RU2015104902A - Композиция, используемая в изготовлении интегральных схем, оптических устройств, микромашин и механических прецизионных устройств - Google Patents
Композиция, используемая в изготовлении интегральных схем, оптических устройств, микромашин и механических прецизионных устройств Download PDFInfo
- Publication number
- RU2015104902A RU2015104902A RU2015104902A RU2015104902A RU2015104902A RU 2015104902 A RU2015104902 A RU 2015104902A RU 2015104902 A RU2015104902 A RU 2015104902A RU 2015104902 A RU2015104902 A RU 2015104902A RU 2015104902 A RU2015104902 A RU 2015104902A
- Authority
- RU
- Russia
- Prior art keywords
- independently selected
- aqueous composition
- alkyl
- composition according
- optionally
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims 2
- 230000003287 optical effect Effects 0.000 title claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract 11
- 239000000758 substrate Substances 0.000 claims abstract 9
- 125000004122 cyclic group Chemical group 0.000 claims abstract 6
- 239000000126 substance Substances 0.000 claims abstract 6
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims abstract 4
- 239000004065 semiconductor Substances 0.000 claims abstract 4
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims abstract 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims abstract 2
- 229920006395 saturated elastomer Polymers 0.000 claims abstract 2
- 125000000217 alkyl group Chemical group 0.000 claims 7
- 125000004103 aminoalkyl group Chemical group 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 4
- 125000005842 heteroatom Chemical group 0.000 claims 4
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 229910052757 nitrogen Inorganic materials 0.000 claims 4
- 229910052760 oxygen Inorganic materials 0.000 claims 4
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 230000010354 integration Effects 0.000 claims 3
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims 2
- 238000007654 immersion Methods 0.000 claims 2
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 1
- 125000006737 (C6-C20) arylalkyl group Chemical group 0.000 claims 1
- 125000002877 alkyl aryl group Chemical group 0.000 claims 1
- 125000002837 carbocyclic group Chemical group 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- -1 cyclodecyl Chemical group 0.000 claims 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 239000012634 fragment Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 125000002950 monocyclic group Chemical group 0.000 claims 1
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical compound C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261671806P | 2012-07-16 | 2012-07-16 | |
| US61/671806 | 2012-07-16 | ||
| PCT/IB2013/055728 WO2014013396A2 (en) | 2012-07-16 | 2013-07-12 | Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| RU2015104902A true RU2015104902A (ru) | 2016-09-10 |
Family
ID=49949313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2015104902A RU2015104902A (ru) | 2012-07-16 | 2013-07-12 | Композиция, используемая в изготовлении интегральных схем, оптических устройств, микромашин и механических прецизионных устройств |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US20150192854A1 (enExample) |
| EP (1) | EP2875406A4 (enExample) |
| JP (1) | JP6328630B2 (enExample) |
| KR (1) | KR102107370B1 (enExample) |
| CN (1) | CN104471487B (enExample) |
| IL (1) | IL236457B (enExample) |
| MY (1) | MY171072A (enExample) |
| RU (1) | RU2015104902A (enExample) |
| SG (1) | SG11201500235XA (enExample) |
