JP2015524358A5 - - Google Patents

Download PDF

Info

Publication number
JP2015524358A5
JP2015524358A5 JP2015525533A JP2015525533A JP2015524358A5 JP 2015524358 A5 JP2015524358 A5 JP 2015524358A5 JP 2015525533 A JP2015525533 A JP 2015525533A JP 2015525533 A JP2015525533 A JP 2015525533A JP 2015524358 A5 JP2015524358 A5 JP 2015524358A5
Authority
JP
Japan
Prior art keywords
polishing
main surface
diamond
abrasive
major surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015525533A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015524358A (ja
JP6715006B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2013/052834 external-priority patent/WO2014022465A1/en
Publication of JP2015524358A publication Critical patent/JP2015524358A/ja
Publication of JP2015524358A5 publication Critical patent/JP2015524358A5/ja
Application granted granted Critical
Publication of JP6715006B2 publication Critical patent/JP6715006B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2015525533A 2012-08-02 2013-07-31 精密に成形された構造部を有する研磨物品及びその作製方法 Active JP6715006B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261678666P 2012-08-02 2012-08-02
US61/678,666 2012-08-02
PCT/US2013/052834 WO2014022465A1 (en) 2012-08-02 2013-07-31 Abrasive articles with precisely shaped features and method of making thereof

Publications (3)

Publication Number Publication Date
JP2015524358A JP2015524358A (ja) 2015-08-24
JP2015524358A5 true JP2015524358A5 (enExample) 2016-09-23
JP6715006B2 JP6715006B2 (ja) 2020-07-01

Family

ID=50028491

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015525533A Active JP6715006B2 (ja) 2012-08-02 2013-07-31 精密に成形された構造部を有する研磨物品及びその作製方法

Country Status (8)

