JP2015524358A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2015524358A5 JP2015524358A5 JP2015525533A JP2015525533A JP2015524358A5 JP 2015524358 A5 JP2015524358 A5 JP 2015524358A5 JP 2015525533 A JP2015525533 A JP 2015525533A JP 2015525533 A JP2015525533 A JP 2015525533A JP 2015524358 A5 JP2015524358 A5 JP 2015524358A5
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- main surface
- diamond
- abrasive
- major surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 claims 16
- 229910003460 diamond Inorganic materials 0.000 claims 7
- 239000010432 diamond Substances 0.000 claims 7
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000000919 ceramic Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261678666P | 2012-08-02 | 2012-08-02 | |
| US61/678,666 | 2012-08-02 | ||
| PCT/US2013/052834 WO2014022465A1 (en) | 2012-08-02 | 2013-07-31 | Abrasive articles with precisely shaped features and method of making thereof |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015524358A JP2015524358A (ja) | 2015-08-24 |
| JP2015524358A5 true JP2015524358A5 (enExample) | 2016-09-23 |
| JP6715006B2 JP6715006B2 (ja) | 2020-07-01 |
Family
ID=50028491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015525533A Active JP6715006B2 (ja) | 2012-08-02 | 2013-07-31 | 精密に成形された構造部を有する研磨物品及びその作製方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US10710211B2 (enExample) |
| EP (1) | EP2879838B1 (enExample) |
| JP (1) | JP6715006B2 (enExample) |
| KR (1) | KR102089383B1 (enExample) |
| CN (1) | CN104736299A (enExample) |
| SG (1) | SG11201500802TA (enExample) |
| TW (1) | TWI695756B (enExample) |
| WO (1) | WO2014022465A1 (enExample) |
Families Citing this family (62)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8758461B2 (en) | 2010-12-31 | 2014-06-24 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive particles having particular shapes and methods of forming such particles |
| US8840694B2 (en) | 2011-06-30 | 2014-09-23 | Saint-Gobain Ceramics & Plastics, Inc. | Liquid phase sintered silicon carbide abrasive particles |
| CN103702800B (zh) | 2011-06-30 | 2017-11-10 | 圣戈本陶瓷及塑料股份有限公司 | 包括氮化硅磨粒的磨料制品 |
| EP2760639B1 (en) | 2011-09-26 | 2021-01-13 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive articles including abrasive particulate materials, coated abrasives using the abrasive particulate materials and methods of forming |
| KR102074138B1 (ko) | 2011-12-30 | 2020-02-07 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 형상화 연마입자 및 이의 형성방법 |
| EP3851248B1 (en) | 2011-12-30 | 2024-04-03 | Saint-Gobain Ceramics & Plastics, Inc. | Composite shaped abrasive particles and method of forming same |
| WO2013106602A1 (en) | 2012-01-10 | 2013-07-18 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive particles having particular shapes and methods of forming such particles |
| KR101667943B1 (ko) | 2012-01-10 | 2016-10-20 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 복잡한 형상들을 가지는 연마 입자들 및 이의 성형 방법들 |
| US9242346B2 (en) | 2012-03-30 | 2016-01-26 | Saint-Gobain Abrasives, Inc. | Abrasive products having fibrillated fibers |
