JP6254098B2 - 基板の選択性酸化のための方法および装置 - Google Patents

基板の選択性酸化のための方法および装置 Download PDF

Info

Publication number
JP6254098B2
JP6254098B2 JP2014556783A JP2014556783A JP6254098B2 JP 6254098 B2 JP6254098 B2 JP 6254098B2 JP 2014556783 A JP2014556783 A JP 2014556783A JP 2014556783 A JP2014556783 A JP 2014556783A JP 6254098 B2 JP6254098 B2 JP 6254098B2
Authority
JP
Japan
Prior art keywords
substrate
temperature
gas
chamber
chamber walls
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014556783A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015511403A (ja
JP2015511403A5 (enExample
Inventor
アグス ティジュンダラ，
アグス ティジュンダラ，
クリストファー エス． オルセン，
クリストファー エス． オルセン，
ヨハネス スウェンベルク，
ヨハネス スウェンベルク，
ララ ハウリルチャック，
ララ ハウリルチャック，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of JP2015511403A publication Critical patent/JP2015511403A/ja
Publication of JP2015511403A5 publication Critical patent/JP2015511403A5/ja
Application granted granted Critical
Publication of JP6254098B2 publication Critical patent/JP6254098B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02244—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of a metallic layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Formation Of Insulating Films (AREA)
JP2014556783A 2012-02-13 2013-02-11 基板の選択性酸化のための方法および装置 Active JP6254098B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261597900P 2012-02-13 2012-02-13
US61/597,900 2012-02-13
US13/764,137 2013-02-11
PCT/US2013/025577 WO2013122874A1 (en) 2012-02-13 2013-02-11 Methods and apparatus for selective oxidation of a substrate
US13/764,137 US8993458B2 (en) 2012-02-13 2013-02-11 Methods and apparatus for selective oxidation of a substrate

Publications (3)

Publication Number Publication Date
JP2015511403A JP2015511403A (ja) 2015-04-16
JP2015511403A5 JP2015511403A5 (enExample) 2016-06-09
JP6254098B2 true JP6254098B2 (ja) 2017-12-27

Family

ID=48945926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014556783A Active JP6254098B2 (ja) 2012-02-13 2013-02-11 基板の選択性酸化のための方法および装置

Country Status (5)

Country Link
US (2) US8993458B2 (enExample)
JP (1) JP6254098B2 (enExample)
KR (1) KR102028779B1 (enExample)
CN (1) CN104106128B (enExample)
WO (1) WO2013122874A1 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106637048A (zh) * 2016-12-29 2017-05-10 常州大学 一种低露点下选择性氧化薄膜的制备方法
TWI700750B (zh) * 2017-01-24 2020-08-01 美商應用材料股份有限公司 用於介電薄膜的選擇性沉積之方法及設備
US10224224B2 (en) 2017-03-10 2019-03-05 Micromaterials, LLC High pressure wafer processing systems and related methods
US10622214B2 (en) 2017-05-25 2020-04-14 Applied Materials, Inc. Tungsten defluorination by high pressure treatment
US10847360B2 (en) 2017-05-25 2020-11-24 Applied Materials, Inc. High pressure treatment of silicon nitride film
CN110678973B (zh) 2017-06-02 2023-09-19 应用材料公司 碳化硼硬掩模的干式剥除
KR102405723B1 (ko) 2017-08-18 2022-06-07 어플라이드 머티어리얼스, 인코포레이티드 고압 및 고온 어닐링 챔버
US10276411B2 (en) 2017-08-18 2019-04-30 Applied Materials, Inc. High pressure and high temperature anneal chamber
US11177128B2 (en) 2017-09-12 2021-11-16 Applied Materials, Inc. Apparatus and methods for manufacturing semiconductor structures using protective barrier layer
US10643867B2 (en) 2017-11-03 2020-05-05 Applied Materials, Inc. Annealing system and method
CN117936417A (zh) 2017-11-11 2024-04-26 微材料有限责任公司 用于高压处理腔室的气体输送系统
US10854483B2 (en) 2017-11-16 2020-12-01 Applied Materials, Inc. High pressure steam anneal processing apparatus
KR20200075892A (ko) 2017-11-17 2020-06-26 어플라이드 머티어리얼스, 인코포레이티드 고압 처리 시스템을 위한 컨덴서 시스템
TW202321493A (zh) * 2017-12-20 2023-06-01 美商應用材料股份有限公司 金屬薄膜之高壓氧化
CN111699549B (zh) 2018-01-24 2025-03-28 应用材料公司 使用高压退火的接缝弥合
JP7239598B2 (ja) 2018-03-09 2023-03-14 アプライド マテリアルズ インコーポレイテッド 金属含有材料の高圧アニーリングプロセス
US10714331B2 (en) 2018-04-04 2020-07-14 Applied Materials, Inc. Method to fabricate thermally stable low K-FinFET spacer
US10950429B2 (en) 2018-05-08 2021-03-16 Applied Materials, Inc. Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom
US10566188B2 (en) 2018-05-17 2020-02-18 Applied Materials, Inc. Method to improve film stability
US10704141B2 (en) 2018-06-01 2020-07-07 Applied Materials, Inc. In-situ CVD and ALD coating of chamber to control metal contamination
US10748783B2 (en) 2018-07-25 2020-08-18 Applied Materials, Inc. Gas delivery module
US10675581B2 (en) 2018-08-06 2020-06-09 Applied Materials, Inc. Gas abatement apparatus
JP7179172B6 (ja) 2018-10-30 2022-12-16 アプライド マテリアルズ インコーポレイテッド 半導体用途の構造体をエッチングするための方法
KR20210077779A (ko) 2018-11-16 2021-06-25 어플라이드 머티어리얼스, 인코포레이티드 강화된 확산 프로세스를 사용한 막 증착
WO2020117462A1 (en) 2018-12-07 2020-06-11 Applied Materials, Inc. Semiconductor processing system
US11322347B2 (en) 2018-12-14 2022-05-03 Applied Materials, Inc. Conformal oxidation processes for 3D NAND
US11901222B2 (en) 2020-02-17 2024-02-13 Applied Materials, Inc. Multi-step process for flowable gap-fill film
US11996305B2 (en) * 2021-06-29 2024-05-28 Applied Materials, Inc. Selective oxidation on rapid thermal processing (RTP) chamber with active steam generation