Country Link
US (2) US10710211B2 (enExample)
EP (1) EP2879838B1 (enExample)
JP (1) JP6715006B2 (enExample)
KR (1) KR102089383B1 (enExample)
CN (1) CN104736299A (enExample)
SG (1) SG11201500802TA (enExample)
TW (1) TWI695756B (enExample)
WO (1) WO2014022465A1 (enExample)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2658680B1 (en) 2010-12-31 2020-12-09 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles comprising abrasive particles having particular shapes and methods of forming such articles
EP2726248B1 (en) 2011-06-30 2019-06-19 Saint-Gobain Ceramics & Plastics, Inc. Liquid phase sintered silicon carbide abrasive particles
CN103702800B (zh) 2011-06-30 2017-11-10 圣戈本陶瓷及塑料股份有限公司 包括氮化硅磨粒的磨料制品
WO2013049239A1 (en) 2011-09-26 2013-04-04 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles including abrasive particulate materials, coated abrasives using the abrasive particulate materials and methods of forming
PL2797716T3 (pl) 2011-12-30 2021-07-05 Saint-Gobain Ceramics & Plastics, Inc. Kompozytowe ukształtowane cząstki ścierne i sposób ich formowania
KR20170018102A (ko) 2011-12-30 2017-02-15 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 형상화 연마입자 및 이의 형성방법
EP3705177A1 (en) 2012-01-10 2020-09-09 Saint-Gobain Ceramics & Plastics Inc. Abrasive particles having complex shapes and methods of forming same
US8840696B2 (en) 2012-01-10 2014-09-23 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
US9242346B2 (en) 2012-03-30 2016-01-26 Saint-Gobain Abrasives, Inc. Abrasive products having fibrillated fibers
KR102197361B1 (ko) 2012-05-23 2021-01-05 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 형상화 연마입자들 및 이의 형성방법
BR112014032152B1 (pt) 2012-06-29 2022-09-20 Saint-Gobain Ceramics & Plastics, Inc Partículas abrasivas tendo formatos particulares e artigos abrasivos
KR102089382B1 (ko) 2012-08-02 2020-03-16 쓰리엠 이노베이티브 프로퍼티즈 컴파니 정밀하게 형상화된 특징부를 갖는 연마 요소 전구체 및 그의 제조 방법
FI2906392T3 (fi) 2012-10-15 2025-06-20 Saint Gobain Abrasives Inc Hiomahiukkasia, joilla on erityisiä muotoja, ja menetelmiä tällaisten hiukkasten muodostamiseksi
US9074119B2 (en) 2012-12-31 2015-07-07 Saint-Gobain Ceramics & Plastics, Inc. Particulate materials and methods of forming same
CN105073343B (zh) 2013-03-29 2017-11-03 圣戈班磨料磨具有限公司 具有特定形状的磨粒、形成这种粒子的方法及其用途
TW201502263A (zh) 2013-06-28 2015-01-16 Saint Gobain Ceramics 包含成形研磨粒子之研磨物品
RU2643004C2 (ru) 2013-09-30 2018-01-29 Сен-Гобен Серэмикс Энд Пластикс, Инк. Формованные абразивные частицы и способы их получения
MX380754B (es) 2013-12-31 2025-03-12 Saint Gobain Abrasives Inc Artículo abrasivo que incluye partículas abrasivas perfiladas.
US9771507B2 (en) 2014-01-31 2017-09-26 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle including dopant material and method of forming same
BR112016023838A2 (pt) 2014-04-14 2017-08-15 Saint Gobain Ceramics artigo abrasivo incluindo partículas abrasivas moldadas
US9803119B2 (en) 2014-04-14 2017-10-31 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
US9902045B2 (en) 2014-05-30 2018-02-27 Saint-Gobain Abrasives, Inc. Method of using an abrasive article including shaped abrasive particles
TW201600242A (zh) * 2014-06-18 2016-01-01 Kinik Co 拋光墊修整器
US20160144477A1 (en) * 2014-11-21 2016-05-26 Diane Scott Coated compressive subpad for chemical mechanical polishing
US9914864B2 (en) 2014-12-23 2018-03-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particles and method of forming same
US9707529B2 (en) 2014-12-23 2017-07-18 Saint-Gobain Ceramics & Plastics, Inc. Composite shaped abrasive particles and method of forming same
US9676981B2 (en) 2014-12-24 2017-06-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle fractions and method of forming same
JP6453666B2 (ja) * 2015-02-20 2019-01-16 東芝メモリ株式会社 研磨パッドドレッサの作製方法