| TW (1) | TWI665177B (enExample) |
| WO (1) | WO2014013396A2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015028576A (ja) * | 2013-07-01 | 2015-02-12 | 富士フイルム株式会社 | パターン形成方法 |
| KR102374206B1 (ko) | 2017-12-05 | 2022-03-14 | 삼성전자주식회사 | 반도체 장치 제조 방법 |
| EP4179057A1 (en) * | 2020-07-09 | 2023-05-17 | Basf Se | Composition comprising a siloxane and an alkane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4628023A (en) * | 1981-04-10 | 1986-12-09 | Shipley Company Inc. | Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant |
| JP3707856B2 (ja) * | 1996-03-07 | 2005-10-19 | 富士通株式会社 | レジストパターンの形成方法 |
| JPH11218932A (ja) * | 1997-10-31 | 1999-08-10 | Nippon Zeon Co Ltd | ポリイミド系感光性樹脂組成物用現像液 |
| US6403289B1 (en) * | 1997-10-31 | 2002-06-11 | Nippon Zeon Co., Ltd. | Developer for photosensitive polyimide resin composition |
| JP4265741B2 (ja) * | 2003-02-28 | 2009-05-20 | 日本カーリット株式会社 | レジスト剥離剤 |
| JP3993549B2 (ja) * | 2003-09-30 | 2007-10-17 | 株式会社東芝 | レジストパターン形成方法 |
| US7157213B2 (en) * | 2004-03-01 | 2007-01-02 | Think Laboratory Co., Ltd. | Developer agent for positive type photosensitive compound |
| TWI391793B (zh) * | 2005-06-13 | 2013-04-01 | Tokuyama Corp | 光阻顯影液、及使用該顯影液之基板的製造方法 |
| JP5206304B2 (ja) * | 2008-10-15 | 2013-06-12 | 東ソー株式会社 | 第四級アンモニウム塩の回収方法 |
| EP2406212B1 (de) * | 2009-03-12 | 2013-05-15 | Basf Se | Verfahren zur herstellung von 1-adamantyltrimethylammoniumhydroxid |
| EP2427804B1 (en) * | 2009-05-07 | 2019-10-02 | Basf Se | Resist stripping compositions and methods for manufacturing electrical devices |
| JP5698922B2 (ja) | 2009-06-26 | 2015-04-08 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 電子デバイスを形成する方法 |
| CN101993377A (zh) * | 2009-08-07 | 2011-03-30 | 出光兴产株式会社 | 具有金刚烷骨架的胺类和季铵盐的制造方法 |
| JP2011145557A (ja) * | 2010-01-15 | 2011-07-28 | Tokyo Ohka Kogyo Co Ltd | フォトリソグラフィ用現像液 |
| JP6213296B2 (ja) * | 2013-04-10 | 2017-10-18 | 信越化学工業株式会社 | 現像液を用いたパターン形成方法 |
-
2013
- 2013-07-12 EP EP13819208.3A patent/EP2875406A4/en not_active Withdrawn
- 2013-07-12 MY MYPI2015000076A patent/MY171072A/en unknown
- 2013-07-12 KR KR1020157004223A patent/KR102107370B1/ko active Active
- 2013-07-12 JP JP2015522210A patent/JP6328630B2/ja active Active
- 2013-07-12 US US14/413,252 patent/US20150192854A1/en not_active Abandoned
- 2013-07-12 WO PCT/IB2013/055728 patent/WO2014013396A2/en not_active Ceased
- 2013-07-12 CN CN201380037762.2A patent/CN104471487B/zh active Active
- 2013-07-12 RU RU2015104902A patent/RU2015104902A/ru not_active Application Discontinuation
- 2013-07-12 SG SG11201500235XA patent/SG11201500235XA/en unknown
- 2013-07-15 TW TW102125198A patent/TWI665177B/zh active
-
2014
- 2014-12-25 IL IL236457A patent/IL236457B/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| KR20150042796A (ko) | 2015-04-21 |
| WO2014013396A2 (en) | 2014-01-23 |
| KR102107370B1 (ko) | 2020-05-07 |
| EP2875406A4 (en) | 2016-11-09 |
| JP2015524577A (ja) | 2015-08-24 |
| TWI665177B (zh) | 2019-07-11 |
| US20150192854A1 (en) | 2015-07-09 |
| IL236457B (en) | 2020-04-30 |
| IL236457A0 (en) | 2015-02-26 |
| EP2875406A2 (en) | 2015-05-27 |
| CN104471487A (zh) | 2015-03-25 |
| CN104471487B (zh) | 2019-07-09 |
| SG11201500235XA (en) | 2015-02-27 |
| MY171072A (en) | 2019-09-24 |
| TW201425279A (zh) | 2014-07-01 |
| WO2014013396A3 (en) | 2014-03-06 |
| JP6328630B2 (ja) | 2018-05-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FA92 | Acknowledgement of application withdrawn (lack of supplementary materials submitted) |
Effective date: 20171020 |