Family Cites Families (89)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2814009B2 (ja) 1990-06-05 1998-10-22 三菱電機株式会社 半導体装置の製造方法
JPH07118522B2 (ja) 1990-10-24 1995-12-18 インターナショナル・ビジネス・マシーンズ・コーポレイション 基板表面を酸化処理するための方法及び半導体の構造
KR940009597B1 (ko) * 1991-08-22 1994-10-15 삼성전자 주식회사 반도체장치의 게이트산화막 형성법
JPH05343391A (ja) 1992-06-04 1993-12-24 Fujitsu Ltd 半導体装置の製造方法
JP3271407B2 (ja) * 1993-12-24 2002-04-02 ソニー株式会社 熱処理方法及び熱処理装置
JPH07273101A (ja) * 1994-03-31 1995-10-20 Tokyo Electron Ltd 枚葉式熱処理装置
JP3383140B2 (ja) 1995-10-02 2003-03-04 株式会社東芝 不揮発性半導体記憶装置の製造方法
JP3084232B2 (ja) * 1996-06-04 2000-09-04 イートン コーポレーション 縦型加熱処理装置
US6071572A (en) 1996-10-15 2000-06-06 Applied Materials, Inc. Forming tin thin films using remote activated specie generation
US5800621A (en) 1997-02-10 1998-09-01 Applied Materials, Inc. Plasma source for HDP-CVD chamber
JPH10313004A (ja) * 1997-05-09 1998-11-24 Oki Electric Ind Co Ltd 半導体装置の製造方法
JP3413174B2 (ja) * 1997-07-11 2003-06-03 アプライド マテリアルズ インコーポレイテッド Ｉｎ−ｓｉｔｕ蒸気生成方法及び装置
TW430882B (en) 1997-11-20 2001-04-21 Tokyo Electron Ltd Plasma film forming method
FR2777115B1 (fr) * 1998-04-07 2001-07-13 Commissariat Energie Atomique Procede de traitement de substrats semi-conducteurs et structures obtenues par ce procede
US6114258A (en) * 1998-10-19 2000-09-05 Applied Materials, Inc. Method of oxidizing a substrate in the presence of nitride and oxynitride films
US6159835A (en) 1998-12-18 2000-12-12 Texas Instruments Incorporated Encapsulated low resistance gate structure and method for forming same
US6450116B1 (en) 1999-04-22 2002-09-17 Applied Materials, Inc. Apparatus for exposing a substrate to plasma radicals
US6348420B1 (en) 1999-12-23 2002-02-19 Asm America, Inc. Situ dielectric stacks
TW520453B (en) 1999-12-27 2003-02-11 Seiko Epson Corp A method to fabricate thin insulating films
JP4222707B2 (ja) 2000-03-24 2009-02-12 東京エレクトロン株式会社 プラズマ処理装置及び方法、ガス供給リング及び誘電体
US6598559B1 (en) * 2000-03-24 2003-07-29 Applied Materials, Inc. Temperature controlled chamber
CN100442454C (zh) 2000-09-19 2008-12-10 马特森技术公司 形成介电薄膜的方法
US6458714B1 (en) 2000-11-22 2002-10-01 Micron Technology, Inc. Method of selective oxidation in semiconductor manufacture
US6617266B2 (en) 2001-04-12 2003-09-09 Applied Materials, Inc. Barium strontium titanate annealing process
US6596653B2 (en) 2001-05-11 2003-07-22 Applied Materials, Inc. Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD
US6627501B2 (en) 2001-05-25 2003-09-30 Macronix International Co., Ltd. Method of forming tunnel oxide layer
US6753506B2 (en) 2001-08-23 2004-06-22 Axcelis Technologies System and method of fast ambient switching for rapid thermal processing
JP2003086569A (ja) 2001-09-12 2003-03-20 Tokyo Electron Ltd プラズマ処理方法
US6716734B2 (en) 2001-09-28 2004-04-06 Infineon Technologies Ag Low temperature sidewall oxidation of W/WN/poly-gatestack
US6812515B2 (en) 2001-11-26 2004-11-02 Hynix Semiconductor, Inc. Polysilicon layers structure and method of forming same
US7220312B2 (en) * 2002-03-13 2007-05-22 Micron Technology, Inc. Methods for treating semiconductor substrates
TWI225668B (en) 2002-05-13 2004-12-21 Tokyo Electron Ltd Substrate processing method
US20030232507A1 (en) 2002-06-12 2003-12-18 Macronix International Co., Ltd. Method for fabricating a semiconductor device having an ONO film