TWI634200B (zh) 2015-03-31 2018-09-01 聖高拜磨料有限公司 固定磨料物品及其形成方法
CN107636109A (zh) 2015-03-31 2018-01-26 圣戈班磨料磨具有限公司 固定磨料制品和其形成方法
EP3307483B1 (en) 2015-06-11 2020-06-17 Saint-Gobain Ceramics&Plastics, Inc. Abrasive article including shaped abrasive particles
AT517693B1 (de) * 2015-11-11 2017-04-15 Zkw Group Gmbh Konverter für Leuchtvorrichtungen
WO2017197002A1 (en) 2016-05-10 2017-11-16 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles and methods of forming same
PL3455321T3 (pl) 2016-05-10 2022-12-12 Saint-Gobain Ceramics&Plastics, Inc. Sposób formowania cząstek ściernych
TWI621502B (zh) * 2016-08-18 2018-04-21 中國砂輪企業股份有限公司 Double chemical mechanical polishing trimming system and method thereof
US11230653B2 (en) 2016-09-29 2022-01-25 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
JP7232763B2 (ja) * 2016-12-21 2023-03-03 スリーエム イノベイティブ プロパティズ カンパニー スペーサ及びウェハ平坦化システムを有するパッドコンディショナ
US10759024B2 (en) 2017-01-31 2020-09-01 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
US10563105B2 (en) 2017-01-31 2020-02-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
CN106956170A (zh) * 2017-03-24 2017-07-18 苏州国量量具科技有限公司 量块的加工方法
CN106938408A (zh) * 2017-03-24 2017-07-11 苏州国量量具科技有限公司 量块的生产方法
WO2018236989A1 (en) 2017-06-21 2018-12-27 Saint-Gobain Ceramics & Plastics, Inc. Particulate materials and methods of forming same
CN121491923A (zh) 2017-07-11 2026-02-10 3M创新有限公司 制备磨料制品的方法和由其制成的抛光系统
CN114633207A (zh) * 2017-11-03 2022-06-17 绍兴自远磨具有限公司 一种钻石减薄垫及其制造方法
US20190351527A1 (en) * 2018-05-17 2019-11-21 Entegris, Inc. Conditioner for chemical-mechanical-planarization pad and related methods
EP3924146A4 (en) 2019-02-13 2022-11-09 3M Innovative Properties Company ABRASIVES WITH PRECISELY SHAPED FEATURES, ABRASIVES MADE THEREOF AND PROCESSES FOR THEIR MANUFACTURE
KR102304965B1 (ko) * 2019-10-30 2021-09-24 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법, 및 이를 이용한 반도체 소자의 제조방법
KR102765343B1 (ko) 2019-12-27 2025-02-13 세인트-고바인 세라믹스 앤드 플라스틱스, 인크. 연마 물품 및 이의 형성 방법
CN114845838B (zh) 2019-12-27 2024-10-25 圣戈本陶瓷及塑料股份有限公司 磨料制品及其形成方法
US12129422B2 (en) 2019-12-27 2024-10-29 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles and methods of forming same
WO2021141904A1 (en) * 2020-01-06 2021-07-15 Saint-Gobain Abrasives, Inc. Abrasive article and method of use
KR102237326B1 (ko) * 2020-06-19 2021-04-07 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법
KR102237321B1 (ko) * 2020-06-19 2021-04-07 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법
KR102237311B1 (ko) * 2020-06-19 2021-04-07 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법
US12138738B2 (en) 2020-06-19 2024-11-12 Sk Enpulse Co., Ltd. Polishing pad, preparation method thereof and method for preparing semiconductor device using same
US11759909B2 (en) * 2020-06-19 2023-09-19 Sk Enpulse Co., Ltd. Polishing pad, preparation method thereof and method for preparing semiconductor device using same
KR102237316B1 (ko) * 2020-06-19 2021-04-07 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법
KR20240060700A (ko) * 2021-09-29 2024-05-08 엔테그리스, 아이엔씨. 폴리머 백킹 플레이트를 갖는 패드 컨디셔너
WO2023055649A1 (en) * 2021-09-29 2023-04-06 Entegris, Inc. Double-sided pad conditioner
WO2023130052A1 (en) 2021-12-30 2023-07-06 Saint-Gobain Abrasives, Inc. Abrasive articles and methods of forming same
CA3241421A1 (en) 2021-12-30 2023-07-06 Anthony MARTONE Abrasive articles and methods of forming same
EP4457054A4 (en) 2021-12-30 2026-01-14 Saint Gobain Abrasives Inc ABRASIVE ARTICLES AND THEIR FORMATION PROCESSES
CN116619246B (zh) * 2023-07-24 2023-11-10 北京寰宇晶科科技有限公司 一种具有金刚石柱状晶簇的cmp抛光垫修整器及其制备方法
WO2025235849A1 (en) * 2024-05-10 2025-11-13 RedoxBlox, Inc. Energy storage articles and methods for making and using the same

