JP6715006B2 - 精密に成形された構造部を有する研磨物品及びその作製方法 - Google Patents

精密に成形された構造部を有する研磨物品及びその作製方法 Download PDF

Info

Publication number
JP6715006B2
JP6715006B2 JP2015525533A JP2015525533A JP6715006B2 JP 6715006 B2 JP6715006 B2 JP 6715006B2 JP 2015525533 A JP2015525533 A JP 2015525533A JP 2015525533 A JP2015525533 A JP 2015525533A JP 6715006 B2 JP6715006 B2 JP 6715006B2
Authority
JP
Japan
Prior art keywords
polishing
abrasive
diamond
pad
elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015525533A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015524358A5 (enExample
JP2015524358A (ja
Inventor
デュイ ケー． レフー，
デュイ ケー． レフー，
ノア オー． シャンティ，
ノア オー． シャンティ，
ジンチン シエ，
ジンチン シエ，
キャスリン アール． ブレッチャー，
キャスリン アール． ブレッチャー，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2015524358A publication Critical patent/JP2015524358A/ja
Publication of JP2015524358A5 publication Critical patent/JP2015524358A5/ja
Application granted granted Critical
Publication of JP6715006B2 publication Critical patent/JP6715006B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/12—Lapping plates for working plane surfaces
    • B24B37/16—Lapping plates for working plane surfaces characterised by the shape of the lapping plate surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B24B37/245—Pads with fixed abrasives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/001—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as supporting member
    • B24D3/002—Flexible supporting members, e.g. paper, woven, plastic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/18—Wheels of special form

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
JP2015525533A 2012-08-02 2013-07-31 精密に成形された構造部を有する研磨物品及びその作製方法 Active JP6715006B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261678666P 2012-08-02 2012-08-02
US61/678,666 2012-08-02
PCT/US2013/052834 WO2014022465A1 (en) 2012-08-02 2013-07-31 Abrasive articles with precisely shaped features and method of making thereof

Publications (3)

Publication Number Publication Date
JP2015524358A JP2015524358A (ja) 2015-08-24
JP2015524358A5 JP2015524358A5 (enExample) 2016-09-23
JP6715006B2 true JP6715006B2 (ja) 2020-07-01

Family

ID=50028491

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015525533A Active JP6715006B2 (ja) 2012-08-02 2013-07-31 精密に成形された構造部を有する研磨物品及びその作製方法

Country Status (8)

Country Link
US (2) US10710211B2 (enExample)
EP (1) EP2879838B1 (enExample)
JP (1) JP6715006B2 (enExample)
KR (1) KR102089383B1 (enExample)
CN (1) CN104736299A (enExample)
SG (1) SG11201500802TA (enExample)
TW (1) TWI695756B (enExample)
WO (1) WO2014022465A1 (enExample)