US7566929B2 (en) 2002-07-05 2009-07-28 Samsung Electronics Co., Ltd. Nonvolatile memory devices having floating gate electrodes with nitrogen-doped layers on portions thereof
US20040077142A1 (en) 2002-10-17 2004-04-22 Taiwan Semiconductor Manufacturing Co., Ltd. Atomic layer deposition and plasma treatment method for forming microelectronic capacitor structure with aluminum oxide containing dual dielectric layer
US6803275B1 (en) 2002-12-03 2004-10-12 Fasl, Llc ONO fabrication process for reducing oxygen vacancy content in bottom oxide layer in flash memory devices
US6806202B2 (en) 2002-12-03 2004-10-19 Motorola, Inc. Method of removing silicon oxide from a surface of a substrate
US7189652B1 (en) 2002-12-06 2007-03-13 Cypress Semiconductor Corporation Selective oxidation of gate stack
KR100497607B1 (ko) 2003-02-17 2005-07-01 삼성전자주식회사 박막 형성 방법 및 박막 증착 장치
JP2004335957A (ja) * 2003-05-12 2004-11-25 Trecenti Technologies Inc 半導体装置の製造方法
JP4694108B2 (ja) 2003-05-23 2011-06-08 東京エレクトロン株式会社 酸化膜形成方法、酸化膜形成装置および電子デバイス材料
US6958112B2 (en) 2003-05-27 2005-10-25 Applied Materials, Inc. Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation
US7179754B2 (en) 2003-05-28 2007-02-20 Applied Materials, Inc. Method and apparatus for plasma nitridation of gate dielectrics using amplitude modulated radio-frequency energy
US7534709B2 (en) 2003-05-29 2009-05-19 Samsung Electronics Co., Ltd. Semiconductor device and method of manufacturing the same
KR100471407B1 (ko) 2003-06-30 2005-03-14 주식회사 하이닉스반도체 폴리메탈 게이트 전극을 갖는 트랜지스터 제조 방법
KR100616498B1 (ko) 2003-07-26 2006-08-25 주식회사 하이닉스반도체 폴리/텅스텐 게이트 전극을 갖는 반도체 소자의 제조방법
US6982196B2 (en) 2003-11-04 2006-01-03 International Business Machines Corporation Oxidation method for altering a film structure and CMOS transistor structure formed therewith
US6955964B2 (en) 2003-11-05 2005-10-18 Promos Technologies, Inc. Formation of a double gate structure
US20050101147A1 (en) 2003-11-08 2005-05-12 Advanced Micro Devices, Inc. Method for integrating a high-k gate dielectric in a transistor fabrication process
US7115530B2 (en) 2003-12-03 2006-10-03 Texas Instruments Incorporated Top surface roughness reduction of high-k dielectric materials using plasma based processes
US8227019B2 (en) 2003-12-15 2012-07-24 Superpower Inc. High-throughput ex-situ method for rare-earth-barium-copper-oxide (REBCO) film growth
US7981785B2 (en) 2004-03-01 2011-07-19 Tokyo Electron Limited Method for manufacturing semiconductor device and plasma oxidation method
US7497959B2 (en) 2004-05-11 2009-03-03 International Business Machines Corporation Methods and structures for protecting one area while processing another area on a chip
US7229931B2 (en) 2004-06-16 2007-06-12 Applied Materials, Inc. Oxygen plasma treatment for enhanced HDP-CVD gapfill
CN1993813B (zh) 2004-08-13 2010-12-22 东京毅力科创株式会社 半导体装置的制造方法和等离子体氧化处理方法
KR100580587B1 (ko) 2004-09-07 2006-05-16 삼성전자주식회사 반도체 장치의 제조 방법
US7521316B2 (en) 2004-09-09 2009-04-21 Samsung Electronics Co., Ltd. Methods of forming gate structures for semiconductor devices
US20060105114A1 (en) 2004-11-16 2006-05-18 White John M Multi-layer high quality gate dielectric for low-temperature poly-silicon TFTs
US7141514B2 (en) 2005-02-02 2006-11-28 Applied Materials, Inc. Selective plasma re-oxidation process using pulsed RF source power
US7214628B2 (en) 2005-02-02 2007-05-08 Applied Materials, Inc. Plasma gate oxidation process using pulsed RF source power