Family Cites Families (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2152392A (en) * 1937-01-26 1939-03-28 Carborundum Co Abrasive article and method of manufacturing the same
KR910002578B1 (ko) * 1988-01-19 1991-04-27 닙폰 가이시 카부시키카이샤 고밀도 SiC 소결체의 제조방법
US5152917B1 (en) 1991-02-06 1998-01-13 Minnesota Mining & Mfg Structured abrasive article
US5197249A (en) * 1991-02-07 1993-03-30 Wiand Ronald C Diamond tool with non-abrasive segments
JP2642573B2 (ja) * 1991-12-27 1997-08-20 日本碍子株式会社 ＳｉＣ質焼結体
US5435816A (en) 1993-01-14 1995-07-25 Minnesota Mining And Manufacturing Company Method of making an abrasive article
DE69419764T2 (de) 1993-09-13 1999-12-23 Minnesota Mining And Mfg. Co., St. Paul Schleifartikel, verfahren zur herstellung desselben, verfahren zur verwendung desselben zum endbearbeiten, und herstellungswerkzeug
US5453312A (en) * 1993-10-29 1995-09-26 Minnesota Mining And Manufacturing Company Abrasive article, a process for its manufacture, and a method of using it to reduce a workpiece surface
JP3261687B2 (ja) 1994-06-09 2002-03-04 日本電信電話株式会社 パッドコンディショナー及びその製造方法
JP2974047B2 (ja) * 1995-03-15 1999-11-08 三和研磨工業株式会社 円形取付部を備えた砥石チップ嵌込式研磨板
US5692950A (en) * 1996-08-08 1997-12-02 Minnesota Mining And Manufacturing Company Abrasive construction for semiconductor wafer modification
US6021559A (en) 1996-11-01 2000-02-08 3M Innovative Properties Company Methods of making a cube corner article master mold
US6368198B1 (en) 1999-11-22 2002-04-09 Kinik Company Diamond grid CMP pad dresser
US6214078B1 (en) 1997-11-25 2001-04-10 Ferro Corporation High temperature ceramic filter
US6364749B1 (en) 1999-09-02 2002-04-02 Micron Technology, Inc. CMP polishing pad with hydrophilic surfaces for enhanced wetting
KR100387954B1 (ko) * 1999-10-12 2003-06-19 (주) 휴네텍 연마패드용 컨디셔너와 이의 제조방법
TW467802B (en) 1999-10-12 2001-12-11 Hunatech Co Ltd Conditioner for polishing pad and method for manufacturing the same
US8062098B2 (en) * 2000-11-17 2011-11-22 Duescher Wayne O High speed flat lapping platen
US6632127B1 (en) 2001-03-07 2003-10-14 Jerry W. Zimmer Fixed abrasive planarization pad conditioner incorporating chemical vapor deposited polycrystalline diamond and method for making same
JP2003103464A (ja) 2001-09-28 2003-04-08 Mitsubishi Materials Corp ダイヤモンドコーティングドレッサー
US6642127B2 (en) 2001-10-19 2003-11-04 Applied Materials, Inc. Method for dicing a semiconductor wafer
US20030109204A1 (en) 2001-12-06 2003-06-12 Kinik Company Fixed abrasive CMP pad dresser and associated methods
JP2004001152A (ja) * 2002-06-03 2004-01-08 Tokyo Seimitsu Co Ltd ドレッサ、ドレッシング方法、研磨装置、及び研磨方法
JP4216025B2 (ja) * 2002-09-09 2009-01-28 株式会社リード 研磨布用ドレッサー及びそれを用いた研磨布のドレッシング方法
KR20050092743A (ko) 2003-01-15 2005-09-22 미츠비시 마테리알 가부시키가이샤 연질재 가공용 절삭 공구
US7089081B2 (en) 2003-01-31 2006-08-08 3M Innovative Properties Company Modeling an abrasive process to achieve controlled material removal
US20050025973A1 (en) 2003-07-25 2005-02-03 Slutz David E. CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same
US7066795B2 (en) * 2004-10-12 2006-06-27 Applied Materials, Inc. Polishing pad conditioner with shaped abrasive patterns and channels
US8398466B2 (en) 2006-11-16 2013-03-19 Chien-Min Sung CMP pad conditioners with mosaic abrasive segments and associated methods
US8622787B2 (en) 2006-11-16 2014-01-07 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US9138862B2 (en) * 2011-05-23 2015-09-22 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
US8393934B2 (en) 2006-11-16 2013-03-12 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
CA2620407A1 (en) * 2005-08-25 2007-03-01 Hiroshi Ishizuka Tool with sintered body polishing surface and method of manufacturing the same
TW200726582A (en) 2005-10-04 2007-07-16 Mitsubishi Materials Corp Rotary tool for processing flexible materials
JP4624293B2 (ja) * 2006-03-31 2011-02-02 株式会社ノリタケスーパーアブレーシブ Ｃｍｐパッドコンディショナー
US7410413B2 (en) * 2006-04-27 2008-08-12 3M Innovative Properties Company Structured abrasive article and method of making and using the same