| KR101813466B1 (ko) | 2012-05-23 | 2017-12-29 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 형상화 연마입자들 및 이의 형성방법 |
| US10106714B2 (en) | 2012-06-29 | 2018-10-23 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive particles having particular shapes and methods of forming such particles |
| CN108177094B (zh) | 2012-08-02 | 2021-01-15 | 3M创新有限公司 | 具有精确成形特征部的研磨元件前体及其制造方法 |
| FI2906392T3 (fi) | 2012-10-15 | 2025-06-20 | Saint Gobain Abrasives Inc | Hiomahiukkasia, joilla on erityisiä muotoja, ja menetelmiä tällaisten hiukkasten muodostamiseksi |
| KR101818946B1 (ko) | 2012-12-31 | 2018-01-17 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 미립자 소재 및 이의 형성방법 |
| CN107685296B (zh) | 2013-03-29 | 2020-03-06 | 圣戈班磨料磨具有限公司 | 具有特定形状的磨粒、形成这种粒子的方法及其用途 |
| TW201502263A (zh) | 2013-06-28 | 2015-01-16 | Saint Gobain Ceramics | 包含成形研磨粒子之研磨物品 |
| RU2643004C2 (ru) | 2013-09-30 | 2018-01-29 | Сен-Гобен Серэмикс Энд Пластикс, Инк. | Формованные абразивные частицы и способы их получения |
| MX380754B (es) | 2013-12-31 | 2025-03-12 | Saint Gobain Abrasives Inc | Artículo abrasivo que incluye partículas abrasivas perfiladas. |
| US9771507B2 (en) | 2014-01-31 | 2017-09-26 | Saint-Gobain Ceramics & Plastics, Inc. | Shaped abrasive particle including dopant material and method of forming same |
| WO2015160855A1 (en) | 2014-04-14 | 2015-10-22 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive article including shaped abrasive particles |
| CA2945491C (en) | 2014-04-14 | 2023-03-14 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive article including shaped abrasive particles |
| US9902045B2 (en) | 2014-05-30 | 2018-02-27 | Saint-Gobain Abrasives, Inc. | Method of using an abrasive article including shaped abrasive particles |
| TW201600242A (zh) * | 2014-06-18 | 2016-01-01 | Kinik Co | 拋光墊修整器 |
| US20160144477A1 (en) * | 2014-11-21 | 2016-05-26 | Diane Scott | Coated compressive subpad for chemical mechanical polishing |
| US9914864B2 (en) | 2014-12-23 | 2018-03-13 | Saint-Gobain Ceramics & Plastics, Inc. | Shaped abrasive particles and method of forming same |
| US9707529B2 (en) | 2014-12-23 | 2017-07-18 | Saint-Gobain Ceramics & Plastics, Inc. | Composite shaped abrasive particles and method of forming same |
| US9676981B2 (en) | 2014-12-24 | 2017-06-13 | Saint-Gobain Ceramics & Plastics, Inc. | Shaped abrasive particle fractions and method of forming same |
| JP6453666B2 (ja) * | 2015-02-20 | 2019-01-16 | 東芝メモリ株式会社 | 研磨パッドドレッサの作製方法 |
| TWI634200B (zh) | 2015-03-31 | 2018-09-01 | 聖高拜磨料有限公司 | 固定磨料物品及其形成方法 |
| EP3277459B1 (en) | 2015-03-31 | 2023-08-16 | Saint-Gobain Abrasives, Inc. | Fixed abrasive articles and methods of forming same |
| ES2819375T3 (es) | 2015-06-11 | 2021-04-15 | Saint Gobain Ceramics & Plastics Inc | Artículo abrasivo que incluye partículas abrasivas conformadas |
| AT517693B1 (de) * | 2015-11-11 | 2017-04-15 | Zkw Group Gmbh | Konverter für Leuchtvorrichtungen |
