JP2015015370A5 - - Google Patents
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- Publication number
- JP2015015370A5 JP2015015370A5 JP2013141295A JP2013141295A JP2015015370A5 JP 2015015370 A5 JP2015015370 A5 JP 2015015370A5 JP 2013141295 A JP2013141295 A JP 2013141295A JP 2013141295 A JP2013141295 A JP 2013141295A JP 2015015370 A5 JP2015015370 A5 JP 2015015370A5
- Authority
- JP
- Japan
- Prior art keywords
- heating step
- coating film
- forming
- substrate
- film according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims description 23
- 239000011248 coating agent Substances 0.000 claims description 21
- 238000000576 coating method Methods 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 238000004132 cross linking Methods 0.000 claims 2
- 230000009477 glass transition Effects 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000000354 decomposition reaction Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013141295A JP6081879B2 (ja) | 2013-07-05 | 2013-07-05 | 塗布膜の形成方法、プログラム及びコンピュータ記憶媒体 |
| PCT/JP2014/065576 WO2015001936A1 (ja) | 2013-07-05 | 2014-06-12 | 塗布膜の形成方法及びコンピュータ記憶媒体 |
| TW103121878A TWI569463B (zh) | 2013-07-05 | 2014-06-25 | The forming method of the coating film and the computer memory medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013141295A JP6081879B2 (ja) | 2013-07-05 | 2013-07-05 | 塗布膜の形成方法、プログラム及びコンピュータ記憶媒体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015015370A JP2015015370A (ja) | 2015-01-22 |
| JP2015015370A5 true JP2015015370A5 (enExample) | 2015-08-06 |
| JP6081879B2 JP6081879B2 (ja) | 2017-02-15 |
Family
ID=52143519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013141295A Active JP6081879B2 (ja) | 2013-07-05 | 2013-07-05 | 塗布膜の形成方法、プログラム及びコンピュータ記憶媒体 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6081879B2 (enExample) |
| TW (1) | TWI569463B (enExample) |
| WO (1) | WO2015001936A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016125408A1 (ja) * | 2015-02-05 | 2016-08-11 | 東京エレクトロン株式会社 | 研磨装置、塗布膜形成装置、塗布膜形成方法、記憶媒体、パターン形成方法及びパターン形成装置 |
| JP7308671B2 (ja) * | 2019-07-03 | 2023-07-14 | 東京エレクトロン株式会社 | 基板熱処理装置、基板熱処理方法及び記憶媒体 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6381820A (ja) * | 1986-09-25 | 1988-04-12 | Toshiba Corp | レジストパタ−ン形成方法 |
| JPS6381923A (ja) * | 1986-09-26 | 1988-04-12 | Hitachi Ltd | 感光性ポリイミド樹脂処理方法および装置 |
| JPH0289059A (ja) * | 1988-09-26 | 1990-03-29 | Hitachi Electron Eng Co Ltd | ベーク方法 |
| JPH0561206A (ja) * | 1991-08-30 | 1993-03-12 | Oki Electric Ind Co Ltd | レジストの平坦化方法 |
| JP3282240B2 (ja) * | 1992-10-03 | 2002-05-13 | 住友金属工業株式会社 | 帯状材の連続塗装方法 |
| JP3563434B2 (ja) * | 1994-03-22 | 2004-09-08 | 株式会社神戸製鋼所 | 感熱自己接着性樹脂塗装金属板およびその製法並びに該樹脂塗装金属板の接合法 |
| JP3801271B2 (ja) * | 1996-08-30 | 2006-07-26 | 旭硝子株式会社 | アクティブマトリクス基板 |
| JP2001188357A (ja) * | 1999-12-28 | 2001-07-10 | Matsushita Electric Ind Co Ltd | 表示素子用基板への樹脂膜形成法及び装置、並びに該方法を用いた液晶表示装置の製造方法 |
| WO2003051999A1 (en) * | 2001-12-17 | 2003-06-26 | Daikin Industries, Ltd. | Crosslinkable elastomer composition and formed product comprising the same |
| JP2004002752A (ja) * | 2002-03-28 | 2004-01-08 | Toray Ind Inc | ポリ(脂環式オレフィン)組成物の処理方法並びに半導体装置、光学部品および有機電界発光装置 |
| US20040084774A1 (en) * | 2002-11-02 | 2004-05-06 | Bo Li | Gas layer formation materials |
| CN102298261A (zh) * | 2005-07-05 | 2011-12-28 | 日立化成工业株式会社 | 感光性粘接剂、粘接薄膜、粘接薄片以及粘接剂图案 |
| JP2008186934A (ja) * | 2007-01-29 | 2008-08-14 | Dainippon Screen Mfg Co Ltd | 熱処理装置および熱処理方法 |
-
2013
- 2013-07-05 JP JP2013141295A patent/JP6081879B2/ja active Active
-
2014
- 2014-06-12 WO PCT/JP2014/065576 patent/WO2015001936A1/ja not_active Ceased
- 2014-06-25 TW TW103121878A patent/TWI569463B/zh active
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