US20080153398A1 (en) 2006-11-16 2008-06-26 Chien-Min Sung Cmp pad conditioners and associated methods
US8083820B2 (en) * 2006-12-22 2011-12-27 3M Innovative Properties Company Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same
US7993185B2 (en) * 2007-01-17 2011-08-09 Russell Gelfuso Device for smoothing the surfaces of hard or soft materials
US8323072B1 (en) * 2007-03-21 2012-12-04 3M Innovative Properties Company Method of polishing transparent armor
US20080233845A1 (en) * 2007-03-21 2008-09-25 3M Innovative Properties Company Abrasive articles, rotationally reciprocating tools, and methods
KR20090013369A (ko) 2007-08-01 2009-02-05 주식회사 세라코리 연마입자 탈락이 방지되는 연마재
WO2009043058A2 (en) 2007-09-28 2009-04-02 Chien-Min Sung Cmp pad conditioners with mosaic abrasive segments and associated methods
US8393938B2 (en) 2007-11-13 2013-03-12 Chien-Min Sung CMP pad dressers
US20090123795A1 (en) 2007-11-13 2009-05-14 Chuah P E Christopher J Condensate drainage subsystem for an electrochemical cell system
WO2009064345A2 (en) 2007-11-14 2009-05-22 Saint-Gobain Abrasives, Inc. A chemical mechanical planarization pad conditioner and methods of forming thereof
US8080073B2 (en) 2007-12-20 2011-12-20 3M Innovative Properties Company Abrasive article having a plurality of precisely-shaped abrasive composites
US8444458B2 (en) * 2007-12-31 2013-05-21 3M Innovative Properties Company Plasma treated abrasive article and method of making same
WO2009114413A1 (en) 2008-03-10 2009-09-17 Morgan Advanced Ceramics, Inc. Non-planar cvd diamond-coated cmp pad conditioner and method for manufacturing
KR100887979B1 (ko) 2008-03-28 2009-03-09 주식회사 세라코리 연마패드용 컨디셔닝 디스크
JP2010047691A (ja) * 2008-08-21 2010-03-04 Amical:Kk 着色ゴムチップ及び着色ゴムチップの製造方法
KR101020870B1 (ko) 2008-09-22 2011-03-09 프리시젼다이아몬드 주식회사 다이아몬드 막이 코팅된 ｃｍｐ 컨디셔너 및 그 제조방법
EP2174751B1 (de) 2008-10-10 2014-07-23 Center for Abrasives and Refractories Research & Development C.A.R.R.D. GmbH Schleifkornagglomerate, Verfahren zu ihrer Herstellung sowie ihre Verwendung zur Herstellung von Schleifmitteln
JP2010125567A (ja) 2008-11-28 2010-06-10 Mitsubishi Materials Corp Ｃｍｐパッドコンディショナー
WO2010063647A1 (en) * 2008-12-03 2010-06-10 Struers A/S Abrasive disc
US8764865B2 (en) 2008-12-17 2014-07-01 3M Innovative Properties Company Shaped abrasive particles with grooves
KR101413030B1 (ko) * 2009-03-24 2014-07-02 생-고벵 아브라시프 화학적 기계적 평탄화 패드 컨디셔너로 사용되는 연마 공구
JP2010221386A (ja) 2009-03-25 2010-10-07 Mitsubishi Materials Corp 基材被覆膜、基材被覆膜の製造方法およびｃｍｐパッドコンディショナー
US8801497B2 (en) * 2009-04-30 2014-08-12 Rdc Holdings, Llc Array of abrasive members with resilient support
JP5422262B2 (ja) * 2009-06-01 2014-02-19 ニッタ・ハース株式会社 研磨パッドのコンディショナー
CA2764358A1 (en) 2009-06-02 2010-12-09 Saint-Gobain Abrasives, Inc. Corrosion-resistant cmp conditioning tools and methods for making and using same
SG178605A1 (en) 2009-09-01 2012-04-27 Saint Gobain Abrasives Inc Chemical mechanical polishing conditioner
JP2011161584A (ja) 2010-02-12 2011-08-25 Shingijutsu Kaihatsu Kk 研磨工具
KR101091030B1 (ko) 2010-04-08 2011-12-09 이화다이아몬드공업 주식회사 감소된 마찰력을 갖는 패드 컨디셔너 제조방법
US20120171935A1 (en) 2010-12-20 2012-07-05 Diamond Innovations, Inc. CMP PAD Conditioning Tool
CN103688343B (zh) * 2011-03-07 2016-09-07 恩特格里公司 化学机械抛光垫修整器
US20130065490A1 (en) * 2011-09-12 2013-03-14 3M Innovative Properties Company Method of refurbishing vinyl composition tile
EP3705177A1 (en) 2012-01-10 2020-09-09 Saint-Gobain Ceramics & Plastics Inc. Abrasive particles having complex shapes and methods of forming same
TW201350267A (zh) * 2012-05-04 2013-12-16 聖高拜磨料有限公司 用於同雙側化學機械平坦化墊修整器一起使用之工具
CN115625629A (zh) 2012-08-02 2023-01-20 3M创新有限公司 具有精确成形特征部的研磨元件、用其制成的研磨制品及其制造方法
KR102089382B1 (ko) 2012-08-02 2020-03-16 쓰리엠 이노베이티브 프로퍼티즈 컴파니 정밀하게 형상화된 특징부를 갖는 연마 요소 전구체 및 그의 제조 방법
TWI530361B (zh) * 2012-11-07 2016-04-21 中國砂輪企業股份有限公司 化學機械研磨修整器及其製法
TWI511841B (zh) * 2013-03-15 2015-12-11 Kinik Co 貼合式化學機械硏磨修整器及其製法
CN203390712U (zh) * 2013-04-08 2014-01-15 宋健民 化学机械研磨修整器
TWI546159B (zh) * 2014-04-11 2016-08-21 中國砂輪企業股份有限公司 可控制研磨深度之化學機械研磨修整器
TWI616278B (zh) * 2015-02-16 2018-03-01 China Grinding Wheel Corp 化學機械研磨修整器