| KR102390844B1 (ko) | 2016-05-10 | 2022-04-26 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 연마 입자 및 이의 형성 방법 |
| EP3455320A4 (en) | 2016-05-10 | 2019-11-20 | Saint-Gobain Ceramics&Plastics, Inc. | GRINDING PARTICLES AND METHOD FOR FORMING THEREOF |
| TWI621502B (zh) * | 2016-08-18 | 2018-04-21 | 中國砂輪企業股份有限公司 | Double chemical mechanical polishing trimming system and method thereof |
| EP3519134B1 (en) | 2016-09-29 | 2024-01-17 | Saint-Gobain Abrasives, Inc. | Fixed abrasive articles and methods of forming same |
| WO2018116122A1 (en) * | 2016-12-21 | 2018-06-28 | 3M Innovative Properties Company | Pad conditioner with spacer and wafer planarization system |
| US10563105B2 (en) | 2017-01-31 | 2020-02-18 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive article including shaped abrasive particles |
| US10759024B2 (en) | 2017-01-31 | 2020-09-01 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive article including shaped abrasive particles |
| CN106956170A (zh) * | 2017-03-24 | 2017-07-18 | 苏州国量量具科技有限公司 | 量块的加工方法 |
| CN106938408A (zh) * | 2017-03-24 | 2017-07-11 | 苏州国量量具科技有限公司 | 量块的生产方法 |
| WO2018236989A1 (en) | 2017-06-21 | 2018-12-27 | Saint-Gobain Ceramics & Plastics, Inc. | Particulate materials and methods of forming same |
| WO2019012389A1 (en) | 2017-07-11 | 2019-01-17 | 3M Innovative Properties Company | ABRASIVE ARTICLES COMPRISING ADAPTABLE COATINGS AND POLISHING SYSTEM MANUFACTURED THEREFROM |
| CN107584434A (zh) * | 2017-11-03 | 2018-01-16 | 绍兴自远磨具有限公司 | 一种钻石减薄垫及其制造方法 |
| US20190351527A1 (en) * | 2018-05-17 | 2019-11-21 | Entegris, Inc. | Conditioner for chemical-mechanical-planarization pad and related methods |
| CN113439010B (zh) | 2019-02-13 | 2024-08-27 | 3M创新有限公司 | 具有精确成形特征部的磨料元件、用其制成的磨料制品及其制造方法 |
| KR102304965B1 (ko) * | 2019-10-30 | 2021-09-24 | 에스케이씨솔믹스 주식회사 | 연마패드, 이의 제조방법, 및 이를 이용한 반도체 소자의 제조방법 |
| EP4081609A4 (en) | 2019-12-27 | 2024-06-05 | Saint-Gobain Ceramics & Plastics Inc. | Abrasive articles and methods of forming same |
| KR102765343B1 (ko) | 2019-12-27 | 2025-02-13 | 세인트-고바인 세라믹스 앤드 플라스틱스, 인크. | 연마 물품 및 이의 형성 방법 |
| CN114845838B (zh) | 2019-12-27 | 2024-10-25 | 圣戈本陶瓷及塑料股份有限公司 | 磨料制品及其形成方法 |
| KR102843434B1 (ko) * | 2020-01-06 | 2025-08-08 | 생-고뱅 어브레이시브즈, 인코포레이티드 | 연마 용품 및 사용 방법 |
| KR102237311B1 (ko) * | 2020-06-19 | 2021-04-07 | 에스케이씨솔믹스 주식회사 | 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법 |
| KR102237321B1 (ko) * | 2020-06-19 | 2021-04-07 | 에스케이씨솔믹스 주식회사 | 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법 |
| KR102237326B1 (ko) * | 2020-06-19 | 2021-04-07 | 에스케이씨솔믹스 주식회사 | 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법 |
| US12138738B2 (en) | 2020-06-19 | 2024-11-12 | Sk Enpulse Co., Ltd. | Polishing pad, preparation method thereof and method for preparing semiconductor device using same |
| US11759909B2 (en) | 2020-06-19 | 2023-09-19 | Sk Enpulse Co., Ltd. | Polishing pad, preparation method thereof and method for preparing semiconductor device using same |
| KR102237316B1 (ko) * | 2020-06-19 | 2021-04-07 | 에스케이씨솔믹스 주식회사 | 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법 |