Families Citing this family (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8758461B2 (en) 2010-12-31 2014-06-24 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
US8840694B2 (en) 2011-06-30 2014-09-23 Saint-Gobain Ceramics & Plastics, Inc. Liquid phase sintered silicon carbide abrasive particles
CN108262695A (zh) 2011-06-30 2018-07-10 圣戈本陶瓷及塑料股份有限公司 包括氮化硅磨粒的磨料制品
CN103826802B (zh) 2011-09-26 2018-06-12 圣戈本陶瓷及塑料股份有限公司 包括磨料颗粒材料的磨料制品，使用磨料颗粒材料的涂布磨料及其形成方法
CN104114327B (zh) 2011-12-30 2018-06-05 圣戈本陶瓷及塑料股份有限公司 复合成型研磨颗粒及其形成方法
EP3517245B1 (en) 2011-12-30 2023-12-13 Saint-Gobain Ceramics & Plastics Inc. Shaped abrasive particle and method of forming same
EP2802436B1 (en) 2012-01-10 2019-09-25 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having complex shapes
WO2013106602A1 (en) 2012-01-10 2013-07-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
WO2013149209A1 (en) 2012-03-30 2013-10-03 Saint-Gobain Abrasives, Inc. Abrasive products having fibrillated fibers
EP2852473B1 (en) 2012-05-23 2020-12-23 Saint-Gobain Ceramics & Plastics Inc. Shaped abrasive particles and methods of forming same
KR20150023034A (ko) 2012-06-29 2015-03-04 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 특정 형상을 가지는 연마입자들 및 이러한 입자들 형성방법
CN108177094B (zh) 2012-08-02 2021-01-15 3M创新有限公司 具有精确成形特征部的研磨元件前体及其制造方法
US9440332B2 (en) 2012-10-15 2016-09-13 Saint-Gobain Abrasives, Inc. Abrasive particles having particular shapes and methods of forming such particles
KR101818946B1 (ko) 2012-12-31 2018-01-17 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 미립자 소재 및 이의 형성방법
MX378491B (es) 2013-03-29 2025-03-11 Saint Gobain Abrasives Inc Particulas abrasivas con formas particulares y metodos para elaborar las particulas.
TW201502263A (zh) 2013-06-28 2015-01-16 Saint Gobain Ceramics 包含成形研磨粒子之研磨物品
US9783718B2 (en) 2013-09-30 2017-10-10 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particles and methods of forming same
WO2015102992A1 (en) 2013-12-31 2015-07-09 Saint-Gobain Abrasives, Inc. Abrasive article including shaped abrasive particles
US9771507B2 (en) 2014-01-31 2017-09-26 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle including dopant material and method of forming same
CA2945493C (en) 2014-04-14 2020-08-04 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
EP3131706B8 (en) 2014-04-14 2024-01-10 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
WO2015184355A1 (en) 2014-05-30 2015-12-03 Saint-Gobain Abrasives, Inc. Method of using an abrasive article including shaped abrasive particles
TW201600242A (zh) * 2014-06-18 2016-01-01 Kinik Co 拋光墊修整器
US20160144477A1 (en) * 2014-11-21 2016-05-26 Diane Scott Coated compressive subpad for chemical mechanical polishing
US9914864B2 (en) 2014-12-23 2018-03-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particles and method of forming same
US9707529B2 (en) 2014-12-23 2017-07-18 Saint-Gobain Ceramics & Plastics, Inc. Composite shaped abrasive particles and method of forming same
US9676981B2 (en) 2014-12-24 2017-06-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle fractions and method of forming same
JP6453666B2 (ja) * 2015-02-20 2019-01-16 東芝メモリ株式会社 研磨パッドドレッサの作製方法
TWI634200B (zh) 2015-03-31 2018-09-01 聖高拜磨料有限公司 固定磨料物品及其形成方法
EP3277459B1 (en) 2015-03-31 2023-08-16 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
KR102006615B1 (ko) 2015-06-11 2019-08-02 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 형상화 연마 입자들을 포함하는 연마 물품
AT517693B1 (de) * 2015-11-11 2017-04-15 Zkw Group Gmbh Konverter für Leuchtvorrichtungen