Similar Documents

Publication Publication Date Title
JP2015524358A5 (enExample)
JP2015530265A5 (enExample)
JP2016538139A5 (enExample)
EA201890835A1 (ru) Термическое напыление керамических материалов
WO2012122186A3 (en) Chemical mechanical planarization pad conditioner
EP3338306A4 (en) SILICON CARBIDE / GRAPHITE COMPOSITE AND ARTICLES AND ARRANGEMENTS MADE THEREFROM
JP2014508652A5 (enExample)
JP2013521144A5 (enExample)
IN2015DN03023A (enExample)
WO2012121946A3 (en) Methods of forming polycrystalline tables and polycrystalline elements and related structures
WO2012162430A3 (en) Cmp pad dresser having leveled tips and associated methods
EP3349237A4 (en) PROCESS FOR PREPARING AN SIC COMPOSITE SUBSTRATE AND METHOD FOR PRODUCING A SEMICONDUCTOR SUBSTRATE
PH12012000019A1 (en) Method of manufacturing a glass substrate for a magnetic disk and method of manufacturing a magnetic disk
TWD179672S (zh) 基板保持環之部分
BR112017014170A2 (pt) agregados de diamante com aglutinante vitrificado
EP2921575A4 (en) SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE AND METHOD FOR THE PRODUCTION THEREOF
MY195662A (en) Method for Manufacturing Magnetic-Disk Substrate, and Polishing Pad
TWD174921S (zh) 複合基板之部分
PH12012000070A1 (en) Method of manufacturing glass substrate for magnetic disk
TWM475334U (en) Polishing pad
CN105686596A (zh) 一种复合缓冲防滑垫
WO2015091682A3 (en) Super hard constructions & methods of making same
PH12014000045A1 (en) Glass substrate for magnetic recording medium and method for manufacturing the glass substrate for magnetic recording medium
JP2013188970A5 (enExample)
JP2016204187A5 (enExample)