WO2006095752A1 (ja) * 2005-03-08 2006-09-14 Hitachi Kokusai Electric Inc. 半導体装置の製造方法および基板処理装置
KR100900073B1 (ko) 2005-03-16 2009-05-28 가부시키가이샤 히다치 고쿠사이 덴키 기판처리방법 및 기판처리장치
US7972441B2 (en) 2005-04-05 2011-07-05 Applied Materials, Inc. Thermal oxidation of silicon using ozone
KR100678632B1 (ko) 2005-06-23 2007-02-05 삼성전자주식회사 반도체 집적 회로 장치의 제조 방법
KR100689679B1 (ko) 2005-09-22 2007-03-09 주식회사 하이닉스반도체 반도체 소자 제조 방법
US7355240B2 (en) 2005-09-22 2008-04-08 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor product including logic, non-volatile memory and volatile memory devices and method for fabrication thereof
US7888217B2 (en) 2005-10-20 2011-02-15 Applied Materials, Inc. Method for fabricating a gate dielectric of a field effect transistor
US7727828B2 (en) * 2005-10-20 2010-06-01 Applied Materials, Inc. Method for fabricating a gate dielectric of a field effect transistor
US20080011426A1 (en) 2006-01-30 2008-01-17 Applied Materials, Inc. Plasma reactor with inductively coupled source power applicator and a high temperature heated workpiece support
WO2007099922A1 (ja) 2006-02-28 2007-09-07 Tokyo Electron Limited プラズマ酸化処理方法および半導体装置の製造方法
US7799637B2 (en) 2006-06-26 2010-09-21 Sandisk Corporation Scaled dielectric enabled by stack sidewall process
US7407871B2 (en) 2006-09-05 2008-08-05 Tech Semiconductor Singapore Pte Ltd Method for passivation of plasma etch defects in DRAM devices
KR100757333B1 (ko) 2006-10-12 2007-09-11 삼성전자주식회사 불휘발성 메모리 장치의 제조 방법
US7976634B2 (en) * 2006-11-21 2011-07-12 Applied Materials, Inc. Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems
JP5283147B2 (ja) 2006-12-08 2013-09-04 国立大学法人東北大学 半導体装置および半導体装置の製造方法
JP2009010144A (ja) * 2007-06-27 2009-01-15 Hitachi Kokusai Electric Inc 基板処理装置
JP5343391B2 (ja) 2007-07-17 2013-11-13 デクセリアルズ株式会社 樹脂組成物及び画像表示装置
US7645709B2 (en) 2007-07-30 2010-01-12 Applied Materials, Inc. Methods for low temperature oxidation of a semiconductor device
US7951728B2 (en) 2007-09-24 2011-05-31 Applied Materials, Inc. Method of improving oxide growth rate of selective oxidation processes
US7749849B2 (en) 2007-12-18 2010-07-06 Micron Technology, Inc. Methods of selectively oxidizing semiconductor structures, and structures resulting therefrom
KR20100114037A (ko) 2007-12-20 2010-10-22 어플라이드 머티어리얼스, 인코포레이티드 향상된 가스 유동 분포를 가진 열 반응기
WO2009114617A1 (en) 2008-03-14 2009-09-17 Applied Materials, Inc. Methods for oxidation of a semiconductor device
US20090269939A1 (en) 2008-04-25 2009-10-29 Asm International, N.V. Cyclical oxidation process
US20090311877A1 (en) 2008-06-14 2009-12-17 Applied Materials, Inc. Post oxidation annealing of low temperature thermal or plasma based oxidation
US8236706B2 (en) 2008-12-12 2012-08-07 Mattson Technology, Inc. Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures
US20100297854A1 (en) 2009-04-22 2010-11-25 Applied Materials, Inc. High throughput selective oxidation of silicon and polysilicon using plasma at room temperature
US20110061810A1 (en) * 2009-09-11 2011-03-17 Applied Materials, Inc. Apparatus and Methods for Cyclical Oxidation and Etching
US20110061812A1 (en) * 2009-09-11 2011-03-17 Applied Materials, Inc. Apparatus and Methods for Cyclical Oxidation and Etching
US20110189860A1 (en) * 2010-02-02 2011-08-04 Applied Materials, Inc. Methods for nitridation and oxidation