WO2017197002A1 (en) 2016-05-10 2017-11-16 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles and methods of forming same
KR102481559B1 (ko) 2016-05-10 2022-12-28 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 연마 입자 및 이의 형성 방법
TWI621502B (zh) * 2016-08-18 2018-04-21 中國砂輪企業股份有限公司 Double chemical mechanical polishing trimming system and method thereof
WO2018064642A1 (en) 2016-09-29 2018-04-05 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
WO2018116122A1 (en) * 2016-12-21 2018-06-28 3M Innovative Properties Company Pad conditioner with spacer and wafer planarization system
US10759024B2 (en) 2017-01-31 2020-09-01 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
US10563105B2 (en) 2017-01-31 2020-02-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
CN106956170A (zh) * 2017-03-24 2017-07-18 苏州国量量具科技有限公司 量块的加工方法
CN106938408A (zh) * 2017-03-24 2017-07-11 苏州国量量具科技有限公司 量块的生产方法
EP3642293A4 (en) 2017-06-21 2021-03-17 Saint-Gobain Ceramics&Plastics, Inc. PARTICULATE MATERIALS AND METHOD FOR MANUFACTURING THEREOF
WO2019012389A1 (en) 2017-07-11 2019-01-17 3M Innovative Properties Company ABRASIVE ARTICLES COMPRISING ADAPTABLE COATINGS AND POLISHING SYSTEM MANUFACTURED THEREFROM
CN107584434A (zh) * 2017-11-03 2018-01-16 绍兴自远磨具有限公司 一种钻石减薄垫及其制造方法
US20190351527A1 (en) * 2018-05-17 2019-11-21 Entegris, Inc. Conditioner for chemical-mechanical-planarization pad and related methods
WO2020165759A1 (en) 2019-02-13 2020-08-20 3M Innovative Properties Company Abrasive elements with precisely shaped features, abrasive articles fabricated therefrom and methods of making thereof
KR102304965B1 (ko) * 2019-10-30 2021-09-24 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법, 및 이를 이용한 반도체 소자의 제조방법
CN114846112A (zh) 2019-12-27 2022-08-02 圣戈本陶瓷及塑料股份有限公司 磨料制品及其形成方法
KR102765343B1 (ko) 2019-12-27 2025-02-13 세인트-고바인 세라믹스 앤드 플라스틱스, 인크. 연마 물품 및 이의 형성 방법
KR102719159B1 (ko) 2019-12-27 2024-10-21 세인트-고바인 세라믹스 앤드 플라스틱스, 인크. 연마 물품 및 이의 형성 방법
KR102843434B1 (ko) * 2020-01-06 2025-08-08 생-고뱅 어브레이시브즈, 인코포레이티드 연마 용품 및 사용 방법
KR102237311B1 (ko) * 2020-06-19 2021-04-07 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법
KR102237326B1 (ko) * 2020-06-19 2021-04-07 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법
US11759909B2 (en) 2020-06-19 2023-09-19 Sk Enpulse Co., Ltd. Polishing pad, preparation method thereof and method for preparing semiconductor device using same
KR102237321B1 (ko) * 2020-06-19 2021-04-07 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법
US12138738B2 (en) 2020-06-19 2024-11-12 Sk Enpulse Co., Ltd. Polishing pad, preparation method thereof and method for preparing semiconductor device using same
KR102237316B1 (ko) * 2020-06-19 2021-04-07 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법
JP2024535447A (ja) * 2021-09-29 2024-09-30 インテグリス・インコーポレーテッド 両面パッドコンディショナー
US20230094483A1 (en) * 2021-09-29 2023-03-30 Entegris, Inc. Pad conditioner with polymer backing plate
WO2023130053A1 (en) 2021-12-30 2023-07-06 Saint-Gobain Abrasives, Inc. Abrasive articles and methods of forming same
EP4457055A4 (en) 2021-12-30 2025-12-24 Saint Gobain Abrasives Inc ABRASIVE ARTICLES AND THEIR FORMATION PROCESSES
WO2023130051A1 (en) 2021-12-30 2023-07-06 Saint-Gobain Abrasives, Inc. Abrasive articles and methods of forming same
US20250058429A1 (en) * 2021-12-31 2025-02-20 3M Innovative Properties Company Pad conditioning disk with compressible circumferential layer
CN116619246B (zh) * 2023-07-24 2023-11-10 北京寰宇晶科科技有限公司 一种具有金刚石柱状晶簇的cmp抛光垫修整器及其制备方法
US20250347473A1 (en) * 2024-05-10 2025-11-13 RedoxBlox, Inc. Energy storage articles and methods for making and using the same

