG 11201500235X A SG11201500235X A SG 11201500235XA SG 11201500235X A SG11201500235X A SG 11201500235XA SG 11201500235X A SG11201500235X A SG 11201500235XA
Authority
SG
Singapore
Prior art keywords
devices
micromachines
composition
integrated circuit
manufacturing integrated
Prior art date
Application number
SG11201500235XA
Inventor
Andreas Klipp
Andrei Honciuc
Pancera Sabrina Montero
Zoltan Baan
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Publication of SG11201500235XA publication Critical patent/SG11201500235XA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
SG11201500235XA 2012-07-16 2013-07-12 Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices SG11201500235XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261671806P 2012-07-16 2012-07-16
PCT/IB2013/055728 WO2014013396A2 (en) 2012-07-16 2013-07-12 Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices

Publications (1)

Publication Number Publication Date
SG11201500235XA true SG11201500235XA (en) 2015-02-27

Family

ID=49949313

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201500235XA SG11201500235XA (en) 2012-07-16 2013-07-12 Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices

Country Status (11)

Country Link
US (1) US20150192854A1 (en)
EP (1) EP2875406A4 (en)
JP (1) JP6328630B2 (en)
KR (1) KR102107370B1 (en)
CN (1) CN104471487B (en)
IL (1) IL236457B (en)
MY (1) MY171072A (en)
RU (1) RU2015104902A (en)
SG (1) SG11201500235XA (en)
TW (1) TWI665177B (en)
WO (1) WO2014013396A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015028576A (en) * 2013-07-01 2015-02-12 富士フイルム株式会社 Pattern forming method
KR102374206B1 (en) 2017-12-05 2022-03-14 삼성전자주식회사 Method of fabricating semiconductor device

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4628023A (en) * 1981-04-10 1986-12-09 Shipley Company Inc. Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant
JP3707856B2 (en) * 1996-03-07 2005-10-19 富士通株式会社 Method for forming resist pattern
US6403289B1 (en) * 1997-10-31 2002-06-11 Nippon Zeon Co., Ltd. Developer for photosensitive polyimide resin composition
JPH11218932A (en) * 1997-10-31 1999-08-10 Nippon Zeon Co Ltd Developer for polimido type photosensitive resin composition
JP4265741B2 (en) * 2003-02-28 2009-05-20 日本カーリット株式会社 Resist stripper
JP3993549B2 (en) * 2003-09-30 2007-10-17 株式会社東芝 Resist pattern forming method
US7157213B2 (en) * 2004-03-01 2007-01-02 Think Laboratory Co., Ltd. Developer agent for positive type photosensitive compound
WO2006134902A1 (en) * 2005-06-13 2006-12-21 Tokuyama Corporation Photoresist developer and process for producing substrate with the use of the developer
JP5206304B2 (en) * 2008-10-15 2013-06-12 東ソー株式会社 Method for recovering quaternary ammonium salt
KR101732747B1 (en) * 2009-03-12 2017-05-04 바스프 에스이 Method for producing 1-adamantyl trimethylammonium hydroxide
KR101799602B1 (en) * 2009-05-07 2017-11-20 바스프 에스이 Resist stripping compositions and methods for manufacturing electrical devices
EP2287669A1 (en) * 2009-06-26 2011-02-23 Rohm and Haas Electronic Materials, L.L.C. Methods of forming electronic devices
CN101993377A (en) * 2009-08-07 2011-03-30 出光兴产株式会社 Method for producing amine and quaternary ammonium salt having adamantane skeleton
JP2011145557A (en) * 2010-01-15 2011-07-28 Tokyo Ohka Kogyo Co Ltd Developing solution for photolithography
JP6213296B2 (en) * 2013-04-10 2017-10-18 信越化学工業株式会社 Pattern forming method using developer

Also Published As

Publication number Publication date
TW201425279A (en) 2014-07-01
EP2875406A4 (en) 2016-11-09
US20150192854A1 (en) 2015-07-09
IL236457B (en) 2020-04-30
WO2014013396A3 (en) 2014-03-06
JP6328630B2 (en) 2018-05-23
KR102107370B1 (en) 2020-05-07
WO2014013396A2 (en) 2014-01-23
KR20150042796A (en) 2015-04-21
CN104471487B (en) 2019-07-09
JP2015524577A (en) 2015-08-24
EP2875406A2 (en) 2015-05-27
TWI665177B (en) 2019-07-11
MY171072A (en) 2019-09-24
RU2015104902A (en) 2016-09-10
CN104471487A (en) 2015-03-25
IL236457A0 (en) 2015-02-26

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