| EP4408614A1 (en) * | 2021-09-29 | 2024-08-07 | Entegris, Inc. | Double-sided pad conditioner |
| US20230094483A1 (en) * | 2021-09-29 | 2023-03-30 | Entegris, Inc. | Pad conditioner with polymer backing plate |
| JP2025500060A (ja) | 2021-12-30 | 2025-01-07 | サンーゴバン アブレイシブズ,インコーポレイティド | 研磨物品及びそれを形成する方法 |
| CN116619246B (zh) * | 2023-07-24 | 2023-11-10 | 北京寰宇晶科科技有限公司 | 一种具有金刚石柱状晶簇的cmp抛光垫修整器及其制备方法 |
| US20250347473A1 (en) * | 2024-05-10 | 2025-11-13 | RedoxBlox, Inc. | Energy storage articles and methods for making and using the same |
Family Cites Families (76)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2152392A (en) * | 1937-01-26 | 1939-03-28 | Carborundum Co | Abrasive article and method of manufacturing the same |
| KR910002578B1 (ko) * | 1988-01-19 | 1991-04-27 | 닙폰 가이시 카부시키카이샤 | 고밀도 SiC 소결체의 제조방법 |
| US5152917B1 (en) | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
| US5197249A (en) * | 1991-02-07 | 1993-03-30 | Wiand Ronald C | Diamond tool with non-abrasive segments |
| JP2642573B2 (ja) | 1991-12-27 | 1997-08-20 | 日本碍子株式会社 | SiC質焼結体 |
| US5435816A (en) | 1993-01-14 | 1995-07-25 | Minnesota Mining And Manufacturing Company | Method of making an abrasive article |
| BR9407536A (pt) | 1993-09-13 | 1997-08-26 | Minnesota Mining & Mfg | Artigo abrasivo processos de fabricação e de refino de peça em trabalho corn o mesmo ferramenta de produção para fabricação do mesmo e processo de produção de matriz mestra para formação da mesma |
| US5453312A (en) * | 1993-10-29 | 1995-09-26 | Minnesota Mining And Manufacturing Company | Abrasive article, a process for its manufacture, and a method of using it to reduce a workpiece surface |
| JP3261687B2 (ja) | 1994-06-09 | 2002-03-04 | 日本電信電話株式会社 | パッドコンディショナー及びその製造方法 |
| JP2974047B2 (ja) * | 1995-03-15 | 1999-11-08 | 三和研磨工業株式会社 | 円形取付部を備えた砥石チップ嵌込式研磨板 |
| US5692950A (en) | 1996-08-08 | 1997-12-02 | Minnesota Mining And Manufacturing Company | Abrasive construction for semiconductor wafer modification |
| US6021559A (en) | 1996-11-01 | 2000-02-08 | 3M Innovative Properties Company | Methods of making a cube corner article master mold |
| US6368198B1 (en) | 1999-11-22 | 2002-04-09 | Kinik Company | Diamond grid CMP pad dresser |
| US6214078B1 (en) | 1997-11-25 | 2001-04-10 | Ferro Corporation | High temperature ceramic filter |
| US6364749B1 (en) | 1999-09-02 | 2002-04-02 | Micron Technology, Inc. | CMP polishing pad with hydrophilic surfaces for enhanced wetting |
| KR100387954B1 (ko) * | 1999-10-12 | 2003-06-19 | (주) 휴네텍 | 연마패드용 컨디셔너와 이의 제조방법 |
| TW467802B (en) | 1999-10-12 | 2001-12-11 | Hunatech Co Ltd | Conditioner for polishing pad and method for manufacturing the same |
| US8062098B2 (en) * | 2000-11-17 | 2011-11-22 | Duescher Wayne O | High speed flat lapping platen |
| US6632127B1 (en) | 2001-03-07 | 2003-10-14 | Jerry W. Zimmer | Fixed abrasive planarization pad conditioner incorporating chemical vapor deposited polycrystalline diamond and method for making same |