Family Cites Families (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2152392A (en) * 1937-01-26 1939-03-28 Carborundum Co Abrasive article and method of manufacturing the same
KR910002578B1 (ko) * 1988-01-19 1991-04-27 닙폰 가이시 카부시키카이샤 고밀도 SiC 소결체의 제조방법
US5152917B1 (en) 1991-02-06 1998-01-13 Minnesota Mining & Mfg Structured abrasive article
US5197249A (en) * 1991-02-07 1993-03-30 Wiand Ronald C Diamond tool with non-abrasive segments
JP2642573B2 (ja) 1991-12-27 1997-08-20 日本碍子株式会社 ＳｉＣ質焼結体
US5435816A (en) 1993-01-14 1995-07-25 Minnesota Mining And Manufacturing Company Method of making an abrasive article
SG64333A1 (en) 1993-09-13 1999-04-27 Minnesota Mining & Mfg Abrasive article method of manufacture of same method of using same for finishing and a production tool
US5453312A (en) * 1993-10-29 1995-09-26 Minnesota Mining And Manufacturing Company Abrasive article, a process for its manufacture, and a method of using it to reduce a workpiece surface
JP3261687B2 (ja) 1994-06-09 2002-03-04 日本電信電話株式会社 パッドコンディショナー及びその製造方法
JP2974047B2 (ja) * 1995-03-15 1999-11-08 三和研磨工業株式会社 円形取付部を備えた砥石チップ嵌込式研磨板
US5692950A (en) * 1996-08-08 1997-12-02 Minnesota Mining And Manufacturing Company Abrasive construction for semiconductor wafer modification
US6021559A (en) 1996-11-01 2000-02-08 3M Innovative Properties Company Methods of making a cube corner article master mold
US6368198B1 (en) 1999-11-22 2002-04-09 Kinik Company Diamond grid CMP pad dresser
US6214078B1 (en) 1997-11-25 2001-04-10 Ferro Corporation High temperature ceramic filter
US6364749B1 (en) 1999-09-02 2002-04-02 Micron Technology, Inc. CMP polishing pad with hydrophilic surfaces for enhanced wetting
KR100387954B1 (ko) * 1999-10-12 2003-06-19 (주) 휴네텍 연마패드용 컨디셔너와 이의 제조방법
US6439986B1 (en) * 1999-10-12 2002-08-27 Hunatech Co., Ltd. Conditioner for polishing pad and method for manufacturing the same
US8062098B2 (en) * 2000-11-17 2011-11-22 Duescher Wayne O High speed flat lapping platen
US6632127B1 (en) 2001-03-07 2003-10-14 Jerry W. Zimmer Fixed abrasive planarization pad conditioner incorporating chemical vapor deposited polycrystalline diamond and method for making same
JP2003103464A (ja) 2001-09-28 2003-04-08 Mitsubishi Materials Corp ダイヤモンドコーティングドレッサー
US6642127B2 (en) 2001-10-19 2003-11-04 Applied Materials, Inc. Method for dicing a semiconductor wafer
US20030109204A1 (en) 2001-12-06 2003-06-12 Kinik Company Fixed abrasive CMP pad dresser and associated methods
JP2004001152A (ja) 2002-06-03 2004-01-08 Tokyo Seimitsu Co Ltd ドレッサ、ドレッシング方法、研磨装置、及び研磨方法
JP4216025B2 (ja) * 2002-09-09 2009-01-28 株式会社リード 研磨布用ドレッサー及びそれを用いた研磨布のドレッシング方法
WO2004062851A1 (ja) 2003-01-15 2004-07-29 Mitsubishi Materials Corporation 軟質材加工用切削工具
US7089081B2 (en) 2003-01-31 2006-08-08 3M Innovative Properties Company Modeling an abrasive process to achieve controlled material removal
US20050025973A1 (en) 2003-07-25 2005-02-03 Slutz David E. CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same
US7066795B2 (en) * 2004-10-12 2006-06-27 Applied Materials, Inc. Polishing pad conditioner with shaped abrasive patterns and channels
US8398466B2 (en) 2006-11-16 2013-03-19 Chien-Min Sung CMP pad conditioners with mosaic abrasive segments and associated methods
US9138862B2 (en) * 2011-05-23 2015-09-22 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
US8393934B2 (en) 2006-11-16 2013-03-12 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US8622787B2 (en) 2006-11-16 2014-01-07 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
CN101693353A (zh) * 2005-08-25 2010-04-14 石塚博 具有烧结体研磨部的工具及其制造方法
TW200726582A (en) 2005-10-04 2007-07-16 Mitsubishi Materials Corp Rotary tool for processing flexible materials
JP4624293B2 (ja) * 2006-03-31 2011-02-02 株式会社ノリタケスーパーアブレーシブ Ｃｍｐパッドコンディショナー
US7410413B2 (en) * 2006-04-27 2008-08-12 3M Innovative Properties Company Structured abrasive article and method of making and using the same
