JP2015511403A5 - - Google Patents

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JP2015511403A5
JP2015511403A5 JP2014556783A JP2014556783A JP2015511403A5 JP 2015511403 A5 JP2015511403 A5 JP 2015511403A5 JP 2014556783 A JP2014556783 A JP 2014556783A JP 2014556783 A JP2014556783 A JP 2014556783A JP 2015511403 A5 JP2015511403 A5 JP 2015511403A5
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temperature
substrate
chamber walls
gas
exposing
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JP2014556783A
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JP2015511403A (ja
JP6254098B2 (ja
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Priority claimed from PCT/US2013/025577 external-priority patent/WO2013122874A1/en
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JP2014556783A 2012-02-13 2013-02-11 基板の選択性酸化のための方法および装置 Active JP6254098B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261597900P 2012-02-13 2012-02-13
US61/597,900 2012-02-13
US13/764,137 2013-02-11
PCT/US2013/025577 WO2013122874A1 (en) 2012-02-13 2013-02-11 Methods and apparatus for selective oxidation of a substrate
US13/764,137 US8993458B2 (en) 2012-02-13 2013-02-11 Methods and apparatus for selective oxidation of a substrate

Publications (3)

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JP2015511403A JP2015511403A (ja) 2015-04-16
JP2015511403A5 true JP2015511403A5 (enExample) 2016-06-09
JP6254098B2 JP6254098B2 (ja) 2017-12-27

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JP2014556783A Active JP6254098B2 (ja) 2012-02-13 2013-02-11 基板の選択性酸化のための方法および装置

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US (2) US8993458B2 (enExample)
JP (1) JP6254098B2 (enExample)
KR (1) KR102028779B1 (enExample)
CN (1) CN104106128B (enExample)
WO (1) WO2013122874A1 (enExample)

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