| JP2003103464A (ja) | 2001-09-28 | 2003-04-08 | Mitsubishi Materials Corp | ダイヤモンドコーティングドレッサー |
| US6642127B2 (en) | 2001-10-19 | 2003-11-04 | Applied Materials, Inc. | Method for dicing a semiconductor wafer |
| US20030109204A1 (en) | 2001-12-06 | 2003-06-12 | Kinik Company | Fixed abrasive CMP pad dresser and associated methods |
| JP2004001152A (ja) * | 2002-06-03 | 2004-01-08 | Tokyo Seimitsu Co Ltd | ドレッサ、ドレッシング方法、研磨装置、及び研磨方法 |
| JP4216025B2 (ja) * | 2002-09-09 | 2009-01-28 | 株式会社リード | 研磨布用ドレッサー及びそれを用いた研磨布のドレッシング方法 |
| KR20050092743A (ko) | 2003-01-15 | 2005-09-22 | 미츠비시 마테리알 가부시키가이샤 | 연질재 가공용 절삭 공구 |
| US7089081B2 (en) | 2003-01-31 | 2006-08-08 | 3M Innovative Properties Company | Modeling an abrasive process to achieve controlled material removal |
| US20050025973A1 (en) | 2003-07-25 | 2005-02-03 | Slutz David E. | CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same |
| US7066795B2 (en) * | 2004-10-12 | 2006-06-27 | Applied Materials, Inc. | Polishing pad conditioner with shaped abrasive patterns and channels |
| US8622787B2 (en) | 2006-11-16 | 2014-01-07 | Chien-Min Sung | CMP pad dressers with hybridized abrasive surface and related methods |
| US9138862B2 (en) * | 2011-05-23 | 2015-09-22 | Chien-Min Sung | CMP pad dresser having leveled tips and associated methods |
| US8398466B2 (en) | 2006-11-16 | 2013-03-19 | Chien-Min Sung | CMP pad conditioners with mosaic abrasive segments and associated methods |
| US8393934B2 (en) | 2006-11-16 | 2013-03-12 | Chien-Min Sung | CMP pad dressers with hybridized abrasive surface and related methods |
| WO2007023949A1 (ja) * | 2005-08-25 | 2007-03-01 | Hiroshi Ishizuka | 焼結体研磨部を持つ工具およびその製造方法 |
| TW200726582A (en) | 2005-10-04 | 2007-07-16 | Mitsubishi Materials Corp | Rotary tool for processing flexible materials |
| JP4624293B2 (ja) * | 2006-03-31 | 2011-02-02 | 株式会社ノリタケスーパーアブレーシブ | Cmpパッドコンディショナー |
| US7410413B2 (en) * | 2006-04-27 | 2008-08-12 | 3M Innovative Properties Company | Structured abrasive article and method of making and using the same |
| US20080153398A1 (en) | 2006-11-16 | 2008-06-26 | Chien-Min Sung | Cmp pad conditioners and associated methods |
| US8083820B2 (en) * | 2006-12-22 | 2011-12-27 | 3M Innovative Properties Company | Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same |
| US7993185B2 (en) * | 2007-01-17 | 2011-08-09 | Russell Gelfuso | Device for smoothing the surfaces of hard or soft materials |
| US8323072B1 (en) * | 2007-03-21 | 2012-12-04 | 3M Innovative Properties Company | Method of polishing transparent armor |
| US20080233845A1 (en) * | 2007-03-21 | 2008-09-25 | 3M Innovative Properties Company | Abrasive articles, rotationally reciprocating tools, and methods |
| KR20090013369A (ko) | 2007-08-01 | 2009-02-05 | 주식회사 세라코리 | 연마입자 탈락이 방지되는 연마재 |
| WO2009043058A2 (en) | 2007-09-28 | 2009-04-02 | Chien-Min Sung | Cmp pad conditioners with mosaic abrasive segments and associated methods |
| US20090123795A1 (en) | 2007-11-13 | 2009-05-14 | Chuah P E Christopher J | Condensate drainage subsystem for an electrochemical cell system |