US20080153398A1 (en) 2006-11-16 2008-06-26 Chien-Min Sung Cmp pad conditioners and associated methods
US8083820B2 (en) * 2006-12-22 2011-12-27 3M Innovative Properties Company Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same
US7993185B2 (en) * 2007-01-17 2011-08-09 Russell Gelfuso Device for smoothing the surfaces of hard or soft materials
US20080233845A1 (en) * 2007-03-21 2008-09-25 3M Innovative Properties Company Abrasive articles, rotationally reciprocating tools, and methods
US8323072B1 (en) * 2007-03-21 2012-12-04 3M Innovative Properties Company Method of polishing transparent armor
KR20090013369A (ko) 2007-08-01 2009-02-05 주식회사 세라코리 연마입자 탈락이 방지되는 연마재
CN104708539A (zh) 2007-09-28 2015-06-17 宋健民 具有镶嵌研磨块的cmp衬垫修整器和相关方法
US20090123795A1 (en) 2007-11-13 2009-05-14 Chuah P E Christopher J Condensate drainage subsystem for an electrochemical cell system
WO2009064677A2 (en) 2007-11-13 2009-05-22 Chien-Min Sung Cmp pad dressers
US8382557B2 (en) 2007-11-14 2013-02-26 Saint-Gobain Abrasives, Inc. Chemical mechanical planarization pad conditioner and methods of forming thereof
US8080073B2 (en) 2007-12-20 2011-12-20 3M Innovative Properties Company Abrasive article having a plurality of precisely-shaped abrasive composites
EP2240298A4 (en) * 2007-12-31 2014-04-30 3M Innovative Properties Co PLASMA TREATED ABRASIVE ARTICLE AND PROCESS FOR PRODUCING THE SAME
JP2011514848A (ja) 2008-03-10 2011-05-12 モルガン アドバンスド セラミックス， インコーポレイテッド 非平面のｃｖｄダイヤモンド被覆ｃｍｐパッドコンディショナーおよびその製造方法
KR100887979B1 (ko) 2008-03-28 2009-03-09 주식회사 세라코리 연마패드용 컨디셔닝 디스크
JP2010047691A (ja) * 2008-08-21 2010-03-04 Amical:Kk 着色ゴムチップ及び着色ゴムチップの製造方法
KR101020870B1 (ko) 2008-09-22 2011-03-09 프리시젼다이아몬드 주식회사 다이아몬드 막이 코팅된 ｃｍｐ 컨디셔너 및 그 제조방법
EP2174751B1 (de) 2008-10-10 2014-07-23 Center for Abrasives and Refractories Research & Development C.A.R.R.D. GmbH Schleifkornagglomerate, Verfahren zu ihrer Herstellung sowie ihre Verwendung zur Herstellung von Schleifmitteln
JP2010125567A (ja) 2008-11-28 2010-06-10 Mitsubishi Materials Corp Ｃｍｐパッドコンディショナー
WO2010063647A1 (en) * 2008-12-03 2010-06-10 Struers A/S Abrasive disc
US8764865B2 (en) 2008-12-17 2014-07-01 3M Innovative Properties Company Shaped abrasive particles with grooves
CN102341215B (zh) * 2009-03-24 2014-06-18 圣戈班磨料磨具有限公司 用作化学机械平坦化垫修整器的研磨工具
JP2010221386A (ja) 2009-03-25 2010-10-07 Mitsubishi Materials Corp 基材被覆膜、基材被覆膜の製造方法およびｃｍｐパッドコンディショナー
US8801497B2 (en) * 2009-04-30 2014-08-12 Rdc Holdings, Llc Array of abrasive members with resilient support
JP5422262B2 (ja) * 2009-06-01 2014-02-19 ニッタ・ハース株式会社 研磨パッドのコンディショナー
CA2764358A1 (en) 2009-06-02 2010-12-09 Saint-Gobain Abrasives, Inc. Corrosion-resistant cmp conditioning tools and methods for making and using same
EP2474025A2 (en) 2009-09-01 2012-07-11 Saint-Gobain Abrasives, Inc. Chemical mechanical polishing conditioner
JP2011161584A (ja) 2010-02-12 2011-08-25 Shingijutsu Kaihatsu Kk 研磨工具
KR101091030B1 (ko) 2010-04-08 2011-12-09 이화다이아몬드공업 주식회사 감소된 마찰력을 갖는 패드 컨디셔너 제조방법
US20120171935A1 (en) 2010-12-20 2012-07-05 Diamond Innovations, Inc. CMP PAD Conditioning Tool
JP6133218B2 (ja) * 2011-03-07 2017-05-24 インテグリス・インコーポレーテッド 化学機械平坦化パッドコンディショナー
US20130065490A1 (en) * 2011-09-12 2013-03-14 3M Innovative Properties Company Method of refurbishing vinyl composition tile
EP2802436B1 (en) * 2012-01-10 2019-09-25 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having complex shapes
TW201350267A (zh) * 2012-05-04 2013-12-16 聖高拜磨料有限公司 用於同雙側化學機械平坦化墊修整器一起使用之工具
CN115625629A (zh) 2012-08-02 2023-01-20 3M创新有限公司 具有精确成形特征部的研磨元件、用其制成的研磨制品及其制造方法
CN108177094B (zh) 2012-08-02 2021-01-15 3M创新有限公司 具有精确成形特征部的研磨元件前体及其制造方法
TWI530361B (zh) * 2012-11-07 2016-04-21 中國砂輪企業股份有限公司 化學機械研磨修整器及其製法
TWI511841B (zh) * 2013-03-15 2015-12-11 Kinik Co 貼合式化學機械硏磨修整器及其製法
CN203390712U (zh) * 2013-04-08 2014-01-15 宋健民 化学机械研磨修整器
TWI546159B (zh) * 2014-04-11 2016-08-21 中國砂輪企業股份有限公司 可控制研磨深度之化學機械研磨修整器
TWI616278B (zh) * 2015-02-16 2018-03-01 China Grinding Wheel Corp 化學機械研磨修整器