Also Published As

Publication number Publication date
US20150206777A1 (en) 2015-07-23
JP2015511403A (ja) 2015-04-16
WO2013122874A1 (en) 2013-08-22
CN104106128A (zh) 2014-10-15
US20130210240A1 (en) 2013-08-15
US9514968B2 (en) 2016-12-06
KR20140135744A (ko) 2014-11-26
KR102028779B1 (ko) 2019-10-04
CN104106128B (zh) 2016-11-09
US8993458B2 (en) 2015-03-31

Similar Documents

Publication Publication Date Title
JP6254098B2 (ja) 基板の選択性酸化のための方法および装置
JP6622844B2 (ja) 遠隔プラズマ源を使用する低温での選択的な酸化のための装置及び方法
JP5451018B2 (ja) 選択的酸化プロセスの酸化物成長速度の改良方法
WO2010113946A1 (ja) 処理装置
JP3474258B2 (ja) 熱処理装置及び熱処理方法
US11189485B2 (en) Steam oxidation initiation for high aspect ratio conformal radical oxidation
KR20160110218A (ko) 기판 온도를 변경하기 위한 기판 트레이를 이용한 사전-세정 챔버 및 공정
JPH10107018A (ja) 半導体ウェーハの熱処理装置
JP5692850B2 (ja) 薄膜形成方法、薄膜形成装置及びプログラム
KR102603029B1 (ko) 열처리 방법 및 열처리 장치
JP4706260B2 (ja) 被処理体の酸化方法、酸化装置及び記憶媒体
US20140349491A1 (en) Methods and apparatus for selective oxidation of a substrate
JP6349234B2 (ja) シリコン酸化膜の形成方法、及び、シリコン酸化膜の形成装置
CN107978520B (zh) 金属的生长工艺
JP2008047588A (ja) 基板処理装置および基板処理方法
JP2010021378A (ja) シリコン酸窒化膜の形成方法および形成装置
JP5037988B2 (ja) ＳｉＣ半導体装置の製造方法
JP3081886B2 (ja) 成膜方法
JP2008153592A (ja) 基板処理装置および基板処理方法
JPH0574757A (ja) 半導体装置用高圧酸化炉
TW202430687A (zh) 基板處理方法，半導體裝置的製造方法，基板處理裝置及程式
JP2015080001A (ja) 薄膜形成方法、薄膜形成装置及びプログラム
JP2003234397A (ja) 被処理体の保持装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20160112

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160414

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20161121

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20161129

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170228

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170314

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170607

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170725

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171017

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20171031

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20171129

R150 Certificate of patent or registration of utility model

Ref document number: 6254098

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250