| US8393938B2 (en) | 2007-11-13 | 2013-03-12 | Chien-Min Sung | CMP pad dressers |
| WO2009064345A2 (en) | 2007-11-14 | 2009-05-22 | Saint-Gobain Abrasives, Inc. | A chemical mechanical planarization pad conditioner and methods of forming thereof |
| US8080073B2 (en) | 2007-12-20 | 2011-12-20 | 3M Innovative Properties Company | Abrasive article having a plurality of precisely-shaped abrasive composites |
| US8444458B2 (en) * | 2007-12-31 | 2013-05-21 | 3M Innovative Properties Company | Plasma treated abrasive article and method of making same |
| JP2011514848A (ja) | 2008-03-10 | 2011-05-12 | モルガン アドバンスド セラミックス, インコーポレイテッド | 非平面のcvdダイヤモンド被覆cmpパッドコンディショナーおよびその製造方法 |
| KR100887979B1 (ko) | 2008-03-28 | 2009-03-09 | 주식회사 세라코리 | 연마패드용 컨디셔닝 디스크 |
| JP2010047691A (ja) * | 2008-08-21 | 2010-03-04 | Amical:Kk | 着色ゴムチップ及び着色ゴムチップの製造方法 |
| KR101020870B1 (ko) | 2008-09-22 | 2011-03-09 | 프리시젼다이아몬드 주식회사 | 다이아몬드 막이 코팅된 cmp 컨디셔너 및 그 제조방법 |
| PT2174751E (pt) | 2008-10-10 | 2014-08-06 | Ct For Abrasives & Refractories Res & Dev Carrd Gmbh | Aglomerados de grãos abrasivos, processo para a sua preparação, bem como a sua utilização para a preparação de agentes abrasivos |
| JP2010125567A (ja) * | 2008-11-28 | 2010-06-10 | Mitsubishi Materials Corp | Cmpパッドコンディショナー |
| WO2010063647A1 (en) | 2008-12-03 | 2010-06-10 | Struers A/S | Abrasive disc |
| BRPI0922318B1 (pt) | 2008-12-17 | 2020-09-15 | 3M Innovative Properties Company | Partículas abrasivas moldadas com sulcos |
| JP5502987B2 (ja) * | 2009-03-24 | 2014-05-28 | サンーゴバン アブレイシブズ,インコーポレイティド | 化学機械平坦化パッドコンディショナとして使用するための研磨工具 |
| JP2010221386A (ja) | 2009-03-25 | 2010-10-07 | Mitsubishi Materials Corp | 基材被覆膜、基材被覆膜の製造方法およびcmpパッドコンディショナー |
| US8801497B2 (en) * | 2009-04-30 | 2014-08-12 | Rdc Holdings, Llc | Array of abrasive members with resilient support |
| JP5422262B2 (ja) * | 2009-06-01 | 2014-02-19 | ニッタ・ハース株式会社 | 研磨パッドのコンディショナー |
| MY155563A (en) | 2009-06-02 | 2015-10-30 | Saint Gobain Abrasives Inc | Corrosion-resistant cmp conditioning tools and methods for making and using same |
| EP2474025A2 (en) | 2009-09-01 | 2012-07-11 | Saint-Gobain Abrasives, Inc. | Chemical mechanical polishing conditioner |
| JP2011161584A (ja) | 2010-02-12 | 2011-08-25 | Shingijutsu Kaihatsu Kk | 研磨工具 |
| KR101091030B1 (ko) | 2010-04-08 | 2011-12-09 | 이화다이아몬드공업 주식회사 | 감소된 마찰력을 갖는 패드 컨디셔너 제조방법 |
| US20120171935A1 (en) | 2010-12-20 | 2012-07-05 | Diamond Innovations, Inc. | CMP PAD Conditioning Tool |
| CN103688343B (zh) * | 2011-03-07 | 2016-09-07 | 恩特格里公司 | 化学机械抛光垫修整器 |
| US20130065490A1 (en) * | 2011-09-12 | 2013-03-14 | 3M Innovative Properties Company | Method of refurbishing vinyl composition tile |
| KR101667943B1 (ko) | 2012-01-10 | 2016-10-20 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 복잡한 형상들을 가지는 연마 입자들 및 이의 성형 방법들 |
| TW201350267A (zh) * | 2012-05-04 | 2013-12-16 | Saint Gobain Abrasives Inc | 用於同雙側化學機械平坦化墊修整器一起使用之工具 |
| US20150224625A1 (en) | 2012-08-02 | 2015-08-13 | 3M Innovative Properties Company | Abrasive Elements with Precisely Shaped Features, Abrasive Articles Fabricated Therefrom and Methods of Making Thereof |
