KR102107370B1 - 집적 회로 기기, 광학 기기, 초소형 기계 장비 및 정밀 기계 장비 제조용 조성물 - Google Patents

집적 회로 기기, 광학 기기, 초소형 기계 장비 및 정밀 기계 장비 제조용 조성물 Download PDF

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KR102107370B1
KR102107370B1 KR1020157004223A KR20157004223A KR102107370B1 KR 102107370 B1 KR102107370 B1 KR 102107370B1 KR 1020157004223 A KR1020157004223 A KR 1020157004223A KR 20157004223 A KR20157004223 A KR 20157004223A KR 102107370 B1 KR102107370 B1 KR 102107370B1
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South Korea
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alkyl
independently selected
photoresist
aqueous composition
integrated circuit
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Korean (ko)
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KR20150042796A (ko
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안드레아스 클리프
안드레이 혼치우크
판세라 사브리나 몬테로
졸탄 반
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바스프 에스이
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020157004223A 2012-07-16 2013-07-12 집적 회로 기기, 광학 기기, 초소형 기계 장비 및 정밀 기계 장비 제조용 조성물 Active KR102107370B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261671806P 2012-07-16 2012-07-16
US61/671,806 2012-07-16
PCT/IB2013/055728 WO2014013396A2 (en) 2012-07-16 2013-07-12 Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices

Publications (2)

Publication Number Publication Date
KR20150042796A KR20150042796A (ko) 2015-04-21
KR102107370B1 true KR102107370B1 (ko) 2020-05-07

Family

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Family Applications (1)

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KR1020157004223A Active KR102107370B1 (ko) 2012-07-16 2013-07-12 집적 회로 기기, 광학 기기, 초소형 기계 장비 및 정밀 기계 장비 제조용 조성물

Country Status (11)

Country Link
US (1) US20150192854A1 (enExample)
EP (1) EP2875406A4 (enExample)
JP (1) JP6328630B2 (enExample)
KR (1) KR102107370B1 (enExample)
CN (1) CN104471487B (enExample)
IL (1) IL236457B (enExample)
MY (1) MY171072A (enExample)
RU (1) RU2015104902A (enExample)
SG (1) SG11201500235XA (enExample)
TW (1) TWI665177B (enExample)
WO (1) WO2014013396A2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015028576A (ja) * 2013-07-01 2015-02-12 富士フイルム株式会社 パターン形成方法
KR102374206B1 (ko) 2017-12-05 2022-03-14 삼성전자주식회사 반도체 장치 제조 방법
EP4179057A1 (en) * 2020-07-09 2023-05-17 Basf Se Composition comprising a siloxane and an alkane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011066393A (ja) 2009-06-26 2011-03-31 Rohm & Haas Electronic Materials Llc 電子デバイスを形成する方法
JP2011145557A (ja) * 2010-01-15 2011-07-28 Tokyo Ohka Kogyo Co Ltd フォトリソグラフィ用現像液

Family Cites Families (13)

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Publication number Priority date Publication date Assignee Title
US4628023A (en) * 1981-04-10 1986-12-09 Shipley Company Inc. Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant
JP3707856B2 (ja) * 1996-03-07 2005-10-19 富士通株式会社 レジストパターンの形成方法
JPH11218932A (ja) * 1997-10-31 1999-08-10 Nippon Zeon Co Ltd ポリイミド系感光性樹脂組成物用現像液
US6403289B1 (en) * 1997-10-31 2002-06-11 Nippon Zeon Co., Ltd. Developer for photosensitive polyimide resin composition
JP4265741B2 (ja) * 2003-02-28 2009-05-20 日本カーリット株式会社 レジスト剥離剤
JP3993549B2 (ja) * 2003-09-30 2007-10-17 株式会社東芝 レジストパターン形成方法
US7157213B2 (en) * 2004-03-01 2007-01-02 Think Laboratory Co., Ltd. Developer agent for positive type photosensitive compound
TWI391793B (zh) * 2005-06-13 2013-04-01 Tokuyama Corp 光阻顯影液、及使用該顯影液之基板的製造方法
JP5206304B2 (ja) * 2008-10-15 2013-06-12 東ソー株式会社 第四級アンモニウム塩の回収方法
EP2406212B1 (de) * 2009-03-12 2013-05-15 Basf Se Verfahren zur herstellung von 1-adamantyltrimethylammoniumhydroxid
EP2427804B1 (en) * 2009-05-07 2019-10-02 Basf Se Resist stripping compositions and methods for manufacturing electrical devices
CN101993377A (zh) * 2009-08-07 2011-03-30 出光兴产株式会社 具有金刚烷骨架的胺类和季铵盐的制造方法
JP6213296B2 (ja) * 2013-04-10 2017-10-18 信越化学工業株式会社 現像液を用いたパターン形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011066393A (ja) 2009-06-26 2011-03-31 Rohm & Haas Electronic Materials Llc 電子デバイスを形成する方法
JP2011145557A (ja) * 2010-01-15 2011-07-28 Tokyo Ohka Kogyo Co Ltd フォトリソグラフィ用現像液

Also Published As

Publication number Publication date
KR20150042796A (ko) 2015-04-21
RU2015104902A (ru) 2016-09-10
WO2014013396A2 (en) 2014-01-23
EP2875406A4 (en) 2016-11-09
JP2015524577A (ja) 2015-08-24
TWI665177B (zh) 2019-07-11
US20150192854A1 (en) 2015-07-09
IL236457B (en) 2020-04-30
IL236457A0 (en) 2015-02-26
EP2875406A2 (en) 2015-05-27
CN104471487A (zh) 2015-03-25
CN104471487B (zh) 2019-07-09
SG11201500235XA (en) 2015-02-27
MY171072A (en) 2019-09-24
TW201425279A (zh) 2014-07-01
WO2014013396A3 (en) 2014-03-06
JP6328630B2 (ja) 2018-05-23

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