Also Published As

Publication number Publication date
EP2879838B1 (en) 2023-09-13
US20200298370A1 (en) 2020-09-24
US11697185B2 (en) 2023-07-11
JP2015524358A (ja) 2015-08-24
KR20150038331A (ko) 2015-04-08
US20150209932A1 (en) 2015-07-30
WO2014022465A1 (en) 2014-02-06
CN104736299A (zh) 2015-06-24
TWI695756B (zh) 2020-06-11
TW201410389A (zh) 2014-03-16
SG11201500802TA (en) 2015-04-29
EP2879838A1 (en) 2015-06-10
US10710211B2 (en) 2020-07-14
EP2879838A4 (en) 2016-05-25
KR102089383B1 (ko) 2020-03-16

Similar Documents

Publication Publication Date Title
JP6474346B2 (ja) 精密に成形された形成部を有する研磨要素前駆体及びその作製方法
US11697185B2 (en) Abrasive articles with precisely shaped features and method of making thereof
TWI660816B (zh) 具有精確成型特徵之硏磨元件，由彼等製得之硏磨物件，及彼等之製造方法
US20250326089A1 (en) Abrasive elements with precisely shaped features, abrasive articles fabricated therefrom and methods of making thereof
US20090068937A1 (en) CMP Pad Conditioners with Mosaic Abrasive Segments and Associated Methods

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160801

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20160801

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20170727

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170808

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20170823

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20170824

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171107

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20171212

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20180312

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20180918

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20190117

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20190125

A912 Re-examination (zenchi) completed and case transferred to appeal board

Free format text: JAPANESE INTERMEDIATE CODE: A912

Effective date: 20190222

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200316

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20200608

R150 Certificate of patent or registration of utility model

Ref document number: 6715006

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250