| CN108177094B (zh) | 2012-08-02 | 2021-01-15 | 3M创新有限公司 | 具有精确成形特征部的研磨元件前体及其制造方法 |
| TWI530361B (zh) * | 2012-11-07 | 2016-04-21 | 中國砂輪企業股份有限公司 | 化學機械研磨修整器及其製法 |
| TWI511841B (zh) * | 2013-03-15 | 2015-12-11 | Kinik Co | 貼合式化學機械硏磨修整器及其製法 |
| CN203390712U (zh) * | 2013-04-08 | 2014-01-15 | 宋健民 | 化学机械研磨修整器 |
| TWI546159B (zh) * | 2014-04-11 | 2016-08-21 | 中國砂輪企業股份有限公司 | 可控制研磨深度之化學機械研磨修整器 |
| TWI616278B (zh) * | 2015-02-16 | 2018-03-01 | China Grinding Wheel Corp | 化學機械研磨修整器 |
-
2013
- 2013-07-31 SG SG11201500802TA patent/SG11201500802TA/en unknown
- 2013-07-31 KR KR1020157004847A patent/KR102089383B1/ko active Active
- 2013-07-31 WO PCT/US2013/052834 patent/WO2014022465A1/en not_active Ceased
- 2013-07-31 CN CN201380041063.5A patent/CN104736299A/zh active Pending
- 2013-07-31 US US14/418,959 patent/US10710211B2/en active Active
- 2013-07-31 JP JP2015525533A patent/JP6715006B2/ja active Active
- 2013-07-31 EP EP13825436.2A patent/EP2879838B1/en active Active
- 2013-08-01 TW TW102127668A patent/TWI695756B/zh active
-
2020
- 2020-06-05 US US16/946,089 patent/US11697185B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2015524358A5 (enExample) | ||
| JP2015530265A5 (enExample) | ||
| JP2016538139A5 (enExample) | ||
| WO2012122186A3 (en) | Chemical mechanical planarization pad conditioner | |
| EA201890835A1 (ru) | Термическое напыление керамических материалов | |
| JP2014508652A5 (enExample) | ||
| PH12014000029A1 (en) | Polishing apparatus, and method for polishing and manufacturing glass substrate | |
| JP2013521144A5 (enExample) | ||
| IN2015DN03023A (enExample) | ||
| WO2012121946A3 (en) | Methods of forming polycrystalline tables and polycrystalline elements and related structures | |
| WO2012162430A3 (en) | Cmp pad dresser having leveled tips and associated methods | |
| EP3349237A4 (en) | PROCESS FOR PREPARING AN SIC COMPOSITE SUBSTRATE AND METHOD FOR PRODUCING A SEMICONDUCTOR SUBSTRATE | |
| JP2012235098A5 (ja) | 半導体装置 | |
| EP2876190A4 (en) | SIC CRYSTAL WAFERS AND MANUFACTURING METHOD THEREFOR | |
| JP2015224143A5 (enExample) | ||
| PH12012000019A1 (en) | Method of manufacturing a glass substrate for a magnetic disk and method of manufacturing a magnetic disk | |
| MX2021007414A (es) | Relleno para asegurar la orientacion de estructuras abrasivas. | |
| BR112017014170A2 (pt) | agregados de diamante com aglutinante vitrificado | |
| EP2921575A4 (en) | SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE AND METHOD FOR THE PRODUCTION THEREOF | |
| MY195662A (en) | Method for Manufacturing Magnetic-Disk Substrate, and Polishing Pad | |
| PH12012000070A1 (en) | Method of manufacturing glass substrate for magnetic disk | |
| TWM475334U (en) | Polishing pad | |
| CN105686596A (zh) | 一种复合缓冲防滑垫 | |
| PH12014000045A1 (en) | Glass substrate for magnetic recording medium and method for manufacturing the glass substrate for magnetic recording medium | |
| JP2016204187A5 (enExample) |